JP5139075B2 - ガス放電ランプの放電容器などのランプ容器の内側コーティング - Google Patents
ガス放電ランプの放電容器などのランプ容器の内側コーティング Download PDFInfo
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- JP5139075B2 JP5139075B2 JP2007545973A JP2007545973A JP5139075B2 JP 5139075 B2 JP5139075 B2 JP 5139075B2 JP 2007545973 A JP2007545973 A JP 2007545973A JP 2007545973 A JP2007545973 A JP 2007545973A JP 5139075 B2 JP5139075 B2 JP 5139075B2
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- Prior art keywords
- lamp
- lamp vessel
- diffusion barrier
- vessel
- inner layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K3/00—Apparatus or processes adapted to the manufacture, installing, removal, or maintenance of incandescent lamps or parts thereof
- H01K3/005—Methods for coating the surface of the envelope
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/004—Coating the inside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/84—Lamps with discharge constricted by high pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K1/00—Details
- H01K1/28—Envelopes; Vessels
- H01K1/32—Envelopes; Vessels provided with coatings on the walls; Vessels or coatings thereon characterised by the material thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Surface Treatment Of Glass (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Description
プロジェクション作業用の高圧メタル・ハライド・ランプ。
ハロゲン・サイクル・プロセスを使用する、プロジェクションの応用ための超高圧水銀ランプ。
本発明を、図面を利用して例示によってより詳細に説明する。
図2は、放電容器の石英ガラス基板21の内部表面上のコーティングとしての拡散バリア層22を示す。そのコーティングは、PICVD法によって石英ガラス基板21のガラス状のSiO223上に、微結晶および/または超微細結晶のSiO2層として付着されている。
Claims (28)
- 石英ガラスのランプ容器を作製するための方法であって、
微結晶の拡散バリア内側層(22)が、CVD法によって前記ランプ容器の内壁に、二酸化ケイ素からなる単一の層として付着される、容器作製方法。 - 透明な材料のランプ容器を作製するための方法であって、
微結晶の拡散バリア内側層(24)が、前記ランプ容器の内部表面の熱処理によって生成され、続けて、さらなる拡散バリア内側層(22)が、CVD法によって前記ランプ容器の内壁上に付着される、容器作製方法。 - 請求項1又は2に記載のランプ容器を作製するための方法において、
前記拡散バリア内側層(22)が、反応性コーティング方法によって付着される容器作製方法。 - 請求項3に記載の容器作製方法において、
前記反応性コーティング方法は、
PICVD(プラズマ衝撃化学気相成長)、
PECVD(プラズマ促進化学気相成長)、
PACVD(プラズマ利用化学気相成長)、
TCVD(熱化学気相成長)
からなる群から選択される、容器作製方法。 - 請求項2に記載のランプ容器を作製するための方法であって、前記2つの拡散バリア内側層(22)及び(24)が、同じ装置の連続するプロセス工程で生成される容器作製方法。
- 拡散バリア内側層を有する放電ランプ用の石英ガラスの放電容器を作製するための方法であって、
微結晶の拡散バリア内側層(24)が、容器内部表面の熱処理によって生成される、容器作製方法。 - 請求項2、5又は6に記載のランプ容器を作製するための方法において、
拡散バリア内側層(24)が、前記容器内部表面上のプラズマ放電による加熱によって生成される容器作製方法。 - 請求項7に記載のランプ容器を作製するための方法において、
拡散バリア内側層(24)が、前記容器内部表面の反応ガスによるプラズマ処理による前記表面の熱処理によって生成される容器作製方法。 - 請求項8に記載のランプ容器を作製するための方法において、
前記表面の前記熱処理が、前記ランプ容器の内部表面上の反応性エッチング・ガスによるプラズマ処理によって生成され、前記反応性エッチング・ガスが、酸素または六フッ化硫黄である容器作製方法。 - 前記ランプ容器は放電ランプ用の放電容器である、請求項1乃至9の何れか1項に記載の方法。
- 前記ランプ容器は白熱灯用の放電容器である、請求項1乃至9の何れか1項に記載の方法。
- 前記ランプ容器はハロゲン・ランプ用の放電容器である、請求項11に記載の方法。
- 前記ランプ容器は石英ガラスのランプ容器である、請求項1乃至12の何れか1項に記載の方法。
- 請求項1乃至13の何れか1項に記載の方法によって作製することのできるランプ容器であって、単一の層であり微結晶二酸化ケイ素からなる拡散バリア内側層(24)が付着されるランプ容器。
- 拡散バリア内側層の二酸化ケイ素の結晶サイズが、50nmより小さい、請求項14に記載のランプ容器。
- 拡散バリア内側層の二酸化ケイ素の結晶サイズが、10nmより小さい、請求項14または15に記載のランプ容器。
- 拡散バリア内側層の厚さが、10から2000nmである、請求項14乃至16の何れか1項に記載のランプ容器。
- 拡散バリア内側層の厚さが、50から500nmである、請求項14乃至17の何れか1項に記載のランプ容器。
- 拡散バリア内側層(22)が、前記容器の内側の表面上にコーティングとして付着される、請求項14乃至18の何れか1項に記載のランプ容器。
- 請求項14乃至18の何れか1項に記載のランプ容器において、
ランプ容器は石英ガラスからなり、
拡散バリア内側層(24)が、前記容器の内側の放電空間に隣接するゾーンに形成されているランプ容器。 - 請求項14乃至18の何れか1項に記載のランプ容器において、
ランプ容器は石英ガラスからなり、
拡散バリア内側層(25)が、前記放電空間に隣接するゾーンに形成された拡散バリア内側層(24)と、前記放電容器の前記内部表面上にコーティングされた二酸化ケイ素である、さらなる拡散バリア層(22)と、の組合せであるランプ容器。 - 請求項14乃至21の何れか1項に記載のランプ容器において、
前記拡散バリア内側層が、ナトリウム及び/又はスカンジウム及び/又は亜鉛に対抗する拡散バリアを形成するランプ容器。 - 請求項14乃至22の何れか1項に記載のランプ容器において、前記ランプ容器を構成する材料がナトリウムを含有するランプ容器。
- 請求項14乃至23の何れか1項に記載のランプ容器において、
前記ランプ容器を構成する材料がヨウ素または臭素を含有するランプ容器。 - 請求項14乃至24の何れか1項に記載のランプ容器を備えるメタル・ハライド・ランプ。
- 請求項14乃至24の何れか1項に記載のランプ容器を備える、高圧ランプ。
- 請求項14乃至24の何れか1項に記載のランプ容器を備える、超高圧ランプ。
- 請求項14乃至24の何れか1項に記載のランプ容器を備えた、自動車分野における照明器具。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004061632.9 | 2004-12-17 | ||
DE102004061632A DE102004061632B4 (de) | 2004-12-17 | 2004-12-17 | Innenbeschichtung von Entladungsgefäßen, Entladungsgefäße aus Quarzglas und deren Verwendung |
PCT/EP2005/013643 WO2006063854A2 (de) | 2004-12-17 | 2005-12-19 | Innenbeschichtung von lampengefässen, wie entladungsgefässen von gasentladungslampen |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008524785A JP2008524785A (ja) | 2008-07-10 |
JP2008524785A5 JP2008524785A5 (ja) | 2012-07-26 |
JP5139075B2 true JP5139075B2 (ja) | 2013-02-06 |
Family
ID=36001832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007545973A Expired - Fee Related JP5139075B2 (ja) | 2004-12-17 | 2005-12-19 | ガス放電ランプの放電容器などのランプ容器の内側コーティング |
Country Status (8)
Country | Link |
---|---|
US (1) | US7965043B2 (ja) |
EP (1) | EP1825498B1 (ja) |
JP (1) | JP5139075B2 (ja) |
KR (1) | KR20070108153A (ja) |
CN (1) | CN101124654B (ja) |
AT (1) | ATE458264T1 (ja) |
DE (2) | DE102004061632B4 (ja) |
WO (1) | WO2006063854A2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4771169B2 (ja) * | 2005-12-16 | 2011-09-14 | 東芝ライテック株式会社 | 蛍光ランプおよび照明装置 |
KR101510258B1 (ko) * | 2010-09-16 | 2015-04-08 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 나노스케일 스위칭 디바이스 |
DE102014016410A1 (de) | 2014-11-05 | 2016-05-12 | Linde Aktiengesellschaft | Gasbehälter |
US20160046408A1 (en) * | 2015-10-27 | 2016-02-18 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Internally coated vessel for housing a metal halide |
RU2631779C2 (ru) * | 2015-12-24 | 2017-09-26 | Федеральное государственное автономное образовательное учреждение высшего образования "Сибирский федеральный университет" | Способ получения покрытия на основе диоксида кремния внутренней поверхности кварцевого изделия |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2906038A1 (de) * | 1979-02-16 | 1980-08-28 | Siemens Ag | Lampenkolben |
US4574218A (en) * | 1979-12-20 | 1986-03-04 | General Electric Company | Metal vapor lamp having internal means promoting condensate film formation |
JPS6486440A (en) * | 1987-09-29 | 1989-03-31 | Semiconductor Energy Lab | Lamp for ultraviolet illuminant |
DE3830249A1 (de) * | 1988-09-06 | 1990-03-15 | Schott Glaswerke | Plasmaverfahren zum beschichten ebener substrate |
NL9100335A (nl) * | 1991-02-26 | 1992-09-16 | Philips Nv | Werkwijze voor de vervaardiging van buisglas. |
DE4208376A1 (de) * | 1992-03-16 | 1993-09-23 | Asea Brown Boveri | Hochleistungsstrahler |
JPH10125282A (ja) * | 1996-10-16 | 1998-05-15 | Matsushita Electron Corp | 水銀放電ランプとその製造方法 |
US5944964A (en) * | 1997-02-13 | 1999-08-31 | Optical Coating Laboratory, Inc. | Methods and apparatus for preparing low net stress multilayer thin film coatings |
JPH11339722A (ja) * | 1998-05-28 | 1999-12-10 | Toshiba Lighting & Technology Corp | 管球およびこの管球を用いた照明器具 |
CH694699A5 (de) * | 1999-04-29 | 2005-06-15 | Balzers Hochvakuum | Verfahren zur Herstellung von Silizium. |
EP1084996B1 (de) * | 1999-09-15 | 2004-06-02 | SCHOTT ROHRGLAS GmbH | Verfahren und Vorrichtung zur Herstellung innenvergüteter Glasrohre |
JP3861557B2 (ja) * | 2000-03-30 | 2006-12-20 | 東芝ライテック株式会社 | 蛍光ランプ |
DE10016108C2 (de) * | 2000-03-31 | 2002-09-26 | Schott Glas | Heißformgebungsverfahren und Vorrichtung zur Herstellung eines Glaskörpers sowie dessen Verwendung |
DE10104193A1 (de) * | 2001-01-31 | 2002-08-01 | Max Planck Gesellschaft | Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art |
KR20030046319A (ko) * | 2001-12-05 | 2003-06-12 | 마쯔시다덴기산교 가부시키가이샤 | 고압방전램프 및 램프유닛 |
DE10216092A1 (de) * | 2002-04-11 | 2003-10-30 | Schott Glas | Verbundmaterial aus einem Substratmaterial und einem Barriereschichtmaterial |
US7544625B2 (en) * | 2003-01-31 | 2009-06-09 | Sharp Laboratories Of America, Inc. | Silicon oxide thin-films with embedded nanocrystalline silicon |
-
2004
- 2004-12-17 DE DE102004061632A patent/DE102004061632B4/de not_active Expired - Fee Related
-
2005
- 2005-12-19 EP EP05822302A patent/EP1825498B1/de not_active Not-in-force
- 2005-12-19 AT AT05822302T patent/ATE458264T1/de not_active IP Right Cessation
- 2005-12-19 DE DE502005009051T patent/DE502005009051D1/de active Active
- 2005-12-19 KR KR1020077016353A patent/KR20070108153A/ko not_active Application Discontinuation
- 2005-12-19 CN CN2005800432201A patent/CN101124654B/zh not_active Expired - Fee Related
- 2005-12-19 WO PCT/EP2005/013643 patent/WO2006063854A2/de active Application Filing
- 2005-12-19 JP JP2007545973A patent/JP5139075B2/ja not_active Expired - Fee Related
- 2005-12-19 US US11/720,914 patent/US7965043B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2008524785A (ja) | 2008-07-10 |
EP1825498A2 (de) | 2007-08-29 |
ATE458264T1 (de) | 2010-03-15 |
CN101124654B (zh) | 2010-11-10 |
WO2006063854A3 (de) | 2007-10-25 |
WO2006063854A2 (de) | 2006-06-22 |
CN101124654A (zh) | 2008-02-13 |
EP1825498B1 (de) | 2010-02-17 |
US20090140628A1 (en) | 2009-06-04 |
DE502005009051D1 (de) | 2010-04-01 |
DE102004061632B4 (de) | 2009-06-18 |
US7965043B2 (en) | 2011-06-21 |
DE102004061632A1 (de) | 2006-07-06 |
KR20070108153A (ko) | 2007-11-08 |
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