JP5319856B1 - 膜厚測定装置及び成膜装置 - Google Patents

膜厚測定装置及び成膜装置 Download PDF

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Publication number
JP5319856B1
JP5319856B1 JP2013510438A JP2013510438A JP5319856B1 JP 5319856 B1 JP5319856 B1 JP 5319856B1 JP 2013510438 A JP2013510438 A JP 2013510438A JP 2013510438 A JP2013510438 A JP 2013510438A JP 5319856 B1 JP5319856 B1 JP 5319856B1
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Japan
Prior art keywords
substrate
film thickness
light receiving
film
light
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English (en)
Japanese (ja)
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JPWO2013186879A1 (ja
Inventor
旭陽 佐井
陽平 日向
芳幸 大瀧
友松 姜
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Shincron Co Ltd
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Shincron Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
JP2013510438A 2012-06-13 2012-06-13 膜厚測定装置及び成膜装置 Active JP5319856B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/065141 WO2013186879A1 (ja) 2012-06-13 2012-06-13 膜厚測定装置及び成膜装置

Publications (2)

Publication Number Publication Date
JP5319856B1 true JP5319856B1 (ja) 2013-10-16
JPWO2013186879A1 JPWO2013186879A1 (ja) 2016-02-01

Family

ID=49595820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013510438A Active JP5319856B1 (ja) 2012-06-13 2012-06-13 膜厚測定装置及び成膜装置

Country Status (5)

Country Link
JP (1) JP5319856B1 (zh)
CN (1) CN104395690B (zh)
HK (1) HK1204490A1 (zh)
TW (1) TWI489080B (zh)
WO (1) WO2013186879A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532239B1 (ko) * 2014-02-11 2015-07-01 주식회사 지디 유리 식각 시스템에서의 활용이 가능한 두께 측정장치

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5925930B1 (ja) * 2015-03-18 2016-05-25 日本航空電子工業株式会社 光ファイバケーブルアセンブリ及び測定装置
JPWO2017135303A1 (ja) * 2016-02-02 2018-11-22 コニカミノルタ株式会社 測定装置
WO2017183471A1 (ja) * 2016-04-19 2017-10-26 東京エレクトロン株式会社 温度測定用基板及び温度測定システム
EP4191236A1 (en) 2017-05-23 2023-06-07 Hamamatsu Photonics K.K. Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
EP3633351B1 (en) * 2017-05-23 2023-03-29 Hamamatsu Photonics K.K. Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
JP6394825B1 (ja) * 2018-02-08 2018-09-26 横河電機株式会社 測定装置および測定方法
CN112176309B (zh) * 2020-11-27 2021-04-09 江苏永鼎光电子技术有限公司 用于镀膜机的激光直接光控装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5037060U (zh) * 1973-07-30 1975-04-18
JPS61145413A (ja) * 1984-12-19 1986-07-03 Mitsubishi Rayon Co Ltd センシング装置
JPH06195705A (ja) * 1992-10-27 1994-07-15 Sony Corp 磁気記録媒体の製造方法及び製造装置
US5483347A (en) * 1993-05-19 1996-01-09 Hughes Aircraft Company Non-contact measurement apparatus using bifurcated optical fiber bundle with intermixed fibers
JP2001124526A (ja) * 1999-10-29 2001-05-11 Japan Aviation Electronics Industry Ltd 光学式膜厚モニタ機構
JP2001141563A (ja) * 1999-11-17 2001-05-25 Toshiba Corp 分光測定方法と装置および温度測定装置と膜圧測定装置
JP2003121116A (ja) * 2001-10-12 2003-04-23 Optorun Co Ltd 真空紫外線光学膜厚モニタおよびこれを備える真空成膜装置
JP2003247811A (ja) * 2002-02-26 2003-09-05 Olympus Optical Co Ltd 光学式膜厚監視方法および装置
JP2008051699A (ja) * 2006-08-25 2008-03-06 Showa Shinku:Kk 有機薄膜の膜厚測定装置及び有機薄膜形成装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411373B1 (en) * 1999-10-08 2002-06-25 Instrumentation Metrics, Inc. Fiber optic illumination and detection patterns, shapes, and locations for use in spectroscopic analysis
US7049156B2 (en) * 2003-03-19 2006-05-23 Verity Instruments, Inc. System and method for in-situ monitor and control of film thickness and trench depth
TWI290614B (en) * 2006-04-21 2007-12-01 Advance Design Technology Inc A measuring apparatus for the thin film thickness using interference technology of laser
TW200839911A (en) * 2007-03-21 2008-10-01 Promos Technologies Inc Method for measuring thickness of film on sidewall of trench in semiconductor device
CN101038183A (zh) * 2007-04-23 2007-09-19 华中科技大学 光纤式结冰传感器
JP4878632B2 (ja) * 2009-07-03 2012-02-15 株式会社シンクロン 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
CN102103081A (zh) * 2009-12-16 2011-06-22 中国科学院大连化学物理研究所 一种集束光纤荧光传感器
CN201748901U (zh) * 2009-12-25 2011-02-16 成都南光机器有限公司 光学膜厚测量控制系统

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5037060U (zh) * 1973-07-30 1975-04-18
JPS61145413A (ja) * 1984-12-19 1986-07-03 Mitsubishi Rayon Co Ltd センシング装置
JPH06195705A (ja) * 1992-10-27 1994-07-15 Sony Corp 磁気記録媒体の製造方法及び製造装置
US5483347A (en) * 1993-05-19 1996-01-09 Hughes Aircraft Company Non-contact measurement apparatus using bifurcated optical fiber bundle with intermixed fibers
JP2001124526A (ja) * 1999-10-29 2001-05-11 Japan Aviation Electronics Industry Ltd 光学式膜厚モニタ機構
JP2001141563A (ja) * 1999-11-17 2001-05-25 Toshiba Corp 分光測定方法と装置および温度測定装置と膜圧測定装置
JP2003121116A (ja) * 2001-10-12 2003-04-23 Optorun Co Ltd 真空紫外線光学膜厚モニタおよびこれを備える真空成膜装置
JP2003247811A (ja) * 2002-02-26 2003-09-05 Olympus Optical Co Ltd 光学式膜厚監視方法および装置
JP2008051699A (ja) * 2006-08-25 2008-03-06 Showa Shinku:Kk 有機薄膜の膜厚測定装置及び有機薄膜形成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532239B1 (ko) * 2014-02-11 2015-07-01 주식회사 지디 유리 식각 시스템에서의 활용이 가능한 두께 측정장치

Also Published As

Publication number Publication date
WO2013186879A1 (ja) 2013-12-19
HK1204490A1 (zh) 2015-11-20
TWI489080B (zh) 2015-06-21
TW201350785A (zh) 2013-12-16
CN104395690B (zh) 2017-05-31
CN104395690A (zh) 2015-03-04
JPWO2013186879A1 (ja) 2016-02-01

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