JP5006711B2 - 露光装置、露光方法及びデバイス製造方法 - Google Patents

露光装置、露光方法及びデバイス製造方法 Download PDF

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Publication number
JP5006711B2
JP5006711B2 JP2007169486A JP2007169486A JP5006711B2 JP 5006711 B2 JP5006711 B2 JP 5006711B2 JP 2007169486 A JP2007169486 A JP 2007169486A JP 2007169486 A JP2007169486 A JP 2007169486A JP 5006711 B2 JP5006711 B2 JP 5006711B2
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JP
Japan
Prior art keywords
exposure
light source
measurement
source distribution
effective light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007169486A
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English (en)
Japanese (ja)
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JP2009010130A5 (enExample
JP2009010130A (ja
Inventor
美和子 安藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007169486A priority Critical patent/JP5006711B2/ja
Priority to TW97121417A priority patent/TWI467341B/zh
Priority to US12/143,898 priority patent/US8411250B2/en
Priority to KR1020080060555A priority patent/KR100976302B1/ko
Publication of JP2009010130A publication Critical patent/JP2009010130A/ja
Publication of JP2009010130A5 publication Critical patent/JP2009010130A5/ja
Application granted granted Critical
Publication of JP5006711B2 publication Critical patent/JP5006711B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2007169486A 2007-06-27 2007-06-27 露光装置、露光方法及びデバイス製造方法 Expired - Fee Related JP5006711B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007169486A JP5006711B2 (ja) 2007-06-27 2007-06-27 露光装置、露光方法及びデバイス製造方法
TW97121417A TWI467341B (zh) 2007-06-27 2008-06-09 曝光設備及裝置製造方法
US12/143,898 US8411250B2 (en) 2007-06-27 2008-06-23 Exposure apparatus and device manufacturing method
KR1020080060555A KR100976302B1 (ko) 2007-06-27 2008-06-26 노광장치 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007169486A JP5006711B2 (ja) 2007-06-27 2007-06-27 露光装置、露光方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009010130A JP2009010130A (ja) 2009-01-15
JP2009010130A5 JP2009010130A5 (enExample) 2012-02-09
JP5006711B2 true JP5006711B2 (ja) 2012-08-22

Family

ID=40159988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007169486A Expired - Fee Related JP5006711B2 (ja) 2007-06-27 2007-06-27 露光装置、露光方法及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8411250B2 (enExample)
JP (1) JP5006711B2 (enExample)
KR (1) KR100976302B1 (enExample)
TW (1) TWI467341B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5785402B2 (ja) 2011-03-03 2015-09-30 キヤノン株式会社 露光装置、デバイス製造方法および計測方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970072024A (ko) * 1996-04-09 1997-11-07 오노 시게오 투영노광장치
JP3709904B2 (ja) * 1996-11-14 2005-10-26 株式会社ニコン 投影露光装置
JP3728613B2 (ja) * 1996-12-06 2005-12-21 株式会社ニコン 走査型露光装置の調整方法及び該方法を使用する走査型露光装置
JPH10284369A (ja) * 1997-04-03 1998-10-23 Nikon Corp 露光装置
JP2000077300A (ja) * 1998-08-28 2000-03-14 Nikon Corp 投影露光装置及び位置検出方法
JP3774590B2 (ja) 1999-05-28 2006-05-17 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP2002195912A (ja) * 2000-12-27 2002-07-10 Nikon Corp 光学特性計測方法及び装置、露光装置、並びにデバイス製造方法
JP2004128149A (ja) * 2002-10-01 2004-04-22 Nikon Corp 収差計測方法、露光方法及び露光装置
CN100463108C (zh) 2004-04-23 2009-02-18 尼康股份有限公司 测量方法、测量装置、曝光方法及曝光装置
JP2006013266A (ja) * 2004-06-28 2006-01-12 Nikon Corp 計測方法、露光方法、及び露光装置
JP2006080299A (ja) * 2004-09-09 2006-03-23 Nikon Corp 結像性能計測方法及び露光方法
CN101031997B (zh) * 2004-09-30 2011-11-02 株式会社尼康 计测方法、曝光方法以及器件制造方法
JP2006196555A (ja) * 2005-01-11 2006-07-27 Nikon Corp 収差計測方法及び装置、並びに露光方法及び装置
JP2006245145A (ja) * 2005-03-01 2006-09-14 Nikon Corp 光学特性計測方法及び装置、並びに露光方法及び装置
JP4753009B2 (ja) * 2005-05-24 2011-08-17 株式会社ニコン 計測方法、露光方法、及び露光装置
JP2006344739A (ja) * 2005-06-08 2006-12-21 Canon Inc 位置計測装置及びその方法
US20070081138A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method
JP2007250947A (ja) 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP4850643B2 (ja) * 2006-09-11 2012-01-11 キヤノン株式会社 露光装置

Also Published As

Publication number Publication date
US8411250B2 (en) 2013-04-02
US20090002665A1 (en) 2009-01-01
TW200907598A (en) 2009-02-16
KR20080114598A (ko) 2008-12-31
KR100976302B1 (ko) 2010-08-16
JP2009010130A (ja) 2009-01-15
TWI467341B (zh) 2015-01-01

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