JP5327226B2 - パワーデバイス - Google Patents
パワーデバイス Download PDFInfo
- Publication number
- JP5327226B2 JP5327226B2 JP2010533736A JP2010533736A JP5327226B2 JP 5327226 B2 JP5327226 B2 JP 5327226B2 JP 2010533736 A JP2010533736 A JP 2010533736A JP 2010533736 A JP2010533736 A JP 2010533736A JP 5327226 B2 JP5327226 B2 JP 5327226B2
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- region
- trench
- emitter
- semiconductor substrate
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 29
- 239000002019 doping agent Substances 0.000 claims description 15
- 238000009825 accumulation Methods 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 230000000694 effects Effects 0.000 description 7
- 230000001629 suppression Effects 0.000 description 5
- 238000012356 Product development Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76831—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers in via holes or trenches, e.g. non-conductive sidewall liners
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0661—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body specially adapted for altering the breakdown voltage by removing semiconductor material at, or in the neighbourhood of, a reverse biased junction, e.g. by bevelling, moat etching, depletion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
- Thyristors (AREA)
Description
16 ベース領域、 19 第1トレンチ溝、 20 エミッタ領域、
22 エミッタ延在部分、 30 窪み、 40 トレンチゲート、
41 ゲート絶縁膜、 42 ダミートレンチ、 43 ダミートレンチ絶縁膜、
49 第2トレンチ溝
Claims (3)
- 第1導電型の半導体基板と、
前記半導体基板の表面に形成された第2導電型のベース領域と、
前記半導体基板の裏面に形成された第2導電型のコレクタ領域と、
前記ベース領域の表面に形成された第1導電型のエミッタ領域と、
前記エミッタ領域を貫通するように前記ベース領域に形成された第1トレンチ溝内にゲート絶縁膜を介して形成されたトレンチゲートと、
前記エミッタ領域と近接して前記ベース領域に形成された窪みと、
前記窪みの内壁に形成され、前記ベース領域よりドーパント密度の高い第2導電型のコンタクト層と、
前記窪みの底部に形成された第2トレンチ溝内にダミートレンチ絶縁膜を介して形成されたダミートレンチと、
前記エミッタ領域、前記コンタクト層及び前記ダミートレンチに電気的に接続されたエミッタ電極とを備え、
前記トレンチゲートと前記ダミートレンチは前記半導体基板に達していることを特徴とするパワーデバイス。 - 前記エミッタ領域は前記窪みの内壁の一部にまで形成され、
前記エミッタ領域が前記トレンチゲートと垂直方向に帯状に形成されることを特徴とする請求項1に記載のパワーデバイス。 - 前記半導体基板の前記ベース領域と接する領域には第1導電型のキャリア蓄積層が形成され、
前記キャリア蓄積層のドーパント密度は、前記半導体基板のうち前記キャリア蓄積層が形成されていない部分のドーパント密度より高いことを特徴とする請求項1に記載のパワーデバイス。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2008/068565 WO2010044135A1 (ja) | 2008-10-14 | 2008-10-14 | パワーデバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010044135A1 JPWO2010044135A1 (ja) | 2012-03-08 |
JP5327226B2 true JP5327226B2 (ja) | 2013-10-30 |
Family
ID=42106313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010533736A Active JP5327226B2 (ja) | 2008-10-14 | 2008-10-14 | パワーデバイス |
Country Status (6)
Country | Link |
---|---|
US (1) | US8129818B2 (ja) |
JP (1) | JP5327226B2 (ja) |
KR (1) | KR101174302B1 (ja) |
CN (1) | CN102187465B (ja) |
DE (1) | DE112008004038B4 (ja) |
WO (1) | WO2010044135A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11908925B2 (en) | 2021-04-09 | 2024-02-20 | Kabushiki Kaisha Toshiba | Semiconductor device and method for controlling semiconductor device |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6284314B2 (ja) * | 2012-08-21 | 2018-02-28 | ローム株式会社 | 半導体装置 |
EP3631862A1 (en) * | 2017-05-25 | 2020-04-08 | Dynex Semiconductor Limited | A semiconductor device |
CN111725306B (zh) * | 2019-03-22 | 2023-04-21 | 安建科技(深圳)有限公司 | 一种沟槽型功率半导体器件及其制造方法 |
US20230317835A1 (en) * | 2022-04-05 | 2023-10-05 | Globalfoundries U.S. Inc. | High holding voltage bipolar junction device |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001168333A (ja) * | 1999-09-30 | 2001-06-22 | Toshiba Corp | トレンチゲート付き半導体装置 |
JP2002353456A (ja) * | 2001-05-29 | 2002-12-06 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
JP2003224278A (ja) * | 2002-01-31 | 2003-08-08 | Mitsubishi Electric Corp | 絶縁ゲート型半導体装置とその製造方法 |
JP2004303964A (ja) * | 2003-03-31 | 2004-10-28 | Rohm Co Ltd | 半導体装置の製造方法および半導体装置 |
JP2005101514A (ja) * | 2003-08-27 | 2005-04-14 | Mitsubishi Electric Corp | 絶縁ゲート型トランジスタ及びインバータ回路 |
JP2007529115A (ja) * | 2003-12-30 | 2007-10-18 | フェアチャイルド・セミコンダクター・コーポレーション | パワー半導体デバイスおよびその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63124762A (ja) | 1986-11-13 | 1988-05-28 | Tokyo Electric Co Ltd | ステツピングモ−タ |
US5321281A (en) | 1992-03-18 | 1994-06-14 | Mitsubishi Denki Kabushiki Kaisha | Insulated gate semiconductor device and method of fabricating same |
JPH07235672A (ja) | 1994-02-21 | 1995-09-05 | Mitsubishi Electric Corp | 絶縁ゲート型半導体装置およびその製造方法 |
JPH1140797A (ja) * | 1997-05-19 | 1999-02-12 | Matsushita Electron Corp | 半導体装置及びその製造方法 |
JP2000058823A (ja) | 1998-08-13 | 2000-02-25 | Toshiba Corp | 半導体装置およびその製造方法 |
JP2000269486A (ja) | 1999-03-15 | 2000-09-29 | Toshiba Corp | 半導体装置 |
US6566691B1 (en) | 1999-09-30 | 2003-05-20 | Kabushiki Kaisha Toshiba | Semiconductor device with trench gate having structure to promote conductivity modulation |
US6916745B2 (en) | 2003-05-20 | 2005-07-12 | Fairchild Semiconductor Corporation | Structure and method for forming a trench MOSFET having self-aligned features |
JP3640945B2 (ja) | 2002-09-02 | 2005-04-20 | 株式会社東芝 | トレンチゲート型半導体装置及びその製造方法 |
JP3927111B2 (ja) | 2002-10-31 | 2007-06-06 | 株式会社東芝 | 電力用半導体装置 |
-
2008
- 2008-10-14 CN CN2008801316080A patent/CN102187465B/zh active Active
- 2008-10-14 DE DE112008004038.9T patent/DE112008004038B4/de active Active
- 2008-10-14 JP JP2010533736A patent/JP5327226B2/ja active Active
- 2008-10-14 US US13/058,544 patent/US8129818B2/en active Active
- 2008-10-14 KR KR1020117007552A patent/KR101174302B1/ko not_active IP Right Cessation
- 2008-10-14 WO PCT/JP2008/068565 patent/WO2010044135A1/ja active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001168333A (ja) * | 1999-09-30 | 2001-06-22 | Toshiba Corp | トレンチゲート付き半導体装置 |
JP2002353456A (ja) * | 2001-05-29 | 2002-12-06 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
JP2003224278A (ja) * | 2002-01-31 | 2003-08-08 | Mitsubishi Electric Corp | 絶縁ゲート型半導体装置とその製造方法 |
JP2004303964A (ja) * | 2003-03-31 | 2004-10-28 | Rohm Co Ltd | 半導体装置の製造方法および半導体装置 |
JP2005101514A (ja) * | 2003-08-27 | 2005-04-14 | Mitsubishi Electric Corp | 絶縁ゲート型トランジスタ及びインバータ回路 |
JP2007529115A (ja) * | 2003-12-30 | 2007-10-18 | フェアチャイルド・セミコンダクター・コーポレーション | パワー半導体デバイスおよびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11908925B2 (en) | 2021-04-09 | 2024-02-20 | Kabushiki Kaisha Toshiba | Semiconductor device and method for controlling semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
US20110133312A1 (en) | 2011-06-09 |
CN102187465B (zh) | 2013-06-19 |
JPWO2010044135A1 (ja) | 2012-03-08 |
DE112008004038T5 (de) | 2011-09-29 |
KR20110048075A (ko) | 2011-05-09 |
WO2010044135A1 (ja) | 2010-04-22 |
DE112008004038B4 (de) | 2015-02-12 |
CN102187465A (zh) | 2011-09-14 |
KR101174302B1 (ko) | 2012-08-16 |
US8129818B2 (en) | 2012-03-06 |
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