JP4948756B2 - 集積回路内に形成されたインダクタ及びその製造方法 - Google Patents

集積回路内に形成されたインダクタ及びその製造方法 Download PDF

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JP4948756B2
JP4948756B2 JP2004283352A JP2004283352A JP4948756B2 JP 4948756 B2 JP4948756 B2 JP 4948756B2 JP 2004283352 A JP2004283352 A JP 2004283352A JP 2004283352 A JP2004283352 A JP 2004283352A JP 4948756 B2 JP4948756 B2 JP 4948756B2
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conductive
forming
spiral
inductor
layer
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JP2005175434A5 (enExample
JP2005175434A (ja
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ベルデン ハリス エドワード
マンシン マーチャント サイレッシュ
ジョージ ステイナー カート
クレイ ヴィトカベイジ スーザン
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Agere Systems LLC
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Agere Systems LLC
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    • H01L2924/301Electrical effects
    • H01L2924/30105Capacitance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor

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  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
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US20060192647A1 (en) 2006-08-31
US7068139B2 (en) 2006-06-27
US7541238B2 (en) 2009-06-02
GB0421662D0 (en) 2004-10-27
KR101045195B1 (ko) 2011-06-30
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TW200520195A (en) 2005-06-16
US7678639B2 (en) 2010-03-16
TWI362098B (en) 2012-04-11
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US20050099259A1 (en) 2005-05-12
JP2005175434A (ja) 2005-06-30
US20090100668A1 (en) 2009-04-23

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