JP5144492B2 - 乾燥装置 - Google Patents

乾燥装置 Download PDF

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Publication number
JP5144492B2
JP5144492B2 JP2008334532A JP2008334532A JP5144492B2 JP 5144492 B2 JP5144492 B2 JP 5144492B2 JP 2008334532 A JP2008334532 A JP 2008334532A JP 2008334532 A JP2008334532 A JP 2008334532A JP 5144492 B2 JP5144492 B2 JP 5144492B2
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Japan
Prior art keywords
substrate
drying
drying apparatus
heating furnace
station
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JP2008334532A
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Japanese (ja)
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JP2010157586A (ja
JP2010157586A5 (https=
Inventor
健司 岡田
雅文 平林
修司 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2008334532A priority Critical patent/JP5144492B2/ja
Publication of JP2010157586A publication Critical patent/JP2010157586A/ja
Publication of JP2010157586A5 publication Critical patent/JP2010157586A5/ja
Application granted granted Critical
Publication of JP5144492B2 publication Critical patent/JP5144492B2/ja
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  • Drying Of Solid Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008334532A 2008-12-26 2008-12-26 乾燥装置 Active JP5144492B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008334532A JP5144492B2 (ja) 2008-12-26 2008-12-26 乾燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008334532A JP5144492B2 (ja) 2008-12-26 2008-12-26 乾燥装置

Publications (3)

Publication Number Publication Date
JP2010157586A JP2010157586A (ja) 2010-07-15
JP2010157586A5 JP2010157586A5 (https=) 2011-11-10
JP5144492B2 true JP5144492B2 (ja) 2013-02-13

Family

ID=42575286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008334532A Active JP5144492B2 (ja) 2008-12-26 2008-12-26 乾燥装置

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JP (1) JP5144492B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101353247B1 (ko) * 2011-03-25 2014-01-24 삼성전기주식회사 원적외선 건조기를 이용한 인쇄회로기판의 포토솔더 레지스트 공정방법
CN111433546B (zh) * 2017-12-06 2022-10-25 快力胶囊股份有限公司 柱状结构物的干燥装置和柱状结构物的制造方法
CN115479456B (zh) * 2022-09-20 2023-09-12 常州光迅工业设备有限公司 一种无尘无氧pi烘箱水冷循环系统
KR102915266B1 (ko) * 2022-09-28 2026-01-21 주식회사미인골드 금박 가공 방법 및 금박 가공 장치
CN117685754A (zh) * 2024-02-04 2024-03-12 江西农业大学 一种过热蒸汽热泵中药材蒸晒装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3517121B2 (ja) * 1998-08-12 2004-04-05 東京エレクトロン株式会社 処理装置
JP2001110793A (ja) * 1999-10-12 2001-04-20 Dainippon Screen Mfg Co Ltd 熱処理装置および基板処理装置
JP4274736B2 (ja) * 2002-03-28 2009-06-10 大日本スクリーン製造株式会社 基板処理装置
JP3963846B2 (ja) * 2003-01-30 2007-08-22 東京エレクトロン株式会社 熱的処理方法および熱的処理装置

Also Published As

Publication number Publication date
JP2010157586A (ja) 2010-07-15

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