ATE514495T1 - Verfahren zum entfernen von partikeln von einer halbleiteroberfläche - Google Patents
Verfahren zum entfernen von partikeln von einer halbleiteroberflächeInfo
- Publication number
- ATE514495T1 ATE514495T1 AT06725265T AT06725265T ATE514495T1 AT E514495 T1 ATE514495 T1 AT E514495T1 AT 06725265 T AT06725265 T AT 06725265T AT 06725265 T AT06725265 T AT 06725265T AT E514495 T1 ATE514495 T1 AT E514495T1
- Authority
- AT
- Austria
- Prior art keywords
- particles
- cleaning
- semiconductor surface
- removal
- supplied
- Prior art date
Links
- 239000002245 particle Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004140 cleaning Methods 0.000 abstract 6
- 238000013019 agitation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/08—Silicates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/14—Silicates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02096—Cleaning only mechanical cleaning
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT5762005 | 2005-04-05 | ||
PCT/EP2006/060987 WO2006106045A1 (en) | 2005-04-05 | 2006-03-23 | Method for removing particles from a semiconductor surface |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE514495T1 true ATE514495T1 (de) | 2011-07-15 |
Family
ID=36699088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06725265T ATE514495T1 (de) | 2005-04-05 | 2006-03-23 | Verfahren zum entfernen von partikeln von einer halbleiteroberfläche |
Country Status (8)
Country | Link |
---|---|
US (1) | US7754019B2 (de) |
EP (1) | EP1869697B1 (de) |
JP (1) | JP5081809B2 (de) |
KR (1) | KR20080003821A (de) |
CN (1) | CN100517594C (de) |
AT (1) | ATE514495T1 (de) |
TW (1) | TWI324797B (de) |
WO (1) | WO2006106045A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI457993B (zh) * | 2007-01-22 | 2014-10-21 | Lam Res Ag | 清潔表面的方法 |
CN101610980A (zh) * | 2007-02-08 | 2009-12-23 | 丰塔纳技术公司 | 粒子去除方法及化合物 |
US8388762B2 (en) * | 2007-05-02 | 2013-03-05 | Lam Research Corporation | Substrate cleaning technique employing multi-phase solution |
US7749327B2 (en) * | 2007-11-01 | 2010-07-06 | Micron Technology, Inc. | Methods for treating surfaces |
JP5518598B2 (ja) * | 2010-07-02 | 2014-06-11 | 東京エレクトロン株式会社 | パーティクル分布解析支援方法及びその方法を実施するためのプログラムを記録した記録媒体 |
US8595929B2 (en) * | 2010-10-21 | 2013-12-03 | Siemens Energy, Inc. | Repair of a turbine engine surface containing crevices |
CN102764743A (zh) * | 2012-07-25 | 2012-11-07 | 赵显华 | 一种超声波清洗方法 |
CN103509657A (zh) * | 2013-10-17 | 2014-01-15 | 太仓康茂电子有限公司 | 零部件表面清洁方法 |
AU2015248440C1 (en) * | 2014-04-14 | 2019-11-07 | Ever Clean And Clear Technologies Ltd | An ultrasound cleaning method with suspended nanoparticles |
CN116581068B (zh) * | 2023-07-13 | 2023-12-19 | 北京紫光华天热能动力技术有限公司 | 一种硅基材料高效脱除纳米颗粒物装置及方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4050954A (en) * | 1976-03-25 | 1977-09-27 | International Business Machines Corporation | Surface treatment of semiconductor substrates |
JP2653511B2 (ja) | 1989-03-30 | 1997-09-17 | 株式会社東芝 | 半導体装置の洗浄方法及びその洗浄装置 |
JPH0629272A (ja) * | 1992-07-10 | 1994-02-04 | Matsushita Electron Corp | 半導体基板の洗浄方法 |
JP3324181B2 (ja) * | 1993-03-12 | 2002-09-17 | 富士通株式会社 | ウエハの洗浄方法 |
US5593339A (en) * | 1993-08-12 | 1997-01-14 | Church & Dwight Co., Inc. | Slurry cleaning process |
EP1080797A3 (de) * | 1994-06-28 | 2005-10-05 | Ebara Corporation | Verfahren und Vorrichtung für die Reinigung von Werkstücken |
DE19525521B4 (de) * | 1994-07-15 | 2007-04-26 | Lam Research Corp.(N.D.Ges.D.Staates Delaware), Fremont | Verfahren zum Reinigen von Substraten |
TW406329B (en) * | 1998-04-30 | 2000-09-21 | Ibm | Method of cleaning semiconductor wafers after cmp planarization |
KR100610387B1 (ko) * | 1998-05-18 | 2006-08-09 | 말린크로트 베이커, 인코포레이티드 | 초소형 전자 기판 세정용 실리케이트 함유 알칼리성 조성물 |
JP3664605B2 (ja) * | 1999-04-30 | 2005-06-29 | 信越半導体株式会社 | ウェーハの研磨方法、洗浄方法及び処理方法 |
US6756308B2 (en) * | 2001-02-13 | 2004-06-29 | Ekc Technology, Inc. | Chemical-mechanical planarization using ozone |
AU2003238888A1 (en) * | 2002-06-05 | 2003-12-22 | Arizona Board Of Regents | Abrasive particles to clean semiconductor wafers during chemical mechanical planarization |
KR100516886B1 (ko) * | 2002-12-09 | 2005-09-23 | 제일모직주식회사 | 실리콘 웨이퍼의 최종 연마용 슬러리 조성물 |
US7407601B2 (en) * | 2003-04-24 | 2008-08-05 | Taiwan Semiconductor Manufacturing Co., Ltd | Polymeric particle slurry system and method to reduce feature sidewall erosion |
US7696141B2 (en) * | 2003-06-27 | 2010-04-13 | Lam Research Corporation | Cleaning compound and method and system for using the cleaning compound |
-
2006
- 2006-02-16 TW TW095105226A patent/TWI324797B/zh not_active IP Right Cessation
- 2006-03-23 EP EP06725265A patent/EP1869697B1/de not_active Not-in-force
- 2006-03-23 WO PCT/EP2006/060987 patent/WO2006106045A1/en not_active Application Discontinuation
- 2006-03-23 AT AT06725265T patent/ATE514495T1/de not_active IP Right Cessation
- 2006-03-23 JP JP2008504731A patent/JP5081809B2/ja not_active Expired - Fee Related
- 2006-03-23 CN CNB2006800108753A patent/CN100517594C/zh not_active Expired - Fee Related
- 2006-03-23 KR KR1020077024254A patent/KR20080003821A/ko active Search and Examination
- 2006-03-23 US US11/887,923 patent/US7754019B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200636839A (en) | 2006-10-16 |
EP1869697A1 (de) | 2007-12-26 |
EP1869697B1 (de) | 2011-06-29 |
US7754019B2 (en) | 2010-07-13 |
JP5081809B2 (ja) | 2012-11-28 |
JP2008535276A (ja) | 2008-08-28 |
KR20080003821A (ko) | 2008-01-08 |
US20090050176A1 (en) | 2009-02-26 |
WO2006106045A1 (en) | 2006-10-12 |
CN100517594C (zh) | 2009-07-22 |
CN101151714A (zh) | 2008-03-26 |
TWI324797B (en) | 2010-05-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |