JP5324448B2 - ビームスプリッタ機器 - Google Patents

ビームスプリッタ機器 Download PDF

Info

Publication number
JP5324448B2
JP5324448B2 JP2009528463A JP2009528463A JP5324448B2 JP 5324448 B2 JP5324448 B2 JP 5324448B2 JP 2009528463 A JP2009528463 A JP 2009528463A JP 2009528463 A JP2009528463 A JP 2009528463A JP 5324448 B2 JP5324448 B2 JP 5324448B2
Authority
JP
Japan
Prior art keywords
beamlets
beam splitter
beamlet
prism
prisms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009528463A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010503897A5 (enExample
JP2010503897A (ja
Inventor
ジェイ． マーナン，アンドリュー
ファクリス，ディーン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2010503897A publication Critical patent/JP2010503897A/ja
Publication of JP2010503897A5 publication Critical patent/JP2010503897A5/ja
Application granted granted Critical
Publication of JP5324448B2 publication Critical patent/JP5324448B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/04—Catoptric systems, e.g. image erecting and reversing system using prisms only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/143—Beam splitting or combining systems operating by reflection only using macroscopically faceted or segmented reflective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2009528463A 2006-09-14 2007-09-13 ビームスプリッタ機器 Expired - Fee Related JP5324448B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/531,870 2006-09-14
US11/531,870 US7551359B2 (en) 2006-09-14 2006-09-14 Beam splitter apparatus and system
PCT/US2007/078357 WO2008033977A1 (en) 2006-09-14 2007-09-13 Beam splitter apparatus and system

Publications (3)

Publication Number Publication Date
JP2010503897A JP2010503897A (ja) 2010-02-04
JP2010503897A5 JP2010503897A5 (enExample) 2010-09-30
JP5324448B2 true JP5324448B2 (ja) 2013-10-23

Family

ID=39184133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009528463A Expired - Fee Related JP5324448B2 (ja) 2006-09-14 2007-09-13 ビームスプリッタ機器

Country Status (5)

Country Link
US (2) US7551359B2 (enExample)
EP (1) EP2074469A4 (enExample)
JP (1) JP5324448B2 (enExample)
CN (2) CN102226853B (enExample)
WO (1) WO2008033977A1 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080083886A1 (en) * 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
US7551359B2 (en) 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
US20100308497A1 (en) * 2007-09-06 2010-12-09 David Moses M Tool for making microstructured articles
ATE534500T1 (de) 2007-09-06 2011-12-15 3M Innovative Properties Co Verfahren zum formen von formwerkzeugen und verfahren zum formen von artikeln unter verwendung der formwerkzeuge
US8149494B1 (en) 2007-09-07 2012-04-03 The United States Of America As Represented By The Secretary Of The Navy Two-photon absorption switch having which-path exclusion and monolithic mach-zehnder interferometer
EP2208100B8 (en) * 2007-10-11 2017-08-16 3M Innovative Properties Company Chromatic confocal sensor
JP5524856B2 (ja) 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
WO2009108543A2 (en) 2008-02-26 2009-09-03 3M Innovative Properties Company Multi-photon exposure system
US20100225783A1 (en) * 2009-03-04 2010-09-09 Wagner Paul A Temporally Aligned Exposure Bracketing for High Dynamic Range Imaging
WO2011072198A2 (en) * 2009-12-10 2011-06-16 The Board Of Regents Of The University Of Texas System Optoacoustic / photoacoustic / acoustic imaging system using probe beam deflection
DE102010020158A1 (de) 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung sowie Verfahren zur Erzeugung dreidimensionaler Strukturen
US8619261B2 (en) * 2011-08-24 2013-12-31 The United States Of America As Represented By The Secretary Of The Navy Optical dynamic non-locality induction bit
CN103257450B (zh) * 2012-02-17 2015-03-25 台达电子工业股份有限公司 分光结构及具有该分光结构的光机系统
US9274344B2 (en) 2013-07-15 2016-03-01 The Boeing Company Method for extracting optical energy from an optical beam
WO2015044819A1 (en) * 2013-09-26 2015-04-02 Ecole Polytechnique Federale De Lausanne (Epfl) Optical prism for creating multiple views of an image
EP3317641B1 (en) 2015-06-30 2019-03-06 IMEC vzw Radiation carrier and use thereof in an optical sensor
KR102422784B1 (ko) 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
WO2017027453A1 (en) * 2015-08-07 2017-02-16 Google Inc. Controlling a line of sight angle of an imaging platform
US10257394B2 (en) 2016-02-12 2019-04-09 Contrast, Inc. Combined HDR/LDR video streaming
US10264196B2 (en) * 2016-02-12 2019-04-16 Contrast, Inc. Systems and methods for HDR video capture with a mobile device
EP3497925B1 (en) 2016-08-09 2022-11-23 Contrast, Inc. Real-time hdr video for vehicle control
KR101936120B1 (ko) * 2016-11-30 2019-01-08 부경대학교 산학협력단 광음향 단층촬영을 위한 프로브 및 실시간 광음향 단층촬영 장치
WO2018112929A1 (zh) * 2016-12-23 2018-06-28 重庆海蓝川马光电科技有限公司 用于多功能望远镜的复合棱镜及其双目望远镜光学系统
EP3837635A4 (en) 2018-08-14 2022-04-27 Contrast, Inc. Image compression
CN215953962U (zh) * 2021-09-03 2022-03-04 佛山市南海威宏模具制造有限公司 双眼式望远镜

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1549077A (en) * 1977-08-09 1979-08-01 Redifon Flight Simulation Ltd Scanning systems
US4797696A (en) 1985-07-24 1989-01-10 Ateq Corporation Beam splitting apparatus
US4796038A (en) 1985-07-24 1989-01-03 Ateq Corporation Laser pattern generation apparatus
JPH0778576B2 (ja) 1988-05-17 1995-08-23 株式会社シンク・ラボラトリー 光ビーム分割方法及び光ビーム分割変調方法
US4884697A (en) 1988-06-21 1989-12-05 Takacs Peter Z Surface profiling interferometer
US4956650A (en) 1988-08-26 1990-09-11 Ateq Corporation Pattern generation system
FR2665959B1 (fr) * 1990-08-16 1994-01-14 Oreal Appareil destine a permettre d'evaluer la brillance d'une surface, en particulier de la peau.
US5386221A (en) 1992-11-02 1995-01-31 Etec Systems, Inc. Laser pattern generation apparatus
DE69418248T2 (de) 1993-06-03 1999-10-14 Hamamatsu Photonics Kk Optisches Laser-Abtastsystem mit Axikon
JPH0735994A (ja) 1993-07-22 1995-02-07 Asahi Optical Co Ltd レーザ描画装置
US5548444A (en) * 1994-07-06 1996-08-20 Hughes Danbury Optical Systems, Inc. Optical beam homogenizing apparatus and method
US20050111089A1 (en) 1994-07-15 2005-05-26 Baer Stephen C. Superresolving microscopy apparatus
US6903347B2 (en) 1994-07-15 2005-06-07 Stephen C. Baer Superresolution in microlithography and fluorescence microscopy
US5952668A (en) 1994-07-15 1999-09-14 Baer; Stephen C. Resolution in microscopy and microlithography
US5671047A (en) 1995-05-15 1997-09-23 Bio-Rad Laboratories Laser beamsplitter for generating a plurality of parallel beams
US6084706A (en) 1997-07-09 2000-07-04 Etec Systems, Inc. High efficiency laser pattern generator
JP4106478B2 (ja) 1998-03-06 2008-06-25 株式会社オーク製作所 多ビーム走査型露光装置
JP4564655B2 (ja) 1998-04-21 2010-10-20 ユニバーシティ オブ コネチカット 多光子励起を用いたフリーフォームナノ製作
US6177170B1 (en) 1998-12-28 2001-01-23 Burlington Industries, Inc. Velvet-like jacquard fabrics and processes for making the same
US6590852B1 (en) 1999-01-05 2003-07-08 Call/Recall, Inc. Massively-parallel writing and reading of information within the three-dimensional volume of an optical disk, particularly by use of a doubly-telecentric afocal imaging system
EP1031868B1 (de) 1999-02-26 2003-05-14 Dr. Johannes Heidenhain GmbH Kompensierter Parallel-Strahlteiler mit zwei Platten sowie Interferometer
US6271514B1 (en) 1999-03-19 2001-08-07 Etec Systems, Inc. Multi-beam scanner including a dove prism array
US6731320B1 (en) 1999-03-19 2004-05-04 Applied Materials, Inc. Laser pattern generator
US6310710B1 (en) 1999-04-23 2001-10-30 Arie Shahar High-resolution reading and writing using beams and lenses rotating at equal or double speed
US6466352B1 (en) 1999-04-23 2002-10-15 Arie Shahar High-resolution reading and writing scan system for planar and cylindrical surfaces
US6243209B1 (en) 1999-05-20 2001-06-05 Etec Systems, Inc. Method and apparatus for providing rectangular shape array of light beams
US6345353B2 (en) 1999-07-20 2002-02-05 Microchip Technology Incorporated Stack pointer with post increment/decrement allowing selection from parallel read/write address outputs
US6767685B2 (en) * 1999-12-03 2004-07-27 Fuji Photo Film Co., Ltd. Plate-making method, plate-making apparatus used in such plate-making method, and image recording material
US6606197B2 (en) * 2000-03-28 2003-08-12 Corning Incorporated Dual grating filtering system
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
KR100810547B1 (ko) 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
JP4965052B2 (ja) 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー ３次元光学素子の加工方法
US6730256B1 (en) 2000-08-04 2004-05-04 Massachusetts Institute Of Technology Stereolithographic patterning with interlayer surface modifications
US6833234B1 (en) * 2000-08-04 2004-12-21 Massachusetts Institute Of Technology Stereolithographic patterning with variable size exposure areas
JP2002104134A (ja) 2000-09-29 2002-04-10 Takata Corp シートベルトリトラクタ
US6611379B2 (en) 2001-01-25 2003-08-26 Brookhaven Science Associates Llc Beam splitter and method for generating equal optical path length beams
US7568365B2 (en) 2001-05-04 2009-08-04 President & Fellows Of Harvard College Method and apparatus for micromachining bulk transparent materials using localized heating by nonlinearly absorbed laser radiation, and devices fabricated thereby
KR100481106B1 (ko) 2001-05-21 2005-04-07 가부시키가이샤 히타치세이사쿠쇼 투사기
US6561648B2 (en) * 2001-05-23 2003-05-13 David E. Thomas System and method for reconstruction of aberrated wavefronts
US6542247B2 (en) * 2001-06-06 2003-04-01 Agilent Technologies, Inc. Multi-axis interferometer with integrated optical structure and method for manufacturing rhomboid assemblies
US20040012872A1 (en) 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6841340B2 (en) 2001-07-13 2005-01-11 Fuji Photo Film Co., Ltd. Optical fabricating method and apparatus
US7298415B2 (en) 2001-07-13 2007-11-20 Xenogen Corporation Structured light imaging apparatus
US6909556B2 (en) * 2002-01-14 2005-06-21 Lightmaster Systems, Inc. Design of prism assemblies and kernel configurations for use in projection systems
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US6788445B2 (en) 2002-01-14 2004-09-07 Applied Materials, Inc. Multi-beam polygon scanning system
US20030164565A1 (en) 2002-03-04 2003-09-04 O'brien Keith T. Method of fabricating an injection mold insert for molding lens molds
US6781763B1 (en) * 2002-04-01 2004-08-24 The United States Of America As Represented By The Secretary Of The Air Force Image analysis through polarization modulation and combination
US7359045B2 (en) * 2002-05-06 2008-04-15 Applied Materials, Israel, Ltd. High speed laser scanning inspection system
US6801299B2 (en) * 2002-07-31 2004-10-05 Asml Holding N.V. System for laser beam expansion without expanding spatial coherence
GB0224529D0 (en) 2002-10-22 2002-11-27 Isis Innovation Improvements in or relating to multiple exposures of photosensitive material
CN100524026C (zh) * 2002-10-25 2009-08-05 迈普尔平版印刷Ip有限公司 光刻系统
US20030155667A1 (en) 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
JP4479232B2 (ja) * 2002-12-20 2010-06-09 富士ゼロックス株式会社 光波分割プリズム、光波分割プリズムの製造方法、及び光−光スイッチ装置
US7307787B2 (en) 2002-12-20 2007-12-11 Fuji Xerox Co., Ltd. Beam splitting prism, method of manufacturing beam splitting prism, and all-optical switching device
US6863244B2 (en) * 2003-01-24 2005-03-08 The Boeing Company Mitigation of angular acceleration effects on optical sensor data
US6995336B2 (en) 2003-01-29 2006-02-07 The Regents Of The University Of Michigan Method for forming nanoscale features
US6909735B2 (en) * 2003-04-10 2005-06-21 Hitachi Via Mechanics, Ltd. System and method for generating and controlling multiple independently steerable laser beam for material processing
US7057720B2 (en) * 2003-06-24 2006-06-06 Corning Incorporated Optical interrogation system and method for using same
JP2005084617A (ja) 2003-09-11 2005-03-31 Fuji Photo Film Co Ltd 多光子吸収露光方法および装置
US7421973B2 (en) * 2003-11-06 2008-09-09 Axcelis Technologies, Inc. System and method for performing SIMOX implants using an ion shower
EP1723455B1 (en) 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
US20050202352A1 (en) 2004-03-11 2005-09-15 Worcester Polytechnic Institute Systems and methods for sub-wavelength imaging
JP4729269B2 (ja) 2004-06-01 2011-07-20 オリンパス株式会社 レーザ走査型顕微鏡
EP1710609A1 (en) * 2005-04-08 2006-10-11 Deutsches Krebsforschungszentrum Stiftung des öffentlichen Rechts Optical scanning device and method of deriving same
US7551359B2 (en) 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US20080083886A1 (en) * 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions

Also Published As

Publication number Publication date
WO2008033977A1 (en) 2008-03-20
EP2074469A4 (en) 2010-12-08
US8107168B2 (en) 2012-01-31
US20090213466A1 (en) 2009-08-27
EP2074469A1 (en) 2009-07-01
CN102226853A (zh) 2011-10-26
CN101529309B (zh) 2011-12-14
CN101529309A (zh) 2009-09-09
JP2010503897A (ja) 2010-02-04
CN102226853B (zh) 2013-01-02
US20080068721A1 (en) 2008-03-20
US7551359B2 (en) 2009-06-23

Similar Documents

Publication Publication Date Title
JP5324448B2 (ja) ビームスプリッタ機器
JP2010503537A (ja) 多光子硬化性光反応性組成物を加工するのに好適な光学システム
KR102132846B1 (ko) 표면을 레이저 가공하기 위한 가공 장치 및 방법
US5373137A (en) Multiple-line laser writing apparatus and method
US20100309559A1 (en) Device for Beam Shaping
JP6768067B2 (ja) 幾何要素のアレイを印刷するための方法およびシステム
CN110389404A (zh) 贝塞尔光束刻写多芯光纤光栅装置
JP2019020731A (ja) レーザビームの線形強度分布を生成するための装置
US20230375760A1 (en) Method For Producing A Continuous Diffractive Optical Element, Device For Carrying Out The Production Method And Continuous Diffractive Optical Element
JP2012030267A (ja) レーザビーム照射装置、およびレーザビーム照射方法
CN102023387A (zh) 阵列环带光子筛匀光器及其制作方法
CN102023389B (zh) 阵列部分环带光子筛匀光器
TWI536122B (zh) 微影投影曝光設備之照明系統
US20120007285A1 (en) Mold making system and mold making method
CN117369222B (zh) 一种极紫外物镜装调全息图的制备系统和制备方法
Poleshchuk et al. Multibeam laser writing of diffractive optical elements
Jariwala et al. A film fabrication process on transparent substrate using mask projection micro-stereolithography
CN119828418B (zh) 一种在曲面光刻圆环微结构阵列的方法和装置
WO2005025800A1 (ja) レーザ加工方法及び加工装置
CN119526757A (zh) 用于生成三维结构的方法以及激光光刻设备
TW202323991A (zh) 特別是在微影投影曝光設備中的光學系統
Prasciolu et al. Fiber-to-rectangular waveguide optical coupling by means of diffractive elements
CN102023392A (zh) 阵列2环位相环匀光器及其制作方法
CN104718486B (zh) 用于聚焦激光的方法和设备
JP2009058625A (ja) レーザー照射光学系

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100813

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100813

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20121009

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121016

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130116

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130618

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130718

R150 Certificate of patent or registration of utility model

Ref document number: 5324448

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees