JP4918191B2 - 成膜方法 - Google Patents

成膜方法 Download PDF

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Publication number
JP4918191B2
JP4918191B2 JP2001045984A JP2001045984A JP4918191B2 JP 4918191 B2 JP4918191 B2 JP 4918191B2 JP 2001045984 A JP2001045984 A JP 2001045984A JP 2001045984 A JP2001045984 A JP 2001045984A JP 4918191 B2 JP4918191 B2 JP 4918191B2
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JP
Japan
Prior art keywords
substrate
film
ions
arc
vacuum chamber
Prior art date
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Expired - Fee Related
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JP2001045984A
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English (en)
Japanese (ja)
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JP2002249867A (ja
JP2002249867A5 (enExample
Inventor
博 早田
義治 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2001045984A priority Critical patent/JP4918191B2/ja
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Publication of JP2002249867A5 publication Critical patent/JP2002249867A5/ja
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  • Physical Vapour Deposition (AREA)
JP2001045984A 2001-02-22 2001-02-22 成膜方法 Expired - Fee Related JP4918191B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001045984A JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001045984A JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

Publications (3)

Publication Number Publication Date
JP2002249867A JP2002249867A (ja) 2002-09-06
JP2002249867A5 JP2002249867A5 (enExample) 2008-01-17
JP4918191B2 true JP4918191B2 (ja) 2012-04-18

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ID=18907687

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JP2001045984A Expired - Fee Related JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

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JP (1) JP4918191B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2159820B1 (en) * 2008-08-25 2018-04-11 Oerlikon Surface Solutions AG, Pfäffikon A physical vapour deposition coating device as well as a physical vapour deposition method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0699799B2 (ja) * 1988-03-18 1994-12-07 株式会社神戸製鋼所 真空蒸着方法
JPH071065U (ja) * 1993-05-28 1995-01-10 シチズン時計株式会社 真空アーク蒸着装置
DE19547305A1 (de) * 1995-12-18 1997-06-19 Univ Sheffield Verfahren zum Beschichten von metallischen Substraten
JP2001003160A (ja) * 1999-06-18 2001-01-09 Nissin Electric Co Ltd 膜形成方法およびその装置

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JP2002249867A (ja) 2002-09-06

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