JP5140903B2 - 着色樹脂組成物、カラーフィルタ及び液晶表示装置 - Google Patents

着色樹脂組成物、カラーフィルタ及び液晶表示装置 Download PDF

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Publication number
JP5140903B2
JP5140903B2 JP2004197214A JP2004197214A JP5140903B2 JP 5140903 B2 JP5140903 B2 JP 5140903B2 JP 2004197214 A JP2004197214 A JP 2004197214A JP 2004197214 A JP2004197214 A JP 2004197214A JP 5140903 B2 JP5140903 B2 JP 5140903B2
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Prior art keywords
group
meth
acrylate
acid
carbon atoms
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JP2004197214A
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Japanese (ja)
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JP2006016545A (ja
JP2006016545A5 (cg-RX-API-DMAC10.html
Inventor
次郎 上村
英資 藤原
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Publication of JP2006016545A5 publication Critical patent/JP2006016545A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/062—Copolymers with monomers not covered by C09D133/06
    • C09D133/068—Copolymers with monomers not covered by C09D133/06 containing glycidyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
JP2004197214A 2004-07-02 2004-07-02 着色樹脂組成物、カラーフィルタ及び液晶表示装置 Expired - Lifetime JP5140903B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004197214A JP5140903B2 (ja) 2004-07-02 2004-07-02 着色樹脂組成物、カラーフィルタ及び液晶表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004197214A JP5140903B2 (ja) 2004-07-02 2004-07-02 着色樹脂組成物、カラーフィルタ及び液晶表示装置

Publications (3)

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JP2006016545A JP2006016545A (ja) 2006-01-19
JP2006016545A5 JP2006016545A5 (cg-RX-API-DMAC10.html) 2007-08-02
JP5140903B2 true JP5140903B2 (ja) 2013-02-13

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101518985B1 (ko) 2007-09-06 2015-05-11 후지필름 가부시키가이샤 가공 안료, 안료 분산 조성물, 착색 감광성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자

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JP4882396B2 (ja) * 2006-01-31 2012-02-22 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
KR101014163B1 (ko) * 2006-03-14 2011-02-14 아사히 가세이 일렉트로닉스 가부시끼가이샤 감광성 수지 적층체
JP5196738B2 (ja) * 2006-05-26 2013-05-15 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ、及びその製造方法
JP4640505B2 (ja) * 2006-09-12 2011-03-02 日立化成工業株式会社 黒色感光性樹脂組成物、ブラックマトリクスの形成方法、カラーフィルタの製造方法及びカラーフィルタ
CN101528694B (zh) 2006-12-27 2012-03-07 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
JP5586828B2 (ja) * 2006-12-27 2014-09-10 富士フイルム株式会社 顔料分散組成物、硬化性組成物、並びにカラーフィルタ及びその製造方法
TWI435917B (zh) 2006-12-27 2014-05-01 Fujifilm Corp 顏料分散組成物、硬化性組成物、彩色濾光片及其製造方法
CN101528682B (zh) 2006-12-27 2012-08-08 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
JP5344790B2 (ja) * 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
JP4998735B2 (ja) * 2006-12-28 2012-08-15 Ｊｓｒ株式会社 感放射線性組成物、カラーフィルタ、ブラックマトリックスおよび液晶表示素子
WO2008149662A1 (ja) * 2007-06-01 2008-12-11 Fujifilm Corporation カラーフィルタ用硬化性組成物、カラーフィルタ用硬化性組成物の製造方法、着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP4990085B2 (ja) 2007-09-28 2012-08-01 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
EP2055746B1 (en) * 2007-10-31 2011-09-28 FUJIFILM Corporation Colored curable composition, color filter, method of producing the same, and solid state image pickup device.
WO2009063955A1 (ja) * 2007-11-16 2009-05-22 Fujifilm Corporation スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
US8202679B2 (en) 2007-12-25 2012-06-19 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5516844B2 (ja) * 2008-03-24 2014-06-11 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーおよびその製造方法ならびに液晶表示素子
JP5315771B2 (ja) * 2008-04-23 2013-10-16 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ及び液晶表示装置
JP5224936B2 (ja) * 2008-06-26 2013-07-03 富士フイルム株式会社 分散液、黒色硬化性組成物、製造方法、固体撮像素子用の遮光膜または反射防止膜の製造方法、および固体撮像素子
JP2010015106A (ja) * 2008-07-07 2010-01-21 Fujifilm Corp 紫外光レーザー露光用の着色硬化性組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、及び表示装置
JP2010117493A (ja) * 2008-11-12 2010-05-27 Fujifilm Corp カラーフィルタ用着色組成物、カラーフィルタ、カラーフィルタの製造方法、液晶表示装置、および固体撮像素子
JP2010127961A (ja) * 2008-11-25 2010-06-10 Dnp Fine Chemicals Co Ltd 感光性着色樹脂組成物
JP4344400B1 (ja) * 2009-02-16 2009-10-14 株式会社日本化学工業所 オキシムエステル化合物及びこれらを用いた感光性樹脂組成物
JP5317809B2 (ja) * 2009-04-20 2013-10-16 富士フイルム株式会社 着色硬化性組成物、着色パターンの形成方法、カラーフィルタ、および液晶表示装置
JP5593637B2 (ja) * 2009-06-05 2014-09-24 凸版印刷株式会社 カラーフィルタ
JP4818458B2 (ja) 2009-11-27 2011-11-16 株式会社Ａｄｅｋａ オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP5554223B2 (ja) * 2009-12-14 2014-07-23 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
CN102792412A (zh) * 2010-03-31 2012-11-21 太阳控股株式会社 光固化性组合物
JP5121912B2 (ja) * 2010-11-24 2013-01-16 富士フイルム株式会社 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ及びそれを備えた表示装置
JP5692338B2 (ja) * 2013-11-25 2015-04-01 東洋インキＳｃホールディングス株式会社 感光性組成物

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US5916713A (en) * 1995-01-25 1999-06-29 Mitsubishi Chemical Corporation Polymerizable composition for a color filter
JPH08297366A (ja) * 1995-04-27 1996-11-12 Toppan Printing Co Ltd 感光性着色組成物とそれを用いたカラーフィルタ
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JP2001264530A (ja) * 2000-03-22 2001-09-26 Jsr Corp カラーフィルタ用感放射線性組成物およびカラーフィルタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101518985B1 (ko) 2007-09-06 2015-05-11 후지필름 가부시키가이샤 가공 안료, 안료 분산 조성물, 착색 감광성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자

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