KR101122970B1 - Mram 기술의 mtjs에 사용하는 합성 반강자성체구조 - Google Patents
Mram 기술의 mtjs에 사용하는 합성 반강자성체구조 Download PDFInfo
- Publication number
- KR101122970B1 KR101122970B1 KR1020067011933A KR20067011933A KR101122970B1 KR 101122970 B1 KR101122970 B1 KR 101122970B1 KR 1020067011933 A KR1020067011933 A KR 1020067011933A KR 20067011933 A KR20067011933 A KR 20067011933A KR 101122970 B1 KR101122970 B1 KR 101122970B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- mtj
- electrode
- ferromagnetic
- iron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Materials of the active region
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/740,338 | 2003-12-18 | ||
| US10/740,338 US6946697B2 (en) | 2003-12-18 | 2003-12-18 | Synthetic antiferromagnet structures for use in MTJs in MRAM technology |
| PCT/US2004/037058 WO2005067472A2 (en) | 2003-12-18 | 2004-11-04 | Synthetic antiferromagnet structures for use in mtjs in mram technology |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20070001912A KR20070001912A (ko) | 2007-01-04 |
| KR101122970B1 true KR101122970B1 (ko) | 2012-03-15 |
Family
ID=34677853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020067011933A Expired - Fee Related KR101122970B1 (ko) | 2003-12-18 | 2004-11-04 | Mram 기술의 mtjs에 사용하는 합성 반강자성체구조 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6946697B2 (enExample) |
| EP (1) | EP1697996A2 (enExample) |
| JP (1) | JP4908227B2 (enExample) |
| KR (1) | KR101122970B1 (enExample) |
| CN (1) | CN100495723C (enExample) |
| TW (1) | TWI370545B (enExample) |
| WO (1) | WO2005067472A2 (enExample) |
Families Citing this family (81)
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| WO2007013887A2 (en) * | 2004-10-15 | 2007-02-01 | The Trustees Of Columbia University In The City Of New York | Methods of manipulating the relaxation rate in magnetic materials and devices for using the same |
| US7285836B2 (en) * | 2005-03-09 | 2007-10-23 | Maglabs, Inc. | Magnetic random access memory with stacked memory cells having oppositely-directed hard-axis biasing |
| US20070194297A1 (en) * | 2006-02-17 | 2007-08-23 | The Programmable Matter Corporation | Quantum Dot Switching Device |
| US20080246104A1 (en) * | 2007-02-12 | 2008-10-09 | Yadav Technology | High Capacity Low Cost Multi-State Magnetic Memory |
| US8084835B2 (en) * | 2006-10-20 | 2011-12-27 | Avalanche Technology, Inc. | Non-uniform switching based non-volatile magnetic based memory |
| US8018011B2 (en) | 2007-02-12 | 2011-09-13 | Avalanche Technology, Inc. | Low cost multi-state magnetic memory |
| US8063459B2 (en) * | 2007-02-12 | 2011-11-22 | Avalanche Technologies, Inc. | Non-volatile magnetic memory element with graded layer |
| US8183652B2 (en) * | 2007-02-12 | 2012-05-22 | Avalanche Technology, Inc. | Non-volatile magnetic memory with low switching current and high thermal stability |
| US20070253245A1 (en) * | 2006-04-27 | 2007-11-01 | Yadav Technology | High Capacity Low Cost Multi-Stacked Cross-Line Magnetic Memory |
| US8058696B2 (en) * | 2006-02-25 | 2011-11-15 | Avalanche Technology, Inc. | High capacity low cost multi-state magnetic memory |
| TWI303063B (en) * | 2006-03-20 | 2008-11-11 | Univ Nat Yunlin Sci & Tech | Composing structure of magnetic tunneling junction for magnetic random access memory |
| US7601946B2 (en) * | 2006-09-12 | 2009-10-13 | Ravenbrick, Llc | Electromagnetic sensor incorporating quantum confinement structures |
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| CN101276879B (zh) * | 2008-04-01 | 2010-06-09 | 北京科技大学 | 一种双自由层垂直铁磁性隧道结结构 |
| EP2269100A4 (en) | 2008-04-23 | 2011-12-28 | Ravenbrick Llc | HANDLING OF GLOSSY ON REFLECTIVE AND THERMO-THINKING SURFACES |
| US7965077B2 (en) | 2008-05-08 | 2011-06-21 | Everspin Technologies, Inc. | Two-axis magnetic field sensor with multiple pinning directions |
| US9116302B2 (en) | 2008-06-19 | 2015-08-25 | Ravenbrick Llc | Optical metapolarizer device |
| US7902616B2 (en) * | 2008-06-30 | 2011-03-08 | Qimonda Ag | Integrated circuit having a magnetic tunnel junction device and method |
| KR101331058B1 (ko) | 2008-08-20 | 2013-11-20 | 라벤브릭 엘엘씨 | 열변색 필터를 제조하는 방법 |
| WO2010024201A1 (ja) * | 2008-08-28 | 2010-03-04 | 株式会社日立製作所 | 多層積層フェリ構造を備えた磁気抵抗効果素子、磁気メモリ及び磁気ランダムアクセスメモリ |
| US8102700B2 (en) | 2008-09-30 | 2012-01-24 | Micron Technology, Inc. | Unidirectional spin torque transfer magnetic memory cell structure |
| GB2465370A (en) * | 2008-11-13 | 2010-05-19 | Ingenia Holdings | Magnetic data storage comprising a synthetic anti-ferromagnetic stack arranged to maintain solitons |
| JP2012124185A (ja) * | 2009-02-23 | 2012-06-28 | Canon Anelva Corp | 磁気抵抗素子 |
| US20100254174A1 (en) * | 2009-04-02 | 2010-10-07 | Seagate Technology Llc | Resistive Sense Memory with Complementary Programmable Recording Layers |
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| US8344433B2 (en) * | 2009-04-14 | 2013-01-01 | Qualcomm Incorporated | Magnetic tunnel junction (MTJ) and methods, and magnetic random access memory (MRAM) employing same |
| US8947760B2 (en) | 2009-04-23 | 2015-02-03 | Ravenbrick Llc | Thermotropic optical shutter incorporating coatable polarizers |
| WO2011053853A2 (en) | 2009-10-30 | 2011-05-05 | Ravenbrick Llc | Thermochromic filters and stopband filters for use with same |
| WO2011062708A2 (en) | 2009-11-17 | 2011-05-26 | Ravenbrick Llc | Thermally switched optical filter incorporating a refractive optical structure |
| JP5890390B2 (ja) | 2010-03-29 | 2016-03-22 | レイブンブリック,エルエルシー | ポリマ安定化型サーモトロピック液晶デバイス |
| US8580580B2 (en) | 2010-04-01 | 2013-11-12 | Seagate Technology Llc | Magnetic element with varying areal extents |
| CA2801399C (en) | 2010-06-01 | 2016-03-29 | Ravenbrick, Llc | Multifunctional building component |
| CN102315255B (zh) * | 2010-07-07 | 2013-10-16 | 中国科学院物理研究所 | 一种自旋场效应晶体管及其磁性存储器 |
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| GB201020727D0 (en) | 2010-12-07 | 2011-01-19 | Cambridge Entpr Ltd | Magnetic structure |
| US8570691B2 (en) | 2011-04-07 | 2013-10-29 | HGST Netherlands B.V. | TMR sensor film using a tantalum insertion layer and systems thereof |
| JP5768494B2 (ja) | 2011-05-19 | 2015-08-26 | ソニー株式会社 | 記憶素子、記憶装置 |
| KR101446338B1 (ko) * | 2012-07-17 | 2014-10-01 | 삼성전자주식회사 | 자기 소자 및 그 제조 방법 |
| US8988109B2 (en) * | 2012-11-16 | 2015-03-24 | Intel Corporation | High speed precessionally switched magnetic logic |
| KR102132650B1 (ko) * | 2013-08-13 | 2020-07-10 | 삼성전자주식회사 | 열 내성 강화 고정 층을 갖는 반도체 소자 |
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| CN104009151A (zh) * | 2014-05-27 | 2014-08-27 | 中国科学院物理研究所 | 闭合形状的磁性隧道结 |
| EP3167449A4 (en) | 2014-07-07 | 2018-02-28 | Intel Corporation | Spin-transfer torque memory (sttm) devices having magnetic contacts |
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| US9502642B2 (en) | 2015-04-10 | 2016-11-22 | Micron Technology, Inc. | Magnetic tunnel junctions, methods used while forming magnetic tunnel junctions, and methods of forming magnetic tunnel junctions |
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| US9520553B2 (en) | 2015-04-15 | 2016-12-13 | Micron Technology, Inc. | Methods of forming a magnetic electrode of a magnetic tunnel junction and methods of forming a magnetic tunnel junction |
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| US9960346B2 (en) | 2015-05-07 | 2018-05-01 | Micron Technology, Inc. | Magnetic tunnel junctions |
| US10326075B2 (en) | 2015-09-25 | 2019-06-18 | Intel Corporation | PSTTM device with multi-layered filter stack |
| US10340445B2 (en) | 2015-09-25 | 2019-07-02 | Intel Corporation | PSTTM device with bottom electrode interface material |
| WO2017052606A1 (en) * | 2015-09-25 | 2017-03-30 | Intel Corporation | Psttm device with free magnetic layers coupled through a metal layer having high temperature stability |
| US10008223B1 (en) | 2016-02-18 | 2018-06-26 | Seagate Technology Llc | Magnetoresistive sensor with recessed antiferromagnetic layer and stabilization feature |
| EP3217446B1 (en) * | 2016-03-10 | 2022-02-23 | Crocus Technology | Magnetoresistive element having an adjustable magnetostriction and magnetic device comprising the magnetoresistive element |
| US9680089B1 (en) | 2016-05-13 | 2017-06-13 | Micron Technology, Inc. | Magnetic tunnel junctions |
| CN110235201A (zh) * | 2016-12-27 | 2019-09-13 | 艾沃思宾技术公司 | 包括在磁隧道结中的合成反铁磁体中的数据存储 |
| KR102423433B1 (ko) | 2017-12-05 | 2022-07-22 | 키오시아 가부시키가이샤 | 전자 장치 |
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| US11444237B2 (en) | 2018-06-29 | 2022-09-13 | Intel Corporation | Spin orbit torque (SOT) memory devices and methods of fabrication |
| US10721815B2 (en) * | 2018-07-06 | 2020-07-21 | Raytheon Company | Method of making patterned conductive microstructures within a heat shrinkable substrate |
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| JP2021002559A (ja) | 2019-06-20 | 2021-01-07 | キオクシア株式会社 | 積層体及び磁気デバイス |
| CN112736191A (zh) * | 2019-10-14 | 2021-04-30 | 上海磁宇信息科技有限公司 | 具有对称结构的磁性隧道结结构及磁性随机存储器 |
| US11500042B2 (en) | 2020-02-28 | 2022-11-15 | Brown University | Magnetic sensing devices based on interlayer exchange-coupled magnetic thin films |
| US11393495B2 (en) | 2020-03-26 | 2022-07-19 | Seagate Technology Llc | Reader with a multi-layer synthetic ferrimagnet free layer |
| US12040114B2 (en) | 2022-09-14 | 2024-07-16 | Western Digital Technologies, Inc. | Magnetoresistive device comprising a synthetic antiferromagnetic coupling layer of RuAl having a (001) texture |
| US12207563B2 (en) | 2022-09-23 | 2025-01-21 | Western Digital Technologies, Inc. | Magnetoresistive devices comprising a synthetic antiferromagnetic coupling layer of RuAl having a (110) texture |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6469926B1 (en) | 2000-03-22 | 2002-10-22 | Motorola, Inc. | Magnetic element with an improved magnetoresistance ratio and fabricating method thereof |
| JP2003283000A (ja) | 2002-03-27 | 2003-10-03 | Toshiba Corp | 磁気抵抗効果素子およびこれを有する磁気メモリ |
| JP2003324225A (ja) | 2002-04-26 | 2003-11-14 | Nec Corp | 積層フェリ型磁性薄膜並びにそれを使用した磁気抵抗効果素子及び強磁性トンネル素子 |
| JP2005116888A (ja) | 2003-10-09 | 2005-04-28 | Toshiba Corp | 磁気メモリ |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3293437B2 (ja) * | 1995-12-19 | 2002-06-17 | 松下電器産業株式会社 | 磁気抵抗効果素子、磁気抵抗効果型ヘッド及びメモリー素子 |
| KR19980042427A (ko) * | 1996-11-18 | 1998-08-17 | 다까노야스아끼 | 자기 저항 효과막 |
| DE19725922C2 (de) * | 1997-06-19 | 2000-07-20 | Gnb Gmbh | Verfahren zur Herstellung eines Behälters |
| US6738236B1 (en) * | 1998-05-07 | 2004-05-18 | Seagate Technology Llc | Spin valve/GMR sensor using synthetic antiferromagnetic layer pinned by Mn-alloy having a high blocking temperature |
| US6197439B1 (en) * | 1999-01-28 | 2001-03-06 | International Business Machines Corporation | Laminated magnetic structures with ultra-thin transition metal spacer layers |
| US6590806B1 (en) * | 2000-03-09 | 2003-07-08 | Hewlett-Packard Development Company, L.P. | Multibit magnetic memory element |
| JP4403337B2 (ja) * | 2000-05-30 | 2010-01-27 | ソニー株式会社 | トンネル磁気抵抗効果素子、及びトンネル磁気抵抗効果型磁気ヘッド |
| US6545906B1 (en) * | 2001-10-16 | 2003-04-08 | Motorola, Inc. | Method of writing to scalable magnetoresistance random access memory element |
| US6518588B1 (en) * | 2001-10-17 | 2003-02-11 | International Business Machines Corporation | Magnetic random access memory with thermally stable magnetic tunnel junction cells |
| JP2004103120A (ja) * | 2002-09-10 | 2004-04-02 | Hitachi Ltd | 差動バイアス型磁区制御構造を有する記録再生分離型磁気ヘッド |
-
2003
- 2003-12-18 US US10/740,338 patent/US6946697B2/en not_active Expired - Lifetime
-
2004
- 2004-11-04 KR KR1020067011933A patent/KR101122970B1/ko not_active Expired - Fee Related
- 2004-11-04 EP EP04810475A patent/EP1697996A2/en not_active Withdrawn
- 2004-11-04 CN CNB2004800374466A patent/CN100495723C/zh not_active Expired - Lifetime
- 2004-11-04 WO PCT/US2004/037058 patent/WO2005067472A2/en not_active Ceased
- 2004-11-04 JP JP2006545636A patent/JP4908227B2/ja not_active Expired - Lifetime
- 2004-12-14 TW TW093138819A patent/TWI370545B/zh not_active IP Right Cessation
-
2005
- 2005-07-15 US US11/182,149 patent/US7226796B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6469926B1 (en) | 2000-03-22 | 2002-10-22 | Motorola, Inc. | Magnetic element with an improved magnetoresistance ratio and fabricating method thereof |
| JP2003283000A (ja) | 2002-03-27 | 2003-10-03 | Toshiba Corp | 磁気抵抗効果素子およびこれを有する磁気メモリ |
| JP2003324225A (ja) | 2002-04-26 | 2003-11-14 | Nec Corp | 積層フェリ型磁性薄膜並びにそれを使用した磁気抵抗効果素子及び強磁性トンネル素子 |
| JP2005116888A (ja) | 2003-10-09 | 2005-04-28 | Toshiba Corp | 磁気メモリ |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070001912A (ko) | 2007-01-04 |
| JP2007515075A (ja) | 2007-06-07 |
| TWI370545B (en) | 2012-08-11 |
| EP1697996A2 (en) | 2006-09-06 |
| JP4908227B2 (ja) | 2012-04-04 |
| CN100495723C (zh) | 2009-06-03 |
| TW200532914A (en) | 2005-10-01 |
| CN1894801A (zh) | 2007-01-10 |
| WO2005067472A2 (en) | 2005-07-28 |
| WO2005067472A3 (en) | 2006-03-02 |
| US20050133840A1 (en) | 2005-06-23 |
| US6946697B2 (en) | 2005-09-20 |
| US20050247964A1 (en) | 2005-11-10 |
| US7226796B2 (en) | 2007-06-05 |
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| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
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| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| E13-X000 | Pre-grant limitation requested |
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