JP5313873B2 - スルホニウム塩開始剤 - Google Patents

スルホニウム塩開始剤 Download PDF

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Publication number
JP5313873B2
JP5313873B2 JP2009504692A JP2009504692A JP5313873B2 JP 5313873 B2 JP5313873 B2 JP 5313873B2 JP 2009504692 A JP2009504692 A JP 2009504692A JP 2009504692 A JP2009504692 A JP 2009504692A JP 5313873 B2 JP5313873 B2 JP 5313873B2
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JP
Japan
Prior art keywords
substituted
alkyl
acid
hydrogen
compound
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JP2009504692A
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English (en)
Japanese (ja)
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JP2009533377A5 (cg-RX-API-DMAC7.html
JP2009533377A (ja
Inventor
ハヨ，パスカル
イルク，シュテファン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
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Ciba Holding AG
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Publication of JP2009533377A5 publication Critical patent/JP2009533377A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/03—Powdery paints
    • C09D5/033—Powdery paints characterised by the additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polyethers (AREA)
  • Detergent Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP2009504692A 2006-04-13 2007-04-04 スルホニウム塩開始剤 Active JP5313873B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06112602 2006-04-13
EP06112602.5 2006-04-13
PCT/EP2007/053280 WO2007118794A1 (en) 2006-04-13 2007-04-04 Sulphonium salt initiators

Publications (3)

Publication Number Publication Date
JP2009533377A JP2009533377A (ja) 2009-09-17
JP2009533377A5 JP2009533377A5 (cg-RX-API-DMAC7.html) 2010-05-20
JP5313873B2 true JP5313873B2 (ja) 2013-10-09

Family

ID=36703163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009504692A Active JP5313873B2 (ja) 2006-04-13 2007-04-04 スルホニウム塩開始剤

Country Status (7)

Country Link
US (1) US8067643B2 (cg-RX-API-DMAC7.html)
EP (1) EP2007834B1 (cg-RX-API-DMAC7.html)
JP (1) JP5313873B2 (cg-RX-API-DMAC7.html)
KR (1) KR101389057B1 (cg-RX-API-DMAC7.html)
CN (1) CN101466804B (cg-RX-API-DMAC7.html)
TW (1) TWI404699B (cg-RX-API-DMAC7.html)
WO (1) WO2007118794A1 (cg-RX-API-DMAC7.html)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5290183B2 (ja) 2006-10-04 2013-09-18 チバ ホールディング インコーポレーテッド スルホニウム塩光開始剤
JP5473921B2 (ja) * 2007-10-10 2014-04-16 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
WO2009047105A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
JP5538229B2 (ja) * 2007-10-10 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
WO2009150074A1 (en) * 2008-06-12 2009-12-17 Basf Se Sulfonium derivatives and the use thereof as latent acids
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
CN102186815B (zh) 2008-10-20 2014-07-30 巴斯夫欧洲公司 锍衍生物及其作为潜酸的用途
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP2199856B1 (en) 2008-12-18 2013-08-07 Agfa Graphics N.V. Cationic radiation curable compositions
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
EP2399905B1 (en) * 2009-02-20 2014-01-22 San-Apro Limited Sulfonium salt, photo-acid generator, and photosensitive resin composition
WO2010141594A1 (en) * 2009-06-02 2010-12-09 Massachusetts Institute Of Technology Coatings
JP5387181B2 (ja) * 2009-07-08 2014-01-15 信越化学工業株式会社 スルホニウム塩、レジスト材料及びパターン形成方法
KR101995185B1 (ko) * 2009-12-17 2019-07-01 디에스엠 아이피 어셋츠 비.브이. 트라이아릴 설포늄 보레이트 양이온 광개시제를 포함하는 적층식 제작을 위한 액체 방사선 경화성 수지
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
KR20130091724A (ko) 2010-07-14 2013-08-19 닛뽄 가야쿠 가부시키가이샤 감광성 수지 조성물 및 이의 경화물
US8394575B2 (en) * 2010-09-30 2013-03-12 Lexmark International, Inc. Formulations for environmentally friendly photoresist film layers
KR20140007797A (ko) * 2010-10-07 2014-01-20 도오꾜오까고오교 가부시끼가이샤 가이드 패턴 형성용 네거티브형 현상용 레지스트 조성물, 가이드 패턴 형성 방법, 블록 코폴리머를 포함하는 층의 패턴 형성 방법
JP5691987B2 (ja) 2010-10-13 2015-04-01 信越化学工業株式会社 光硬化性樹脂組成物、そのドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜
JP5749631B2 (ja) * 2010-12-07 2015-07-15 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
JP6880416B2 (ja) 2015-10-01 2021-06-02 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 付加造形用液状ハイブリッドＵＶ／ｖｉｓ線硬化性樹脂組成物
JP2018536731A (ja) 2015-11-17 2018-12-13 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途
WO2018020974A1 (ja) * 2016-07-28 2018-02-01 サンアプロ株式会社 スルホニウム塩、熱又は光酸発生剤、熱又は光硬化性組成物及びその硬化体
CN107698477B (zh) 2016-08-08 2020-05-12 常州强力电子新材料股份有限公司 一种新型阳离子型光引发剂及其制备方法和应用
US11142495B2 (en) * 2016-10-17 2021-10-12 Toyo Gosei Co., Ltd. Composition and method for manufacturing device using same
CN109135392B (zh) * 2017-06-15 2021-11-02 常州强力电子新材料股份有限公司 一种双硫鎓盐光引发剂
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
CN109456242B (zh) 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN110922346A (zh) * 2019-11-12 2020-03-27 上海鑫响实业有限公司 一种三(4-乙酰联苯硫醚)硫醚鎓六氟磷酸盐及其合成方法
CN114901638B (zh) 2020-03-17 2024-10-29 三亚普罗股份有限公司 锍盐、光酸产生剂、固化性组合物和抗蚀剂组合物
JP7702796B2 (ja) * 2020-04-22 2025-07-04 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7784813B2 (ja) * 2020-04-22 2025-12-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716899B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7716900B2 (ja) * 2020-07-16 2025-08-01 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7713327B2 (ja) * 2020-08-03 2025-07-25 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
JP7758495B2 (ja) * 2020-08-03 2025-10-22 住友化学株式会社 酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488378A (en) 1966-04-06 1970-01-06 Dow Chemical Co Complexes of organic sulfoxides and hydrogen chloride and related sulfonium salts
US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
US4201640A (en) * 1979-03-14 1980-05-06 American Can Company Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6
ZA805273B (en) 1979-09-28 1981-11-25 Gen Electric Process of deep section curing photocurable compositions
US4451409A (en) * 1982-02-08 1984-05-29 The Dow Chemical Company Sulfonium organosulfonates
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
CA2034400A1 (en) * 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
DE4211060A1 (de) 1992-04-03 1993-10-07 Roehm Gmbh Polymerprodukte zur Behandlung von Leder
US5254760A (en) 1992-07-29 1993-10-19 Ciba-Geigy Corporation Inhibiting polymerization of vinyl aromatic monomers
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
JP4204113B2 (ja) * 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US5998092A (en) 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
US6337426B1 (en) 1998-11-23 2002-01-08 Nalco/Exxon Energy Chemicals, L.P. Antifoulant compositions and processes
US6444733B1 (en) 1999-03-01 2002-09-03 Ciba Specialty Chemicals Corporation Stabilizer combination for the rotomolding process
EP1350789B1 (en) 2000-12-15 2008-06-25 San-Apro Limited Process for producing sulfonium salt
US6468595B1 (en) 2001-02-13 2002-10-22 Sigma Technologies International, Inc. Vaccum deposition of cationic polymer systems
US6696216B2 (en) * 2001-06-29 2004-02-24 International Business Machines Corporation Thiophene-containing photo acid generators for photolithography
ES2329345T3 (es) 2001-07-19 2009-11-25 Lamberti Spa Sales de sulfonio como fotoiniciadores para sistemas que se pueden curar por radiacion.
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
AU2003233559A1 (en) * 2002-05-16 2003-12-02 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
US6632960B2 (en) * 2002-06-21 2003-10-14 Goldschmidt Ag Diaryliodonium salt catalysts made from iodotoluene and a method for preparing them
WO2004029037A1 (ja) * 2002-09-25 2004-04-08 Asahi Denka Co.Ltd. 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法
CA2511979A1 (en) 2003-02-19 2004-09-02 Akira Matsumoto Halogenated oxime derivatives and the use thereof as latent acids
US20050148679A1 (en) * 2003-12-29 2005-07-07 Chingfan Chiu Aryl sulfonium salt, polymerizable composition and polymerization method of the same
KR20070004649A (ko) 2004-01-27 2007-01-09 시바 스페셜티 케미칼스 홀딩 인크. 열적으로 안정한 양이온성 광경화성 조성물
US7592376B2 (en) * 2004-08-23 2009-09-22 Rensselaer Polytechnic Institute Photopolymerizable epoxide and oxetane compositions
CN1727333A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 一种链烷基硫鎓盐的制法及作为光聚合引发剂的用途
US7795323B2 (en) * 2005-09-02 2010-09-14 Konica Minolta Medical & Graphic, Inc. Active ray curable ink-jet ink
JP5473921B2 (ja) * 2007-10-10 2014-04-16 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤

Also Published As

Publication number Publication date
TW200804260A (en) 2008-01-16
US8067643B2 (en) 2011-11-29
WO2007118794A1 (en) 2007-10-25
KR20080112377A (ko) 2008-12-24
TWI404699B (zh) 2013-08-11
KR101389057B1 (ko) 2014-05-13
CN101466804B (zh) 2012-02-22
JP2009533377A (ja) 2009-09-17
EP2007834B1 (en) 2015-11-04
US20090197987A1 (en) 2009-08-06
CN101466804A (zh) 2009-06-24
EP2007834A1 (en) 2008-12-31
WO2007118794B1 (en) 2008-01-03

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