JP5081809B2 - 半導体表面から粒子を除去する方法 - Google Patents
半導体表面から粒子を除去する方法 Download PDFInfo
- Publication number
- JP5081809B2 JP5081809B2 JP2008504731A JP2008504731A JP5081809B2 JP 5081809 B2 JP5081809 B2 JP 5081809B2 JP 2008504731 A JP2008504731 A JP 2008504731A JP 2008504731 A JP2008504731 A JP 2008504731A JP 5081809 B2 JP5081809 B2 JP 5081809B2
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- Prior art keywords
- cleaning
- particles
- medium
- rinsing
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title claims abstract description 87
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 238000004140 cleaning Methods 0.000 claims abstract description 70
- 238000013019 agitation Methods 0.000 claims abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 239000008119 colloidal silica Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 16
- 239000007800 oxidant agent Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 229910010272 inorganic material Inorganic materials 0.000 claims description 3
- 239000011147 inorganic material Substances 0.000 claims description 3
- 239000000080 wetting agent Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 32
- 235000012431 wafers Nutrition 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 239000007788 liquid Substances 0.000 description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 11
- 239000000084 colloidal system Substances 0.000 description 7
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- 230000002378 acidificating effect Effects 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005411 Van der Waals force Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- -1 hydroxide ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/08—Silicates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/14—Silicates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02096—Cleaning only mechanical cleaning
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
方法を提供することである。
ガソニック)により印加される。超音波エネルギーによるこのような機械的振盪は液体の超音波振盪または基板の超音波振盪のいずれかにより印加可能である。清浄化媒体によりファンデルワールス力および静電力を低減するためのは、粒子と基板の間に若干の液体が存在しなければならない。粒子と基板の間にこの薄い中間液体層を得るためには、最小の機械的衝撃が有利である。
−超音波振盪(1500kHz)を60℃で1分間印加し、
−超音波振盪下25℃で1分間DI水によりすすぎ、
−窒素雰囲気下で乾燥する。
により基板になお強く結合される。粒子により引き付けられるが、基板により引き付けられない、基板材料の小さいコロイドの添加は、ファンデルワールス力を低下させ、粒子を浮き上がらせる。加えて、除去された粒子は基板材料コロイドにより被覆され、再付着は強く抑制される。
Claims (14)
- 水性清浄化媒体が半導体表面に供給され、清浄化媒体が7未満のpH値を有し且つ0.
0001〜1g/lの範囲の濃度でコロイド状で懸濁されている清浄化粒子を含んでなり、そして機械的振盪が清浄化段階の間の少なくとも一部の時間、除去対象の粒子に印加される、清浄化段階を含んでなる、半導体表面から粒子を除去する方法。 - 清浄化粒子が無機材料からなる、請求項1に記載の方法。
- 清浄化粒子がコロイド状シリカからなる、請求項1に記載の方法。
- 清浄化粒子が洗浄化対象の表面の少なくとも1つの材料と化学的に同一の材料からなる、請求項1に記載の方法。
- 清浄化粒子の平均粒子サイズが1〜100nmの範囲にある、請求項1に記載の方法。
- 半導体表面上の素子が特定の最小の素子寸法を有し、そして清浄化粒子の平均粒子サイズが最小素子寸法の半分よりも小さい、請求項1に記載の方法。
- 粒子が100m2/g以上の粒子比表面積を有する、請求項1に記載の方法。
- 清浄化媒体が2モル/1以下のイオン強度を有する、請求項1に記載の方法。
- 前記清浄化溶液が酸化剤を含んでなる、請求項1に記載の方法。
- 前記清浄化溶液が湿潤剤を更に含んでなる、請求項1に記載の方法。
- 清浄化段階の後の水性すすぎ媒体によるすすぎ段階を更に含んでなり、すすぎ媒体が粒子を実質的に含有しない、請求項1に記載の方法。
- すすぎ段階が清浄化段階に引き続いて表面の中間乾燥なしで行われる、請求項11に記載の方法。
- 清浄化段階を停止する前にすすぎ段階が開始される、請求項11に記載の方法。
- 機械的振盪が超音波エネルギーにより印加される、請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT5762005 | 2005-04-05 | ||
ATA576/2005 | 2005-04-05 | ||
PCT/EP2006/060987 WO2006106045A1 (en) | 2005-04-05 | 2006-03-23 | Method for removing particles from a semiconductor surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008535276A JP2008535276A (ja) | 2008-08-28 |
JP5081809B2 true JP5081809B2 (ja) | 2012-11-28 |
Family
ID=36699088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008504731A Expired - Fee Related JP5081809B2 (ja) | 2005-04-05 | 2006-03-23 | 半導体表面から粒子を除去する方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7754019B2 (ja) |
EP (1) | EP1869697B1 (ja) |
JP (1) | JP5081809B2 (ja) |
KR (1) | KR20080003821A (ja) |
CN (1) | CN100517594C (ja) |
AT (1) | ATE514495T1 (ja) |
TW (1) | TWI324797B (ja) |
WO (1) | WO2006106045A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101583439B (zh) * | 2007-01-22 | 2013-03-13 | 兰姆研究股份公司 | 清洁表面的方法 |
SG192313A1 (en) | 2007-02-08 | 2013-08-30 | Fontana Technology | Particle removal method and composition |
US8388762B2 (en) * | 2007-05-02 | 2013-03-05 | Lam Research Corporation | Substrate cleaning technique employing multi-phase solution |
US7749327B2 (en) * | 2007-11-01 | 2010-07-06 | Micron Technology, Inc. | Methods for treating surfaces |
JP5518598B2 (ja) * | 2010-07-02 | 2014-06-11 | 東京エレクトロン株式会社 | パーティクル分布解析支援方法及びその方法を実施するためのプログラムを記録した記録媒体 |
US8595929B2 (en) * | 2010-10-21 | 2013-12-03 | Siemens Energy, Inc. | Repair of a turbine engine surface containing crevices |
CN102764743A (zh) * | 2012-07-25 | 2012-11-07 | 赵显华 | 一种超声波清洗方法 |
CN103509657A (zh) * | 2013-10-17 | 2014-01-15 | 太仓康茂电子有限公司 | 零部件表面清洁方法 |
US10080370B2 (en) | 2014-04-14 | 2018-09-25 | Ever Clean And Clear Technologies Ltd. | Ultrasound cleaning method with suspended nanoparticles |
CN116581068B (zh) * | 2023-07-13 | 2023-12-19 | 北京紫光华天热能动力技术有限公司 | 一种硅基材料高效脱除纳米颗粒物装置及方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4050954A (en) * | 1976-03-25 | 1977-09-27 | International Business Machines Corporation | Surface treatment of semiconductor substrates |
JP2653511B2 (ja) * | 1989-03-30 | 1997-09-17 | 株式会社東芝 | 半導体装置の洗浄方法及びその洗浄装置 |
JPH0629272A (ja) * | 1992-07-10 | 1994-02-04 | Matsushita Electron Corp | 半導体基板の洗浄方法 |
JP3324181B2 (ja) * | 1993-03-12 | 2002-09-17 | 富士通株式会社 | ウエハの洗浄方法 |
US5593339A (en) * | 1993-08-12 | 1997-01-14 | Church & Dwight Co., Inc. | Slurry cleaning process |
EP0692318B1 (en) * | 1994-06-28 | 2001-09-12 | Ebara Corporation | Method of and apparatus for cleaning workpiece |
FR2722511B1 (fr) * | 1994-07-15 | 1999-04-02 | Ontrak Systems Inc | Procede pour enlever les metaux dans un dispositif de recurage |
TW406329B (en) | 1998-04-30 | 2000-09-21 | Ibm | Method of cleaning semiconductor wafers after cmp planarization |
KR100610387B1 (ko) | 1998-05-18 | 2006-08-09 | 말린크로트 베이커, 인코포레이티드 | 초소형 전자 기판 세정용 실리케이트 함유 알칼리성 조성물 |
JP3664605B2 (ja) * | 1999-04-30 | 2005-06-29 | 信越半導体株式会社 | ウェーハの研磨方法、洗浄方法及び処理方法 |
US6756308B2 (en) | 2001-02-13 | 2004-06-29 | Ekc Technology, Inc. | Chemical-mechanical planarization using ozone |
US6811471B2 (en) * | 2002-06-05 | 2004-11-02 | Arizona Board Of Regents | Abrasive particles to clean semiconductor wafers during chemical mechanical planarization |
KR100516886B1 (ko) * | 2002-12-09 | 2005-09-23 | 제일모직주식회사 | 실리콘 웨이퍼의 최종 연마용 슬러리 조성물 |
US7407601B2 (en) * | 2003-04-24 | 2008-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd | Polymeric particle slurry system and method to reduce feature sidewall erosion |
US7696141B2 (en) * | 2003-06-27 | 2010-04-13 | Lam Research Corporation | Cleaning compound and method and system for using the cleaning compound |
-
2006
- 2006-02-16 TW TW095105226A patent/TWI324797B/zh not_active IP Right Cessation
- 2006-03-23 EP EP06725265A patent/EP1869697B1/en not_active Not-in-force
- 2006-03-23 KR KR1020077024254A patent/KR20080003821A/ko active Search and Examination
- 2006-03-23 JP JP2008504731A patent/JP5081809B2/ja not_active Expired - Fee Related
- 2006-03-23 WO PCT/EP2006/060987 patent/WO2006106045A1/en not_active Application Discontinuation
- 2006-03-23 CN CNB2006800108753A patent/CN100517594C/zh not_active Expired - Fee Related
- 2006-03-23 US US11/887,923 patent/US7754019B2/en not_active Expired - Fee Related
- 2006-03-23 AT AT06725265T patent/ATE514495T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN100517594C (zh) | 2009-07-22 |
ATE514495T1 (de) | 2011-07-15 |
TWI324797B (en) | 2010-05-11 |
CN101151714A (zh) | 2008-03-26 |
TW200636839A (en) | 2006-10-16 |
EP1869697B1 (en) | 2011-06-29 |
JP2008535276A (ja) | 2008-08-28 |
US20090050176A1 (en) | 2009-02-26 |
WO2006106045A1 (en) | 2006-10-12 |
EP1869697A1 (en) | 2007-12-26 |
KR20080003821A (ko) | 2008-01-08 |
US7754019B2 (en) | 2010-07-13 |
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