JP5312037B2 - 誘導結合rf電源を実現するためのシステムおよび方法 - Google Patents
誘導結合rf電源を実現するためのシステムおよび方法 Download PDFInfo
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- 238000005859 coupling reaction Methods 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
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- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
- H03L7/00—Automatic control of frequency or phase; Synchronisation
- H03L7/06—Automatic control of frequency or phase; Synchronisation using a reference signal applied to a frequency- or phase-locked loop
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
- H03L5/00—Automatic control of voltage, current, or power
- H03L5/02—Automatic control of voltage, current, or power of power
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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Description
216 RF増幅器
220 可変周波数RF電力信号
224 密結合インピーダンス整合器
Claims (15)
- 電源(116)を実現するためのシステムであって、
調節可能な作動周波数で高周波電力信号(220)を発生する電力増幅器(216)と、
可変共振条件を有するプラズマコイル(120)に前記高周波電力信号を供給するインピーダンス整合器(224)と、
前記調整可能な作動周波数を制御するために前記電力増幅器に対する駆動信号(248)を発生する位相同期回路(240)とを含み、
第一の制御回路であって、
前記電力増幅器に電力を供給するための可変電源(260)と、
前記電力増幅器に供給した前記電力のモニタリングを行い、それに応じて前記電力増幅器に所望の電力を供給するために前記可変電源を制御するための電源コントローラとを含む第一の制御回路と、
第二の制御回路であって、
前記プラズマコイルに隣接して位置決めされ、前記調節可能な作動周波数に対応するコイル位相信号(236)を発生する位相プローブ(232)を含み、
前記電力増幅器は、前記高周波電力信号から導出される基準位相信号(244)も発生し、
前記位相同期回路によって発生された前記駆動信号は、前記基準位相信号と前記コイル位相信号の間の位相関係に基づいており、
前記可変共振条件の変化に追従するために前記調節可能な作動周波数を調節することによって、前記電力増幅器から前記プラズマコイルに、実質的に安定した電力伝送を提供することを特徴とする第二の制御回路とをさらに含み、
前記電源は分析計器向けであること
を特徴とするシステム。 - 前記位相同期回路(240)の位相検出器(416)が、前記基準位相信号(244)及び前記コイル位相信号(236)を受信してそれらを比較し、前記位相関係を判断することを特徴とする請求項1に記載のシステム。
- 前記位相検出器(416)は、前記位相関係のマグニチュード及び極性を表す誤差電圧を発生することを特徴とする請求項2に記載のシステム。
- 前記誤差電圧は、前記調節可能な作動周波数が前記可変共振条件に等しい場合はゼロボルトに等しいことを特徴とする請求項3に記載のシステム。
- 前記基準位相信号(244)及び前記コイル位相信号(236)は、前記誤差電圧がゼロボルトに等しい時に前記位相関係が90度の位相外れになるようにサンプリングされることを特徴とする請求項4に記載のシステム。
- 前記位相検出器は、前記調節可能な作動周波数が、前記プラズマコイルのピーク共振周波数と異なる共振周波数に設定されるように前記誤差電圧を調節することを特徴とする請求項3に記載のシステム。
- 積分器デバイス(428)が、不要高周波成分を除去するために前記誤差電圧に対して濾波処理を実行することを特徴とする請求項3に記載のシステム。
- 前記位相同期回路(240)の電圧制御発振器(432)が、前記誤差電圧の振幅及び極性に応答して前記調節可能な作動周波数で前記駆動信号(248)を発生することを特徴とする請求項3に記載のシステム。
- 前記電源(116)の前記電力増幅器(216)は、前記インピーダンス整合器(224)に直接に密結合されることを特徴とする請求項1に記載のシステム。
- 前記インピーダンス整合器(224)は、前記電力増幅器(216)に対して動的可変インピーダンス特性を有することを特徴とする請求項1に記載のシステム。
- 前記インピーダンス整合器(224)は、固定インピーダンスを有することを特徴とする請求項1に記載のシステム。
- 前記電源(116)の前記プラズマコイル(120)を利用して、光学発光測定技術及び質量分光測定技術の少なくとも一方による分析のためにプラズマトーチ(124)内で試験サンプルをプラズマ状態で開始し、かつ維持することを特徴とする請求項1に記載のシステム。
- 前記電源(116)は、前記高周波電力信号(220)に対する作動電圧を選択するように調節可能である可変電源(260)を含むことを特徴とする請求項1に記載のシステム。
- 前記電源(116)は、該電源と外部ホストデバイスの間の双方向通信を可能にするホストインタフェースを含むことを特徴とする請求項1に記載のシステム。
- 電源(116)を実現する方法であって、
高周波電力信号(220)を、電力増幅器(216)を利用することにより、調節可能な作動周波数で発生させる段階と、
インピーダンス整合器(224)を利用して、可変共振条件を有するプラズマコイル(120)に前記高周波電力信号を供給する段階と、
前記調節可能な作動周波数を制御するために、位相同期回路(240)から前記電力増幅器に対する駆動信号(248)を発生させる段階とを含み、
第一の制御回路を動作させる段階であって、
可変電源(260)から電力増幅器に電力を供給する段階と、
前記電力増幅器に供給した電力のモニタリングを行い、それに応じて前記電力増幅器に所望の電力を供給するために前記可変電源を制御する段階と
を含む第一の制御回路を動作させる段階と、
第二の制御回路を動作させる段階であって、
前記電力増幅器から、前記高周波電力信号から導出される基準位相信号(244)を発生させる段階と、
前記プラズマコイルに隣接して位相プローブ(232)を位置決めし、前記調節可能な作動周波数に対応するコイル位相信号(236)を発生させる段階と、
前記基準位相信号と前記コイル位相信号の間の位相関係に基づいて、前記電力増幅器に対する前記駆動信号を発生させる段階と、
前記可変共振条件の変化に追従するために前記調節可能な作動周波数を調節することによって、前記電力増幅器から前記プラズマコイルに、実質的に安定した電力伝送を提供する段階と
を含む第二の制御回路を動作させる段階とをさらに含むことを特徴とし、
前記電源は分析計器向けであること
を特徴とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US11/285,530 | 2005-11-21 | ||
US11/285,530 US7459899B2 (en) | 2005-11-21 | 2005-11-21 | Inductively-coupled RF power source |
PCT/US2006/044752 WO2007061879A1 (en) | 2005-11-21 | 2006-11-16 | Inductively-coupled rf power source |
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JP2009516905A JP2009516905A (ja) | 2009-04-23 |
JP5312037B2 true JP5312037B2 (ja) | 2013-10-09 |
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JP2008542378A Active JP5312037B2 (ja) | 2005-11-21 | 2006-11-16 | 誘導結合rf電源を実現するためのシステムおよび方法 |
Country Status (7)
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US (3) | US7459899B2 (ja) |
EP (1) | EP1952537B1 (ja) |
JP (1) | JP5312037B2 (ja) |
CN (1) | CN101313471B (ja) |
AU (1) | AU2006318772A1 (ja) |
CA (1) | CA2629567C (ja) |
WO (1) | WO2007061879A1 (ja) |
Families Citing this family (90)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2720574T3 (es) | 2004-07-21 | 2019-07-23 | Mevion Medical Systems Inc | Generador de forma de onda de radio frecuencia programable para un sincrociclotrón |
EP2389982A3 (en) | 2005-11-18 | 2012-03-07 | Still River Systems, Inc. | Charged particle radiation therapy |
US7459899B2 (en) * | 2005-11-21 | 2008-12-02 | Thermo Fisher Scientific Inc. | Inductively-coupled RF power source |
US8447234B2 (en) | 2006-01-18 | 2013-05-21 | Qualcomm Incorporated | Method and system for powering an electronic device via a wireless link |
US9130602B2 (en) * | 2006-01-18 | 2015-09-08 | Qualcomm Incorporated | Method and apparatus for delivering energy to an electrical or electronic device via a wireless link |
US9774086B2 (en) | 2007-03-02 | 2017-09-26 | Qualcomm Incorporated | Wireless power apparatus and methods |
US9124120B2 (en) | 2007-06-11 | 2015-09-01 | Qualcomm Incorporated | Wireless power system and proximity effects |
DE102007036592B4 (de) * | 2007-08-02 | 2014-07-10 | Astrium Gmbh | Hochfrequenzgenerator für Ionen- und Elektronenquellen |
JP5697979B2 (ja) * | 2007-08-09 | 2015-04-08 | クゥアルコム・インコーポレイテッドQualcomm Incorporated | ワイヤレスに電力供給および充電するためのシステムおよび方法 |
KR20100063756A (ko) | 2007-09-13 | 2010-06-11 | 퀄컴 인코포레이티드 | 무선 전력 자기 공진기로부터 산출된 전력의 최대화 |
CN101828300A (zh) * | 2007-09-17 | 2010-09-08 | 高通股份有限公司 | 用于无线能量转移的发射器和接收器 |
EP2208279A4 (en) * | 2007-10-11 | 2016-11-30 | Qualcomm Inc | WIRELESS POWER TRANSFER USING MAGNETO-MECHANICAL SYSTEMS |
US8933650B2 (en) | 2007-11-30 | 2015-01-13 | Mevion Medical Systems, Inc. | Matching a resonant frequency of a resonant cavity to a frequency of an input voltage |
US8629576B2 (en) * | 2008-03-28 | 2014-01-14 | Qualcomm Incorporated | Tuning and gain control in electro-magnetic power systems |
US20090299918A1 (en) * | 2008-05-28 | 2009-12-03 | Nigelpower, Llc | Wireless delivery of power to a mobile powered device |
WO2009146439A1 (en) | 2008-05-30 | 2009-12-03 | Colorado State University Research Foundation | System, method and apparatus for generating plasma |
US8994270B2 (en) | 2008-05-30 | 2015-03-31 | Colorado State University Research Foundation | System and methods for plasma application |
WO2009146432A1 (en) | 2008-05-30 | 2009-12-03 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
KR101037445B1 (ko) | 2008-09-12 | 2011-05-30 | 전자부품연구원 | 안테나의 공진 주파수 고정장치 |
KR101767697B1 (ko) * | 2009-10-20 | 2017-08-11 | 램 리써치 코포레이션 | 플라즈마 프로세싱 시스템에서의 전류 제어 |
US8222822B2 (en) | 2009-10-27 | 2012-07-17 | Tyco Healthcare Group Lp | Inductively-coupled plasma device |
DE102010001395B4 (de) * | 2010-01-29 | 2013-11-14 | Forschungsverbund Berlin E.V. | Miniaturisierbare Plasmaquelle |
EP2554028B1 (en) | 2010-03-31 | 2016-11-23 | Colorado State University Research Foundation | Liquid-gas interface plasma device |
EP2552340A4 (en) | 2010-03-31 | 2015-10-14 | Univ Colorado State Res Found | PLASMA DEVICE WITH LIQUID GAS INTERFACE |
CN102439820B (zh) * | 2010-05-03 | 2016-08-03 | 松下知识产权经营株式会社 | 发电装置、发电系统及无线电力传输装置 |
CN102647845B (zh) * | 2011-02-22 | 2016-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 等离子体点火的装置、方法和半导体设备 |
US20130284369A1 (en) * | 2012-04-26 | 2013-10-31 | Applied Materials, Inc. | Two-phase operation of plasma chamber by phase locked loop |
US9161428B2 (en) | 2012-04-26 | 2015-10-13 | Applied Materials, Inc. | Independent control of RF phases of separate coils of an inductively coupled plasma reactor |
CN102740580B (zh) * | 2012-06-27 | 2015-08-19 | 华东师范大学 | 一种小功率集成微波微等离子体源 |
DE102012025079B4 (de) * | 2012-08-31 | 2016-09-08 | NorthCo Ventures GmbH & Co. KG | Vorrichtung und Verfahren zur Behandlung von biologischem Gewebe mit einem Niederdruckplasma |
US20150306411A1 (en) * | 2012-08-31 | 2015-10-29 | NorthCo Ventures GmbH & Co. KG | Apparatus and method for treatment of organic human tissue with a low pressure plasma |
JP2014055785A (ja) * | 2012-09-11 | 2014-03-27 | Shimadzu Corp | プラズマ用高周波電源及びそれを用いたicp発光分光分析装置 |
EP3581243A1 (en) | 2012-09-28 | 2019-12-18 | Mevion Medical Systems, Inc. | Controlling particle therapy |
CN104812444B (zh) | 2012-09-28 | 2017-11-21 | 梅维昂医疗系统股份有限公司 | 粒子束的能量调节 |
EP2901823B1 (en) | 2012-09-28 | 2021-12-08 | Mevion Medical Systems, Inc. | Controlling intensity of a particle beam |
EP2901824B1 (en) | 2012-09-28 | 2020-04-15 | Mevion Medical Systems, Inc. | Magnetic shims to adjust a position of a main coil and corresponding method |
JP6121546B2 (ja) | 2012-09-28 | 2017-04-26 | メビオン・メディカル・システムズ・インコーポレーテッド | 粒子加速器用の制御システム |
WO2014052718A2 (en) | 2012-09-28 | 2014-04-03 | Mevion Medical Systems, Inc. | Focusing a particle beam |
US9622335B2 (en) | 2012-09-28 | 2017-04-11 | Mevion Medical Systems, Inc. | Magnetic field regenerator |
US10254739B2 (en) | 2012-09-28 | 2019-04-09 | Mevion Medical Systems, Inc. | Coil positioning system |
EP2901820B1 (en) | 2012-09-28 | 2021-02-17 | Mevion Medical Systems, Inc. | Focusing a particle beam using magnetic field flutter |
JP6048068B2 (ja) * | 2012-10-25 | 2016-12-21 | 株式会社島津製作所 | プラズマ用高周波電源及びそれを用いたicp発光分光分析装置 |
GB2508176A (en) * | 2012-11-11 | 2014-05-28 | Univ Liverpool | Plasma generator RF frequency control tracking plasma resonance with adjustable frequency offset for power regulation |
CN103855911B (zh) * | 2012-11-28 | 2016-05-11 | 中国科学院微电子研究所 | 射频信号相位可数字式调节的射频电源 |
CN103855910B (zh) * | 2012-11-28 | 2016-05-11 | 中国科学院微电子研究所 | 射频信号相位可调节的射频电源 |
JP6456298B2 (ja) | 2012-12-18 | 2019-01-23 | トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトTRUMPF Huettinger GmbH + Co. KG | アーク消弧方法及び電力変換器を備えた電力供給システム |
CN104871430B (zh) | 2012-12-18 | 2018-01-12 | 通快许廷格两合公司 | 用于产生高频功率的方法和具有用于给负载供送功率的功率转换器的功率供送系统 |
CN103903945B (zh) * | 2012-12-24 | 2016-04-20 | 中微半导体设备(上海)有限公司 | 一种稳定脉冲射频的方法 |
US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
US9312106B2 (en) * | 2013-03-13 | 2016-04-12 | Applied Materials, Inc. | Digital phase controller for two-phase operation of a plasma reactor |
US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
EP2974559B1 (en) * | 2013-03-13 | 2020-05-13 | Radom Corporation | Plasma generator using dielectric resonator |
US8791656B1 (en) | 2013-05-31 | 2014-07-29 | Mevion Medical Systems, Inc. | Active return system |
US9730308B2 (en) | 2013-06-12 | 2017-08-08 | Mevion Medical Systems, Inc. | Particle accelerator that produces charged particles having variable energies |
US9601267B2 (en) | 2013-07-03 | 2017-03-21 | Qualcomm Incorporated | Wireless power transmitter with a plurality of magnetic oscillators |
CN104349567A (zh) * | 2013-07-29 | 2015-02-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 射频电源系统和利用射频电源系统进行阻抗匹配的方法 |
JP6855240B2 (ja) | 2013-09-27 | 2021-04-07 | メビオン・メディカル・システムズ・インコーポレーテッド | 粒子ビーム走査 |
JP6694813B2 (ja) | 2013-10-23 | 2020-05-20 | パーキンエルマー・ヘルス・サイエンシーズ・インコーポレイテッドPerkinelmer Health Sciences, Inc. | ジェネレータ及びシステム |
US9635750B2 (en) | 2013-10-23 | 2017-04-25 | Perkinelmer Health Sciences, Inc. | Oscillator generators and methods of using them |
US10675487B2 (en) | 2013-12-20 | 2020-06-09 | Mevion Medical Systems, Inc. | Energy degrader enabling high-speed energy switching |
US9962560B2 (en) | 2013-12-20 | 2018-05-08 | Mevion Medical Systems, Inc. | Collimator and energy degrader |
US9661736B2 (en) | 2014-02-20 | 2017-05-23 | Mevion Medical Systems, Inc. | Scanning system for a particle therapy system |
WO2015135104A1 (zh) * | 2014-03-10 | 2015-09-17 | 华为技术有限公司 | 一种阻抗匹配电路及发射机 |
TWI692274B (zh) | 2014-05-21 | 2020-04-21 | 瑞士商菲利浦莫里斯製品股份有限公司 | 用於加熱氣溶膠形成基材之感應加熱裝置及操作感應加熱系統之方法 |
US9950194B2 (en) | 2014-09-09 | 2018-04-24 | Mevion Medical Systems, Inc. | Patient positioning system |
US10624158B2 (en) | 2014-10-21 | 2020-04-14 | Ultraflex International Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
US11051369B2 (en) | 2014-10-21 | 2021-06-29 | Ultraflex International, Inc. | Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control |
JP6623557B2 (ja) * | 2015-05-27 | 2019-12-25 | 株式会社島津製作所 | Icp分析装置 |
US9866336B2 (en) * | 2015-06-17 | 2018-01-09 | Google Llc | Phased array antenna self-calibration |
US10786689B2 (en) | 2015-11-10 | 2020-09-29 | Mevion Medical Systems, Inc. | Adaptive aperture |
CA3022428A1 (en) * | 2016-04-27 | 2017-11-02 | Perkinelmer Health Sciences, Inc. | Oscillator generators and methods of using them |
WO2018009779A1 (en) | 2016-07-08 | 2018-01-11 | Mevion Medical Systems, Inc. | Treatment planning |
CN106234557A (zh) * | 2016-10-10 | 2016-12-21 | 成都沃特塞恩电子技术有限公司 | 一种射频功率源和射频解冻装置 |
US11103730B2 (en) | 2017-02-23 | 2021-08-31 | Mevion Medical Systems, Inc. | Automated treatment in particle therapy |
CN107123585B (zh) * | 2017-05-08 | 2018-11-30 | 清华大学深圳研究生院 | 一种直驱射频电源 |
CN107040226B (zh) * | 2017-06-08 | 2021-02-19 | 钢研纳克检测技术股份有限公司 | 一种全差分驱动的射频发生器 |
WO2019006253A1 (en) | 2017-06-30 | 2019-01-03 | Mevion Medical Systems, Inc. | CONFIGURABLE COLLIMATOR CONTROLLED BY LINEAR MOTORS |
US10020168B1 (en) * | 2017-07-20 | 2018-07-10 | Lam Research Corporation | Systems and methods for increasing efficiency of delivered power of a megahertz radio frequency generator in the presence of a kilohertz radio frequency generator |
CN107741523B (zh) * | 2017-09-07 | 2020-01-07 | 江汉大学 | 一种基于pll锁相环的时域信号测量装置 |
CN107450645B (zh) * | 2017-09-07 | 2018-12-28 | 武汉驭波科技有限公司 | 射频电源 |
US20190108976A1 (en) * | 2017-10-11 | 2019-04-11 | Advanced Energy Industries, Inc. | Matched source impedance driving system and method of operating the same |
CN108123713A (zh) * | 2018-02-09 | 2018-06-05 | 江苏天瑞仪器股份有限公司 | 一种新型固态射频电源系统 |
RU2695541C1 (ru) * | 2018-07-02 | 2019-07-24 | Акционерное общество "Концерн "Созвзедие" | Устройство ввода энергии в газоразрядную плазму |
US10950383B2 (en) | 2018-08-24 | 2021-03-16 | Etherdyne Technologies, Inc. | Large area power transmitter for wireless power transfer |
JP2022524103A (ja) | 2019-03-08 | 2022-04-27 | メビオン・メディカル・システムズ・インコーポレーテッド | カラム別の放射線の照射およびそのための治療計画の生成 |
CN110311631B (zh) * | 2019-05-29 | 2023-06-27 | 上海联影医疗科技股份有限公司 | 射频功率放大器、射频功率放大方法以及磁共振成像系统 |
CN112532198B (zh) * | 2020-12-03 | 2023-06-27 | 南华大学 | 一种射频离子源阻抗匹配方法及装置 |
JP2022139328A (ja) * | 2021-03-11 | 2022-09-26 | 東京エレクトロン株式会社 | 着火方法及びプラズマ処理装置 |
CN116419464A (zh) * | 2023-06-09 | 2023-07-11 | 安徽农业大学 | 一种等离子体炬装置 |
CN116722751A (zh) * | 2023-06-26 | 2023-09-08 | 中南大学 | 一种频率选择型射频电源及柔性变频控制方法 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3134947A (en) | 1961-11-28 | 1964-05-26 | Honeywell Regulator Co | Amplitude stabilized transistor oscillator |
US4245178A (en) | 1979-02-21 | 1981-01-13 | Westinghouse Electric Corp. | High-frequency electrodeless discharge device energized by compact RF oscillator operating in class E mode |
FR2460589A1 (fr) | 1979-07-04 | 1981-01-23 | Instruments Sa | Generateur de plasma |
US4577165A (en) | 1983-02-22 | 1986-03-18 | Tokyo Denshi Kagaku Co., Ltd. | High-frequency oscillator with power amplifier and automatic power control |
US4629887A (en) | 1983-03-08 | 1986-12-16 | Allied Corporation | Plasma excitation system |
US4629940A (en) | 1984-03-02 | 1986-12-16 | The Perkin-Elmer Corporation | Plasma emission source |
AT388814B (de) | 1985-11-15 | 1989-09-11 | Paar Anton Kg | Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas |
ES2003363A6 (es) | 1986-10-02 | 1988-11-01 | Gh Ind Sa | Perfeccionamientos en generadores de alta frecuencia para aplicaciones de calentamiento por induccion laser plasma y similares |
US4818916A (en) | 1987-03-06 | 1989-04-04 | The Perkin-Elmer Corporation | Power system for inductively coupled plasma torch |
DE3824970C2 (de) | 1988-07-22 | 1999-04-01 | Lindenmeier Heinz | Rückgekoppelter Hochfrequenz-Leistungsoszillator |
US5155547A (en) | 1990-02-26 | 1992-10-13 | Leco Corporation | Power control circuit for inductively coupled plasma atomic emission spectroscopy |
GB9226335D0 (en) | 1992-12-17 | 1993-02-10 | Fisons Plc | Inductively coupled plasma spectrometers and radio-frequency power supply therefor |
US5383019A (en) | 1990-03-23 | 1995-01-17 | Fisons Plc | Inductively coupled plasma spectrometers and radio-frequency power supply therefor |
NL9000809A (nl) | 1990-04-06 | 1991-11-01 | Philips Nv | Plasmagenerator. |
DE4019729A1 (de) | 1990-06-21 | 1992-01-02 | Leybold Ag | Ionenquelle |
FR2671929A1 (fr) | 1991-01-18 | 1992-07-24 | Thomson Tubes Electroniques | Generateur de chauffage par haute frequence. |
JP2710467B2 (ja) | 1992-04-16 | 1998-02-10 | アドバンスド エナージィ インダストリーズ,インコーポレイテッド | プロセシング・プラズマのac特性を特徴付ける装置 |
US5688357A (en) | 1995-02-15 | 1997-11-18 | Applied Materials, Inc. | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
TW369674B (en) * | 1996-05-15 | 1999-09-11 | Daihen Corp | Plasma processing apparatus |
US5909086A (en) | 1996-09-24 | 1999-06-01 | Jump Technologies Limited | Plasma generator for generating unipolar plasma |
US6329757B1 (en) | 1996-12-31 | 2001-12-11 | The Perkin-Elmer Corporation | High frequency transistor oscillator system |
US6027601A (en) | 1997-07-01 | 2000-02-22 | Applied Materials, Inc | Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor |
GB9714142D0 (en) | 1997-07-05 | 1997-09-10 | Surface Tech Sys Ltd | An arrangement for the feeding of RF power to one or more antennae |
JP2001516963A (ja) * | 1997-09-17 | 2001-10-02 | 東京エレクトロン株式会社 | ガスプラズマ処理を監視しかつ管理するためのシステムおよび方法 |
CN1310858A (zh) | 1998-01-13 | 2001-08-29 | 熔化照明股份有限公司 | 高频感应灯和功率振荡器 |
US6222186B1 (en) | 1998-06-25 | 2001-04-24 | Agilent Technologies, Inc. | Power-modulated inductively coupled plasma spectrometry |
US6351693B1 (en) * | 1999-01-22 | 2002-02-26 | Honeywell International Inc. | Computerized system for controlling thermostats |
US6752505B2 (en) * | 1999-02-23 | 2004-06-22 | Solid State Opto Limited | Light redirecting films and film systems |
US6646386B1 (en) | 1999-07-20 | 2003-11-11 | Tokyo Electron Limited | Stabilized oscillator circuit for plasma density measurement |
DE10085223T1 (de) | 1999-11-23 | 2002-10-31 | Fusion Lighting Inc | Selbstabstimmende elektrodenlose Lampen |
US6305316B1 (en) | 2000-07-20 | 2001-10-23 | Axcelis Technologies, Inc. | Integrated power oscillator RF source of plasma immersion ion implantation system |
US6459066B1 (en) | 2000-08-25 | 2002-10-01 | Board Of Regents, The University Of Texas System | Transmission line based inductively coupled plasma source with stable impedance |
WO2002054835A2 (en) * | 2001-01-08 | 2002-07-11 | Tokyo Electron Limited | Addition of power at selected harmonics of plasma processor drive frequency |
US6738051B2 (en) * | 2001-04-06 | 2004-05-18 | 3M Innovative Properties Company | Frontlit illuminated touch panel |
US6592234B2 (en) * | 2001-04-06 | 2003-07-15 | 3M Innovative Properties Company | Frontlit display |
JP4772232B2 (ja) * | 2001-08-29 | 2011-09-14 | アジレント・テクノロジーズ・インク | 高周波増幅回路及び高周波増幅回路の駆動方法 |
KR100964398B1 (ko) * | 2003-01-03 | 2010-06-17 | 삼성전자주식회사 | 유도결합형 안테나 및 이를 채용한 플라즈마 처리장치 |
JP4052473B2 (ja) * | 2004-01-29 | 2008-02-27 | 三菱重工業株式会社 | プラズマ処理装置 |
US7602127B2 (en) * | 2005-04-18 | 2009-10-13 | Mks Instruments, Inc. | Phase and frequency control of a radio frequency generator from an external source |
US7459899B2 (en) * | 2005-11-21 | 2008-12-02 | Thermo Fisher Scientific Inc. | Inductively-coupled RF power source |
-
2005
- 2005-11-21 US US11/285,530 patent/US7459899B2/en active Active
-
2006
- 2006-11-16 EP EP06837963.5A patent/EP1952537B1/en active Active
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CA2629567C (en) | 2012-09-18 |
US8110993B2 (en) | 2012-02-07 |
EP1952537A1 (en) | 2008-08-06 |
US20070114945A1 (en) | 2007-05-24 |
CN101313471B (zh) | 2012-06-20 |
CN101313471A (zh) | 2008-11-26 |
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