JP5254664B2 - 反射防止膜及びその製造方法 - Google Patents

反射防止膜及びその製造方法 Download PDF

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Publication number
JP5254664B2
JP5254664B2 JP2008138444A JP2008138444A JP5254664B2 JP 5254664 B2 JP5254664 B2 JP 5254664B2 JP 2008138444 A JP2008138444 A JP 2008138444A JP 2008138444 A JP2008138444 A JP 2008138444A JP 5254664 B2 JP5254664 B2 JP 5254664B2
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JP
Japan
Prior art keywords
polishing
antireflection film
less
mold
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008138444A
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English (en)
Japanese (ja)
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JP2009288337A (ja
JP2009288337A5 (enExample
Inventor
一也 佐藤
司 松本
裕 渡辺
淳 六波羅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DNP Fine Chemicals Co Ltd
Original Assignee
DNP Fine Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2008138444A priority Critical patent/JP5254664B2/ja
Application filed by DNP Fine Chemicals Co Ltd filed Critical DNP Fine Chemicals Co Ltd
Priority to CN2009801190975A priority patent/CN102047149A/zh
Priority to KR1020107026452A priority patent/KR101376350B1/ko
Priority to PCT/JP2009/058810 priority patent/WO2009145049A1/ja
Priority to EP09754557A priority patent/EP2293119A4/en
Priority to US12/994,807 priority patent/US20110157704A1/en
Priority to TW098115782A priority patent/TWI406048B/zh
Publication of JP2009288337A publication Critical patent/JP2009288337A/ja
Publication of JP2009288337A5 publication Critical patent/JP2009288337A5/ja
Application granted granted Critical
Publication of JP5254664B2 publication Critical patent/JP5254664B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Liquid Crystal (AREA)
JP2008138444A 2008-05-27 2008-05-27 反射防止膜及びその製造方法 Expired - Fee Related JP5254664B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2008138444A JP5254664B2 (ja) 2008-05-27 2008-05-27 反射防止膜及びその製造方法
KR1020107026452A KR101376350B1 (ko) 2008-05-27 2009-05-12 반사 방지막 및 그 제조 방법
PCT/JP2009/058810 WO2009145049A1 (ja) 2008-05-27 2009-05-12 反射防止膜及びその製造方法
EP09754557A EP2293119A4 (en) 2008-05-27 2009-05-12 ANTIREFLECTION FILM AND PROCESS FOR PRODUCING THE ANTIREFLECTION FILM
CN2009801190975A CN102047149A (zh) 2008-05-27 2009-05-12 防反射膜及其制造方法
US12/994,807 US20110157704A1 (en) 2008-05-27 2009-05-12 Antireflective film and production method thereof
TW098115782A TWI406048B (zh) 2008-05-27 2009-05-13 反射防止膜及其製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008138444A JP5254664B2 (ja) 2008-05-27 2008-05-27 反射防止膜及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013086812A Division JP2013210638A (ja) 2013-04-17 2013-04-17 反射防止膜及びその製造方法

Publications (3)

Publication Number Publication Date
JP2009288337A JP2009288337A (ja) 2009-12-10
JP2009288337A5 JP2009288337A5 (enExample) 2010-11-25
JP5254664B2 true JP5254664B2 (ja) 2013-08-07

Family

ID=41376934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008138444A Expired - Fee Related JP5254664B2 (ja) 2008-05-27 2008-05-27 反射防止膜及びその製造方法

Country Status (7)

Country Link
US (1) US20110157704A1 (enExample)
EP (1) EP2293119A4 (enExample)
JP (1) JP5254664B2 (enExample)
KR (1) KR101376350B1 (enExample)
CN (1) CN102047149A (enExample)
TW (1) TWI406048B (enExample)
WO (1) WO2009145049A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI727683B (zh) * 2020-02-27 2021-05-11 態金材料科技股份有限公司 抗反射光學玻璃之製法及其製品

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JP5053465B2 (ja) * 2010-02-24 2012-10-17 シャープ株式会社 型および型の製造方法ならびに反射防止膜の製造方法
SG184986A1 (en) 2010-04-28 2012-11-29 3M Innovative Properties Co Silicone-based material
JP4849183B1 (ja) * 2010-08-05 2012-01-11 大日本印刷株式会社 反射防止フィルム製造用金型の製造方法
TWI443011B (zh) * 2011-07-29 2014-07-01 Chi Mei Corp Duplex microstructure optical plate forming apparatus and manufacturing method thereof
TWI440548B (zh) * 2011-04-25 2014-06-11 Chi Mei Corp Method for manufacturing microstructure optical plate with high transfer rate and molding device thereof
CN102398338B (zh) * 2010-09-17 2014-02-26 奇美实业股份有限公司 具有高转写率的微结构光学板的制造方法
TWI448379B (zh) * 2010-11-12 2014-08-11 Chi Mei Corp The manufacturing method of the optical plate
KR20140045308A (ko) * 2010-12-20 2014-04-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 실리카 나노입자로 코팅된 유리같은 중합체 반사 방지 필름, 그 제조 방법 및 그를 사용한 광 흡수 디바이스
JP5821205B2 (ja) * 2011-02-04 2015-11-24 ソニー株式会社 光学素子およびその製造方法、表示装置、情報入力装置、ならびに写真
US9447492B2 (en) * 2011-06-03 2016-09-20 Graham J. Hubbard Conductive anti-reflective films
WO2013035839A1 (ja) * 2011-09-08 2013-03-14 三菱レイヨン株式会社 微細凹凸構造を表面に有する透明フィルム、その製造方法および透明フィルムの製造に用いられる基材フィルム
WO2013054832A1 (ja) * 2011-10-14 2013-04-18 三菱レイヨン株式会社 光学シート製造用ロール状金型の製造方法、光学シート製造方法、電子表示装置、及びアルミニウム母材の鏡面加工方法
TW201325884A (zh) * 2011-12-29 2013-07-01 Hon Hai Prec Ind Co Ltd 光學薄膜壓印滾輪及該滾輪之製作方法
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US20150116834A1 (en) * 2012-03-15 2015-04-30 Soken Chemical & Engineering Co., Ltd. Antireflection film
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US9890466B2 (en) 2013-08-14 2018-02-13 Mitsubishi Chemical Corporation Method for producing mold for nanoimprinting and anti-reflective article
JP6265127B2 (ja) * 2013-08-14 2018-01-24 三菱ケミカル株式会社 円柱状ナノインプリント用モールドの製造方法、およびナノインプリント用再生モールドの製造方法
WO2015041283A1 (ja) * 2013-09-18 2015-03-26 三菱レイヨン株式会社 構造体及びその製造方法、並びに前記構造体を備える物品
JP6324048B2 (ja) * 2013-12-11 2018-05-16 旭化成株式会社 機能転写体及び機能層の転写方法、ならびに太陽電池及びその製造方法
JP2015079262A (ja) * 2014-11-28 2015-04-23 大日本印刷株式会社 反射防止フィルム
JP6689576B2 (ja) 2015-03-31 2020-04-28 デクセリアルズ株式会社 原盤の製造方法、原盤、及び光学体
JP6482120B2 (ja) 2015-03-31 2019-03-13 デクセリアルズ株式会社 原盤の製造方法、光学体の製造方法、光学部材の製造方法、および表示装置の製造方法
KR101948821B1 (ko) 2016-03-14 2019-02-15 주식회사 엘지화학 반사 방지 필름 및 디스플레이 장치
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI727683B (zh) * 2020-02-27 2021-05-11 態金材料科技股份有限公司 抗反射光學玻璃之製法及其製品

Also Published As

Publication number Publication date
TW201001011A (en) 2010-01-01
CN102047149A (zh) 2011-05-04
JP2009288337A (ja) 2009-12-10
TWI406048B (zh) 2013-08-21
WO2009145049A1 (ja) 2009-12-03
KR20100135950A (ko) 2010-12-27
KR101376350B1 (ko) 2014-03-20
EP2293119A4 (en) 2012-05-09
US20110157704A1 (en) 2011-06-30
EP2293119A1 (en) 2011-03-09

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