JP5288149B2 - 集積型薄膜素子の製造方法 - Google Patents

集積型薄膜素子の製造方法 Download PDF

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Publication number
JP5288149B2
JP5288149B2 JP2001142014A JP2001142014A JP5288149B2 JP 5288149 B2 JP5288149 B2 JP 5288149B2 JP 2001142014 A JP2001142014 A JP 2001142014A JP 2001142014 A JP2001142014 A JP 2001142014A JP 5288149 B2 JP5288149 B2 JP 5288149B2
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Japan
Prior art keywords
thin film
solar cell
semiconductor layer
layer
integrated
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Expired - Fee Related
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JP2001142014A
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Japanese (ja)
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JP2002343995A (ja
JP2002343995A5 (enExample
Inventor
直子 廣島屋
孟史 松下
一志 山内
公 佐藤
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Sony Corp
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Sony Corp
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Priority to JP2001142014A priority Critical patent/JP5288149B2/ja
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

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  • Photovoltaic Devices (AREA)
JP2001142014A 2001-05-11 2001-05-11 集積型薄膜素子の製造方法 Expired - Fee Related JP5288149B2 (ja)

Priority Applications (1)

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JP2001142014A JP5288149B2 (ja) 2001-05-11 2001-05-11 集積型薄膜素子の製造方法

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JP2001142014A JP5288149B2 (ja) 2001-05-11 2001-05-11 集積型薄膜素子の製造方法

Related Child Applications (2)

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JP2012224853A Division JP5472420B2 (ja) 2012-10-10 2012-10-10 集積型薄膜素子の製造方法
JP2012224852A Division JP5472419B2 (ja) 2012-10-10 2012-10-10 集積型薄膜素子の製造方法

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JP2002343995A JP2002343995A (ja) 2002-11-29
JP2002343995A5 JP2002343995A5 (enExample) 2008-04-24
JP5288149B2 true JP5288149B2 (ja) 2013-09-11

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JP2001142014A Expired - Fee Related JP5288149B2 (ja) 2001-05-11 2001-05-11 集積型薄膜素子の製造方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9496128B1 (en) 2015-10-15 2016-11-15 International Business Machines Corporation Controlled spalling utilizing vaporizable release layers

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4563085B2 (ja) * 2004-06-15 2010-10-13 三菱重工業株式会社 薄膜太陽電池
JP2011146678A (ja) * 2009-12-16 2011-07-28 Kyocera Corp 太陽電池素子の製造方法
JP5472419B2 (ja) * 2012-10-10 2014-04-16 ソニー株式会社 集積型薄膜素子の製造方法
CN105720121A (zh) * 2016-02-18 2016-06-29 安徽旭能光伏电力有限公司 一种晶体硅柔性太阳能电池片及制造工艺
KR102550104B1 (ko) * 2016-12-09 2023-06-30 엠파워 테크놀로지 인코포레이티드 고성능 태양 전지, 이의 어레이 및 제조 방법
JP6782452B2 (ja) * 2016-12-20 2020-11-11 パナソニックＩｐマネジメント株式会社 太陽電池セル
JPWO2024075738A1 (enExample) * 2022-10-03 2024-04-11

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138086A (ja) * 1982-02-10 1983-08-16 Sumitomo Electric Ind Ltd 半導体デバイスの製造方法
JPH09298339A (ja) * 1996-04-30 1997-11-18 Rohm Co Ltd 半導体レーザの製法
JPH1027766A (ja) * 1996-07-09 1998-01-27 Sony Corp 固体材料の劈開方法及び劈開装置
JPH10229211A (ja) * 1997-02-18 1998-08-25 Hitachi Ltd 光電変換装置およびその製造方法
JP4441938B2 (ja) * 1998-12-28 2010-03-31 ソニー株式会社 集積型薄膜素子およびその製造方法
JP2000223444A (ja) * 1999-01-28 2000-08-11 Sony Corp 半導体製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9496128B1 (en) 2015-10-15 2016-11-15 International Business Machines Corporation Controlled spalling utilizing vaporizable release layers
US9698039B2 (en) 2015-10-15 2017-07-04 International Business Machines Corporation Controlled spalling utilizing vaporizable release layers

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JP2002343995A (ja) 2002-11-29

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