JP5303008B2 - 半導体素子及び半導体素子の製造方法 - Google Patents
半導体素子及び半導体素子の製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 95
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 238000000034 method Methods 0.000 title description 21
- 238000009792 diffusion process Methods 0.000 claims description 83
- 229910052732 germanium Inorganic materials 0.000 claims description 40
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 39
- 238000010438 heat treatment Methods 0.000 claims description 39
- 230000002265 prevention Effects 0.000 claims description 34
- 229910052710 silicon Inorganic materials 0.000 claims description 33
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 28
- 239000010703 silicon Substances 0.000 claims description 28
- 229910000838 Al alloy Inorganic materials 0.000 claims description 25
- 229910052782 aluminium Inorganic materials 0.000 claims description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- 239000010410 layer Substances 0.000 description 100
- 239000000758 substrate Substances 0.000 description 8
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 7
- 230000004913 activation Effects 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 229910008310 Si—Ge Inorganic materials 0.000 description 5
- 210000000746 body region Anatomy 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Description
シリコンを含む半導体領域、アルミニウムを主成分として含む電極、及び上記半導体領域と電極との間に介在し、ゲルマニウム並びにシリコンを含有する拡散防止層を備え、
上記拡散防止層及び電極が、ゲルマニウムを0.1原子%以上3原子%以下含有するアルミニウム合金膜の熱処理によって形成され、
上記拡散防止層のゲルマニウム含有量が20原子%以上50原子%以下、ゲルマニウム含有量に対するシリコン含有量の比が0.3以上3以下であり、上記拡散防止層の膜厚が1nm以上5nm以下である半導体素子である。
シリコンを含む半導体領域の表面に、ゲルマニウムを含むアルミニウム合金膜を形成する工程、及び
上記アルミニウム合金膜が形成された半導体領域に熱処理を行う工程
を有する。
本発明の半導体素子は、半導体領域、電極、及び上記半導体領域と電極との間に介在する拡散防止層を備える。
当該半導体素子の製造方法としては、特に限定されず、
(1)シリコンを含む半導体領域の表面に、ゲルマニウムを含むアルミニウム合金膜を形成する工程、及び
上記アルミニウム合金膜が形成された半導体領域に熱処理を行う工程
を有する製造方法や、
(2)シリコンを含む半導体領域の表面に、スパッタ等により拡散防止層を形成する工程、及び
上記拡散防止層の表面にアルミニウム膜又はアルミニウム合金膜を形成する工程
を有する製造方法等を用いることができる。なお、上記アルミニウム膜又はアルミニウム合金膜が、得られた半導体素子において電極として機能する。
各成分の含有量は、EDXライン分析により行った。このEDXライン分析は、電界放射型透過電子顕微鏡HF−2000(日立製作所製)及びこれに付加したEDX分析装置Sigma(Kevex製)を用いた。この際、EDXライン分析は約5nm間隔で測定点でデータ取得した。
TEM(上記電界放射型透過電子顕微鏡HF−2000(日立製作所製))を用い、拡散防止膜状の任意の5点の膜厚を測定し、この平均値をとった。
半導体領域としての単結晶シリコン基板(面方位100)表面に、マグネトロン・スパッタ法にて、ゲルマニウムを0.5原子%含むアルミニウム合金膜を成膜した。続いて、不活性ガス(N2)雰囲気下にて、500℃20分間保持する熱処理を行った。このようにして、シリコン基板(半導体領域)とアルミニウム合金膜(電極)との間に拡散防止層を形成し、実施例1の半導体素子を得た。
2 コレクタ層
3 ベース層
4 ボディ領域
5 エミッタ層
6 コレクタ電極
7 チャネル領域
8 ゲート絶縁膜
9 ゲート電極膜
10 エミッタ電極
11 層間絶縁膜
21 電極(Al)
22 半導体領域(Si)
23 拡散防止層
Claims (4)
- シリコンを含む半導体領域、アルミニウムを主成分として含む電極、及び上記半導体領域と電極との間に介在し、ゲルマニウム並びにシリコンを含有する拡散防止層を備え、
上記拡散防止層及び電極が、ゲルマニウムを0.1原子%以上3原子%以下含有するアルミニウム合金膜の熱処理によって形成され、
上記拡散防止層のゲルマニウム含有量が20原子%以上50原子%以下、ゲルマニウム含有量に対するシリコン含有量の比が0.3以上3以下であり、上記拡散防止層の膜厚が1nm以上5nm以下である半導体素子。 - 上記拡散防止層のゲルマニウム含有量が20原子%以上30原子%以下である請求項1に記載の半導体素子。
- シリコンを含む半導体領域の表面に、ゲルマニウムを0.1原子%以上3原子%以下含有するアルミニウム合金膜を形成する工程、及び
上記アルミニウム合金膜が形成された半導体領域に熱処理を行う工程
を有する半導体素子の製造方法。 - 請求項3に記載の製造方法により得られた半導体素子。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011157571A JP5303008B2 (ja) | 2011-07-19 | 2011-07-19 | 半導体素子及び半導体素子の製造方法 |
CN201280035317.8A CN103733310B (zh) | 2011-07-19 | 2012-07-19 | 半导体元件以及半导体元件的制造方法 |
EP12815245.1A EP2741318B1 (en) | 2011-07-19 | 2012-07-19 | Semiconductor element and method for manufacturing semiconductor element |
US14/233,388 US20140151886A1 (en) | 2011-07-19 | 2012-07-19 | Semiconductor element and method for manufacturing semiconductor element |
PCT/JP2012/068383 WO2013012050A1 (ja) | 2011-07-19 | 2012-07-19 | 半導体素子及び半導体素子の製造方法 |
KR1020147001064A KR101541656B1 (ko) | 2011-07-19 | 2012-07-19 | 반도체 소자 및 반도체 소자의 제조 방법 |
TW101126047A TWI493706B (zh) | 2011-07-19 | 2012-07-19 | Semiconductor element and manufacturing method of semiconductor element |
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KR (1) | KR101541656B1 (ja) |
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JPH065734B2 (ja) * | 1985-09-28 | 1994-01-19 | 新日本無線株式会社 | 半導体装置 |
JP2730265B2 (ja) * | 1990-05-14 | 1998-03-25 | 日本電気株式会社 | 半導体装置とその製造方法 |
JPH04280424A (ja) * | 1991-03-07 | 1992-10-06 | Hitachi Ltd | 半導体配線構造およびその製造方法 |
JP3804945B2 (ja) * | 1996-04-29 | 2006-08-02 | 株式会社半導体エネルギー研究所 | 薄膜トランジスタの作製方法 |
US6607948B1 (en) * | 1998-12-24 | 2003-08-19 | Kabushiki Kaisha Toshiba | Method of manufacturing a substrate using an SiGe layer |
JP2001185571A (ja) * | 1999-12-22 | 2001-07-06 | Matsushita Electronics Industry Corp | 突起電極の形成方法およびその形成装置 |
JP3940385B2 (ja) * | 2002-12-19 | 2007-07-04 | 株式会社神戸製鋼所 | 表示デバイスおよびその製法 |
JP2008010801A (ja) | 2005-08-17 | 2008-01-17 | Kobe Steel Ltd | ソース−ドレイン電極、薄膜トランジスタ基板およびその製造方法、並びに表示デバイス |
JP4826290B2 (ja) | 2006-03-06 | 2011-11-30 | トヨタ自動車株式会社 | 半導体素子の製造方法 |
JP2010238800A (ja) * | 2009-03-30 | 2010-10-21 | Kobe Steel Ltd | 表示装置用Al合金膜、薄膜トランジスタ基板および表示装置 |
CN101599522B (zh) * | 2009-06-30 | 2011-05-25 | 厦门市三安光电科技有限公司 | 一种采用绝缘介质阻挡层的垂直发光二极管及其制备方法 |
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US8536043B2 (en) * | 2011-01-31 | 2013-09-17 | International Business Machines Corporation | Reduced S/D contact resistance of III-V MOSFET using low temperature metal-induced crystallization of n+ Ge |
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CN103733310B (zh) | 2016-08-17 |
EP2741318A4 (en) | 2015-03-25 |
EP2741318B1 (en) | 2020-08-26 |
KR101541656B1 (ko) | 2015-08-03 |
US20140151886A1 (en) | 2014-06-05 |
CN103733310A (zh) | 2014-04-16 |
EP2741318A1 (en) | 2014-06-11 |
TW201330252A (zh) | 2013-07-16 |
WO2013012050A1 (ja) | 2013-01-24 |
JP2013026308A (ja) | 2013-02-04 |
TWI493706B (zh) | 2015-07-21 |
KR20140024460A (ko) | 2014-02-28 |
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