JP5027224B2 - 窒化炭素の製造方法 - Google Patents
窒化炭素の製造方法 Download PDFInfo
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- JP5027224B2 JP5027224B2 JP2009518909A JP2009518909A JP5027224B2 JP 5027224 B2 JP5027224 B2 JP 5027224B2 JP 2009518909 A JP2009518909 A JP 2009518909A JP 2009518909 A JP2009518909 A JP 2009518909A JP 5027224 B2 JP5027224 B2 JP 5027224B2
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- JP
- Japan
- Prior art keywords
- carbon nitride
- nitride material
- carbon
- pyrolysis
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000000463 material Substances 0.000 claims description 61
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 34
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 238000000197 pyrolysis Methods 0.000 claims description 16
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 10
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical group [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 229910052755 nonmetal Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 19
- 239000000047 product Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 15
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 11
- 229910052783 alkali metal Inorganic materials 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 239000006227 byproduct Substances 0.000 description 8
- 150000001340 alkali metals Chemical class 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- -1 alkali metal amide Chemical class 0.000 description 3
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229960001701 chloroform Drugs 0.000 description 2
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004729 solvothermal method Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000007736 thin film deposition technique Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000013375 chromatographic separation Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 150000002540 isothiocyanates Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- IDBFBDSKYCUNPW-UHFFFAOYSA-N lithium nitride Chemical compound [Li]N([Li])[Li] IDBFBDSKYCUNPW-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000011104 metalized film Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000013341 scale-up Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 229910021654 trace metal Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/0828—Carbonitrides or oxycarbonitrides of metals, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/0605—Binary compounds of nitrogen with carbon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C3/00—Cyanogen; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C3/00—Cyanogen; Compounds thereof
- C01C3/20—Thiocyanic acid; Salts thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
- C22C29/04—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbonitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Electrochemistry (AREA)
- Structural Engineering (AREA)
- Dispersion Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Carbon And Carbon Compounds (AREA)
- Catalysts (AREA)
- Chemical Vapour Deposition (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Saccharide Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20060682 | 2006-07-13 | ||
| FI20060682A FI121924B (fi) | 2006-07-13 | 2006-07-13 | Menetelmä karbonitridin valmistamiseksi |
| PCT/FI2007/000192 WO2008006935A2 (en) | 2006-07-13 | 2007-07-13 | Carbon nitride preparation method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009542574A JP2009542574A (ja) | 2009-12-03 |
| JP2009542574A5 JP2009542574A5 (https=) | 2010-01-21 |
| JP5027224B2 true JP5027224B2 (ja) | 2012-09-19 |
Family
ID=36758289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009518909A Expired - Fee Related JP5027224B2 (ja) | 2006-07-13 | 2007-07-13 | 窒化炭素の製造方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7807124B2 (https=) |
| EP (1) | EP2049438B1 (https=) |
| JP (1) | JP5027224B2 (https=) |
| KR (1) | KR101381952B1 (https=) |
| CN (1) | CN101489923B (https=) |
| CA (1) | CA2657482C (https=) |
| FI (1) | FI121924B (https=) |
| IL (1) | IL196153A (https=) |
| RU (1) | RU2425799C2 (https=) |
| WO (1) | WO2008006935A2 (https=) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007096476A2 (en) * | 2006-02-23 | 2007-08-30 | Picodeon Ltd Oy | Coating on a medical substrate and a coated medical product |
| FI121924B (fi) | 2006-07-13 | 2011-06-15 | Carbodeon Ltd Oy | Menetelmä karbonitridin valmistamiseksi |
| US9643165B2 (en) | 2008-06-18 | 2017-05-09 | Board Of Trustees Of The University Of Arkansas | Doped-carbon composites, synthesizing methods and applications of the same |
| US9095837B2 (en) | 2008-06-18 | 2015-08-04 | Broad of Trustees of the University of Arkansas | Renewable resource-based metal oxide-containing materials and applications of the same |
| US8753603B2 (en) * | 2008-06-18 | 2014-06-17 | Board Of Trustees Of The University Of Arkansas | Microwave-assisted synthesis of carbon nanotubes from tannin, lignin, and derivatives |
| US8574337B2 (en) | 2008-06-18 | 2013-11-05 | Board Of Trustees Of The University Of Arkansas | Renewable resource-based metal-containing materials and applications of the same |
| DE102009005095A1 (de) * | 2009-01-19 | 2010-07-22 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Verfahren zur Herstellung von Carbonitriden über Polykondensations- bzw. Sol-Gel-Verfahren unter Verwendung Wasserstoff-freier Isocyanate |
| CN102479950B (zh) * | 2010-11-23 | 2015-06-24 | 中国科学院物理研究所 | 铌酸钛复合材料、其制备方法及含该复合材料的负极和电池 |
| US20120190216A1 (en) * | 2011-01-20 | 2012-07-26 | International Business Machines Corporation | Annealing techniques for high performance complementary metal oxide semiconductor (cmos) device fabrication |
| CN102350833B (zh) * | 2011-07-19 | 2014-04-16 | 上海耀华皮尔金顿玻璃股份有限公司 | 一种节能可钢化三银低辐射镀膜玻璃 |
| CN102268655A (zh) * | 2011-07-28 | 2011-12-07 | 河南大学 | 一种纳米晶碳氮薄膜的制备方法及装置 |
| CN103272639B (zh) * | 2013-06-09 | 2015-02-04 | 福州大学 | 一种共聚合改性的石墨相氮化碳纳米片可见光催化剂 |
| WO2016027042A1 (en) * | 2014-08-21 | 2016-02-25 | The University Of Liverpool | Two-dimensional carbon nitride material and method of preparation |
| CN105536844B (zh) * | 2015-12-15 | 2018-07-17 | 南京工业大学 | 一种无定型碳复合氮化碳光催化材料及其制备方法 |
| CN105925954B (zh) * | 2016-05-27 | 2020-04-14 | 清华大学 | 一种半导体氮化碳薄膜的制备方法 |
| RU2663165C1 (ru) * | 2017-06-16 | 2018-08-01 | федеральное государственное автономное образовательное учреждение высшего образования "Южно-Уральский государственный университет (национальный исследовательский университет)" | Способ получения углеродных материалов с высоким содержанием азота |
| CN107352517B (zh) * | 2017-07-21 | 2020-02-18 | 桂林理工大学 | 一种具有非晶态表面的石墨相氮化碳纳米花束的制备方法 |
| RU2690810C1 (ru) * | 2018-10-05 | 2019-06-05 | Федеральное государственное бюджетное учреждение науки Научно-технологический центр уникального приборостроения Российской академии наук (НТЦ УП РАН) | Способ получения нитрида углерода, обладающего аномально высоким уровнем флуоресценции под действием лазерного излучения видимого диапазона |
| CN109534307B (zh) * | 2019-01-16 | 2022-03-29 | 济南大学 | 一种g-C3N4晶相/非晶相同质结及其制备方法和应用 |
| CN110183773B (zh) * | 2019-07-03 | 2021-06-25 | 西北师范大学 | 壳聚糖季铵盐有机插层蒙脱土复合材料的制备方法 |
| RU2725796C1 (ru) * | 2020-01-30 | 2020-07-06 | Федеральное государственное бюджетное учреждение науки Научно-технологический центр уникального приборостроения Российской академии наук (НТЦ УП РАН) | Способ получения композитного материала, обладающего высоким уровнем флуоресценции под действием электромагнитного излучения видимого диапазона |
| CN113976157A (zh) * | 2021-10-19 | 2022-01-28 | 新乡医学院 | 一种三维多孔原位碳掺杂g-C3N4催化剂的制备方法 |
| CN118684201B (zh) * | 2024-08-23 | 2024-12-03 | 齐鲁理工学院 | 一种氮化碳纳米微球、其制备方法、应用及复合材料 |
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| SU282303A1 (ru) * | 1969-03-18 | 1985-09-07 | Со Ан Ссср Института Неорганической Химии Со Ан Ссср | Способ получени полуторных сульфидов и оксисульфидов редкоземельных элементов |
| SU339143A1 (ru) * | 1970-02-18 | 1991-10-30 | Институт Неорганической Химии Со Ан Ссср | Способ получени оксисульфидов редкоземельных элементов и иттри |
| JPS5133123B2 (https=) * | 1971-12-30 | 1976-09-17 | ||
| US3956460A (en) * | 1973-11-05 | 1976-05-11 | Ralph M. Parsons Company | Process for the treatment of gas streams containing hydrogen cyanide |
| US4205103A (en) * | 1975-05-14 | 1980-05-27 | The Goodyear Tire & Rubber Company | Process using same stable foam latex with built-in self gel mechanism and coating |
| SU783263A1 (ru) * | 1979-02-20 | 1980-11-30 | Ленинградский научно-исследовательский институт протезирования | Состав материала форм дл изготовлени моделей |
| JPS5722116A (en) * | 1980-07-16 | 1982-02-05 | Sumikin Coke Co Ltd | Preparation of purified ammonium sulfate |
| JPS59169914A (ja) * | 1983-03-11 | 1984-09-26 | Sumikin Coke Co Ltd | スルフアミン酸アンモニウムの製造方法 |
| US4832930A (en) * | 1988-05-02 | 1989-05-23 | Tekatch William M | Decomposition of ammonium thiocyanate |
| US5215728A (en) * | 1990-12-20 | 1993-06-01 | Ari Technologies Inc. | Method and apparatus for removal of h2s from a process gas, including thiosulfate and/or cyanide salt decomposition |
| US5606056A (en) | 1994-05-24 | 1997-02-25 | Arizona Board Of Regents | Carbon nitride and its synthesis |
| US5981094A (en) | 1996-01-04 | 1999-11-09 | The Carnegie Institution Of Washington | Low compressibility carbon nitrides |
| US6428762B1 (en) | 1999-07-27 | 2002-08-06 | William Marsh Rice University | Powder synthesis and characterization of amorphous carbon nitride, a-C3N4 |
| EP1276516B1 (en) * | 2000-04-26 | 2006-02-08 | Dow Global Technologies Inc. | Durable, absorbent latex foam composition having high vertical wicking |
| US6824599B2 (en) | 2001-10-03 | 2004-11-30 | The University Of Alabama | Dissolution and processing of cellulose using ionic liquids |
| JP2004284910A (ja) * | 2003-03-25 | 2004-10-14 | Hidetoshi Saito | 窒化炭素物の製造方法 |
| JP2004323316A (ja) * | 2003-04-25 | 2004-11-18 | Hidetoshi Saito | 窒化炭素物及び該窒化炭素物を用いた水素吸蔵材 |
| PL1630161T3 (pl) * | 2003-06-04 | 2011-04-29 | Asahi Chemical Ind | Sposób wytwarzania węglanu alkilenu |
| JP4941953B2 (ja) * | 2004-10-29 | 2012-05-30 | 独立行政法人物質・材料研究機構 | 窒化炭素多孔体およびその製造方法 |
| RU2288170C2 (ru) | 2005-02-16 | 2006-11-27 | Карбодеон Лтд Ой | Способ получения нитрида углерода |
| FI121924B (fi) | 2006-07-13 | 2011-06-15 | Carbodeon Ltd Oy | Menetelmä karbonitridin valmistamiseksi |
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| EP2049438B1 (en) | 2014-09-17 |
| US7807124B2 (en) | 2010-10-05 |
| CN101489923B (zh) | 2014-07-16 |
| WO2008006935A2 (en) | 2008-01-17 |
| FI121924B (fi) | 2011-06-15 |
| CA2657482C (en) | 2014-04-08 |
| EP2049438A2 (en) | 2009-04-22 |
| WO2008006935A3 (en) | 2008-04-17 |
| CA2657482A1 (en) | 2008-01-17 |
| RU2425799C2 (ru) | 2011-08-10 |
| FI20060682L (fi) | 2008-01-14 |
| FI20060682A0 (fi) | 2006-07-13 |
| US20100015030A1 (en) | 2010-01-21 |
| JP2009542574A (ja) | 2009-12-03 |
| IL196153A (en) | 2012-12-31 |
| CN101489923A (zh) | 2009-07-22 |
| KR20090038867A (ko) | 2009-04-21 |
| RU2009104020A (ru) | 2010-08-20 |
| IL196153A0 (en) | 2009-09-22 |
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