JP4996946B2 - 反射防止膜形成用組成物、反射防止膜および光学デバイス - Google Patents

反射防止膜形成用組成物、反射防止膜および光学デバイス Download PDF

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Publication number
JP4996946B2
JP4996946B2 JP2007052647A JP2007052647A JP4996946B2 JP 4996946 B2 JP4996946 B2 JP 4996946B2 JP 2007052647 A JP2007052647 A JP 2007052647A JP 2007052647 A JP2007052647 A JP 2007052647A JP 4996946 B2 JP4996946 B2 JP 4996946B2
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Japan
Prior art keywords
composition
compound
antireflection film
forming
film
Prior art date
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Application number
JP2007052647A
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English (en)
Japanese (ja)
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JP2008214455A (ja
JP2008214455A5 (enExample
Inventor
健介 森田
誠 村松
浩二 殿原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2007052647A priority Critical patent/JP4996946B2/ja
Priority to US12/040,941 priority patent/US7964684B2/en
Publication of JP2008214455A publication Critical patent/JP2008214455A/ja
Publication of JP2008214455A5 publication Critical patent/JP2008214455A5/ja
Application granted granted Critical
Publication of JP4996946B2 publication Critical patent/JP4996946B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04—Homopolymers or copolymers of monomers containing silicon
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silicon Polymers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
JP2007052647A 2007-03-02 2007-03-02 反射防止膜形成用組成物、反射防止膜および光学デバイス Active JP4996946B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007052647A JP4996946B2 (ja) 2007-03-02 2007-03-02 反射防止膜形成用組成物、反射防止膜および光学デバイス
US12/040,941 US7964684B2 (en) 2007-03-02 2008-03-03 Antireflection film forming composition, antireflection film and optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007052647A JP4996946B2 (ja) 2007-03-02 2007-03-02 反射防止膜形成用組成物、反射防止膜および光学デバイス

Publications (3)

Publication Number Publication Date
JP2008214455A JP2008214455A (ja) 2008-09-18
JP2008214455A5 JP2008214455A5 (enExample) 2010-12-09
JP4996946B2 true JP4996946B2 (ja) 2012-08-08

Family

ID=39733291

Family Applications (1)

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JP2007052647A Active JP4996946B2 (ja) 2007-03-02 2007-03-02 反射防止膜形成用組成物、反射防止膜および光学デバイス

Country Status (2)

Country Link
US (1) US7964684B2 (enExample)
JP (1) JP4996946B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011084672A (ja) 2009-10-16 2011-04-28 Fujifilm Corp 光学材料用組成物
KR101133695B1 (ko) * 2009-11-20 2012-04-06 주식회사 에이피엠 기계적 성질이 향상된 반사 방지 피막용 조성물
MX368848B (es) * 2011-07-11 2019-10-18 Tokuyama Corp Composición curable fotocrómica.
KR20130042867A (ko) * 2011-10-19 2013-04-29 삼성디스플레이 주식회사 보호막 용액 조성물, 박막 트랜지스터 표시판 및 박막 트랜지스터 표시판 제조 방법
AU2013408092B2 (en) * 2013-12-19 2016-11-03 WEN, Xia Solar cell and preparation method therefor
JP5895957B2 (ja) 2014-02-20 2016-03-30 横浜ゴム株式会社 ハイパワー光ファイバー用接着剤組成物
JP6842560B2 (ja) 2017-09-26 2021-03-17 富士フイルム株式会社 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6252030B1 (en) * 1999-03-17 2001-06-26 Dow Corning Asia, Ltd. Hydrogenated octasilsesquioxane-vinyl group-containing copolymer and method for manufacture
JP2000334881A (ja) * 1999-05-28 2000-12-05 Konica Corp かご状シルセスキオキサン含有皮膜
JP2002363414A (ja) * 2001-06-12 2002-12-18 Asahi Kasei Corp 籠状シルセスキオキサン含有組成物
US20040120915A1 (en) * 2002-12-19 2004-06-24 Kaiyuan Yang Multifunctional compositions for surface applications
JP2005092099A (ja) * 2003-09-19 2005-04-07 Fuji Photo Film Co Ltd 硬化性樹脂組成物、及び光学物品、並びにそれを用いた画像表示装置
US7232864B2 (en) * 2003-10-30 2007-06-19 Bening Robert C Coupled radial anionic polymers
JPWO2006006527A1 (ja) * 2004-07-12 2008-04-24 大日本印刷株式会社 電磁波シールドフィルタ
JP4301115B2 (ja) * 2004-08-25 2009-07-22 Ｊｓｒ株式会社 活性エネルギー線硬化性樹脂組成物及び反射防止膜
US7915369B2 (en) * 2004-12-07 2011-03-29 Panasonic Electric Works Co., Ltd. Ultraviolet transmissive polyhedral silsesquioxane polymers
JP2007092019A (ja) * 2005-09-05 2007-04-12 Fujifilm Corp 膜形成用組成物、絶縁膜、およびその製造方法
TW200714636A (en) * 2005-09-05 2007-04-16 Fuji Photo Film Co Ltd Composition, film and producing method therefor
JP2007284652A (ja) * 2006-03-20 2007-11-01 Fujifilm Corp 組成物、膜、およびその製造方法

Also Published As

Publication number Publication date
JP2008214455A (ja) 2008-09-18
US20080213602A1 (en) 2008-09-04
US7964684B2 (en) 2011-06-21

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