JP5195051B2 - 紫外線照射装置 - Google Patents

紫外線照射装置 Download PDF

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Publication number
JP5195051B2
JP5195051B2 JP2008150748A JP2008150748A JP5195051B2 JP 5195051 B2 JP5195051 B2 JP 5195051B2 JP 2008150748 A JP2008150748 A JP 2008150748A JP 2008150748 A JP2008150748 A JP 2008150748A JP 5195051 B2 JP5195051 B2 JP 5195051B2
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JP
Japan
Prior art keywords
transformer
excimer lamp
ultraviolet irradiation
transformers
excimer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2008150748A
Other languages
English (en)
Japanese (ja)
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JP2009295923A (ja
Inventor
賢治 山森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP2008150748A priority Critical patent/JP5195051B2/ja
Priority to TW098114431A priority patent/TWI409848B/zh
Priority to KR1020090039843A priority patent/KR101255408B1/ko
Priority to CN2009101413532A priority patent/CN101603640B/zh
Publication of JP2009295923A publication Critical patent/JP2009295923A/ja
Application granted granted Critical
Publication of JP5195051B2 publication Critical patent/JP5195051B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2008150748A 2008-06-09 2008-06-09 紫外線照射装置 Active JP5195051B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008150748A JP5195051B2 (ja) 2008-06-09 2008-06-09 紫外線照射装置
TW098114431A TWI409848B (zh) 2008-06-09 2009-04-30 Ultraviolet radiation device
KR1020090039843A KR101255408B1 (ko) 2008-06-09 2009-05-07 자외선 조사 장치
CN2009101413532A CN101603640B (zh) 2008-06-09 2009-06-02 紫外线照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008150748A JP5195051B2 (ja) 2008-06-09 2008-06-09 紫外線照射装置

Publications (2)

Publication Number Publication Date
JP2009295923A JP2009295923A (ja) 2009-12-17
JP5195051B2 true JP5195051B2 (ja) 2013-05-08

Family

ID=41469482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008150748A Active JP5195051B2 (ja) 2008-06-09 2008-06-09 紫外線照射装置

Country Status (4)

Country Link
JP (1) JP5195051B2 (zh)
KR (1) KR101255408B1 (zh)
CN (1) CN101603640B (zh)
TW (1) TWI409848B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5651985B2 (ja) * 2010-04-01 2015-01-14 ウシオ電機株式会社 紫外線照射装置
CN103962346B (zh) * 2014-05-21 2016-08-24 深圳市华星光电技术有限公司 可调整紫外光照射能量的紫外光清洗基板的方法
CN111359994B (zh) * 2020-03-16 2021-06-01 Tcl华星光电技术有限公司 清洗装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08146097A (ja) * 1994-11-24 1996-06-07 Advantest Corp 半導体ｉｃ試験装置用一体型密閉筐体冷却装置
DE20114380U1 (de) * 2001-08-31 2002-02-21 Hoenle Ag Dr UV-Bestrahlungsvorrichtung
JP2003303694A (ja) * 2002-04-08 2003-10-24 Ushio Inc エキシマ光照射装置
JP4260588B2 (ja) * 2003-09-22 2009-04-30 ウシオ電機株式会社 高電圧パルス発生装置並びに高電圧パルス発生装置を備えた放電励起ガスレーザ装置
JP4424296B2 (ja) * 2005-10-13 2010-03-03 ウシオ電機株式会社 紫外線照射装置
US20070295012A1 (en) * 2006-06-26 2007-12-27 Applied Materials, Inc. Nitrogen enriched cooling air module for uv curing system
JP5019156B2 (ja) * 2006-08-21 2012-09-05 ウシオ電機株式会社 エキシマランプ装置

Also Published As

Publication number Publication date
CN101603640B (zh) 2013-05-08
JP2009295923A (ja) 2009-12-17
CN101603640A (zh) 2009-12-16
TWI409848B (zh) 2013-09-21
TW201009888A (en) 2010-03-01
KR101255408B1 (ko) 2013-04-17
KR20090127804A (ko) 2009-12-14

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