HK1204490A1 - 膜厚測量裝置和成膜裝置 - Google Patents

膜厚測量裝置和成膜裝置

Info

Publication number
HK1204490A1
HK1204490A1 HK15104929.1A HK15104929A HK1204490A1 HK 1204490 A1 HK1204490 A1 HK 1204490A1 HK 15104929 A HK15104929 A HK 15104929A HK 1204490 A1 HK1204490 A1 HK 1204490A1
Authority
HK
Hong Kong
Prior art keywords
measuring
film thickness
film
forming
forming film
Prior art date
Application number
HK15104929.1A
Other languages
English (en)
Inventor
佐井旭陽
日向陽平
大瀧芳幸
姜友松
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Publication of HK1204490A1 publication Critical patent/HK1204490A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
HK15104929.1A 2012-06-13 2015-05-24 膜厚測量裝置和成膜裝置 HK1204490A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/065141 WO2013186879A1 (ja) 2012-06-13 2012-06-13 膜厚測定装置及び成膜装置

Publications (1)

Publication Number Publication Date
HK1204490A1 true HK1204490A1 (zh) 2015-11-20

Family

ID=49595820

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15104929.1A HK1204490A1 (zh) 2012-06-13 2015-05-24 膜厚測量裝置和成膜裝置

Country Status (5)

Country Link
JP (1) JP5319856B1 (zh)
CN (1) CN104395690B (zh)
HK (1) HK1204490A1 (zh)
TW (1) TWI489080B (zh)
WO (1) WO2013186879A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532239B1 (ko) * 2014-02-11 2015-07-01 주식회사 지디 유리 식각 시스템에서의 활용이 가능한 두께 측정장치
JP5925930B1 (ja) * 2015-03-18 2016-05-25 日本航空電子工業株式会社 光ファイバケーブルアセンブリ及び測定装置
WO2017135303A1 (ja) * 2016-02-02 2017-08-10 コニカミノルタ株式会社 測定装置
CN107850495B (zh) * 2016-04-19 2020-06-30 东京毅力科创株式会社 温度测量用基板以及温度测量系统
EP4191236A1 (en) 2017-05-23 2023-06-07 Hamamatsu Photonics K.K. Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
WO2018216246A1 (ja) * 2017-05-23 2018-11-29 浜松ホトニクス株式会社 配向特性測定方法、配向特性測定プログラム、及び配向特性測定装置
JP6394825B1 (ja) * 2018-02-08 2018-09-26 横河電機株式会社 測定装置および測定方法
CN112176309B (zh) * 2020-11-27 2021-04-09 江苏永鼎光电子技术有限公司 用于镀膜机的激光直接光控装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5037060U (zh) * 1973-07-30 1975-04-18
JPS61145413A (ja) * 1984-12-19 1986-07-03 Mitsubishi Rayon Co Ltd センシング装置
JPH06195705A (ja) * 1992-10-27 1994-07-15 Sony Corp 磁気記録媒体の製造方法及び製造装置
US5483347A (en) * 1993-05-19 1996-01-09 Hughes Aircraft Company Non-contact measurement apparatus using bifurcated optical fiber bundle with intermixed fibers
US6411373B1 (en) * 1999-10-08 2002-06-25 Instrumentation Metrics, Inc. Fiber optic illumination and detection patterns, shapes, and locations for use in spectroscopic analysis
JP2001124526A (ja) * 1999-10-29 2001-05-11 Japan Aviation Electronics Industry Ltd 光学式膜厚モニタ機構
JP2001141563A (ja) * 1999-11-17 2001-05-25 Toshiba Corp 分光測定方法と装置および温度測定装置と膜圧測定装置
JP2003121116A (ja) * 2001-10-12 2003-04-23 Optorun Co Ltd 真空紫外線光学膜厚モニタおよびこれを備える真空成膜装置
JP3865303B2 (ja) * 2002-02-26 2007-01-10 オリンパス株式会社 光学式膜厚監視方法および装置
US7049156B2 (en) * 2003-03-19 2006-05-23 Verity Instruments, Inc. System and method for in-situ monitor and control of film thickness and trench depth
TWI290614B (en) * 2006-04-21 2007-12-01 Advance Design Technology Inc A measuring apparatus for the thin film thickness using interference technology of laser
JP4813292B2 (ja) * 2006-08-25 2011-11-09 株式会社昭和真空 有機薄膜の膜厚測定装置及び有機薄膜形成装置
TW200839911A (en) * 2007-03-21 2008-10-01 Promos Technologies Inc Method for measuring thickness of film on sidewall of trench in semiconductor device
CN101038183A (zh) * 2007-04-23 2007-09-19 华中科技大学 光纤式结冰传感器
JP4878632B2 (ja) * 2009-07-03 2012-02-15 株式会社シンクロン 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置
CN102103081A (zh) * 2009-12-16 2011-06-22 中国科学院大连化学物理研究所 一种集束光纤荧光传感器
CN201748901U (zh) * 2009-12-25 2011-02-16 成都南光机器有限公司 光学膜厚测量控制系统

Also Published As

Publication number Publication date
TW201350785A (zh) 2013-12-16
CN104395690A (zh) 2015-03-04
JPWO2013186879A1 (ja) 2016-02-01
WO2013186879A1 (ja) 2013-12-19
TWI489080B (zh) 2015-06-21
JP5319856B1 (ja) 2013-10-16
CN104395690B (zh) 2017-05-31

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210610