CN102226853B - 分束器装置和系统 - Google Patents

分束器装置和系统 Download PDF

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Publication number
CN102226853B
CN102226853B CN201110162555.2A CN201110162555A CN102226853B CN 102226853 B CN102226853 B CN 102226853B CN 201110162555 A CN201110162555 A CN 201110162555A CN 102226853 B CN102226853 B CN 102226853B
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CN
China
Prior art keywords
light pencil
beam splitter
prism
light
splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN201110162555.2A
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English (en)
Chinese (zh)
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CN102226853A (zh
Inventor
安德鲁·J·默南
迪安·法克里斯
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN102226853A publication Critical patent/CN102226853A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/04—Catoptric systems, e.g. image erecting and reversing system using prisms only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/143—Beam splitting or combining systems operating by reflection only using macroscopically faceted or segmented reflective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN201110162555.2A 2006-09-14 2007-09-13 分束器装置和系统 Expired - Fee Related CN102226853B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/531,870 2006-09-14
US11/531,870 US7551359B2 (en) 2006-09-14 2006-09-14 Beam splitter apparatus and system

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN2007800339752A Division CN101529309B (zh) 2006-09-14 2007-09-13 分束器装置和系统

Publications (2)

Publication Number Publication Date
CN102226853A CN102226853A (zh) 2011-10-26
CN102226853B true CN102226853B (zh) 2013-01-02

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CN201110162555.2A Expired - Fee Related CN102226853B (zh) 2006-09-14 2007-09-13 分束器装置和系统
CN2007800339752A Expired - Fee Related CN101529309B (zh) 2006-09-14 2007-09-13 分束器装置和系统

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US (2) US7551359B2 (enExample)
EP (1) EP2074469A4 (enExample)
JP (1) JP5324448B2 (enExample)
CN (2) CN102226853B (enExample)
WO (1) WO2008033977A1 (enExample)

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US7551359B2 (en) 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
US20100308497A1 (en) * 2007-09-06 2010-12-09 David Moses M Tool for making microstructured articles
ATE534500T1 (de) 2007-09-06 2011-12-15 3M Innovative Properties Co Verfahren zum formen von formwerkzeugen und verfahren zum formen von artikeln unter verwendung der formwerkzeuge
US8149494B1 (en) 2007-09-07 2012-04-03 The United States Of America As Represented By The Secretary Of The Navy Two-photon absorption switch having which-path exclusion and monolithic mach-zehnder interferometer
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JP5524856B2 (ja) 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
WO2009108543A2 (en) 2008-02-26 2009-09-03 3M Innovative Properties Company Multi-photon exposure system
US20100225783A1 (en) * 2009-03-04 2010-09-09 Wagner Paul A Temporally Aligned Exposure Bracketing for High Dynamic Range Imaging
WO2011072198A2 (en) * 2009-12-10 2011-06-16 The Board Of Regents Of The University Of Texas System Optoacoustic / photoacoustic / acoustic imaging system using probe beam deflection
DE102010020158A1 (de) 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung sowie Verfahren zur Erzeugung dreidimensionaler Strukturen
US8619261B2 (en) * 2011-08-24 2013-12-31 The United States Of America As Represented By The Secretary Of The Navy Optical dynamic non-locality induction bit
CN103257450B (zh) * 2012-02-17 2015-03-25 台达电子工业股份有限公司 分光结构及具有该分光结构的光机系统
US9274344B2 (en) 2013-07-15 2016-03-01 The Boeing Company Method for extracting optical energy from an optical beam
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KR102422784B1 (ko) 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
WO2017027453A1 (en) * 2015-08-07 2017-02-16 Google Inc. Controlling a line of sight angle of an imaging platform
US10257394B2 (en) 2016-02-12 2019-04-09 Contrast, Inc. Combined HDR/LDR video streaming
US10264196B2 (en) * 2016-02-12 2019-04-16 Contrast, Inc. Systems and methods for HDR video capture with a mobile device
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KR101936120B1 (ko) * 2016-11-30 2019-01-08 부경대학교 산학협력단 광음향 단층촬영을 위한 프로브 및 실시간 광음향 단층촬영 장치
WO2018112929A1 (zh) * 2016-12-23 2018-06-28 重庆海蓝川马光电科技有限公司 用于多功能望远镜的复合棱镜及其双目望远镜光学系统
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Also Published As

Publication number Publication date
WO2008033977A1 (en) 2008-03-20
EP2074469A4 (en) 2010-12-08
US8107168B2 (en) 2012-01-31
US20090213466A1 (en) 2009-08-27
EP2074469A1 (en) 2009-07-01
CN102226853A (zh) 2011-10-26
CN101529309B (zh) 2011-12-14
CN101529309A (zh) 2009-09-09
JP2010503897A (ja) 2010-02-04
JP5324448B2 (ja) 2013-10-23
US20080068721A1 (en) 2008-03-20
US7551359B2 (en) 2009-06-23

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