JP4960595B2 - 高い密着性を有するガラス状膜を製造するためのゾル−ゲル法及び前記方法を実施するのに適している安定なコロイド溶液 - Google Patents
高い密着性を有するガラス状膜を製造するためのゾル−ゲル法及び前記方法を実施するのに適している安定なコロイド溶液 Download PDFInfo
- Publication number
- JP4960595B2 JP4960595B2 JP2004520511A JP2004520511A JP4960595B2 JP 4960595 B2 JP4960595 B2 JP 4960595B2 JP 2004520511 A JP2004520511 A JP 2004520511A JP 2004520511 A JP2004520511 A JP 2004520511A JP 4960595 B2 JP4960595 B2 JP 4960595B2
- Authority
- JP
- Japan
- Prior art keywords
- depositing
- producing
- substrate according
- glassy film
- alkoxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 38
- 238000003980 solgel method Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 35
- 238000000151 deposition Methods 0.000 claims description 31
- 239000000243 solution Substances 0.000 claims description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 25
- 238000006460 hydrolysis reaction Methods 0.000 claims description 25
- 238000004519 manufacturing process Methods 0.000 claims description 25
- 150000004703 alkoxides Chemical class 0.000 claims description 22
- 230000007062 hydrolysis Effects 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000000010 aprotic solvent Substances 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000004528 spin coating Methods 0.000 claims description 4
- 230000006641 stabilisation Effects 0.000 claims description 3
- 238000011105 stabilization Methods 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 238000003618 dip coating Methods 0.000 claims description 2
- 238000000605 extraction Methods 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- 239000011707 mineral Substances 0.000 claims description 2
- 150000007524 organic acids Chemical class 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
- 235000005985 organic acids Nutrition 0.000 claims 1
- 238000010345 tape casting Methods 0.000 claims 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical group CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims 1
- 229940095070 tetrapropyl orthosilicate Drugs 0.000 claims 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 claims 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000001879 gelation Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 239000012528 membrane Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- QYBKVVRRGQSGDC-UHFFFAOYSA-N triethyl methyl silicate Chemical compound CCO[Si](OC)(OCC)OCC QYBKVVRRGQSGDC-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 241000531791 Eurypyga helias Species 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000004807 desolvation Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- -1 silicon alkoxide Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
- C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Wood Science & Technology (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Surface Treatment Of Glass (AREA)
- Formation Of Insulating Films (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITNO2002A000009 | 2002-07-12 | ||
| IT2002NO000009A ITNO20020009A1 (it) | 2002-07-12 | 2002-07-12 | "processo sol-gel per la preparazione di film vetrosi con elevate proprieta' di adesione e soluzioni colloidali stabili adatte alla loro rea |
| PCT/EP2003/007275 WO2004007384A1 (en) | 2002-07-12 | 2003-07-07 | Sol-gel process for the preparation of vitreous films possessing high adhesion properties and stable colloidal solutions suitable for its carrying out the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005532974A JP2005532974A (ja) | 2005-11-04 |
| JP2005532974A5 JP2005532974A5 (enExample) | 2006-01-05 |
| JP4960595B2 true JP4960595B2 (ja) | 2012-06-27 |
Family
ID=30012835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004520511A Expired - Fee Related JP4960595B2 (ja) | 2002-07-12 | 2003-07-07 | 高い密着性を有するガラス状膜を製造するためのゾル−ゲル法及び前記方法を実施するのに適している安定なコロイド溶液 |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US7790232B2 (enExample) |
| EP (1) | EP1521724A1 (enExample) |
| JP (1) | JP4960595B2 (enExample) |
| KR (1) | KR100669004B1 (enExample) |
| CN (1) | CN1296300C (enExample) |
| AU (1) | AU2003266231B2 (enExample) |
| CA (1) | CA2492256C (enExample) |
| HR (1) | HRP20050030A2 (enExample) |
| IL (1) | IL166211A0 (enExample) |
| IT (1) | ITNO20020009A1 (enExample) |
| NO (1) | NO20050142L (enExample) |
| PL (1) | PL372899A1 (enExample) |
| TW (1) | TWI233938B (enExample) |
| WO (1) | WO2004007384A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG127749A1 (en) * | 2005-05-11 | 2006-12-29 | Agency Science Tech & Res | Method and solution for forming anatase titanium dioxide, and titanium dioxide particles, colloidal dispersion and film |
| DE102005063510B4 (de) * | 2005-09-22 | 2010-06-02 | Siemens Aktiengesellschaft | Verwendung eines Verfahrens zur Beschichtung einer Druckschablone eines SMT-Prozesses |
| JP5446266B2 (ja) * | 2006-09-08 | 2014-03-19 | セントラル硝子株式会社 | 車両用熱線遮蔽ガラス及びその製造方法 |
| ES2377227T3 (es) * | 2006-12-19 | 2012-03-23 | Evonik Degussa Gmbh | Proceso sol-gel para producción de películas protectoras para sustratos polímeros |
| KR101627989B1 (ko) | 2011-05-26 | 2016-06-07 | 애드베니라 엔터프라이지즈, 인크. | 물체를 코팅하기 위한 시스템 및 방법 |
| FR3004933B1 (fr) * | 2013-04-30 | 2015-04-17 | Oreal | Composition cosmetique de revetement des ongles |
| FR3004932B1 (fr) * | 2013-04-30 | 2015-04-17 | Oreal | Composition cosmetique de revetement des ongles |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4816049A (en) * | 1985-07-12 | 1989-03-28 | Hoya Corporation | Process of surface treating laser glass |
| FR2601017B1 (fr) * | 1986-07-02 | 1988-09-23 | Centre Nat Rech Scient | Nouvelles compositions a base de derives de silice modifiee par des groupements organiques, leur preparation et leur application, notamment comme conducteurs protoniques |
| FR2704851B1 (fr) * | 1993-05-04 | 1995-06-30 | Essilor Int | Procédé de fabrication de verres denses transparents obtenus à partir d'alcoxydes de silicium ou de métal par voie sol-gel, et verres obtenus selon ce procédé. |
| JP2739902B2 (ja) * | 1993-09-30 | 1998-04-15 | 東京応化工業株式会社 | 酸化ケイ素系被膜形成用塗布液 |
| JP3342170B2 (ja) * | 1994-04-18 | 2002-11-05 | 日本板硝子株式会社 | 撥水被膜の形成方法 |
| US5626923A (en) * | 1995-09-19 | 1997-05-06 | Mcdonnell Douglas Corporation | Method of applying ceramic coating compositions to ceramic or metallic substrate |
| DE59607013D1 (de) | 1995-09-19 | 2001-07-05 | Inst Neue Mat Gemein Gmbh | DÜNNE SiO 2-FOLIEN, VERFAHREN ZU IHRER HERSTELLUNG UND IHRE VERWENDUNG |
| US6130152A (en) | 1995-11-16 | 2000-10-10 | Texas Instruments Incorporated | Aerogel thin film formation from multi-solvent systems |
| IT1306214B1 (it) | 1998-09-09 | 2001-05-30 | Gel Design And Engineering Srl | Processo per la preparazione di film vetrosi spessi di ossido disilicio secondo la tecnica sol-gel e film spessi cosi' ottenuti. |
| JP2001240800A (ja) * | 2000-02-25 | 2001-09-04 | Nippon Sheet Glass Co Ltd | 所定表面形状を有する物品の製造方法 |
-
2002
- 2002-07-12 IT IT2002NO000009A patent/ITNO20020009A1/it unknown
-
2003
- 2003-07-07 PL PL03372899A patent/PL372899A1/xx not_active Application Discontinuation
- 2003-07-07 US US10/520,495 patent/US7790232B2/en not_active Expired - Fee Related
- 2003-07-07 CA CA2492256A patent/CA2492256C/en not_active Expired - Fee Related
- 2003-07-07 JP JP2004520511A patent/JP4960595B2/ja not_active Expired - Fee Related
- 2003-07-07 CN CNB038165864A patent/CN1296300C/zh not_active Expired - Fee Related
- 2003-07-07 WO PCT/EP2003/007275 patent/WO2004007384A1/en not_active Ceased
- 2003-07-07 HR HR20050030A patent/HRP20050030A2/hr not_active Application Discontinuation
- 2003-07-07 AU AU2003266231A patent/AU2003266231B2/en not_active Ceased
- 2003-07-07 EP EP03763735A patent/EP1521724A1/en not_active Withdrawn
- 2003-07-07 KR KR1020057000539A patent/KR100669004B1/ko not_active Expired - Fee Related
- 2003-07-08 TW TW092118621A patent/TWI233938B/zh not_active IP Right Cessation
-
2005
- 2005-01-10 IL IL16621105A patent/IL166211A0/xx unknown
- 2005-01-11 NO NO20050142A patent/NO20050142L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003266231A1 (en) | 2004-02-02 |
| US7790232B2 (en) | 2010-09-07 |
| WO2004007384A1 (en) | 2004-01-22 |
| TW200403306A (en) | 2004-03-01 |
| PL372899A1 (en) | 2005-08-08 |
| CN1296300C (zh) | 2007-01-24 |
| EP1521724A1 (en) | 2005-04-13 |
| US20050215076A1 (en) | 2005-09-29 |
| HK1082494A1 (en) | 2006-06-09 |
| NO20050142D0 (no) | 2005-01-11 |
| ITNO20020009A1 (it) | 2004-01-12 |
| KR100669004B1 (ko) | 2007-01-16 |
| HRP20050030A2 (en) | 2005-02-28 |
| TWI233938B (en) | 2005-06-11 |
| JP2005532974A (ja) | 2005-11-04 |
| AU2003266231B2 (en) | 2008-05-08 |
| CA2492256C (en) | 2011-08-30 |
| CA2492256A1 (en) | 2004-01-22 |
| CN1668542A (zh) | 2005-09-14 |
| KR20050019837A (ko) | 2005-03-03 |
| NO20050142L (no) | 2005-04-06 |
| IL166211A0 (en) | 2006-01-15 |
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