JP4991147B2 - 画像形成部材 - Google Patents
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- JP4991147B2 JP4991147B2 JP2005361036A JP2005361036A JP4991147B2 JP 4991147 B2 JP4991147 B2 JP 4991147B2 JP 2005361036 A JP2005361036 A JP 2005361036A JP 2005361036 A JP2005361036 A JP 2005361036A JP 4991147 B2 JP4991147 B2 JP 4991147B2
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- 229920000642 polymer Polymers 0.000 claims description 54
- 239000006185 dispersion Substances 0.000 claims description 45
- 239000002245 particle Substances 0.000 claims description 41
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 34
- 239000011248 coating agent Substances 0.000 claims description 32
- 239000002904 solvent Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 24
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 22
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 22
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims description 17
- -1 hydroxyalkyl acrylate Chemical compound 0.000 claims description 15
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 14
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 14
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 12
- 238000003384 imaging method Methods 0.000 claims description 12
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 12
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- 239000011159 matrix material Substances 0.000 claims description 12
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 12
- 239000007795 chemical reaction product Substances 0.000 claims description 9
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- DNTVTBIKSZRANH-UHFFFAOYSA-N 4-(4-aminophenyl)-3-(3-methylphenyl)aniline Chemical compound CC1=CC=CC(C=2C(=CC=C(N)C=2)C=2C=CC(N)=CC=2)=C1 DNTVTBIKSZRANH-UHFFFAOYSA-N 0.000 description 1
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- 238000009835 boiling Methods 0.000 description 1
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- 239000003795 chemical substances by application Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
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- PRMHOXAMWFXGCO-UHFFFAOYSA-M molport-000-691-708 Chemical compound N1=C(C2=CC=CC=C2C2=NC=3C4=CC=CC=C4C(=N4)N=3)N2[Ga](Cl)N2C4=C(C=CC=C3)C3=C2N=C2C3=CC=CC=C3C1=N2 PRMHOXAMWFXGCO-UHFFFAOYSA-M 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- YRZZLAGRKZIJJI-UHFFFAOYSA-N oxyvanadium phthalocyanine Chemical compound [V+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 YRZZLAGRKZIJJI-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium(II) oxide Chemical compound [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- IBYSTTGVDIFUAY-UHFFFAOYSA-N vanadium monoxide Chemical compound [V]=O IBYSTTGVDIFUAY-UHFFFAOYSA-N 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
- C08J3/095—Oxygen containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0503—Inert supplements
- G03G5/051—Organic non-macromolecular compounds
- G03G5/0514—Organic non-macromolecular compounds not comprising cyclic groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0525—Coating methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0539—Halogenated polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0542—Polyvinylalcohol, polyallylalcohol; Derivatives thereof, e.g. polyvinylesters, polyvinylethers, polyvinylamines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0546—Polymers comprising at least one carboxyl radical, e.g. polyacrylic acid, polycrotonic acid, polymaleic acid; Derivatives thereof, e.g. their esters, salts, anhydrides, nitriles, amides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0664—Dyes
- G03G5/0696—Phthalocyanines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C08J2327/06—Homopolymers or copolymers of vinyl chloride
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Photoreceptors In Electrophotography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
フィルム形成ポリマー組成物を100%のNBAに溶解し、次にヒドロキシガリウムフタロシアニン色素を加えて分散物を調製した。このポリマーは、ポリマー重量に対し81重量%の塩化ビニル、4重量%の酢酸ビニル、0.28重量%のマレイン酸および15重量%のヒドロキシエチルアクリレートからなるポリマー反応生成物であって、数平均分子量は約35,000であった(UCARMag527、ユニオンカーバイドから入手可能)。分散物中の色素濃度は、全固形物重量(色素およびポリマー)をベースとして60重量%であった。分散物を磨砕機(attritor mill)で0.5から10時間、1mm径のガラスビーズと共に粉砕した。分散物をろ過してビーズを取り除き、塗布用に固形分含量を4から5%に調整した。調整はNBAとMIBKとの混合物を使用して行い、この分散物の最終溶剤濃度を、NBA65%、MIBK35%となるようにした。BI−90プラス粒径分析装置(BI−90plus particle sizer)(ブルックヘブンインスツルメント社(Brookheven Instrumenet Inc.)による粉砕された色素粒子の平均実効径(average effect diameter)は、約0.15から0.3μmであった。コーティング混合物の分散品質(dispersion quality)をフローパターンの均一性を測定することによって調べた。次に、円筒形の40mm径および310mm長のアルミニウムドラムに、下塗り層(undercoat layer)の乾燥重量の58重量%の二酸化チタン、4重量%の二酸化ケイ素、および4重量%のバーカム(Varcum)を含む下塗り層を4μm厚に塗布形成した。次に、このアルミドラムを電荷発生分散物中に浸漬し(immersing)、ドラムの軸に対して平行な道筋に沿った垂直方向に、200mm/分の速度で引き上げる(withdrawing)ことによって、電荷発生分散物を塗布した。塗布した電荷発生皮膜を大気中で10分間乾燥して、厚さ約0.3μmの層を形成した。次にこの電荷発生層を、PCZ400/N,N’−ジフェニル−N,N−ビス(3−メチルフェニル)−1,1’−ビフェニル−4,4’−ジアミン/THF/モノクロロベンゼンの電荷輸送(層)混合物で浸漬コーティングした。塗布形成した電荷輸送皮膜を強制エアーオーブンで135℃、40分間乾燥し、厚さ24μmの層を形成した。光受容体を調製するために使用した電荷発生分散物の特性を下記表1にまとめる。
フィルム形成ポリマーが、ポリマーの重量に対し86重量%の塩化ビニル、13重量%の酢酸ビニル、1重量%のマレイン酸からなる反応生成物であって、その数平均分子量が約27,000である(VMCH、ユニオンカーバイド社から入手可能)以外は実施例1の手法を使用して対照となる光受容体を調製した。
分散物中の色素濃度が、全固形物(色素およびポリマー)重量をベースとして35重量%であること以外は実施例1の手法を使用して、光受容体を調製した。
フィルム形成ポリマーが、ポリマーの重量に対し86重量%の塩化ビニル、13重量%の酢酸ビニル、1重量%のマレイン酸からなる反応生成物であって、その数平均分子量が約27,000である(VMCH、ユニオンカーバイド社から入手可能)以外は実施例2の手法を使用して対照となる光受容体を調製した。
実施例1で調製した光受容体およびその対照である光受容体(対照例1)は、100電荷消去サイクル(charge−erase cycles)のすぐ後にさらに100サイクル、続いて2電荷消去サイクルおよび1電荷露出消去サイクル(charge−expose−erase cycle)となるようにセットしたサイクルスキャナーで、電気的にテストした。ここで、光の強度を、サイクル進行と共に徐々に増加させ光誘導放電カーブ(photo−induced discharge curve、PIDC)を作成し、そこから光感受性を測定した。スキャナーには光受容体の表面に80nC/cm2の電荷を与えるようセットされた単線ワイヤーコロトロン(5cm幅)を装着した。光受容体を負の帯電モードでテストした。露光強度を、一連の中性密度フィルター(neutral density filters)を調節する手段によって徐々に増加させ、露出波長は、780±5nmにバンドフィルターで調節した。露光光源は、1,000ワットのキセノンアークランプの白色光源とした。光受容体の暗放電(dark discharge)を、80nC/cm2(消去せずに)の1帯電サイクル(single charge cycle)を行った後、表面電位を7秒間モニターすることによって測定した。光感受性(dV/dx)は、低露光強度での初期放電率(initial discharge rate)から計算して、初期電圧(約0から約7エルグ/cm2露光)の約70%であると特定した。臨界電圧Vcは、発生効率(generation efficiency)が1/2であるポイントで決定した。ドラムを40rpmの速度で回転させて、表面速度62.8mm/秒またはサイクル時間を1.5秒とした。乾式電子写真模擬実験(xerographic simulation)を環境コントロールした(environmentally controlled)暗室中、環境条件(ambient conditions)(相対湿度30%、25℃)で実施した。光誘導暗放電率(light induced dark discharge rate)を測定するために、光受容体を24時間暗所に置いた後、一回の帯電サイクルをかけ、その結果生じる電圧減衰(voltage decay)を暗所で測定した。実施例1および対照例1の暗所に置かれた(dark rested)光受容体についての暗放電電流は、この時点では同一である。サンプルを続いて300負帯電電荷消去サイクル(negative charge−erase cycles)にさらし、最終サイクルは、暗所にて減衰させた。光誘導暗放電率は、2つの暗減衰電圧率(dark decay voltage rates)の差から計算される。300負帯電電荷消去サイクル後、実施例1の光受容体は、約2V/sの小さな暗減衰率を示した。これは本発明における電荷発生層によって輸送能力が改善されたことを実証するものである。結果を下記表2にまとめる。
Claims (3)
- 基材に電荷発生層を塗布形成する際の使用に適する分散物を調製する方法であって、
酢酸n−ブチル中に塩化ビニル、酢酸ビニル、カルボキシル化モノマーおよびヒドロキシアルキルアクリレートを含む高分子フィルムを形成する生成物を溶解して溶液を作成する工程と、
前記溶液中に光伝導性フタロシアニン粒子を分散する工程と、
メチルイソブチルケトンを添加して、溶剤系を有する最終分散物を作成する工程と、
を含み、
前記溶剤系は、溶剤の重量に対して40重量%から95重量%の酢酸n−ブチルと、5重量%から60重量%のメチルイソブチルケトンを含む、方法。 - 塩化ビニル、酢酸ビニル、マレイン酸およびヒドロキシアルキルアクリレートを含む高分子フィルムを形成する生成物を有するポリマーマトリクスと、
光伝導性フタロシアニン粒子と、
溶剤系と、
を含む分散物であって、
前記溶剤系は、溶剤の重量に対して60重量%から75重量%の酢酸n−ブチルと、25重量%から40重量%のメチルイソブチルケトンを含む、分散物。 - 基材と、
電荷発生層と、
電荷輸送層と、
を備える画像形成部材であって、
前記電荷発生層は、
ポリマーマトリクス中に光伝導性フタロシアニン粒子を分散させた分散物を前記基材に塗布し、塗布した前記分散物を乾燥させて調製され、
前記ポリマーマトリクスは、酢酸n−ブチルおよびメチルイソブチルケトンの溶剤中に、塩化ビニル、酢酸ビニル、マレイン酸およびヒドロキシアルキルアクリレートを含む高分子フィルム形成反応生成物を含む、画像形成部材。
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US7799501B2 (en) * | 2007-05-31 | 2010-09-21 | Xerox Corporation | Photoreceptors |
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US4291110A (en) | 1979-06-11 | 1981-09-22 | Xerox Corporation | Siloxane hole trapping layer for overcoated photoreceptors |
US4268033A (en) | 1980-04-07 | 1981-05-19 | Fontaine Paul E | Cue ball aiming device |
US4338387A (en) | 1981-03-02 | 1982-07-06 | Xerox Corporation | Overcoated photoreceptor containing inorganic electron trapping and hole trapping layers |
US4654284A (en) | 1985-10-24 | 1987-03-31 | Xerox Corporation | Electrostatographic imaging member with anti-curl layer comprising a reaction product of a binder bi-functional coupling agent and crystalline particles |
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US5418107A (en) | 1993-08-13 | 1995-05-23 | Xerox Corporation | Process for fabricating an electrophotographic imaging members |
US5456998A (en) | 1994-04-26 | 1995-10-10 | Xerox Corporation | Photoconductive imaging members containing alkoxy-bridged metallophthalocyanine dimers |
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US5681678A (en) * | 1997-01-21 | 1997-10-28 | Xerox Corporation | Charge generation layer containing hydroxyalkyl acrylate reaction product |
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