JP5132240B2 - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物 Download PDF

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Publication number
JP5132240B2
JP5132240B2 JP2007265976A JP2007265976A JP5132240B2 JP 5132240 B2 JP5132240 B2 JP 5132240B2 JP 2007265976 A JP2007265976 A JP 2007265976A JP 2007265976 A JP2007265976 A JP 2007265976A JP 5132240 B2 JP5132240 B2 JP 5132240B2
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Japan
Prior art keywords
benzyl
resin composition
photosensitive resin
positive photosensitive
compound
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Expired - Fee Related
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JP2007265976A
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English (en)
Japanese (ja)
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JP2009093095A5 (https=
JP2009093095A (ja
Inventor
さゆり 青木
隆弘 佐々木
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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Priority to JP2007265976A priority Critical patent/JP5132240B2/ja
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Publication of JP2009093095A5 publication Critical patent/JP2009093095A5/ja
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2007265976A 2007-10-12 2007-10-12 ポジ型感光性樹脂組成物 Expired - Fee Related JP5132240B2 (ja)

Priority Applications (1)

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JP2007265976A JP5132240B2 (ja) 2007-10-12 2007-10-12 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007265976A JP5132240B2 (ja) 2007-10-12 2007-10-12 ポジ型感光性樹脂組成物

Publications (3)

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JP2009093095A JP2009093095A (ja) 2009-04-30
JP2009093095A5 JP2009093095A5 (https=) 2010-11-25
JP5132240B2 true JP5132240B2 (ja) 2013-01-30

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ID=40665115

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JP2007265976A Expired - Fee Related JP5132240B2 (ja) 2007-10-12 2007-10-12 ポジ型感光性樹脂組成物

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JP (1) JP5132240B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5981739B2 (ja) * 2012-03-14 2016-08-31 旭化成株式会社 感光性樹脂組成物、及び硬化レリーフパターンの製造方法
JP6217199B2 (ja) * 2013-07-12 2017-10-25 日立化成株式会社 フィルム状ポジ型感光性接着剤組成物、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (ja) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6450040A (en) * 1987-08-21 1989-02-27 Konishiroku Photo Ind Production of photosensitive planographic printing plate
JPH087433B2 (ja) * 1989-04-19 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JP3057010B2 (ja) * 1996-08-29 2000-06-26 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターンの形成方法
JP4548001B2 (ja) * 2004-06-09 2010-09-22 東レ株式会社 ポジ型感光性樹脂前駆体組成物
JP2007052359A (ja) * 2005-08-19 2007-03-01 Jsr Corp パターン形成方法、その硬化物および回路基板
JP4640037B2 (ja) * 2005-08-22 2011-03-02 Ｊｓｒ株式会社 ポジ型感光性絶縁樹脂組成物およびその硬化物
JP4627030B2 (ja) * 2005-10-26 2011-02-09 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物

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JP2009093095A (ja) 2009-04-30

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