JP4931212B2 - 改質シリコンへの低ドーズ酸素注入による薄い埋め込み酸化物 - Google Patents
改質シリコンへの低ドーズ酸素注入による薄い埋め込み酸化物 Download PDFInfo
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- 239000001301 oxygen Substances 0.000 title claims description 86
- 229910052760 oxygen Inorganic materials 0.000 title claims description 86
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 57
- 238000002513 implantation Methods 0.000 title claims description 31
- 238000000034 method Methods 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 48
- 229910021426 porous silicon Inorganic materials 0.000 claims description 40
- -1 oxygen ions Chemical class 0.000 claims description 23
- 238000000137 annealing Methods 0.000 claims description 21
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 18
- 238000002347 injection Methods 0.000 claims description 16
- 239000007924 injection Substances 0.000 claims description 16
- 238000007254 oxidation reaction Methods 0.000 claims description 16
- 239000002019 doping agent Substances 0.000 claims description 13
- 239000012212 insulator Substances 0.000 claims description 12
- 230000003647 oxidation Effects 0.000 claims description 12
- 238000002048 anodisation reaction Methods 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 9
- 238000005468 ion implantation Methods 0.000 claims description 7
- 239000000243 solution Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 5
- 239000007943 implant Substances 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 64
- 235000012431 wafers Nutrition 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000001878 scanning electron micrograph Methods 0.000 description 6
- 239000011800 void material Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910003811 SiGeC Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76243—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using silicon implanted buried insulating layers, e.g. oxide layers, i.e. SIMOX techniques
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Description
‐開始基板:1E19cm−3のホウ素のp型ドーピングによりドープされたウェハ
‐多孔質Si形成:電流:0.5−1.0mA、時間:約2分
‐Epi−Si成長:1150℃でのH2ベークのとき4000−5000Å
‐酸素注入:350℃で5E16cm−2
‐酸素注入:公称室温で2E15cm−2
‐高温アニール:Arと混合した約25%酸素により1325℃で10時間+Arと混合した約35%酸素により1325℃で5時間
領域Aはアニールの間に成長した表面酸化物である。
領域BはSOI層である。
領域Cは薄い埋め込み酸化物である。
領域Dは基板である。
‐開始基板:1E19cm−3のホウ素のp型ドーピングによりドープされたウェハ
‐Epi−Si成長:1150℃でのH2ベークのとき4000−5000Å
‐酸素注入:350℃で5E16cm−2
‐酸素注入:公称室温:2E15cm−2
‐高温アニール:Arと混合した約25%酸素により1325℃で10時間+Arと混合した約35%酸素により1325℃で5時間
領域Aはアニールの間に成長した表面酸化物である。
領域BはSOI層である。
領域Cは破壊された埋め込み酸化物である。
領域Dは基板である。
‐開始基板:1E19cm−3のホウ素のp型ドーピングによりドープされたウェハ
‐多孔質Si形成:電流、0.5−1.0mA、時間:約2分
‐Epi−Si成長:1150℃でのH2ベークのとき4000−5000Å
‐酸素注入:350℃で1E17cm−2
‐酸素注入:公称室温で2E15cm−2
‐高温アニール:Arと混合した約25%酸素により1325℃で10時間+Arと混合した約35%酸素により1325℃で5時間
領域Aはアニールの間に成長した表面酸化物である。
領域BはSOI層である。
領域Cは薄い埋め込み酸化物である。
領域Dは基板である。
Claims (25)
- シリコン・オン・インシュレータ(SOI)基板を製造する方法であって、
Si含有基板の上部において少なくとも0.01%の多孔率を有する多孔質Si含有基板を少なくとも含む構造体を提供するステップと、
前記提供された構造体の上に単結晶Si含有層を形成するステップと、
1E17atoms/cm2以下の酸素ドーズを用いて、酸素のピークが前記単結晶Si含有層と前記多孔質Si含有領域の境界面に又は前記多孔質Si含有領域内に配置されるように酸素イオンを注入するステップと、
前記酸素イオンの注入後に、前記構造体をアニールして、Si含有上層と100nm又はそれよりも小さい厚さを有する埋め込み酸化物とを含むシリコン・オン・インシュレータを形成するステップであって、前記多孔質Si含有領域中の多数の孔が前記アニールプロセスの間に消費され、前記埋め込み酸化物層の下にある多孔質Si含有領域において前記多孔質Si含有領域中に残った孔が崩壊してボイドになる、前記形成するステップと
を含む、前記方法。 - シリコン・オン・インシュレータ(SOI)基板を製造する方法であって、
Si含有基板の上部において少なくとも0.01%の多孔率を有する多孔質Si含有基板を少なくとも含む構造体を提供するステップと、
1E17atoms/cm2以下の酸素ドーズを用いて、前記多孔質Si含有領域内に酸素イオンを注入するステップと、
前記酸素イオンの注入後に、前記構造体をアニールして、Si含有上層と100nm又はそれよりも小さい厚さを有する埋め込み酸化物とを含むシリコン・オン・インシュレータを形成するステップであって、前記多孔質Si含有領域中の多数の孔が前記アニールプロセスの間に消費され、前記埋め込み酸化物層の下にある多孔質Si含有領域において前記多孔質Si含有領域中に残った孔が崩壊してボイドになる、前記形成するステップと
を含む、前記方法。 - シリコン・オン・インシュレータ(SOI)基板を製造する方法であって、
Si含有基板の上部において少なくとも0.01%の多孔率を有する多孔質Si含有基板を少なくとも含む構造体を提供するステップと、
前記提供された構造体に、水素含有雰囲気において実行されるベークステップを行うステップと、
前記べーク後に、1E17atoms/cm2以下の酸素ドーズを用いて、前記多孔質Si含有領域内に酸素イオンを注入するステップと、
前記酸素イオンの注入後に、前記構造体をアニールして、Si含有上層と100nm又はそれよりも小さい厚さを有する埋め込み酸化物とを含むシリコン・オン・インシュレータを形成するステップであって、前記多孔質Si含有領域中の多数の孔が前記アニールプロセスの間に消費され、前記埋め込み酸化物層の下にある多孔質Si含有領域において前記多孔質Si含有領域中に残った孔が崩壊してボイドになる、前記形成するステップと
を含む、前記方法。 - 前記埋め込み酸化物の厚さが10〜80nmである、請求項1〜3のいずれか一項に記載の方法。
- 前記酸素イオンの注入が、0.05〜500ミリアンペア/cm2のビーム電流密度、40〜1000keVのエネルギー、及び、200℃〜600℃の温度を用いて実行される、請求項1〜4のいずれか一項に記載の方法。
- 前記酸素イオンを注入するステップが、第2の酸素イオンを注入するステップをさらに含む、請求項1〜5のいずれか一項に記載の方法。
- 前記第2の酸素イオンの注入が、1E17atoms/cm2以下のイオンドーズで実行される、請求項6に記載の方法。
- 前記第2の酸素イオンの注入が、0.05〜5ミリアンペア/cm2のビーム電流密度、40〜1000keVのエネルギー、及び、4〜200℃の温度を用いて実行される、請求項6又は7に記載の方法。
- 前記酸素イオンの注入によって、1つの酸素注入領域が形成される、請求項1〜8のいずれか一項に記載の方法。
- 前記酸素イオンの注入によって、複数のパターン化された酸素注入領域が形成される、請求項1〜8のいずれか一項に記載の方法。
- 前記アニールによって、1つの埋め込み酸化物層が形成される、請求項9に記載の方法。
- 前記アニールによって、複数のパターン化された埋め込み酸化物層が形成される、請求項10に記載の方法。
- 前記アニールが酸素含有雰囲気において実行される、請求項1〜12のいずれか一項に記載の方法。
- 前記アニールが、650℃〜1350℃の温度で実行される、請求項1〜13のいずれか一項に記載の方法。
- 前記アニールが、前記単結晶Si含有層上に酸化物層を形成する、請求項1に記載の方法。
- 前記形成された酸化物層を除去するステップをさらに含む、請求項15に記載の方法。
- 前記Si含有基板が、n型又はp型ドーパントを含むドープされた基板である、請求項1〜16のいずれか一項に記載の方法。
- 前記提供するステップが電解陽極酸化プロセスを含む、請求項1〜17のいずれか一項に記載の方法。
- 前記電解陽極酸化プロセスがHF含有溶液の存在下で実行される、請求項18に記載の方法。
- 前記電解陽極酸化プロセスが、0.05〜50ミリアンペア/cm2の電流密度で作動する定電流源を用いて実行される、請求項18又は19に記載の方法。
- 前記電解陽極酸化プロセスが、0.05〜5ミリアンペア/cm 2 の電流密度で作動する定電流源を用いて実行される、請求項20に記載の方法。
- 前記注入するステップが、ブランケット注入プロセス、又は、パターン化した注入プロセスである、請求項1〜21のいずれか一項に記載の方法。
- 前記提供された構造体の上に単結晶Si含有層を形成するステップをさらに含み、前記形成するステップが前記ベークステップと前記注入するステップとの間で生じるようにする、請求項3に記載の方法。
- 前記ベークステップが、800℃〜1200℃の温度で水素含有雰囲気において実行される、請求項3又は23に記載の方法。
- 前記単結晶Si含有層が、エピタキシャルSi、アモルファスSi、SiGe、単結晶若しくは多結晶Si、又はそれらの組み合わせをも含む、請求項1、23又は24に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/674,647 | 2003-09-30 | ||
US10/674,647 US7718231B2 (en) | 2003-09-30 | 2003-09-30 | Thin buried oxides by low-dose oxygen implantation into modified silicon |
PCT/US2004/031823 WO2005034209A2 (en) | 2003-09-30 | 2004-09-28 | Thin buried oxides by low-dose oxygen implantation into modified silicon |
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JP4931212B2 true JP4931212B2 (ja) | 2012-05-16 |
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EP (1) | EP1678743A2 (ja) |
JP (1) | JP4931212B2 (ja) |
KR (1) | KR100861739B1 (ja) |
CN (1) | CN100463135C (ja) |
TW (1) | TW200514173A (ja) |
WO (1) | WO2005034209A2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
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US7718231B2 (en) | 2003-09-30 | 2010-05-18 | International Business Machines Corporation | Thin buried oxides by low-dose oxygen implantation into modified silicon |
US20080203484A1 (en) * | 2007-02-23 | 2008-08-28 | Infineon Technologies Ag | Field effect transistor arrangement and method of producing a field effect transistor arrangement |
US8378384B2 (en) * | 2007-09-28 | 2013-02-19 | Infineon Technologies Ag | Wafer and method for producing a wafer |
CN101593674B (zh) * | 2008-05-26 | 2011-10-05 | 中芯国际集成电路制造(北京)有限公司 | 半导体衬底的形成方法以及太阳能电池的制作方法 |
JP2010114409A (ja) * | 2008-10-10 | 2010-05-20 | Sony Corp | Soi基板とその製造方法、固体撮像装置とその製造方法、および撮像装置 |
US20100176482A1 (en) | 2009-01-12 | 2010-07-15 | International Business Machine Corporation | Low cost fabrication of double box back gate silicon-on-insulator wafers with subsequent self aligned shallow trench isolation |
US7767546B1 (en) * | 2009-01-12 | 2010-08-03 | International Business Machines Corporation | Low cost fabrication of double box back gate silicon-on-insulator wafers with built-in shallow trench isolation in back gate layer |
US20100176495A1 (en) * | 2009-01-12 | 2010-07-15 | International Business Machines Corporation | Low cost fabrication of double box back gate silicon-on-insulator wafers |
JP2011029618A (ja) * | 2009-06-25 | 2011-02-10 | Sumco Corp | Simoxウェーハの製造方法、simoxウェーハ |
US8587063B2 (en) * | 2009-11-06 | 2013-11-19 | International Business Machines Corporation | Hybrid double box back gate silicon-on-insulator wafers with enhanced mobility channels |
CN114830332A (zh) * | 2019-10-18 | 2022-07-29 | 光量子计算公司 | 在衬底上制造并包含在衬底上外延生长的铁电层的电光装置 |
TWI783583B (zh) * | 2020-07-21 | 2022-11-11 | 美商應用材料股份有限公司 | 用於非晶矽中減少氫併入的離子佈植 |
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- 2003-09-30 US US10/674,647 patent/US7718231B2/en not_active Expired - Fee Related
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- 2004-09-28 EP EP04789172A patent/EP1678743A2/en not_active Withdrawn
- 2004-09-28 KR KR1020067004269A patent/KR100861739B1/ko not_active IP Right Cessation
- 2004-09-28 JP JP2006534023A patent/JP4931212B2/ja not_active Expired - Fee Related
- 2004-09-28 CN CNB2004800285443A patent/CN100463135C/zh not_active Expired - Fee Related
- 2004-09-28 WO PCT/US2004/031823 patent/WO2005034209A2/en active Search and Examination
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KR100861739B1 (ko) | 2008-10-06 |
WO2005034209A2 (en) | 2005-04-14 |
EP1678743A2 (en) | 2006-07-12 |
TW200514173A (en) | 2005-04-16 |
US7718231B2 (en) | 2010-05-18 |
CN100463135C (zh) | 2009-02-18 |
US20050067055A1 (en) | 2005-03-31 |
KR20060058124A (ko) | 2006-05-29 |
WO2005034209A3 (en) | 2005-05-19 |
CN1890794A (zh) | 2007-01-03 |
JP2007507898A (ja) | 2007-03-29 |
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