JP5159068B2 - 全反射蛍光ｘ線分析装置 - Google Patents

全反射蛍光ｘ線分析装置 Download PDF

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Publication number
JP5159068B2
JP5159068B2 JP2006231713A JP2006231713A JP5159068B2 JP 5159068 B2 JP5159068 B2 JP 5159068B2 JP 2006231713 A JP2006231713 A JP 2006231713A JP 2006231713 A JP2006231713 A JP 2006231713A JP 5159068 B2 JP5159068 B2 JP 5159068B2
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Japan
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ray
sample
rays
polycapillary
primary
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JP2006231713A
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Japanese (ja)
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JP2007093593A5 (enExample
JP2007093593A (ja
Inventor
幸一 辻
啓太 田中
和彦 中野
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Japan Science and Technology Agency
National Institute of Japan Science and Technology Agency
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Japan Science and Technology Agency
National Institute of Japan Science and Technology Agency
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JP2006231713A 2005-09-01 2006-08-29 全反射蛍光ｘ線分析装置 Expired - Fee Related JP5159068B2 (ja)

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JP2006231713A JP5159068B2 (ja) 2005-09-01 2006-08-29 全反射蛍光ｘ線分析装置

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JP2005254037 2005-09-01
JP2005254037 2005-09-01
JP2006231713A JP5159068B2 (ja) 2005-09-01 2006-08-29 全反射蛍光ｘ線分析装置

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JP2007093593A JP2007093593A (ja) 2007-04-12
JP2007093593A5 JP2007093593A5 (enExample) 2009-08-20
JP5159068B2 true JP5159068B2 (ja) 2013-03-06

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5646147B2 (ja) * 2008-03-28 2014-12-24 公立大学法人大阪市立大学 二次元分布を測定する方法及び装置
JP2010019584A (ja) * 2008-07-08 2010-01-28 Central Japan Railway Co 蛍光ｘ線分析装置
JP5846469B2 (ja) * 2008-09-02 2016-01-20 国立大学法人京都大学 全反射蛍光ｘ線分析装置及び全反射蛍光ｘ線分析方法
JP2010197229A (ja) * 2009-02-25 2010-09-09 Osaka City Univ 蛍光ｘ線分析装置
JP5407075B2 (ja) * 2009-04-23 2014-02-05 公立大学法人兵庫県立大学 Ｘ線分析装置
JP5964705B2 (ja) * 2012-09-14 2016-08-03 浜松ホトニクス株式会社 ポリキャピラリレンズ
EP2762862B1 (en) * 2013-01-30 2017-03-08 Bruker AXS GmbH XRF measurement apparatus for detecting contaminations on the bevel of a wafer
JP6501230B2 (ja) * 2016-03-08 2019-04-17 株式会社リガク 多元素同時型蛍光ｘ線分析装置および多元素同時蛍光ｘ線分析方法
US11391680B2 (en) * 2018-06-08 2022-07-19 Shimadzu Corporation X-ray fluorescence analyzer and X-ray fluorescence analysis method
CN114878614B (zh) * 2022-04-28 2025-10-21 度微检测技术(杭州)有限公司 X射线光片共聚焦三维荧光显微成像系统和方法
CN115389538B (zh) * 2022-08-09 2023-12-29 深圳市埃芯半导体科技有限公司 X射线分析装置及方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0740080B2 (ja) * 1986-06-19 1995-05-01 株式会社島津製作所 Ｘ線ビ−ム収束装置
JP2675737B2 (ja) * 1993-05-06 1997-11-12 理学電機工業株式会社 全反射蛍光ｘ線分析方法および分析装置
JPH0961382A (ja) * 1995-08-24 1997-03-07 Hitachi Ltd 全反射蛍光ｘ線分析装置
JPH10227749A (ja) * 1997-02-14 1998-08-25 Matsushita Electric Ind Co Ltd Ｘ線検査装置及びｘ線検査方法
ES2271277T3 (es) * 2001-06-19 2007-04-16 X-Ray Optical Systems, Inc. Sistema xrf dispersivo de longitud de onda que usa optica de enfoque para la excitacion y un monocromador de enfoque para la recogida.
JP2003202306A (ja) * 2002-01-08 2003-07-18 Japan Science & Technology Corp 試料基板と反射板を用いてｘ線が多重全反射して収束する構成にした全反射蛍光ｘ線分析法および該分析装置
JP4421327B2 (ja) * 2004-02-25 2010-02-24 浜松ホトニクス株式会社 Ｘ線コリメータ及びｘ線撮像装置

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