JP4955918B2 - 非対称直鎖有機オリゴマー及びその製造方法と用途 - Google Patents
非対称直鎖有機オリゴマー及びその製造方法と用途 Download PDFInfo
- Publication number
- JP4955918B2 JP4955918B2 JP2004327606A JP2004327606A JP4955918B2 JP 4955918 B2 JP4955918 B2 JP 4955918B2 JP 2004327606 A JP2004327606 A JP 2004327606A JP 2004327606 A JP2004327606 A JP 2004327606A JP 4955918 B2 JP4955918 B2 JP 4955918B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- layer
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/40—Esters thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electroluminescent Light Sources (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Thin Film Transistor (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Dental Preparations (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10353093-2 | 2003-11-12 | ||
| DE10353093A DE10353093A1 (de) | 2003-11-12 | 2003-11-12 | Unsymmetrische lineare organische Oligomere |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005145968A JP2005145968A (ja) | 2005-06-09 |
| JP2005145968A5 JP2005145968A5 (https=) | 2007-12-27 |
| JP4955918B2 true JP4955918B2 (ja) | 2012-06-20 |
Family
ID=34428721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004327606A Expired - Fee Related JP4955918B2 (ja) | 2003-11-12 | 2004-11-11 | 非対称直鎖有機オリゴマー及びその製造方法と用途 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7196206B2 (https=) |
| EP (1) | EP1531155B1 (https=) |
| JP (1) | JP4955918B2 (https=) |
| KR (1) | KR101178701B1 (https=) |
| AT (1) | ATE368675T1 (https=) |
| CA (1) | CA2487210A1 (https=) |
| DE (2) | DE10353093A1 (https=) |
| IL (1) | IL165133A0 (https=) |
| TW (1) | TWI379416B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4446697B2 (ja) * | 2003-07-29 | 2010-04-07 | 大日本印刷株式会社 | 有機エレクトロルミネッセンス素子及びその製造方法 |
| KR100701751B1 (ko) * | 2005-09-27 | 2007-03-29 | 삼성전자주식회사 | 저분자 공액 인 화합물 및 이를 이용한 소자 |
| DE102006043039A1 (de) * | 2006-09-14 | 2008-03-27 | H.C. Starck Gmbh | Halbleiterschichten bildende Mischungen von organischen Verbindungen |
| DE102008014158A1 (de) * | 2008-03-14 | 2009-09-17 | H.C. Starck Gmbh | Neue makromolekulare Verbindungen aufweisend eine Kern-Schale-Struktur zur Verwendung als Halbleiter |
| DE102010031897A1 (de) | 2010-07-21 | 2012-01-26 | Heraeus Clevios Gmbh | Halbleiter auf Basis substituierter [1] Benzothieno[3,2-b][1]-benzothiophene |
| CN111057087B (zh) * | 2019-11-01 | 2021-06-04 | 河南大学 | 一种非对称噻吩[7]螺烯同分异构体及其制备方法和应用 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3885244B2 (ja) * | 1994-12-05 | 2007-02-21 | 松下電器産業株式会社 | オリゴチオフェン重合体、及びオリゴチオフェン化合物の製造方法 |
| US6414164B1 (en) * | 2000-07-12 | 2002-07-02 | International Business Machines Corporation | Synthesis of soluble derivatives of sexithiophene and their use as the semiconducting channels in thin-film filed-effect transistors |
| JP4025920B2 (ja) * | 2001-03-05 | 2007-12-26 | 入江 正浩 | フォトクロミック材料 |
| WO2002086913A1 (en) * | 2001-04-17 | 2002-10-31 | Matsushita Electric Industrial Co., Ltd. | Conductive organic thin film and production method therefor, electrode and electric cable using it |
| US6433359B1 (en) * | 2001-09-06 | 2002-08-13 | 3M Innovative Properties Company | Surface modifying layers for organic thin film transistors |
| JP3963693B2 (ja) * | 2001-10-15 | 2007-08-22 | 富士通株式会社 | 導電性有機化合物及び電子素子 |
| DE602004021211D1 (de) * | 2003-03-07 | 2009-07-09 | Merck Patent Gmbh | Fluorene und Arylgruppen enthaltende Mono-, Oligo- und Polymere |
| US7166327B2 (en) * | 2003-03-21 | 2007-01-23 | International Business Machines Corporation | Method of preparing a conjugated molecular assembly |
| US7102017B2 (en) * | 2004-06-10 | 2006-09-05 | Xerox Corporation | Processes to prepare small molecular thiophene compounds |
-
2003
- 2003-11-12 DE DE10353093A patent/DE10353093A1/de not_active Withdrawn
-
2004
- 2004-10-29 AT AT04025730T patent/ATE368675T1/de active
- 2004-10-29 DE DE502004004498T patent/DE502004004498D1/de not_active Expired - Lifetime
- 2004-10-29 EP EP04025730A patent/EP1531155B1/de not_active Revoked
- 2004-11-09 CA CA002487210A patent/CA2487210A1/en not_active Abandoned
- 2004-11-09 US US10/984,512 patent/US7196206B2/en not_active Expired - Fee Related
- 2004-11-10 IL IL16513304A patent/IL165133A0/xx unknown
- 2004-11-11 JP JP2004327606A patent/JP4955918B2/ja not_active Expired - Fee Related
- 2004-11-11 KR KR1020040091664A patent/KR101178701B1/ko not_active Expired - Fee Related
- 2004-11-11 TW TW093134391A patent/TWI379416B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| IL165133A0 (en) | 2005-12-18 |
| TW200534480A (en) | 2005-10-16 |
| JP2005145968A (ja) | 2005-06-09 |
| US7196206B2 (en) | 2007-03-27 |
| KR20050045898A (ko) | 2005-05-17 |
| DE10353093A1 (de) | 2005-06-16 |
| US20050139822A1 (en) | 2005-06-30 |
| EP1531155A1 (de) | 2005-05-18 |
| KR101178701B1 (ko) | 2012-08-30 |
| ATE368675T1 (de) | 2007-08-15 |
| EP1531155B1 (de) | 2007-08-01 |
| DE502004004498D1 (de) | 2007-09-13 |
| TWI379416B (en) | 2012-12-11 |
| CA2487210A1 (en) | 2005-05-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101103037B (zh) | 新的缩合多环芳族化合物及其应用 | |
| CN102574868B (zh) | 取代苯并硫属并苯化合物、包含该化合物的薄膜以及包括该薄膜的有机半导体装置 | |
| JP2012227518A (ja) | 半導体組成物 | |
| JP4955918B2 (ja) | 非対称直鎖有機オリゴマー及びその製造方法と用途 | |
| US7078724B2 (en) | Organic compounds having a core-shell structure | |
| CN102119164A (zh) | 可溶液处理的有机半导体 | |
| JP4528000B2 (ja) | π電子共役系分子含有ケイ素化合物及びその製造方法 | |
| JP2004137502A (ja) | 有機オリゴマーの製法、それを含む層、この層の使用ならびに製法 | |
| CN104755483A (zh) | 噻吩并[2,3-c]吡咯-二酮衍生物及其在有机半导体中的用途 | |
| KR102564943B1 (ko) | 유기 화합물, 유기 박막 및 전자 소자 | |
| WO2017170245A1 (ja) | 新規有機高分子及びその製造方法 | |
| KR101626363B1 (ko) | 안트라세닐계 교호 공중합체, 그 제조 방법 및 이를 이용한 유기 박막 트랜지스터 | |
| JP5096731B2 (ja) | 新規な芳香族エンジイン誘導体、これを含む有機半導体製造用の前駆体溶液、その前駆体溶液を用いた有機半導体薄膜およびその製造方法、ならびに電子素子 | |
| JP3955872B2 (ja) | 両末端に脱離反応性の異なる異種官能基を有する有機化合物を用いた有機デバイスおよびその製造方法 | |
| JP4177286B2 (ja) | 新規なアントラセン誘導体 | |
| CN105585589B (zh) | 一种可溶性并苯化合物及其制备方法和应用 | |
| CN1970551A (zh) | 芳香烯二炔衍生物、有机半导体薄膜、生产方法和电子器件 | |
| JP2004307847A (ja) | 機能性有機薄膜及びその製造方法 | |
| KR101121204B1 (ko) | 방향족 엔다이인 유도체를 이용한 유기 반도체 박막의제조방법, 그에 의한 유기 반도체 박막 및 이를 채용한전자소자 | |
| CN100354339C (zh) | 功能有机薄膜,有机薄膜晶体管,含π电子共轭分子的硅化合物,它们的形成方法 | |
| JP2007311569A (ja) | ケイ素架橋チオフェンオリゴマーおよびこれを用いた電子デバイス | |
| TW201038619A (en) | Oligomeric and polymeric semiconductors based on thienothiazoles | |
| JP2006036723A (ja) | π電子共役系分子含有ケイ素化合物及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071108 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071108 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20080630 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101117 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101130 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110218 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110223 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110325 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110330 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110420 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110425 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110527 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110802 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111028 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111102 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111125 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111130 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111221 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111227 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120131 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120221 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120316 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150323 Year of fee payment: 3 |
|
| LAPS | Cancellation because of no payment of annual fees |