JP5254664B2 - 反射防止膜及びその製造方法 - Google Patents
反射防止膜及びその製造方法 Download PDFInfo
- Publication number
- JP5254664B2 JP5254664B2 JP2008138444A JP2008138444A JP5254664B2 JP 5254664 B2 JP5254664 B2 JP 5254664B2 JP 2008138444 A JP2008138444 A JP 2008138444A JP 2008138444 A JP2008138444 A JP 2008138444A JP 5254664 B2 JP5254664 B2 JP 5254664B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- antireflection film
- less
- mold
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
- B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Liquid Crystal (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008138444A JP5254664B2 (ja) | 2008-05-27 | 2008-05-27 | 反射防止膜及びその製造方法 |
| CN2009801190975A CN102047149A (zh) | 2008-05-27 | 2009-05-12 | 防反射膜及其制造方法 |
| US12/994,807 US20110157704A1 (en) | 2008-05-27 | 2009-05-12 | Antireflective film and production method thereof |
| KR1020107026452A KR101376350B1 (ko) | 2008-05-27 | 2009-05-12 | 반사 방지막 및 그 제조 방법 |
| EP09754557A EP2293119A4 (en) | 2008-05-27 | 2009-05-12 | ANTIREFLECTION FILM AND PROCESS FOR PRODUCING THE ANTIREFLECTION FILM |
| PCT/JP2009/058810 WO2009145049A1 (ja) | 2008-05-27 | 2009-05-12 | 反射防止膜及びその製造方法 |
| TW098115782A TWI406048B (zh) | 2008-05-27 | 2009-05-13 | 反射防止膜及其製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008138444A JP5254664B2 (ja) | 2008-05-27 | 2008-05-27 | 反射防止膜及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013086812A Division JP2013210638A (ja) | 2013-04-17 | 2013-04-17 | 反射防止膜及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009288337A JP2009288337A (ja) | 2009-12-10 |
| JP2009288337A5 JP2009288337A5 (https=) | 2010-11-25 |
| JP5254664B2 true JP5254664B2 (ja) | 2013-08-07 |
Family
ID=41376934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008138444A Expired - Fee Related JP5254664B2 (ja) | 2008-05-27 | 2008-05-27 | 反射防止膜及びその製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110157704A1 (https=) |
| EP (1) | EP2293119A4 (https=) |
| JP (1) | JP5254664B2 (https=) |
| KR (1) | KR101376350B1 (https=) |
| CN (1) | CN102047149A (https=) |
| TW (1) | TWI406048B (https=) |
| WO (1) | WO2009145049A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI727683B (zh) * | 2020-02-27 | 2021-05-11 | 態金材料科技股份有限公司 | 抗反射光學玻璃之製法及其製品 |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5229206B2 (ja) * | 2009-12-18 | 2013-07-03 | 大日本印刷株式会社 | 反射防止フィルムの製造方法 |
| JP4985754B2 (ja) * | 2009-12-18 | 2012-07-25 | 大日本印刷株式会社 | 反射防止フィルムの製造方法及び製造装置 |
| JP5053465B2 (ja) * | 2010-02-24 | 2012-10-17 | シャープ株式会社 | 型および型の製造方法ならびに反射防止膜の製造方法 |
| WO2011139573A2 (en) | 2010-04-28 | 2011-11-10 | 3M Innovative Properties Company | Silicone-based material |
| JP4849183B1 (ja) * | 2010-08-05 | 2012-01-11 | 大日本印刷株式会社 | 反射防止フィルム製造用金型の製造方法 |
| TWI443011B (zh) * | 2011-07-29 | 2014-07-01 | Chi Mei Corp | Duplex microstructure optical plate forming apparatus and manufacturing method thereof |
| TWI440548B (zh) * | 2011-04-25 | 2014-06-11 | Chi Mei Corp | Method for manufacturing microstructure optical plate with high transfer rate and molding device thereof |
| CN102398338B (zh) * | 2010-09-17 | 2014-02-26 | 奇美实业股份有限公司 | 具有高转写率的微结构光学板的制造方法 |
| TWI448379B (zh) * | 2010-11-12 | 2014-08-11 | Chi Mei Corp | The manufacturing method of the optical plate |
| JP2014502735A (ja) * | 2010-12-20 | 2014-02-03 | スリーエム イノベイティブ プロパティズ カンパニー | シリカナノ粒子でコーティングされたガラス状のポリマー反射防止フィルム、該フィルムの製造方法、及び該フィルムを用いた光吸収装置 |
| JP5821205B2 (ja) * | 2011-02-04 | 2015-11-24 | ソニー株式会社 | 光学素子およびその製造方法、表示装置、情報入力装置、ならびに写真 |
| US9447492B2 (en) * | 2011-06-03 | 2016-09-20 | Graham J. Hubbard | Conductive anti-reflective films |
| JP6048145B2 (ja) * | 2011-09-08 | 2016-12-21 | 三菱レイヨン株式会社 | 微細凹凸構造を表面に有する透明フィルム、および、その製造方法 |
| JPWO2013054832A1 (ja) * | 2011-10-14 | 2015-03-30 | 三菱レイヨン株式会社 | 光学シート製造用ロール状金型の製造方法、光学シート製造方法、電子表示装置、及びアルミニウム母材の鏡面加工方法 |
| TW201325884A (zh) * | 2011-12-29 | 2013-07-01 | Hon Hai Prec Ind Co Ltd | 光學薄膜壓印滾輪及該滾輪之製作方法 |
| JP2013142823A (ja) * | 2012-01-11 | 2013-07-22 | Dainippon Printing Co Ltd | 光反射防止物品 |
| CN104169746B (zh) * | 2012-03-15 | 2016-06-08 | 综研化学株式会社 | 防反射膜 |
| US9218516B2 (en) * | 2012-06-08 | 2015-12-22 | Datalogic ADC, Inc. | Data reader platter with integral features delineating a data-reading sweep region |
| KR101879797B1 (ko) * | 2013-08-14 | 2018-07-18 | 미쯔비시 케미컬 주식회사 | 원기둥형상 나노임프린트용 몰드의 제조방법 및 나노임프린트용 재생 몰드의 제조방법 |
| WO2015022916A1 (ja) * | 2013-08-14 | 2015-02-19 | 三菱レイヨン株式会社 | ナノインプリント用モールドの製造方法、および反射防止物品 |
| US10259149B2 (en) * | 2013-09-18 | 2019-04-16 | Mitsubishi Chemical Corporation | Structure, production method thereof, and article provided with said structure |
| JP6324048B2 (ja) * | 2013-12-11 | 2018-05-16 | 旭化成株式会社 | 機能転写体及び機能層の転写方法、ならびに太陽電池及びその製造方法 |
| JP2015079262A (ja) * | 2014-11-28 | 2015-04-23 | 大日本印刷株式会社 | 反射防止フィルム |
| JP6689576B2 (ja) | 2015-03-31 | 2020-04-28 | デクセリアルズ株式会社 | 原盤の製造方法、原盤、及び光学体 |
| JP6482120B2 (ja) | 2015-03-31 | 2019-03-13 | デクセリアルズ株式会社 | 原盤の製造方法、光学体の製造方法、光学部材の製造方法、および表示装置の製造方法 |
| KR101948821B1 (ko) | 2016-03-14 | 2019-02-15 | 주식회사 엘지화학 | 반사 방지 필름 및 디스플레이 장치 |
| KR101951863B1 (ko) | 2016-03-14 | 2019-02-25 | 주식회사 엘지화학 | 반사 방지 필름 및 디스플레이 장치 |
| KR101951864B1 (ko) * | 2016-03-14 | 2019-02-25 | 주식회사 엘지화학 | 반사 방지 필름 및 디스플레이 장치 |
| JP7186524B2 (ja) * | 2017-06-30 | 2022-12-09 | 大日本印刷株式会社 | 回折光学素子及びその製造方法、並びに照明装置 |
| EP3936906B1 (en) * | 2019-04-26 | 2026-03-11 | Huawei Technologies Co., Ltd. | Reflection-reducing film, optical element, camera module and terminal |
| JP2022093162A (ja) * | 2020-12-11 | 2022-06-23 | デクセリアルズ株式会社 | 光学体、光学体の製造方法、積層体及びイメージセンサ |
| CN118292115B (zh) * | 2024-04-07 | 2026-03-24 | 杭州南河新能源科技有限公司 | 一种硅片的化学抛光方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1462618A (en) | 1973-05-10 | 1977-01-26 | Secretary Industry Brit | Reducing the reflectance of surfaces to radiation |
| JPH09193332A (ja) | 1996-01-16 | 1997-07-29 | Dainippon Printing Co Ltd | 防眩性フィルム |
| JP2003043203A (ja) | 2001-08-01 | 2003-02-13 | Hitachi Maxell Ltd | 反射防止膜、その製造方法、反射防止膜製造用スタンパ、その製造方法、スタンパ製造用鋳型及びその製造方法 |
| JP4248805B2 (ja) | 2001-09-14 | 2009-04-02 | 大日本印刷株式会社 | 光硬化性樹脂組成物、シート、転写箔、微細凹凸パターン形成方法、及び光学用物品 |
| JP2003215314A (ja) | 2002-01-18 | 2003-07-30 | Dainippon Printing Co Ltd | 反射防止物品 |
| JP2003240903A (ja) | 2002-02-20 | 2003-08-27 | Dainippon Printing Co Ltd | 反射防止物品 |
| JP4324374B2 (ja) | 2002-03-29 | 2009-09-02 | 大日本印刷株式会社 | 微細凹凸パターン形成材料、微細凹凸パターン形成方法、転写箔、光学物品及びスタンパー |
| JP4100991B2 (ja) | 2002-07-31 | 2008-06-11 | 大日本印刷株式会社 | 光硬化性樹脂組成物を用いた光学物品、微細凹凸パターン形成方法、及び転写箔 |
| JP4197240B2 (ja) | 2002-07-31 | 2008-12-17 | 大日本印刷株式会社 | 光硬化性樹脂、光硬化性樹脂組成物、微細凹凸パターン形成方法、転写箔、光学物品及びスタンパー |
| JP4275469B2 (ja) | 2003-06-16 | 2009-06-10 | 大日本印刷株式会社 | 凹凸パターン形成材料、凹凸パターン受容体、凹凸パターン形成方法、転写箔、及び光学物品 |
| JP2005092099A (ja) | 2003-09-19 | 2005-04-07 | Fuji Photo Film Co Ltd | 硬化性樹脂組成物、及び光学物品、並びにそれを用いた画像表示装置 |
| JP4406553B2 (ja) | 2003-11-21 | 2010-01-27 | 財団法人神奈川科学技術アカデミー | 反射防止膜の製造方法 |
| US7414263B2 (en) * | 2004-03-16 | 2008-08-19 | Lg Chem, Ltd. | Highly efficient organic light-emitting device using substrate or electrode having nanosized half-spherical convex and method for preparing the same |
| JP2005329451A (ja) * | 2004-05-21 | 2005-12-02 | Fuji Photo Film Co Ltd | アルミニウム板の表面加工方法及び平版印刷版用支持体並びに平版印刷版 |
| KR100893251B1 (ko) * | 2004-12-03 | 2009-04-17 | 샤프 가부시키가이샤 | 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법 |
| JP4603402B2 (ja) * | 2005-03-31 | 2010-12-22 | 富士フイルム株式会社 | 微細構造体およびその製造方法 |
| JP4848161B2 (ja) | 2005-09-21 | 2011-12-28 | 財団法人神奈川科学技術アカデミー | 反射防止膜の製造方法及び反射防止膜作製用スタンパの製造方法 |
| DE502006006440D1 (de) * | 2006-04-07 | 2010-04-29 | Ems Chemie Ag | Transparente, amorphe Polyamidformmassen und deren Verwendung |
| CN101484614B (zh) * | 2006-06-30 | 2011-09-07 | 三菱丽阳株式会社 | 铸模、铸模的制造方法以及片材的制造方法 |
| JP2008138444A (ja) | 2006-12-01 | 2008-06-19 | I K G:Kk | 棟の構造および棟の施工方法 |
-
2008
- 2008-05-27 JP JP2008138444A patent/JP5254664B2/ja not_active Expired - Fee Related
-
2009
- 2009-05-12 WO PCT/JP2009/058810 patent/WO2009145049A1/ja not_active Ceased
- 2009-05-12 CN CN2009801190975A patent/CN102047149A/zh active Pending
- 2009-05-12 KR KR1020107026452A patent/KR101376350B1/ko not_active Expired - Fee Related
- 2009-05-12 EP EP09754557A patent/EP2293119A4/en not_active Withdrawn
- 2009-05-12 US US12/994,807 patent/US20110157704A1/en not_active Abandoned
- 2009-05-13 TW TW098115782A patent/TWI406048B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI727683B (zh) * | 2020-02-27 | 2021-05-11 | 態金材料科技股份有限公司 | 抗反射光學玻璃之製法及其製品 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110157704A1 (en) | 2011-06-30 |
| EP2293119A4 (en) | 2012-05-09 |
| JP2009288337A (ja) | 2009-12-10 |
| EP2293119A1 (en) | 2011-03-09 |
| TWI406048B (zh) | 2013-08-21 |
| CN102047149A (zh) | 2011-05-04 |
| TW201001011A (en) | 2010-01-01 |
| KR101376350B1 (ko) | 2014-03-20 |
| WO2009145049A1 (ja) | 2009-12-03 |
| KR20100135950A (ko) | 2010-12-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5254664B2 (ja) | 反射防止膜及びその製造方法 | |
| CN102341229B (zh) | 薄膜的制造方法 | |
| CN102933374B (zh) | 表面具有微细凹凸结构的物品的制造方法、模具的脱模处理方法及用于模具表面脱模处理的活性能量射线固化性树脂组合物 | |
| CN105451967B (zh) | 纳米压印用模具的制造方法以及防反射物品 | |
| CN103260841B (zh) | 表面具有微细凹凸结构的物品的制造方法 | |
| CN102933373B (zh) | 表面具有微细凹凸结构的物品的制造方法 | |
| CN101253227B (zh) | 具有特定的表面形状与物性的结构体及用于形成该结构体的(甲基)丙烯酸系聚合性组合物 | |
| CN104350184B (zh) | 模具的制造方法和表面具有微细凹凸结构的成形体的制造方法 | |
| CN102791804B (zh) | 活性能量射线固化性树脂组合物、及表面具有微细凹凸结构的物品的制造方法 | |
| JP2009272557A (ja) | ウェーハの製造方法及び製造装置、並びに硬化性樹脂組成物 | |
| JP2011002759A (ja) | 反射防止膜 | |
| TW201318805A (zh) | 光學片的製造方法、光學片製造用模具的製造方法、電子顯示裝置以及鏡面加工方法 | |
| JP2013210638A (ja) | 反射防止膜及びその製造方法 | |
| JP5616036B2 (ja) | 基材、中間膜及び微細凹凸構造膜を積層してなる積層体 | |
| JP2011002762A (ja) | 光の反射防止効果を有する成型品 | |
| JP6455127B2 (ja) | 透明フィルムの製造方法 | |
| JP2014077040A (ja) | 活性エネルギー線硬化性組成物、およびそれを用いた微細凹凸構造体 | |
| JP2012082470A (ja) | ナノ構造体作製用型体及びその製造方法 | |
| JP5750755B2 (ja) | ナノ構造体作製用型体及びその製造方法 | |
| JP2014126761A (ja) | 積層体、およびその製造方法 | |
| KR101279521B1 (ko) | 고휘도 및 고헤이즈를 갖는 대전방지성 알루미늄 하드몰드 타입의 확산 시트의 제조 방법 및 이에 따라 제조한 확산 시트 | |
| JP7102688B2 (ja) | 研磨フィルム、及び該研磨フィルムの製造方法 | |
| JP2013112892A (ja) | ナノ構造体作製用型体の製造方法、製造装置、ナノ構造体作製用型体及びナノ構造体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101010 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20101122 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121106 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121228 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130319 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130418 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160426 Year of fee payment: 3 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |