JP5085366B2 - フォトマスクの欠陥修正方法及びフォトマスクの製造方法 - Google Patents
フォトマスクの欠陥修正方法及びフォトマスクの製造方法 Download PDFInfo
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- JP5085366B2 JP5085366B2 JP2008033842A JP2008033842A JP5085366B2 JP 5085366 B2 JP5085366 B2 JP 5085366B2 JP 2008033842 A JP2008033842 A JP 2008033842A JP 2008033842 A JP2008033842 A JP 2008033842A JP 5085366 B2 JP5085366 B2 JP 5085366B2
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- light
- defect
- photomask
- phase shift
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- 230000007547 defect Effects 0.000 title claims description 148
- 238000000034 method Methods 0.000 title claims description 68
- 238000012937 correction Methods 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 230000010363 phase shift Effects 0.000 claims description 87
- 239000000758 substrate Substances 0.000 claims description 71
- 238000000059 patterning Methods 0.000 claims description 6
- 239000010408 film Substances 0.000 description 83
- 238000012546 transfer Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000007689 inspection Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000010453 quartz Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000009412 basement excavation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008033842A JP5085366B2 (ja) | 2008-02-14 | 2008-02-14 | フォトマスクの欠陥修正方法及びフォトマスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008033842A JP5085366B2 (ja) | 2008-02-14 | 2008-02-14 | フォトマスクの欠陥修正方法及びフォトマスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009192846A JP2009192846A (ja) | 2009-08-27 |
| JP2009192846A5 JP2009192846A5 (enExample) | 2011-03-17 |
| JP5085366B2 true JP5085366B2 (ja) | 2012-11-28 |
Family
ID=41074899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008033842A Expired - Fee Related JP5085366B2 (ja) | 2008-02-14 | 2008-02-14 | フォトマスクの欠陥修正方法及びフォトマスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5085366B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5104832B2 (ja) * | 2009-09-09 | 2012-12-19 | 大日本印刷株式会社 | フォトマスクの修正方法および修正されたフォトマスク |
| JP6167568B2 (ja) * | 2013-03-07 | 2017-07-26 | 大日本印刷株式会社 | フォトマスクの欠陥修正方法、及びフォトマスクの製造方法 |
| JP2014174243A (ja) * | 2013-03-07 | 2014-09-22 | Dainippon Printing Co Ltd | フォトマスクの欠陥修正方法、フォトマスクの製造方法及びフォトマスク |
| CN110727170B (zh) * | 2018-07-16 | 2023-12-01 | 中芯国际集成电路制造(上海)有限公司 | 一种光罩的缺陷修复方法及光罩 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2862924B2 (ja) * | 1989-12-26 | 1999-03-03 | 株式会社日立製作所 | パターン形成方法及びマスク修正方法 |
| JP2634289B2 (ja) * | 1990-04-18 | 1997-07-23 | 三菱電機株式会社 | 位相シフトマスクの修正方法 |
| JPH0611827A (ja) * | 1992-03-31 | 1994-01-21 | Matsushita Electron Corp | ホトマスクおよびその修正方法 |
| JP3071324B2 (ja) * | 1992-09-08 | 2000-07-31 | 沖電気工業株式会社 | 位相シフトマスクの修正方法 |
| JP2988417B2 (ja) * | 1997-02-28 | 1999-12-13 | 日本電気株式会社 | フォトマスク |
| JP2000347386A (ja) * | 1999-06-04 | 2000-12-15 | Sony Corp | 露光用マスクの欠陥修正方法、露光用マスク、露光方法、並びに、半導体装置及びその製造方法 |
| JP2002323746A (ja) * | 2001-04-24 | 2002-11-08 | Matsushita Electric Ind Co Ltd | 位相シフトマスク及び、それを用いたホールパターン形成方法 |
| JP4339106B2 (ja) * | 2003-12-25 | 2009-10-07 | エスアイアイ・ナノテクノロジー株式会社 | 位相シフトマスクの欠陥修正方法 |
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2008
- 2008-02-14 JP JP2008033842A patent/JP5085366B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JP2009192846A (ja) | 2009-08-27 |
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