JP5311756B2 - 耐しみ汚れ性に優れた電気Znめっき鋼板 - Google Patents
耐しみ汚れ性に優れた電気Znめっき鋼板 Download PDFInfo
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- JP5311756B2 JP5311756B2 JP2007079917A JP2007079917A JP5311756B2 JP 5311756 B2 JP5311756 B2 JP 5311756B2 JP 2007079917 A JP2007079917 A JP 2007079917A JP 2007079917 A JP2007079917 A JP 2007079917A JP 5311756 B2 JP5311756 B2 JP 5311756B2
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- steel sheet
- resin
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- plating
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- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 73
- 239000010959 steel Substances 0.000 title claims abstract description 73
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- 239000011347 resin Substances 0.000 claims abstract description 127
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 11
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- 229910052802 copper Inorganic materials 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 10
- 229910052738 indium Inorganic materials 0.000 claims abstract description 9
- 229910052709 silver Inorganic materials 0.000 claims abstract description 8
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- 239000011701 zinc Substances 0.000 claims description 84
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 40
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 40
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- 229910010272 inorganic material Inorganic materials 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 13
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- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
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- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
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- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 210000002287 horizontal cell Anatomy 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical class O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000005324 oxide salts Chemical class 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/02—Electrolytic coating other than with metals with organic materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007079917A JP5311756B2 (ja) | 2007-03-26 | 2007-03-26 | 耐しみ汚れ性に優れた電気Znめっき鋼板 |
| CNA2008100094821A CN101307474A (zh) | 2007-03-26 | 2008-02-03 | 耐斑污性优良的电镀锌钢板 |
| TW097105795A TWI369419B (en) | 2007-03-26 | 2008-02-19 | Stain-resistant electrogalvanized steel sheet |
| KR1020080027168A KR100987912B1 (ko) | 2007-03-26 | 2008-03-25 | 내얼룩 오염성이 우수한 전기 Zn 도금 강판 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007079917A JP5311756B2 (ja) | 2007-03-26 | 2007-03-26 | 耐しみ汚れ性に優れた電気Znめっき鋼板 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008240036A JP2008240036A (ja) | 2008-10-09 |
| JP2008240036A5 JP2008240036A5 (enExample) | 2010-06-24 |
| JP5311756B2 true JP5311756B2 (ja) | 2013-10-09 |
Family
ID=39911721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007079917A Expired - Fee Related JP5311756B2 (ja) | 2007-03-26 | 2007-03-26 | 耐しみ汚れ性に優れた電気Znめっき鋼板 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5311756B2 (enExample) |
| KR (1) | KR100987912B1 (enExample) |
| CN (1) | CN101307474A (enExample) |
| TW (1) | TWI369419B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009197303A (ja) * | 2008-02-25 | 2009-09-03 | Kobe Steel Ltd | 耐しみ汚れ性に優れた電気Znめっき鋼板 |
| KR101112580B1 (ko) * | 2009-01-09 | 2012-02-22 | 오경호 | 인조 동판 제조방법 |
| CN103140605B (zh) * | 2010-09-29 | 2015-09-02 | 杰富意钢铁株式会社 | 镀锌系钢板 |
| CN104878417A (zh) * | 2015-06-26 | 2015-09-02 | 厦门理工学院 | 一种电镀液、三维多孔结构锌薄膜材料及其制备方法 |
| JP6427541B2 (ja) * | 2016-09-16 | 2018-11-21 | 本田技研工業株式会社 | 亜鉛−ニッケル複合めっき浴及びめっき方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08188898A (ja) * | 1995-01-11 | 1996-07-23 | Kobe Steel Ltd | 電気亜鉛めっき鋼板およびその製法 |
| JPH09195082A (ja) * | 1996-01-17 | 1997-07-29 | Nippon Steel Corp | めっき外観に優れた電気亜鉛めっき鋼板及びその製造方法 |
| JP3043336B1 (ja) * | 1999-06-11 | 2000-05-22 | 株式会社神戸製鋼所 | 耐白錆性に優れる電気Znめっき鋼板およびその製造方法 |
| WO2002078949A1 (en) | 2001-03-30 | 2002-10-10 | Nippon Steel Corporation | Metal product surface-treated with alkali-soluble lubricating film exhibiting excellent formability and excellent film removal property being stable for a long time and independent of temperature for drying film |
| JP3801470B2 (ja) * | 2001-08-29 | 2006-07-26 | 新日本製鐵株式会社 | 防錆剤含有水分散性金属表面処理剤、表面処理金属材とその製造方法 |
| JP4318610B2 (ja) | 2004-07-30 | 2009-08-26 | 株式会社神戸製鋼所 | 表面処理金属板 |
| JP4057626B2 (ja) * | 2006-08-11 | 2008-03-05 | 株式会社神戸製鋼所 | 耐しみ汚れ性に優れた電気Znめっき鋼板 |
-
2007
- 2007-03-26 JP JP2007079917A patent/JP5311756B2/ja not_active Expired - Fee Related
-
2008
- 2008-02-03 CN CNA2008100094821A patent/CN101307474A/zh active Pending
- 2008-02-19 TW TW097105795A patent/TWI369419B/zh not_active IP Right Cessation
- 2008-03-25 KR KR1020080027168A patent/KR100987912B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008240036A (ja) | 2008-10-09 |
| KR20080087698A (ko) | 2008-10-01 |
| KR100987912B1 (ko) | 2010-10-13 |
| TWI369419B (en) | 2012-08-01 |
| TW200912047A (en) | 2009-03-16 |
| CN101307474A (zh) | 2008-11-19 |
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