JP5049542B2

JP5049542B2 - 反射防止フイルム、偏光板、及びそれを用いた画像表示装置

反射防止フイルム、偏光板、及びそれを用いた画像表示装置 Download PDF

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Publication number: JP5049542B2
Authority: JP; Japan
Prior art keywords: group; fine particles; refractive index; silica; general formula
Prior art date: 2005-09-26
Legal status : Active

Application number

JP2006259566A

Other languages

English (en)

Japanese (ja)

Other versions

JP2007114772A5 (fr

JP2007114772A (ja

Inventor

修沢登

博之米山

Current Assignee

Fujifilm Corp

Original Assignee

Fujifilm Corp

Priority date

2005-09-26

Filing date

2006-09-25

Publication date

2012-10-17

2006-09-25 Application filed by Fujifilm Corp filed Critical Fujifilm Corp

2006-09-25 Priority to JP2006259566A priority Critical patent/JP5049542B2/ja

2007-05-10 Publication of JP2007114772A publication Critical patent/JP2007114772A/ja

2009-05-14 Publication of JP2007114772A5 publication Critical patent/JP2007114772A5/ja

2012-10-17 Application granted granted Critical

2012-10-17 Publication of JP5049542B2 publication Critical patent/JP5049542B2/ja

Status Active legal-status Critical Current

2026-09-25 Anticipated expiration legal-status Critical

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VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 415
239000010410 layer Substances 0.000 claims description 285
239000010419 fine particle Substances 0.000 claims description 282
239000000377 silicon dioxide Substances 0.000 claims description 183
239000002245 particle Substances 0.000 claims description 163
-1 polysiloxane Polymers 0.000 claims description 147
150000001875 compounds Chemical class 0.000 claims description 114
238000000576 coating method Methods 0.000 claims description 91
239000011248 coating agent Substances 0.000 claims description 86
229920000642 polymer Polymers 0.000 claims description 79
229910000410 antimony oxide Inorganic materials 0.000 claims description 77
VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 77
229910052731 fluorine Inorganic materials 0.000 claims description 73
239000011247 coating layer Substances 0.000 claims description 72
125000004432 carbon atom Chemical group C* 0.000 claims description 62
239000011737 fluorine Substances 0.000 claims description 62
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 61
229920001296 polysiloxane Polymers 0.000 claims description 60
230000005865 ionizing radiation Effects 0.000 claims description 51
125000000217 alkyl group Chemical group 0.000 claims description 43
230000036961 partial effect Effects 0.000 claims description 42
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 36
229910044991 metal oxide Inorganic materials 0.000 claims description 33
150000004706 metal oxides Chemical class 0.000 claims description 33
125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 32
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 31
125000003118 aryl group Chemical group 0.000 claims description 26
238000006243 chemical reaction Methods 0.000 claims description 26
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 22
229920001577 copolymer Polymers 0.000 claims description 22
238000004132 cross linking Methods 0.000 claims description 20
125000005647 linker group Chemical group 0.000 claims description 20
239000000203 mixture Substances 0.000 claims description 19
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 18
125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 16
239000002519 antifouling agent Substances 0.000 claims description 14
239000000470 constituent Substances 0.000 claims description 13
239000008199 coating composition Substances 0.000 claims description 11
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
150000001282 organosilanes Chemical class 0.000 claims description 8
125000002723 alicyclic group Chemical group 0.000 claims description 6
229920002313 fluoropolymer Polymers 0.000 claims description 5
239000004811 fluoropolymer Substances 0.000 claims description 5
125000000962 organic group Chemical group 0.000 claims description 5
125000005010 perfluoroalkyl group Chemical group 0.000 claims description 5
239000010954 inorganic particle Substances 0.000 claims description 3
239000010408 film Substances 0.000 description 230
239000006185 dispersion Substances 0.000 description 83
238000000034 method Methods 0.000 description 73
239000000243 solution Substances 0.000 description 57
239000002131 composite material Substances 0.000 description 43
239000007864 aqueous solution Substances 0.000 description 40
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 34
239000000178 monomer Substances 0.000 description 34
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 32
239000000126 substance Substances 0.000 description 29
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
239000007787 solid Substances 0.000 description 27
239000003513 alkali Substances 0.000 description 26
ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 26
AQTIRDJOWSATJB-UHFFFAOYSA-K antimonic acid Chemical compound O[Sb](O)(O)=O AQTIRDJOWSATJB-UHFFFAOYSA-K 0.000 description 25
229910004298 SiO 2 Inorganic materials 0.000 description 24
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
239000002585 base Substances 0.000 description 23
239000004973 liquid crystal related substance Substances 0.000 description 23
238000006116 polymerization reaction Methods 0.000 description 23
235000002639 sodium chloride Nutrition 0.000 description 23
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 23
238000002360 preparation method Methods 0.000 description 22
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
239000007788 liquid Substances 0.000 description 21
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 20
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 20
230000003373 anti-fouling effect Effects 0.000 description 20
239000003999 initiator Substances 0.000 description 20
150000003839 salts Chemical class 0.000 description 20
239000000523 sample Substances 0.000 description 20
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 19
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 19
230000000694 effects Effects 0.000 description 19
238000010438 heat treatment Methods 0.000 description 19
229910052751 metal Inorganic materials 0.000 description 19
239000002184 metal Substances 0.000 description 19
238000011282 treatment Methods 0.000 description 19
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 18
238000004519 manufacturing process Methods 0.000 description 18
239000000463 material Substances 0.000 description 18
239000002904 solvent Substances 0.000 description 18
239000003792 electrolyte Substances 0.000 description 17
125000000524 functional group Chemical group 0.000 description 17
125000002947 alkylene group Chemical group 0.000 description 16
239000011230 binding agent Substances 0.000 description 16
238000011156 evaluation Methods 0.000 description 16
125000001153 fluoro group Chemical group F* 0.000 description 16
238000001723 curing Methods 0.000 description 15
239000003960 organic solvent Substances 0.000 description 15
229910018072 Al 2 O 3 Inorganic materials 0.000 description 14
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 14
239000000428 dust Substances 0.000 description 14
229910052809 inorganic oxide Inorganic materials 0.000 description 14
125000003700 epoxy group Chemical group 0.000 description 13
150000003961 organosilicon compounds Chemical class 0.000 description 13
229910052760 oxygen Inorganic materials 0.000 description 13
229920002554 vinyl polymer Polymers 0.000 description 13
229920002284 Cellulose triacetate Polymers 0.000 description 12
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
229910010413 TiO 2 Inorganic materials 0.000 description 12
QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 12
NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 12
239000002253 acid Substances 0.000 description 12
125000003545 alkoxy group Chemical group 0.000 description 12
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
210000002858 crystal cell Anatomy 0.000 description 12
239000001301 oxygen Substances 0.000 description 12
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 12
150000003254 radicals Chemical group 0.000 description 12
125000001424 substituent group Chemical group 0.000 description 12
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
239000003054 catalyst Substances 0.000 description 11
125000005702 oxyalkylene group Chemical group 0.000 description 11
238000007127 saponification reaction Methods 0.000 description 11
239000011257 shell material Substances 0.000 description 11
229910052710 silicon Inorganic materials 0.000 description 11
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 10
230000007423 decrease Effects 0.000 description 10
230000007062 hydrolysis Effects 0.000 description 10
238000006460 hydrolysis reaction Methods 0.000 description 10
239000011256 inorganic filler Substances 0.000 description 10
229910003475 inorganic filler Inorganic materials 0.000 description 10
229910052757 nitrogen Inorganic materials 0.000 description 10
229920000728 polyester Polymers 0.000 description 10
239000000047 product Substances 0.000 description 10
229920005989 resin Polymers 0.000 description 10
239000011347 resin Substances 0.000 description 10
239000010703 silicon Substances 0.000 description 10
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
239000003795 chemical substances by application Substances 0.000 description 9
239000002609 medium Substances 0.000 description 9
230000003287 optical effect Effects 0.000 description 9
230000001681 protective effect Effects 0.000 description 9
RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 9
SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 9
239000011787 zinc oxide Substances 0.000 description 9
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 8
239000006087 Silane Coupling Agent Substances 0.000 description 8
MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
239000013522 chelant Substances 0.000 description 8
229910052801 chlorine Inorganic materials 0.000 description 8
238000009826 distribution Methods 0.000 description 8
238000001035 drying Methods 0.000 description 8
150000002148 esters Chemical class 0.000 description 8
FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 8
125000005843 halogen group Chemical group 0.000 description 8
150000002484 inorganic compounds Chemical class 0.000 description 8
229910010272 inorganic material Inorganic materials 0.000 description 8
125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 8
125000004430 oxygen atom Chemical group O* 0.000 description 8
239000003505 polymerization initiator Substances 0.000 description 8
239000000843 powder Substances 0.000 description 8
239000002994 raw material Substances 0.000 description 8
230000009257 reactivity Effects 0.000 description 8
229920001567 vinyl ester resin Polymers 0.000 description 8
NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 7
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 7
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 7
229910006404 SnO 2 Inorganic materials 0.000 description 7
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
230000015572 biosynthetic process Effects 0.000 description 7
239000003729 cation exchange resin Substances 0.000 description 7
229910052736 halogen Inorganic materials 0.000 description 7
230000001678 irradiating effect Effects 0.000 description 7
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235000012239 silicon dioxide Nutrition 0.000 description 7
239000000758 substrate Substances 0.000 description 7
238000000108 ultra-filtration Methods 0.000 description 7
TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
235000010724 Wisteria floribunda Nutrition 0.000 description 6
230000002378 acidificating effect Effects 0.000 description 6
230000003667 anti-reflective effect Effects 0.000 description 6
229910052799 carbon Inorganic materials 0.000 description 6
125000001309 chloro group Chemical group Cl* 0.000 description 6
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
125000003709 fluoroalkyl group Chemical group 0.000 description 6
150000002367 halogens Chemical class 0.000 description 6
WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 6
239000011164 primary particle Substances 0.000 description 6
125000003396 thiol group Chemical group [H]S* 0.000 description 6
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
239000004793 Polystyrene Substances 0.000 description 5
MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 5
229910052910 alkali metal silicate Inorganic materials 0.000 description 5
125000000732 arylene group Chemical group 0.000 description 5
125000004093 cyano group Chemical group *C#N 0.000 description 5
230000006866 deterioration Effects 0.000 description 5
KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
125000004185 ester group Chemical group 0.000 description 5
125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 5
HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 5
239000012528 membrane Substances 0.000 description 5
FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 5
125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 5
125000001624 naphthyl group Chemical group 0.000 description 5
229920002223 polystyrene Polymers 0.000 description 5
238000003756 stirring Methods 0.000 description 5
238000004381 surface treatment Methods 0.000 description 5
238000003786 synthesis reaction Methods 0.000 description 5
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
229910001887 tin oxide Inorganic materials 0.000 description 5
SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 4
VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
239000004372 Polyvinyl alcohol Substances 0.000 description 4
238000003917 TEM image Methods 0.000 description 4
150000003926 acrylamides Chemical class 0.000 description 4
230000032683 aging Effects 0.000 description 4
239000012670 alkaline solution Substances 0.000 description 4
125000005529 alkyleneoxy group Chemical group 0.000 description 4
125000003277 amino group Chemical group 0.000 description 4
229910052787 antimony Inorganic materials 0.000 description 4
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 4
125000000751 azo group Chemical group [*]N=N[*] 0.000 description 4
238000007334 copolymerization reaction Methods 0.000 description 4
239000007771 core particle Substances 0.000 description 4
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AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 4
239000000945 filler Substances 0.000 description 4
FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
229910001507 metal halide Inorganic materials 0.000 description 4
150000005309 metal halides Chemical class 0.000 description 4
XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 4
239000012788 optical film Substances 0.000 description 4
150000002978 peroxides Chemical class 0.000 description 4
229920000058 polyacrylate Polymers 0.000 description 4
229920002451 polyvinyl alcohol Polymers 0.000 description 4
238000010926 purge Methods 0.000 description 4
238000003847 radiation curing Methods 0.000 description 4
230000002829 reductive effect Effects 0.000 description 4
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
239000000725 suspension Substances 0.000 description 4
229910052719 titanium Inorganic materials 0.000 description 4
239000010936 titanium Substances 0.000 description 4
QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 3
UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
PGUFRYZQAPBGDW-UHFFFAOYSA-N 2,2-difluoro-2-[1,1,2,2-tetrafluoro-2-[1,1,2,2-tetrafluoro-2-(trifluoromethoxy)ethoxy]ethoxy]ethanol Chemical compound OCC(F)(F)OC(F)(F)C(F)(F)OC(F)(F)C(F)(F)OC(F)(F)F PGUFRYZQAPBGDW-UHFFFAOYSA-N 0.000 description 3
HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 3
125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 3
UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 3
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150000003459 sulfonic acid esters Chemical class 0.000 description 1
HSVFKFNNMLUVEY-UHFFFAOYSA-N sulfuryl diazide Chemical compound [N-]=[N+]=NS(=O)(=O)N=[N+]=[N-] HSVFKFNNMLUVEY-UHFFFAOYSA-N 0.000 description 1
239000004291 sulphur dioxide Substances 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
239000012756 surface treatment agent Substances 0.000 description 1
238000010557 suspension polymerization reaction Methods 0.000 description 1
238000001308 synthesis method Methods 0.000 description 1
230000002194 synthesizing effect Effects 0.000 description 1
238000012360 testing method Methods 0.000 description 1
CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
238000004448 titration Methods 0.000 description 1
DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical group C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
238000012546 transfer Methods 0.000 description 1
TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 description 1
CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
239000005051 trimethylchlorosilane Substances 0.000 description 1
AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
SOLUNJPVPZJLOM-UHFFFAOYSA-N trizinc;distiborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-][Sb]([O-])([O-])=O.[O-][Sb]([O-])([O-])=O SOLUNJPVPZJLOM-UHFFFAOYSA-N 0.000 description 1
239000011882 ultra-fine particle Substances 0.000 description 1
239000005050 vinyl trichlorosilane Substances 0.000 description 1
239000011800 void material Substances 0.000 description 1
238000005406 washing Methods 0.000 description 1
210000002268 wool Anatomy 0.000 description 1