JP5090911B2 - 断続的コンベヤシステムを有するコータ - Google Patents
断続的コンベヤシステムを有するコータ Download PDFInfo
- Publication number
- JP5090911B2 JP5090911B2 JP2007530232A JP2007530232A JP5090911B2 JP 5090911 B2 JP5090911 B2 JP 5090911B2 JP 2007530232 A JP2007530232 A JP 2007530232A JP 2007530232 A JP2007530232 A JP 2007530232A JP 5090911 B2 JP5090911 B2 JP 5090911B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- coater
- coating material
- conveyor
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims description 273
- 238000000576 coating method Methods 0.000 claims description 255
- 239000011248 coating agent Substances 0.000 claims description 239
- 239000000463 material Substances 0.000 claims description 133
- 238000000151 deposition Methods 0.000 claims description 68
- 230000008021 deposition Effects 0.000 claims description 65
- 238000000034 method Methods 0.000 claims description 54
- 239000010408 film Substances 0.000 claims description 20
- 238000005477 sputtering target Methods 0.000 claims description 20
- 230000004907 flux Effects 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 238000000427 thin-film deposition Methods 0.000 claims description 12
- 238000001771 vacuum deposition Methods 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 238000000869 ion-assisted deposition Methods 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 4
- 239000005357 flat glass Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims 2
- 239000007789 gas Substances 0.000 description 8
- 239000013077 target material Substances 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000001699 photocatalysis Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229920000271 Kevlar® Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60709104P | 2004-09-03 | 2004-09-03 | |
| US60/607,091 | 2004-09-03 | ||
| US64413905P | 2005-01-07 | 2005-01-07 | |
| US60/644,139 | 2005-01-07 | ||
| PCT/US2005/030667 WO2006028774A2 (en) | 2004-09-03 | 2005-08-29 | Coater having interrupted conveyor system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012027319A Division JP5449423B2 (ja) | 2004-09-03 | 2012-02-10 | 断続的コンベヤシステムを有するコータ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008512565A JP2008512565A (ja) | 2008-04-24 |
| JP2008512565A5 JP2008512565A5 (enExample) | 2012-03-29 |
| JP5090911B2 true JP5090911B2 (ja) | 2012-12-05 |
Family
ID=35482371
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007530232A Expired - Fee Related JP5090911B2 (ja) | 2004-09-03 | 2005-08-29 | 断続的コンベヤシステムを有するコータ |
| JP2012027319A Expired - Fee Related JP5449423B2 (ja) | 2004-09-03 | 2012-02-10 | 断続的コンベヤシステムを有するコータ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012027319A Expired - Fee Related JP5449423B2 (ja) | 2004-09-03 | 2012-02-10 | 断続的コンベヤシステムを有するコータ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7749364B2 (enExample) |
| EP (2) | EP2253732A2 (enExample) |
| JP (2) | JP5090911B2 (enExample) |
| CA (1) | CA2556573A1 (enExample) |
| WO (1) | WO2006028774A2 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10352144B8 (de) * | 2003-11-04 | 2008-11-13 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten |
| DE102004036170B4 (de) * | 2004-07-26 | 2007-10-11 | Schott Ag | Vakuumbeschichtungsanlage und Verfahren zur Vakuumbeschichtung und deren Verwendung |
| AU2006315105C1 (en) | 2005-11-15 | 2012-08-16 | Swimc Llc | Crush resistant latex topcoat composition for fiber cement substrates |
| EP1979293B1 (en) | 2006-01-31 | 2013-03-06 | Valspar Sourcing, Inc. | Coating system for cement composite articles |
| US9783622B2 (en) * | 2006-01-31 | 2017-10-10 | Axalta Coating Systems Ip Co., Llc | Coating system for cement composite articles |
| EP1979426A1 (en) * | 2006-01-31 | 2008-10-15 | Valspar Sourcing, Inc. | Coating system for cement composite articles |
| AU2007211046B2 (en) * | 2006-01-31 | 2011-09-01 | Valspar Sourcing, Inc. | Method for coating a cement fiberboard article |
| MX2008014749A (es) | 2006-05-19 | 2009-02-04 | Valspar Sourcing Inc | Sistema de recubrimiento para articulos compuestos de cemento. |
| US7812090B2 (en) * | 2006-06-02 | 2010-10-12 | Valspar Sourcing, Inc. | High performance aqueous coating compositions |
| EP2035516B2 (en) | 2006-06-02 | 2017-01-04 | Valspar Sourcing, Inc. | High performance aqueous coating compositions |
| EP2361898B1 (en) | 2006-07-07 | 2019-02-06 | Swimc Llc | Coating systems for cement composite articles |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| US8202581B2 (en) * | 2007-02-16 | 2012-06-19 | Valspar Sourcing, Inc. | Treatment for cement composite articles |
| AU2007357110B2 (en) * | 2007-08-01 | 2013-11-07 | Valspar Sourcing, Inc. | Coating system for cement composite articles |
| DE102007058052B4 (de) * | 2007-11-30 | 2013-12-05 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage |
| WO2010019825A2 (en) * | 2008-08-15 | 2010-02-18 | Valspar Sourcing, Inc. | Self-etching cementitious substrate coating composition |
| US20100059115A1 (en) * | 2008-09-05 | 2010-03-11 | First Solar, Inc. | Coated Substrates and Semiconductor Devices Including the Substrates |
| JP2010077508A (ja) * | 2008-09-26 | 2010-04-08 | Tokyo Electron Ltd | 成膜装置及び基板処理装置 |
| US9133064B2 (en) | 2008-11-24 | 2015-09-15 | Valspar Sourcing, Inc. | Coating system for cement composite articles |
| US20100163406A1 (en) * | 2008-12-30 | 2010-07-01 | Applied Materials, Inc. | Substrate support in a reactive sputter chamber |
| TW201137143A (en) * | 2010-04-28 | 2011-11-01 | Hon Hai Prec Ind Co Ltd | Sputtering system |
| EP2641665A1 (en) * | 2012-03-19 | 2013-09-25 | Deceuninck NV | Multi-step process for fully coloured construction elements |
| ITTO20120981A1 (it) * | 2012-11-13 | 2014-05-14 | Itt Italia Srl | Metodo ed impianto per la verniciatura a polvere di elementi elettricamente non conduttivi, in particolare pastiglie freno |
| DE102012022237A1 (de) * | 2012-11-14 | 2014-05-15 | Heraeus Materials Technology Gmbh & Co. Kg | Sputtertarget mit optimierten Gebrauchseigenschaften |
| US9435028B2 (en) | 2013-05-06 | 2016-09-06 | Lotus Applied Technology, Llc | Plasma generation for thin film deposition on flexible substrates |
| WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
| CN206768212U (zh) * | 2017-06-08 | 2017-12-19 | 合肥鑫晟光电科技有限公司 | 成膜设备 |
| CN107235642A (zh) * | 2017-07-03 | 2017-10-10 | 中国建材国际工程集团有限公司 | 用于生产镀膜玻璃的镀膜段及其用途 |
| EP3760759B1 (en) * | 2018-03-30 | 2024-12-11 | JFE Steel Corporation | Method of using a surface treatment facility |
| RU2765964C1 (ru) * | 2021-11-29 | 2022-02-07 | Дмитрий Юрьевич Старцев | Способы нанесения на стеклянные изделия покрытий из оксида титана |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1848102A (en) * | 1928-07-14 | 1932-03-08 | Libbey Owens Ford Glass Co | Process and apparatus for producing sheet glass |
| US2975753A (en) * | 1958-11-18 | 1961-03-21 | Nat Res Corp | Vacuum coating apparatus |
| US3528906A (en) * | 1967-06-05 | 1970-09-15 | Texas Instruments Inc | Rf sputtering method and system |
| US3968018A (en) * | 1969-09-29 | 1976-07-06 | Warner-Lambert Company | Sputter coating method |
| GB1442314A (en) * | 1973-07-20 | 1976-07-14 | Triplex Safety Glass Co | Heat treatment of glass sheets |
| JPS5374005A (en) | 1976-12-14 | 1978-07-01 | Matsushita Electric Ind Co Ltd | Manufacture of magnetic recording medium |
| US4194962A (en) * | 1978-12-20 | 1980-03-25 | Advanced Coating Technology, Inc. | Cathode for sputtering |
| US4890714A (en) * | 1986-02-14 | 1990-01-02 | Brown H Gary | Conveying system |
| FR2596920A1 (fr) * | 1986-04-03 | 1987-10-09 | Saint Roch Sa Glaceries | Cathode de pulverisation |
| DE3623970A1 (de) * | 1986-07-16 | 1988-01-28 | Leybold Heraeus Gmbh & Co Kg | Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen |
| JPH0649937B2 (ja) * | 1987-12-17 | 1994-06-29 | 株式会社日立製作所 | 磁性膜形成装置 |
| DE4029905C2 (de) * | 1990-09-21 | 1993-10-28 | Leybold Ag | Vorrichtung für den Transport von Substraten |
| US5228553A (en) * | 1992-02-24 | 1993-07-20 | Circuit Chemistry Equipment, Inc. | Drive mechanism for a conveyor of a printer circuit board processor |
| DE4428136A1 (de) * | 1994-08-09 | 1996-02-15 | Leybold Ag | Vakuum-Beschichtungsanlage |
| JPH09184070A (ja) * | 1996-01-05 | 1997-07-15 | Chugai Ro Co Ltd | Ｐｖｄ成膜装置のシャッタ機構 |
| JP3245810B2 (ja) * | 1996-05-28 | 2002-01-15 | 住友重機械工業株式会社 | プラズマ処理方法 |
| KR19990047679A (ko) * | 1997-12-05 | 1999-07-05 | 박호군 | 이온 빔을 이용한 재료의 표면 처리 장치 |
| CA2355685C (en) * | 1998-12-21 | 2004-04-06 | Cardinal Ig Company | Soil-resistant coating for glass surfaces |
| JP4739532B2 (ja) * | 1999-05-06 | 2011-08-03 | 東京エレクトロン株式会社 | Ｌｃｄガラス基板の搬送システム |
| MXPA03002138A (es) * | 2000-09-11 | 2004-05-04 | Cardinal Cg Co | Cubiertas protectoras temporales que contienen superficies hidrofilicas. |
| JP4364423B2 (ja) * | 2000-12-20 | 2009-11-18 | 新明和工業株式会社 | 成膜装置 |
| JP2003041361A (ja) * | 2001-08-02 | 2003-02-13 | Sony Corp | 成膜装置 |
| CN1535327A (zh) * | 2001-08-07 | 2004-10-06 | �ձ�������ʽ���� | 溅射装置 |
| JP4000823B2 (ja) * | 2001-10-30 | 2007-10-31 | セイコーエプソン株式会社 | 蒸着装置、蒸着方法、液晶装置の製造方法 |
| EP1579025B1 (en) * | 2002-12-31 | 2010-09-29 | Cardinal CG Company | Coater having substrate cleaning device and coating deposition method employing such coater |
-
2005
- 2005-08-29 EP EP10176246A patent/EP2253732A2/en not_active Withdrawn
- 2005-08-29 EP EP05792475A patent/EP1786947B1/en not_active Expired - Lifetime
- 2005-08-29 JP JP2007530232A patent/JP5090911B2/ja not_active Expired - Fee Related
- 2005-08-29 CA CA002556573A patent/CA2556573A1/en not_active Abandoned
- 2005-08-29 WO PCT/US2005/030667 patent/WO2006028774A2/en not_active Ceased
- 2005-08-29 US US11/214,663 patent/US7749364B2/en not_active Expired - Fee Related
-
2012
- 2012-02-10 JP JP2012027319A patent/JP5449423B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006028774A3 (en) | 2006-07-13 |
| US7749364B2 (en) | 2010-07-06 |
| WO2006028774A2 (en) | 2006-03-16 |
| US20060048708A1 (en) | 2006-03-09 |
| CA2556573A1 (en) | 2006-03-16 |
| EP2253732A2 (en) | 2010-11-24 |
| EP1786947A2 (en) | 2007-05-23 |
| JP2012112046A (ja) | 2012-06-14 |
| JP2008512565A (ja) | 2008-04-24 |
| EP1786947B1 (en) | 2012-12-19 |
| JP5449423B2 (ja) | 2014-03-19 |
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