JP2002249867A5 - - Google Patents

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Publication number
JP2002249867A5
JP2002249867A5 JP2001045984A JP2001045984A JP2002249867A5 JP 2002249867 A5 JP2002249867 A5 JP 2002249867A5 JP 2001045984 A JP2001045984 A JP 2001045984A JP 2001045984 A JP2001045984 A JP 2001045984A JP 2002249867 A5 JP2002249867 A5 JP 2002249867A5
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JP
Japan
Prior art keywords
arc
film
cathode
substrate
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2001045984A
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English (en)
Japanese (ja)
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JP2002249867A (ja
JP4918191B2 (ja
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Application filed filed Critical
Priority to JP2001045984A priority Critical patent/JP4918191B2/ja
Priority claimed from JP2001045984A external-priority patent/JP4918191B2/ja
Publication of JP2002249867A publication Critical patent/JP2002249867A/ja
Publication of JP2002249867A5 publication Critical patent/JP2002249867A5/ja
Application granted granted Critical
Publication of JP4918191B2 publication Critical patent/JP4918191B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001045984A 2001-02-22 2001-02-22 成膜方法 Expired - Fee Related JP4918191B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001045984A JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001045984A JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

Publications (3)

Publication Number Publication Date
JP2002249867A JP2002249867A (ja) 2002-09-06
JP2002249867A5 true JP2002249867A5 (enExample) 2008-01-17
JP4918191B2 JP4918191B2 (ja) 2012-04-18

Family

ID=18907687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001045984A Expired - Fee Related JP4918191B2 (ja) 2001-02-22 2001-02-22 成膜方法

Country Status (1)

Country Link
JP (1) JP4918191B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2159820B1 (en) * 2008-08-25 2018-04-11 Oerlikon Surface Solutions AG, Pfäffikon A physical vapour deposition coating device as well as a physical vapour deposition method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0699799B2 (ja) * 1988-03-18 1994-12-07 株式会社神戸製鋼所 真空蒸着方法
JPH071065U (ja) * 1993-05-28 1995-01-10 シチズン時計株式会社 真空アーク蒸着装置
DE19547305A1 (de) * 1995-12-18 1997-06-19 Univ Sheffield Verfahren zum Beschichten von metallischen Substraten
JP2001003160A (ja) * 1999-06-18 2001-01-09 Nissin Electric Co Ltd 膜形成方法およびその装置

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