JP4908227B2 - Mram技術のmtjに使用される合成反強磁性体構造 - Google Patents
Mram技術のmtjに使用される合成反強磁性体構造 Download PDFInfo
- Publication number
- JP4908227B2 JP4908227B2 JP2006545636A JP2006545636A JP4908227B2 JP 4908227 B2 JP4908227 B2 JP 4908227B2 JP 2006545636 A JP2006545636 A JP 2006545636A JP 2006545636 A JP2006545636 A JP 2006545636A JP 4908227 B2 JP4908227 B2 JP 4908227B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode
- saf
- mtj
- ferromagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Materials of the active region
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/740,338 US6946697B2 (en) | 2003-12-18 | 2003-12-18 | Synthetic antiferromagnet structures for use in MTJs in MRAM technology |
| US10/740,338 | 2003-12-18 | ||
| PCT/US2004/037058 WO2005067472A2 (en) | 2003-12-18 | 2004-11-04 | Synthetic antiferromagnet structures for use in mtjs in mram technology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007515075A JP2007515075A (ja) | 2007-06-07 |
| JP2007515075A5 JP2007515075A5 (enExample) | 2007-12-13 |
| JP4908227B2 true JP4908227B2 (ja) | 2012-04-04 |
Family
ID=34677853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006545636A Expired - Lifetime JP4908227B2 (ja) | 2003-12-18 | 2004-11-04 | Mram技術のmtjに使用される合成反強磁性体構造 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6946697B2 (enExample) |
| EP (1) | EP1697996A2 (enExample) |
| JP (1) | JP4908227B2 (enExample) |
| KR (1) | KR101122970B1 (enExample) |
| CN (1) | CN100495723C (enExample) |
| TW (1) | TWI370545B (enExample) |
| WO (1) | WO2005067472A2 (enExample) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6978070B1 (en) * | 2001-08-14 | 2005-12-20 | The Programmable Matter Corporation | Fiber incorporating quantum dots as programmable dopants |
| US20050073878A1 (en) * | 2003-10-03 | 2005-04-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multi-sensing level MRAM structure with different magnetoresistance ratios |
| JP5015600B2 (ja) * | 2003-10-14 | 2012-08-29 | エージェンシー フォー サイエンス,テクノロジー アンド リサーチ | 磁気メモリデバイス |
| CN101065845A (zh) * | 2004-06-04 | 2007-10-31 | 可编程物公司 | 包含作为可编程掺杂剂的量子点的层状复合薄膜 |
| US20070242395A1 (en) * | 2004-10-15 | 2007-10-18 | Bailey William E | Methods of manipulating the relaxation rate in magnetic materials and devices for using the same |
| US7285836B2 (en) * | 2005-03-09 | 2007-10-23 | Maglabs, Inc. | Magnetic random access memory with stacked memory cells having oppositely-directed hard-axis biasing |
| US20070194297A1 (en) * | 2006-02-17 | 2007-08-23 | The Programmable Matter Corporation | Quantum Dot Switching Device |
| US8063459B2 (en) * | 2007-02-12 | 2011-11-22 | Avalanche Technologies, Inc. | Non-volatile magnetic memory element with graded layer |
| US8018011B2 (en) | 2007-02-12 | 2011-09-13 | Avalanche Technology, Inc. | Low cost multi-state magnetic memory |
| US20080246104A1 (en) * | 2007-02-12 | 2008-10-09 | Yadav Technology | High Capacity Low Cost Multi-State Magnetic Memory |
| US8084835B2 (en) * | 2006-10-20 | 2011-12-27 | Avalanche Technology, Inc. | Non-uniform switching based non-volatile magnetic based memory |
| US20070253245A1 (en) * | 2006-04-27 | 2007-11-01 | Yadav Technology | High Capacity Low Cost Multi-Stacked Cross-Line Magnetic Memory |
| US8058696B2 (en) * | 2006-02-25 | 2011-11-15 | Avalanche Technology, Inc. | High capacity low cost multi-state magnetic memory |
| US8183652B2 (en) * | 2007-02-12 | 2012-05-22 | Avalanche Technology, Inc. | Non-volatile magnetic memory with low switching current and high thermal stability |
| TWI303063B (en) * | 2006-03-20 | 2008-11-11 | Univ Nat Yunlin Sci & Tech | Composing structure of magnetic tunneling junction for magnetic random access memory |
| US7601946B2 (en) * | 2006-09-12 | 2009-10-13 | Ravenbrick, Llc | Electromagnetic sensor incorporating quantum confinement structures |
| US7572645B2 (en) * | 2006-11-15 | 2009-08-11 | Everspin Technologies, Inc. | Magnetic tunnel junction structure and method |
| US7768693B2 (en) | 2007-01-24 | 2010-08-03 | Ravenbrick Llc | Thermally switched optical downconverting filter |
| US8363307B2 (en) * | 2007-02-28 | 2013-01-29 | Ravenbrick, Llc | Multicolor light emitting device incorporating tunable quantum confinement devices |
| US7936500B2 (en) * | 2007-03-02 | 2011-05-03 | Ravenbrick Llc | Wavelength-specific optical switch |
| EP2171520A4 (en) | 2007-07-11 | 2011-09-07 | Ravenbrick Llc | REFLECTIVE OPTICAL SHUTTER WITH THERMAL SWITCHING |
| WO2009039423A1 (en) | 2007-09-19 | 2009-03-26 | Ravenbrick, Llc | Low-emissivity window films and coatings incoporating nanoscale wire grids |
| US8169685B2 (en) | 2007-12-20 | 2012-05-01 | Ravenbrick, Llc | Thermally switched absorptive window shutter |
| US8216703B2 (en) * | 2008-02-21 | 2012-07-10 | Everspin Technologies, Inc. | Magnetic tunnel junction device |
| CN101276879B (zh) * | 2008-04-01 | 2010-06-09 | 北京科技大学 | 一种双自由层垂直铁磁性隧道结结构 |
| US8634137B2 (en) | 2008-04-23 | 2014-01-21 | Ravenbrick Llc | Glare management of reflective and thermoreflective surfaces |
| US7965077B2 (en) | 2008-05-08 | 2011-06-21 | Everspin Technologies, Inc. | Two-axis magnetic field sensor with multiple pinning directions |
| US9116302B2 (en) | 2008-06-19 | 2015-08-25 | Ravenbrick Llc | Optical metapolarizer device |
| US7902616B2 (en) * | 2008-06-30 | 2011-03-08 | Qimonda Ag | Integrated circuit having a magnetic tunnel junction device and method |
| CA2737041C (en) | 2008-08-20 | 2013-10-15 | Ravenbrick, Llc | Methods for fabricating thermochromic filters |
| WO2010024201A1 (ja) * | 2008-08-28 | 2010-03-04 | 株式会社日立製作所 | 多層積層フェリ構造を備えた磁気抵抗効果素子、磁気メモリ及び磁気ランダムアクセスメモリ |
| US8102700B2 (en) | 2008-09-30 | 2012-01-24 | Micron Technology, Inc. | Unidirectional spin torque transfer magnetic memory cell structure |
| GB2465370A (en) * | 2008-11-13 | 2010-05-19 | Ingenia Holdings | Magnetic data storage comprising a synthetic anti-ferromagnetic stack arranged to maintain solitons |
| JP2012124185A (ja) * | 2009-02-23 | 2012-06-28 | Canon Anelva Corp | 磁気抵抗素子 |
| US20100254174A1 (en) * | 2009-04-02 | 2010-10-07 | Seagate Technology Llc | Resistive Sense Memory with Complementary Programmable Recording Layers |
| US8643795B2 (en) | 2009-04-10 | 2014-02-04 | Ravenbrick Llc | Thermally switched optical filter incorporating a refractive optical structure |
| CN102460238A (zh) | 2009-04-10 | 2012-05-16 | 雷文布里克有限责任公司 | 结合有宾主型结构的热切换滤光器 |
| US8344433B2 (en) * | 2009-04-14 | 2013-01-01 | Qualcomm Incorporated | Magnetic tunnel junction (MTJ) and methods, and magnetic random access memory (MRAM) employing same |
| US8867132B2 (en) | 2009-10-30 | 2014-10-21 | Ravenbrick Llc | Thermochromic filters and stopband filters for use with same |
| AU2011235265A1 (en) | 2010-03-29 | 2012-10-25 | Ravenbrick Llc | Polymer-stabilized thermotropic liquid crystal device |
| US8580580B2 (en) | 2010-04-01 | 2013-11-12 | Seagate Technology Llc | Magnetic element with varying areal extents |
| WO2011153214A2 (en) | 2010-06-01 | 2011-12-08 | Ravenbrick Llc | Multifunctional building component |
| CN102315255B (zh) * | 2010-07-07 | 2013-10-16 | 中国科学院物理研究所 | 一种自旋场效应晶体管及其磁性存储器 |
| GB201015497D0 (en) | 2010-09-16 | 2010-10-27 | Cambridge Entpr Ltd | Magnetic data storage |
| GB201020727D0 (en) | 2010-12-07 | 2011-01-19 | Cambridge Entpr Ltd | Magnetic structure |
| US8570691B2 (en) | 2011-04-07 | 2013-10-29 | HGST Netherlands B.V. | TMR sensor film using a tantalum insertion layer and systems thereof |
| JP5768494B2 (ja) | 2011-05-19 | 2015-08-26 | ソニー株式会社 | 記憶素子、記憶装置 |
| WO2013033608A2 (en) | 2011-09-01 | 2013-03-07 | Wil Mccarthy | Thermotropic optical shutter incorporating coatable polarizers |
| KR101446338B1 (ko) * | 2012-07-17 | 2014-10-01 | 삼성전자주식회사 | 자기 소자 및 그 제조 방법 |
| US8988109B2 (en) * | 2012-11-16 | 2015-03-24 | Intel Corporation | High speed precessionally switched magnetic logic |
| KR102132650B1 (ko) * | 2013-08-13 | 2020-07-10 | 삼성전자주식회사 | 열 내성 강화 고정 층을 갖는 반도체 소자 |
| US9240547B2 (en) | 2013-09-10 | 2016-01-19 | Micron Technology, Inc. | Magnetic tunnel junctions and methods of forming magnetic tunnel junctions |
| CN104009151A (zh) * | 2014-05-27 | 2014-08-27 | 中国科学院物理研究所 | 闭合形状的磁性隧道结 |
| EP3167449A4 (en) * | 2014-07-07 | 2018-02-28 | Intel Corporation | Spin-transfer torque memory (sttm) devices having magnetic contacts |
| US9373779B1 (en) | 2014-12-08 | 2016-06-21 | Micron Technology, Inc. | Magnetic tunnel junctions |
| US9502642B2 (en) | 2015-04-10 | 2016-11-22 | Micron Technology, Inc. | Magnetic tunnel junctions, methods used while forming magnetic tunnel junctions, and methods of forming magnetic tunnel junctions |
| US9530959B2 (en) | 2015-04-15 | 2016-12-27 | Micron Technology, Inc. | Magnetic tunnel junctions |
| US9520553B2 (en) | 2015-04-15 | 2016-12-13 | Micron Technology, Inc. | Methods of forming a magnetic electrode of a magnetic tunnel junction and methods of forming a magnetic tunnel junction |
| US9257136B1 (en) | 2015-05-05 | 2016-02-09 | Micron Technology, Inc. | Magnetic tunnel junctions |
| US9960346B2 (en) | 2015-05-07 | 2018-05-01 | Micron Technology, Inc. | Magnetic tunnel junctions |
| WO2017052606A1 (en) * | 2015-09-25 | 2017-03-30 | Intel Corporation | Psttm device with free magnetic layers coupled through a metal layer having high temperature stability |
| US10326075B2 (en) | 2015-09-25 | 2019-06-18 | Intel Corporation | PSTTM device with multi-layered filter stack |
| US10340445B2 (en) | 2015-09-25 | 2019-07-02 | Intel Corporation | PSTTM device with bottom electrode interface material |
| US10008223B1 (en) | 2016-02-18 | 2018-06-26 | Seagate Technology Llc | Magnetoresistive sensor with recessed antiferromagnetic layer and stabilization feature |
| EP3217446B1 (en) * | 2016-03-10 | 2022-02-23 | Crocus Technology | Magnetoresistive element having an adjustable magnetostriction and magnetic device comprising the magnetoresistive element |
| US9680089B1 (en) | 2016-05-13 | 2017-06-13 | Micron Technology, Inc. | Magnetic tunnel junctions |
| EP3563377A1 (en) * | 2016-12-27 | 2019-11-06 | Everspin Technologies, Inc. | Data storage in synthetic antiferromagnets included in magnetic tunnel junctions |
| KR102423433B1 (ko) | 2017-12-05 | 2022-07-22 | 키오시아 가부시키가이샤 | 전자 장치 |
| US11502188B2 (en) | 2018-06-14 | 2022-11-15 | Intel Corporation | Apparatus and method for boosting signal in magnetoelectric spin orbit logic |
| US11476412B2 (en) | 2018-06-19 | 2022-10-18 | Intel Corporation | Perpendicular exchange bias with antiferromagnet for spin orbit coupling based memory |
| US11444237B2 (en) | 2018-06-29 | 2022-09-13 | Intel Corporation | Spin orbit torque (SOT) memory devices and methods of fabrication |
| US11616192B2 (en) | 2018-06-29 | 2023-03-28 | Intel Corporation | Magnetic memory devices with a transition metal dopant at an interface of free magnetic layers and methods of fabrication |
| US10721815B2 (en) * | 2018-07-06 | 2020-07-21 | Raytheon Company | Method of making patterned conductive microstructures within a heat shrinkable substrate |
| US11557629B2 (en) | 2019-03-27 | 2023-01-17 | Intel Corporation | Spin orbit memory devices with reduced magnetic moment and methods of fabrication |
| US11594673B2 (en) | 2019-03-27 | 2023-02-28 | Intel Corporation | Two terminal spin orbit memory devices and methods of fabrication |
| JP2021002559A (ja) | 2019-06-20 | 2021-01-07 | キオクシア株式会社 | 積層体及び磁気デバイス |
| CN112736191A (zh) * | 2019-10-14 | 2021-04-30 | 上海磁宇信息科技有限公司 | 具有对称结构的磁性隧道结结构及磁性随机存储器 |
| US11500042B2 (en) | 2020-02-28 | 2022-11-15 | Brown University | Magnetic sensing devices based on interlayer exchange-coupled magnetic thin films |
| US11393495B2 (en) | 2020-03-26 | 2022-07-19 | Seagate Technology Llc | Reader with a multi-layer synthetic ferrimagnet free layer |
| US12040114B2 (en) | 2022-09-14 | 2024-07-16 | Western Digital Technologies, Inc. | Magnetoresistive device comprising a synthetic antiferromagnetic coupling layer of RuAl having a (001) texture |
| US12207563B2 (en) | 2022-09-23 | 2025-01-21 | Western Digital Technologies, Inc. | Magnetoresistive devices comprising a synthetic antiferromagnetic coupling layer of RuAl having a (110) texture |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3293437B2 (ja) * | 1995-12-19 | 2002-06-17 | 松下電器産業株式会社 | 磁気抵抗効果素子、磁気抵抗効果型ヘッド及びメモリー素子 |
| KR19980042427A (ko) * | 1996-11-18 | 1998-08-17 | 다까노야스아끼 | 자기 저항 효과막 |
| DE19725922C2 (de) * | 1997-06-19 | 2000-07-20 | Gnb Gmbh | Verfahren zur Herstellung eines Behälters |
| US6738236B1 (en) * | 1998-05-07 | 2004-05-18 | Seagate Technology Llc | Spin valve/GMR sensor using synthetic antiferromagnetic layer pinned by Mn-alloy having a high blocking temperature |
| US6197439B1 (en) * | 1999-01-28 | 2001-03-06 | International Business Machines Corporation | Laminated magnetic structures with ultra-thin transition metal spacer layers |
| US6590806B1 (en) * | 2000-03-09 | 2003-07-08 | Hewlett-Packard Development Company, L.P. | Multibit magnetic memory element |
| US6469926B1 (en) * | 2000-03-22 | 2002-10-22 | Motorola, Inc. | Magnetic element with an improved magnetoresistance ratio and fabricating method thereof |
| JP4403337B2 (ja) * | 2000-05-30 | 2010-01-27 | ソニー株式会社 | トンネル磁気抵抗効果素子、及びトンネル磁気抵抗効果型磁気ヘッド |
| US6545906B1 (en) * | 2001-10-16 | 2003-04-08 | Motorola, Inc. | Method of writing to scalable magnetoresistance random access memory element |
| US6518588B1 (en) * | 2001-10-17 | 2003-02-11 | International Business Machines Corporation | Magnetic random access memory with thermally stable magnetic tunnel junction cells |
| JP2003283000A (ja) * | 2002-03-27 | 2003-10-03 | Toshiba Corp | 磁気抵抗効果素子およびこれを有する磁気メモリ |
| JP2003324225A (ja) | 2002-04-26 | 2003-11-14 | Nec Corp | 積層フェリ型磁性薄膜並びにそれを使用した磁気抵抗効果素子及び強磁性トンネル素子 |
| JP2004103120A (ja) * | 2002-09-10 | 2004-04-02 | Hitachi Ltd | 差動バイアス型磁区制御構造を有する記録再生分離型磁気ヘッド |
| JP4080982B2 (ja) | 2003-10-09 | 2008-04-23 | 株式会社東芝 | 磁気メモリ |
-
2003
- 2003-12-18 US US10/740,338 patent/US6946697B2/en not_active Expired - Lifetime
-
2004
- 2004-11-04 KR KR1020067011933A patent/KR101122970B1/ko not_active Expired - Fee Related
- 2004-11-04 CN CNB2004800374466A patent/CN100495723C/zh not_active Expired - Lifetime
- 2004-11-04 JP JP2006545636A patent/JP4908227B2/ja not_active Expired - Lifetime
- 2004-11-04 WO PCT/US2004/037058 patent/WO2005067472A2/en not_active Ceased
- 2004-11-04 EP EP04810475A patent/EP1697996A2/en not_active Withdrawn
- 2004-12-14 TW TW093138819A patent/TWI370545B/zh not_active IP Right Cessation
-
2005
- 2005-07-15 US US11/182,149 patent/US7226796B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN100495723C (zh) | 2009-06-03 |
| TWI370545B (en) | 2012-08-11 |
| WO2005067472A2 (en) | 2005-07-28 |
| CN1894801A (zh) | 2007-01-10 |
| EP1697996A2 (en) | 2006-09-06 |
| TW200532914A (en) | 2005-10-01 |
| WO2005067472A3 (en) | 2006-03-02 |
| US20050247964A1 (en) | 2005-11-10 |
| US7226796B2 (en) | 2007-06-05 |
| KR20070001912A (ko) | 2007-01-04 |
| US20050133840A1 (en) | 2005-06-23 |
| US6946697B2 (en) | 2005-09-20 |
| KR101122970B1 (ko) | 2012-03-15 |
| JP2007515075A (ja) | 2007-06-07 |
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