JP5267931B2 - 光陰極半導体素子 - Google Patents
光陰極半導体素子 Download PDFInfo
- Publication number
- JP5267931B2 JP5267931B2 JP2008278867A JP2008278867A JP5267931B2 JP 5267931 B2 JP5267931 B2 JP 5267931B2 JP 2008278867 A JP2008278867 A JP 2008278867A JP 2008278867 A JP2008278867 A JP 2008278867A JP 5267931 B2 JP5267931 B2 JP 5267931B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- miniband
- thickness
- layer
- photocathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/34—Photo-emissive cathodes
Landscapes
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008278867A JP5267931B2 (ja) | 2008-10-29 | 2008-10-29 | 光陰極半導体素子 |
| US12/589,661 US8143615B2 (en) | 2008-10-29 | 2009-10-27 | Electron beam emitting device with a superlattice structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008278867A JP5267931B2 (ja) | 2008-10-29 | 2008-10-29 | 光陰極半導体素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010108722A JP2010108722A (ja) | 2010-05-13 |
| JP2010108722A5 JP2010108722A5 (enExample) | 2011-11-04 |
| JP5267931B2 true JP5267931B2 (ja) | 2013-08-21 |
Family
ID=42130297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008278867A Expired - Fee Related JP5267931B2 (ja) | 2008-10-29 | 2008-10-29 | 光陰極半導体素子 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8143615B2 (enExample) |
| JP (1) | JP5267931B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5808021B2 (ja) * | 2013-07-16 | 2015-11-10 | 国立大学法人名古屋大学 | 電子親和力の低下処理装置に用いられる活性化容器及びキット、該キットを含む電子親和力の低下処理装置、フォトカソード電子ビーム源、並びに、フォトカソード電子ビーム源を含む電子銃、自由電子レーザー加速器、透過型電子顕微鏡、走査型電子顕微鏡、電子線ホログラフィー顕微鏡、電子線描画装置、電子線回折装置及び電子線検査装置 |
| US10692683B2 (en) | 2017-09-12 | 2020-06-23 | Intevac, Inc. | Thermally assisted negative electron affinity photocathode |
| CN111192914B (zh) * | 2017-10-18 | 2023-10-31 | 汉阳大学校产学协力团 | 层、多级元件、多级元件制造方法和驱动多级元件的方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2612572B2 (ja) * | 1987-04-14 | 1997-05-21 | キヤノン株式会社 | 電子放出素子 |
| US5563423A (en) * | 1991-08-15 | 1996-10-08 | Hughes Aircraft Company | Dark current-free multiquantum well superlattice infrared detector |
| US5296720A (en) * | 1991-11-17 | 1994-03-22 | Hughes Aircraft Company | Apparatus and method for discriminating against undesired radiation in a multiple quantum well long wavelength infrared detector |
| JP3154569B2 (ja) | 1992-09-25 | 2001-04-09 | 克巳 岸野 | 偏極電子線発生素子 |
| JPH06115221A (ja) | 1992-10-05 | 1994-04-26 | Konica Corp | プリンタ |
| US5877510A (en) * | 1994-05-27 | 1999-03-02 | Nec Corporation | Spin polarized electron semiconductor source and apparatus utilizing the same |
| US5510627A (en) * | 1994-06-29 | 1996-04-23 | The United States Of America As Represented By The Secretary Of The Navy | Infrared-to-visible converter |
| JPH08222164A (ja) * | 1995-02-14 | 1996-08-30 | Daido Steel Co Ltd | 低速電子線源 |
| US6130466A (en) * | 1995-10-17 | 2000-10-10 | Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Semiconductor heterostructure radiation detector having two spectral sensitivity ranges |
| US7286585B2 (en) * | 1998-12-21 | 2007-10-23 | Finisar Corporation | Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region |
| US6875975B2 (en) * | 1999-12-24 | 2005-04-05 | Bae Systems Information And Electronic Systems Integration Inc | Multi-color, multi-focal plane optical detector |
| US7253432B2 (en) * | 2000-10-16 | 2007-08-07 | Georgia State University Research Foundation, Inc. | Heterojunction far infrared photodetector |
| JP2003142783A (ja) * | 2001-11-08 | 2003-05-16 | Hitachi Ltd | 半導体レーザおよびそれを用いた光モジュール |
| US7205563B2 (en) * | 2004-03-18 | 2007-04-17 | Bae Systems Information And Electronic Systems Integration Inc. | QWIP with electron launcher for reducing dielectric relaxation effect in low background conditions |
| US7838869B2 (en) * | 2005-10-21 | 2010-11-23 | Georgia State University Research Foundation, Inc. | Dual band photodetector |
| JP2007258119A (ja) * | 2006-03-24 | 2007-10-04 | Univ Nagoya | スピン偏極電子発生装置 |
| US7381966B2 (en) * | 2006-04-13 | 2008-06-03 | Integrated Micro Sensors, Inc. | Single-chip monolithic dual-band visible- or solar-blind photodetector |
-
2008
- 2008-10-29 JP JP2008278867A patent/JP5267931B2/ja not_active Expired - Fee Related
-
2009
- 2009-10-27 US US12/589,661 patent/US8143615B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010108722A (ja) | 2010-05-13 |
| US8143615B2 (en) | 2012-03-27 |
| US20100108983A1 (en) | 2010-05-06 |
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