JP2009168852A5 - - Google Patents
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- Publication number
- JP2009168852A5 JP2009168852A5 JP2008003644A JP2008003644A JP2009168852A5 JP 2009168852 A5 JP2009168852 A5 JP 2009168852A5 JP 2008003644 A JP2008003644 A JP 2008003644A JP 2008003644 A JP2008003644 A JP 2008003644A JP 2009168852 A5 JP2009168852 A5 JP 2009168852A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- film
- silica
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004965 Silica aerogel Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008003644A JP4974910B2 (ja) | 2008-01-10 | 2008-01-10 | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 |
| US12/342,128 US8199404B2 (en) | 2007-12-27 | 2008-12-23 | Anti-reflection coating, optical member, exchange lens unit and imaging device |
| KR1020080131992A KR20090071417A (ko) | 2007-12-27 | 2008-12-23 | 반사방지막, 광학부품, 교환 렌즈 및 촬상장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008003644A JP4974910B2 (ja) | 2008-01-10 | 2008-01-10 | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009168852A JP2009168852A (ja) | 2009-07-30 |
| JP2009168852A5 true JP2009168852A5 (https=) | 2010-12-24 |
| JP4974910B2 JP4974910B2 (ja) | 2012-07-11 |
Family
ID=40970133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008003644A Active JP4974910B2 (ja) | 2007-12-27 | 2008-01-10 | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4974910B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2416184A4 (en) * | 2009-03-31 | 2014-09-03 | Stella Chemifa Corp | OPTICAL ELEMENT AND METHOD FOR THE PRODUCTION THEREOF |
| US9581733B2 (en) | 2013-08-23 | 2017-02-28 | Ricoh Imaging Company, Ltd. | Anti-reflection coating and optical member comprising same |
| JP6385108B2 (ja) * | 2014-04-03 | 2018-09-05 | キヤノン株式会社 | 光学素子および光学系、並びに光学素子の製造方法 |
| JP6385117B2 (ja) | 2014-04-11 | 2018-09-05 | キヤノン株式会社 | 光学素子及びそれを有する光学系 |
| JP7405405B2 (ja) * | 2019-05-15 | 2023-12-26 | 株式会社シグマ | 反射防止膜及びこれを有する光学素子、反射防止膜の製造方法 |
| DE102019122451B4 (de) * | 2019-08-21 | 2022-12-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer porösen Siliziumoxidschicht |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1020102A (ja) * | 1996-07-03 | 1998-01-23 | Nikon Corp | 反射防止膜 |
| JP2004109728A (ja) * | 2002-09-20 | 2004-04-08 | Tokai Kogaku Kk | 眼鏡用プラスチックレンズ |
| JP4497460B2 (ja) * | 2004-06-11 | 2010-07-07 | Hoya株式会社 | 反射防止膜の製造方法 |
| JP4443318B2 (ja) * | 2004-06-16 | 2010-03-31 | Hoya株式会社 | 反射防止膜及び反射防止膜を有する光学素子 |
| JP2006215542A (ja) * | 2005-01-07 | 2006-08-17 | Pentax Corp | 反射防止膜及びこれを有する撮像系光学素子 |
-
2008
- 2008-01-10 JP JP2008003644A patent/JP4974910B2/ja active Active
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