JP4974910B2 - 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 - Google Patents

反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 Download PDF

Info

Publication number
JP4974910B2
JP4974910B2 JP2008003644A JP2008003644A JP4974910B2 JP 4974910 B2 JP4974910 B2 JP 4974910B2 JP 2008003644 A JP2008003644 A JP 2008003644A JP 2008003644 A JP2008003644 A JP 2008003644A JP 4974910 B2 JP4974910 B2 JP 4974910B2
Authority
JP
Japan
Prior art keywords
layer
refractive index
film
antireflection film
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2008003644A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009168852A (ja
JP2009168852A5 (https=
Inventor
和広 山田
寛之 中山
峰太 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Imaging Co Ltd
Original Assignee
Ricoh Imaging Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Imaging Co Ltd filed Critical Ricoh Imaging Co Ltd
Priority to JP2008003644A priority Critical patent/JP4974910B2/ja
Priority to US12/342,128 priority patent/US8199404B2/en
Priority to KR1020080131992A priority patent/KR20090071417A/ko
Publication of JP2009168852A publication Critical patent/JP2009168852A/ja
Publication of JP2009168852A5 publication Critical patent/JP2009168852A5/ja
Application granted granted Critical
Publication of JP4974910B2 publication Critical patent/JP4974910B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
JP2008003644A 2007-12-27 2008-01-10 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 Active JP4974910B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008003644A JP4974910B2 (ja) 2008-01-10 2008-01-10 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
US12/342,128 US8199404B2 (en) 2007-12-27 2008-12-23 Anti-reflection coating, optical member, exchange lens unit and imaging device
KR1020080131992A KR20090071417A (ko) 2007-12-27 2008-12-23 반사방지막, 광학부품, 교환 렌즈 및 촬상장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008003644A JP4974910B2 (ja) 2008-01-10 2008-01-10 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置

Publications (3)

Publication Number Publication Date
JP2009168852A JP2009168852A (ja) 2009-07-30
JP2009168852A5 JP2009168852A5 (https=) 2010-12-24
JP4974910B2 true JP4974910B2 (ja) 2012-07-11

Family

ID=40970133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008003644A Active JP4974910B2 (ja) 2007-12-27 2008-01-10 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置

Country Status (1)

Country Link
JP (1) JP4974910B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2416184A4 (en) * 2009-03-31 2014-09-03 Stella Chemifa Corp OPTICAL ELEMENT AND METHOD FOR THE PRODUCTION THEREOF
US9581733B2 (en) 2013-08-23 2017-02-28 Ricoh Imaging Company, Ltd. Anti-reflection coating and optical member comprising same
JP6385108B2 (ja) * 2014-04-03 2018-09-05 キヤノン株式会社 光学素子および光学系、並びに光学素子の製造方法
JP6385117B2 (ja) 2014-04-11 2018-09-05 キヤノン株式会社 光学素子及びそれを有する光学系
JP7405405B2 (ja) * 2019-05-15 2023-12-26 株式会社シグマ 反射防止膜及びこれを有する光学素子、反射防止膜の製造方法
DE102019122451B4 (de) * 2019-08-21 2022-12-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer porösen Siliziumoxidschicht

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1020102A (ja) * 1996-07-03 1998-01-23 Nikon Corp 反射防止膜
JP2004109728A (ja) * 2002-09-20 2004-04-08 Tokai Kogaku Kk 眼鏡用プラスチックレンズ
JP4497460B2 (ja) * 2004-06-11 2010-07-07 Ｈｏｙａ株式会社 反射防止膜の製造方法
JP4443318B2 (ja) * 2004-06-16 2010-03-31 Ｈｏｙａ株式会社 反射防止膜及び反射防止膜を有する光学素子
JP2006215542A (ja) * 2005-01-07 2006-08-17 Pentax Corp 反射防止膜及びこれを有する撮像系光学素子

Also Published As

Publication number Publication date
JP2009168852A (ja) 2009-07-30

Similar Documents

Publication Publication Date Title
JP5509616B2 (ja) 反射防止膜、光学部品、交換レンズ及び撮像装置
JP4951500B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP5096933B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
US8199404B2 (en) Anti-reflection coating, optical member, exchange lens unit and imaging device
JP5313587B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP5375247B2 (ja) 反射防止膜の形成方法及び光学素子
JP5091043B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
US20060154044A1 (en) Anti-reflection coating and optical element having such anti-reflection coating for image sensors
JP4977631B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP5154971B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP4443318B2 (ja) 反射防止膜及び反射防止膜を有する光学素子
JP5347145B2 (ja) 反射防止膜及びこれを有する光学部品、並びに前記光学部品を有する交換レンズ及び撮像装置
JP4497460B2 (ja) 反射防止膜の製造方法
JP2006215542A (ja) 反射防止膜及びこれを有する撮像系光学素子
JP4974910B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP4953426B2 (ja) シリカエアロゲル膜の製造方法
JP5096966B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JPWO2004113966A1 (ja) 反射防止膜
JP5313750B2 (ja) 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置
JP5266019B2 (ja) 反射防止膜、その形成方法、光学素子、交換レンズ及び撮像装置
JP6314627B2 (ja) 反射防止膜、及びそれを有する光学部品
JP2013217977A (ja) 反射防止膜及び光学素子
JP4828232B2 (ja) 反射防止膜を有する光学素子及びその製造方法
JP2007078817A (ja) 反射防止膜
JP2007078816A (ja) 反射防止膜

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101104

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101104

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20111117

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111130

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20111207

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120127

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120404

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120410

R150 Certificate of patent or registration of utility model

Ref document number: 4974910

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150420

Year of fee payment: 3

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250