JP4965829B2 - 真空用露光装置 - Google Patents

真空用露光装置 Download PDF

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Publication number
JP4965829B2
JP4965829B2 JP2005230840A JP2005230840A JP4965829B2 JP 4965829 B2 JP4965829 B2 JP 4965829B2 JP 2005230840 A JP2005230840 A JP 2005230840A JP 2005230840 A JP2005230840 A JP 2005230840A JP 4965829 B2 JP4965829 B2 JP 4965829B2
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JP
Japan
Prior art keywords
cover
optical system
exposure apparatus
wafer
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005230840A
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English (en)
Japanese (ja)
Other versions
JP2007048881A5 (https=
JP2007048881A (ja
Inventor
秀樹 稲
孝一 千徳
岳 高橋
良則 三輪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005230840A priority Critical patent/JP4965829B2/ja
Priority to US11/462,175 priority patent/US7586582B2/en
Publication of JP2007048881A publication Critical patent/JP2007048881A/ja
Publication of JP2007048881A5 publication Critical patent/JP2007048881A5/ja
Application granted granted Critical
Publication of JP4965829B2 publication Critical patent/JP4965829B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005230840A 2005-08-09 2005-08-09 真空用露光装置 Expired - Fee Related JP4965829B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005230840A JP4965829B2 (ja) 2005-08-09 2005-08-09 真空用露光装置
US11/462,175 US7586582B2 (en) 2005-08-09 2006-08-03 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005230840A JP4965829B2 (ja) 2005-08-09 2005-08-09 真空用露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011162156A Division JP2012004575A (ja) 2011-07-25 2011-07-25 計測装置

Publications (3)

Publication Number Publication Date
JP2007048881A JP2007048881A (ja) 2007-02-22
JP2007048881A5 JP2007048881A5 (https=) 2008-09-18
JP4965829B2 true JP4965829B2 (ja) 2012-07-04

Family

ID=37742204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005230840A Expired - Fee Related JP4965829B2 (ja) 2005-08-09 2005-08-09 真空用露光装置

Country Status (2)

Country Link
US (1) US7586582B2 (https=)
JP (1) JP4965829B2 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011121896A1 (ja) * 2010-03-31 2011-10-06 コニカミノルタセンシング株式会社 測定用光学系ならびにそれを用いた色彩輝度計および色彩計
CN102538969B (zh) * 2012-01-17 2014-04-23 北京华夏科创仪器技术有限公司 高分辨率光谱仪及其光学定标方法
JP2013219086A (ja) * 2012-04-04 2013-10-24 Canon Inc 検出装置、リソグラフィー装置、荷電粒子線装置、および物品製造方法
CN103775862A (zh) * 2012-10-25 2014-05-07 深圳市福明电子科技有限公司 一种全色谱led照明灯具及其制作方法
CN103900694B (zh) * 2013-12-17 2016-07-20 中国科学院西安光学精密机械研究所 一种近红外偏振干涉光谱仪
CN103900689B (zh) * 2014-03-28 2016-03-30 中国科学院上海技术物理研究所 声光调制型宽谱段多通道偏振单色光源
CN105807580B (zh) * 2014-12-31 2019-12-24 上海微电子装备（集团）股份有限公司 一种工件六自由度位置和姿态测量传感器装置
CN104729711B (zh) * 2015-04-13 2017-09-26 中国科学院光电研究院 一种次镜改进型成像光谱仪
CN106814557B (zh) * 2015-11-30 2019-04-30 上海微电子装备（集团）股份有限公司 一种对准系统及对准方法
EP3321740A1 (en) * 2016-11-11 2018-05-16 ASML Netherlands B.V. Determining an optimal operational parameter setting of a metrology system
KR20210145153A (ko) 2019-04-01 2021-12-01 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 그와 관련된 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0547641A (ja) * 1991-06-04 1993-02-26 Toshiba Corp Ｘ線露光装置
JPH11312640A (ja) * 1998-02-25 1999-11-09 Canon Inc 処理装置および該処理装置を用いたデバイス製造方法
JPH11271335A (ja) * 1998-03-23 1999-10-08 Olympus Optical Co Ltd 走査型プローブ顕微鏡
KR100685697B1 (ko) * 1998-03-31 2007-02-23 가부시키가이샤 니콘 광학장치 및 동 장치를 구비한 노광장치
JP4722244B2 (ja) * 1998-07-14 2011-07-13 ノバ・メジャリング・インストルメンツ・リミテッド 所定のフォトリソグラフィ工程に従って基板を加工する装置
JP2000227358A (ja) 1999-02-03 2000-08-15 Nikon Corp 真空容器内取付部品および検出装置
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
US6765201B2 (en) * 2000-02-09 2004-07-20 Hitachi, Ltd. Ultraviolet laser-generating device and defect inspection apparatus and method therefor
JP2001274054A (ja) * 2000-03-24 2001-10-05 Canon Inc 露光装置、半導体デバイス製造方法および半導体デバイス製造工場
JP2001284210A (ja) * 2000-03-30 2001-10-12 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP2002075827A (ja) * 2000-08-29 2002-03-15 Nikon Corp Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス
US6756706B2 (en) * 2002-01-18 2004-06-29 Nikon Corporation Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines
JP4677174B2 (ja) * 2003-02-03 2011-04-27 キヤノン株式会社 位置検出装置
JP2004311843A (ja) * 2003-04-09 2004-11-04 Nsk Ltd 光学装置
JP2005113977A (ja) * 2003-10-06 2005-04-28 Canon Inc チューブ及びそれを有する露光装置、デバイスの製造方法
JP2005148254A (ja) * 2003-11-13 2005-06-09 Canon Inc レンズ保持装置、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
US7586582B2 (en) 2009-09-08
JP2007048881A (ja) 2007-02-22
US20070035708A1 (en) 2007-02-15

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