JP4894779B2 - 接着フィルム - Google Patents

接着フィルム Download PDF

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Publication number
JP4894779B2
JP4894779B2 JP2008035243A JP2008035243A JP4894779B2 JP 4894779 B2 JP4894779 B2 JP 4894779B2 JP 2008035243 A JP2008035243 A JP 2008035243A JP 2008035243 A JP2008035243 A JP 2008035243A JP 4894779 B2 JP4894779 B2 JP 4894779B2
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JP
Japan
Prior art keywords
adhesive film
adhesive
weight
film
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2008035243A
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English (en)
Japanese (ja)
Other versions
JP2008195943A (ja
Inventor
禎一 稲田
圭二 住谷
健男 富山
哲郎 岩倉
広幸 川上
雅雄 鈴木
隆行 松崎
羊一 細川
恵一 畠山
靖 島田
裕子 田中
弘之 栗谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2008035243A priority Critical patent/JP4894779B2/ja
Publication of JP2008195943A publication Critical patent/JP2008195943A/ja
Application granted granted Critical
Publication of JP4894779B2 publication Critical patent/JP4894779B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/145Organic substrates, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3114Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3737Organic materials with or without a thermoconductive filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/564Details not otherwise provided for, e.g. protection against moisture
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0271Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2666/00Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
    • C08L2666/02Organic macromolecular compounds, natural resins, waxes or and bituminous materials
    • C08L2666/04Macromolecular compounds according to groups C08L7/00 - C08L49/00, or C08L55/00 - C08L57/00; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00Presence of (meth)acrylic polymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2463/00Presence of epoxy resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01068Erbium [Er]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01087Francium [Fr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1089Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2839Web or sheet containing structurally defined element or component and having an adhesive outermost layer with release or antistick coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852Adhesive compositions
    • Y10T428/287Adhesive compositions including epoxy group or epoxy polymer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Die Bonding (AREA)
  • Epoxy Resins (AREA)
  • Laminated Bodies (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
JP2008035243A 2000-02-15 2008-02-15 接着フィルム Expired - Lifetime JP4894779B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008035243A JP4894779B2 (ja) 2000-02-15 2008-02-15 接着フィルム

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2000041346 2000-02-15
JP2000041346 2000-02-15
JP2000349739 2000-11-16
JP2000349739 2000-11-16
JP2000349737 2000-11-16
JP2000349737 2000-11-16
JP2008035243A JP4894779B2 (ja) 2000-02-15 2008-02-15 接着フィルム

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001560310A Division JP4839564B6 (ja) 2000-02-15 2001-02-15 接着フィルム及びその製造方法

Publications (2)

Publication Number Publication Date
JP2008195943A JP2008195943A (ja) 2008-08-28
JP4894779B2 true JP4894779B2 (ja) 2012-03-14

Family

ID=27342410

Family Applications (8)

Application Number Title Priority Date Filing Date
JP2008035249A Pending JP2008187189A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035248A Pending JP2008193105A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035244A Pending JP2008208367A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035243A Expired - Lifetime JP4894779B2 (ja) 2000-02-15 2008-02-15 接着フィルム
JP2008035247A Pending JP2008214631A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035246A Pending JP2008195944A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035245A Expired - Lifetime JP4858459B2 (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2010261408A Expired - Lifetime JP5549559B2 (ja) 2000-02-15 2010-11-24 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP2008035249A Pending JP2008187189A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035248A Pending JP2008193105A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035244A Pending JP2008208367A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置

Family Applications After (4)

Application Number Title Priority Date Filing Date
JP2008035247A Pending JP2008214631A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035246A Pending JP2008195944A (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2008035245A Expired - Lifetime JP4858459B2 (ja) 2000-02-15 2008-02-15 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置
JP2010261408A Expired - Lifetime JP5549559B2 (ja) 2000-02-15 2010-11-24 接着剤組成物、その製造方法、これを用いた接着フィルム、半導体搭載用基板及び半導体装置

Country Status (7)

Country Link
US (9) US20030069331A1 (ko)
JP (8) JP2008187189A (ko)
KR (16) KR20080087046A (ko)
CN (1) CN1208418C (ko)
AU (1) AU2001232298A1 (ko)
TW (1) TWI299748B (ko)
WO (1) WO2001060938A1 (ko)

Families Citing this family (144)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080087046A (ko) * 2000-02-15 2008-09-29 히다치 가세고교 가부시끼가이샤 접착제 조성물, 그 제조 방법, 이것을 이용한 접착 필름, 반도체 탑재용 기판 및 반도체 장치
US7061084B2 (en) * 2000-02-29 2006-06-13 Advanced Semiconductor Engineering, Inc. Lead-bond type chip package and manufacturing method thereof
JP5236134B2 (ja) * 2001-01-26 2013-07-17 日立化成株式会社 接着剤組成物、接着部材、半導体搭載用支持部材及び半導体装置等
US20030129438A1 (en) * 2001-12-14 2003-07-10 Becker Kevin Harris Dual cure B-stageable adhesive for die attach
JP2003238925A (ja) * 2002-02-19 2003-08-27 Hitachi Chem Co Ltd 接着剤組成物、接着フィルム
US6770371B2 (en) * 2002-07-08 2004-08-03 The Boeing Company Silane triol capped expoxy-amine adhesion promoter for adhesive-bonded metal substrates
JP4240448B2 (ja) * 2002-08-22 2009-03-18 三井金属鉱業株式会社 樹脂層付銅箔を用いた多層プリント配線板の製造方法
JP5274744B2 (ja) * 2002-09-30 2013-08-28 日立化成株式会社 フィルム状接着剤及びこれを用いた半導体装置
JP4529357B2 (ja) * 2003-02-26 2010-08-25 日立化成工業株式会社 接着シート、ならびにこれを用いた半導体装置およびその製造方法
KR101169182B1 (ko) * 2003-06-06 2012-07-30 히다치 가세고교 가부시끼가이샤 반도체 장치의 제조방법
JP4600640B2 (ja) * 2003-11-10 2010-12-15 信越化学工業株式会社 アクリル系接着剤シート
JP2005154687A (ja) * 2003-11-28 2005-06-16 Hitachi Chem Co Ltd 接着剤組成物、接着部材、半導体搭載用支持部材及び半導体装置
US20050126706A1 (en) * 2003-12-10 2005-06-16 Bunch Richard D. Non-corrosive low temperature liquid resist adhesive
EP1557880A1 (en) * 2004-01-21 2005-07-27 Nitto Denko Corporation Resin composition for encapsulating semiconductor
JP4934284B2 (ja) * 2004-03-15 2012-05-16 日立化成工業株式会社 ダイシングダイボンドシート
JP4141403B2 (ja) 2004-04-01 2008-08-27 富士通株式会社 半導体装置及び半導体装置の製造方法
JP4816871B2 (ja) * 2004-04-20 2011-11-16 日立化成工業株式会社 接着シート、半導体装置、及び半導体装置の製造方法
KR20070004100A (ko) 2004-04-20 2007-01-05 히다치 가세고교 가부시끼가이샤 접착시트, 반도체장치, 및 반도체장치의 제조방법
TW200617123A (en) * 2004-09-29 2006-06-01 Shinetsu Chemical Co Acrylic flame retardant adhesive composition and acrylic flame retardant adhesive sheet
US20060069200A1 (en) * 2004-09-29 2006-03-30 Shin-Etsu Chemical Co., Ltd. Acrylic adhesive composition and acrylic adhesive sheet
KR100635053B1 (ko) 2005-06-21 2006-10-16 도레이새한 주식회사 전자부품용 접착테이프
KR100637322B1 (ko) * 2004-10-22 2006-10-20 도레이새한 주식회사 전자부품용 접착테이프 조성물
US7332822B2 (en) * 2004-11-12 2008-02-19 Delphi Technologies, Inc. Flip chip system with organic/inorganic hybrid underfill composition
CN1327545C (zh) * 2004-12-09 2007-07-18 英赛尔科技(深圳)有限公司 用于制造软包装锂电池或聚合物锂电池的隔膜粘接胶
JP5030196B2 (ja) * 2004-12-16 2012-09-19 住友電気工業株式会社 回路接続用接着剤
JP2006182919A (ja) * 2004-12-28 2006-07-13 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置
US20060182949A1 (en) * 2005-02-17 2006-08-17 3M Innovative Properties Company Surfacing and/or joining method
JP2006233053A (ja) * 2005-02-25 2006-09-07 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置
KR100642889B1 (ko) * 2005-05-25 2006-11-03 엘에스전선 주식회사 반도체용 접착필름
US20060199301A1 (en) * 2005-03-07 2006-09-07 Basheer Rafil A Methods of making a curable composition having low coefficient of thermal expansion and an integrated circuit and a curable composition and integrated circuit made there from
US7790814B2 (en) * 2005-04-05 2010-09-07 Delphi Technologies, Inc. Radiopaque polymers for circuit board assembly
JP4839934B2 (ja) * 2005-05-13 2011-12-21 日立化成工業株式会社 硬化性樹脂組成物、プリプレグ、基板、金属箔張積層板、樹脂付金属箔及びプリント配線板
KR100646481B1 (ko) * 2005-06-15 2006-11-14 엘에스전선 주식회사 반도체용 접착제 조성물 및 이를 이용한 접착 필름
JP5288150B2 (ja) * 2005-10-24 2013-09-11 株式会社スリーボンド 有機el素子封止用熱硬化型組成物
JP4967359B2 (ja) * 2006-02-06 2012-07-04 住友ベークライト株式会社 樹脂組成物、樹脂フィルム、層間接着材および多層回路板
DE102006007108B4 (de) * 2006-02-16 2020-09-17 Lohmann Gmbh & Co. Kg Reaktive Harzmischung und Verfahren zu deren Herstellung
JP4687576B2 (ja) * 2006-02-28 2011-05-25 日立化成工業株式会社 回路接続用フィルム状接着剤
US20070212551A1 (en) * 2006-03-10 2007-09-13 Andrew Collins Adhesive composition
KR101370245B1 (ko) * 2006-05-23 2014-03-05 린텍 가부시키가이샤 점접착제 조성물, 점접착 시트 및 반도체장치의 제조방법
JP2008034787A (ja) * 2006-06-30 2008-02-14 Matsushita Electric Ind Co Ltd 固体撮像装置およびその製造方法、並びに半導体装置およびその製造方法
US8641957B2 (en) * 2006-07-05 2014-02-04 GM Global Technology Operations LLC Molding cosmetic composite panels with visible fibers from ultraviolent light resistant epoxy compositions
WO2008016889A1 (en) 2006-07-31 2008-02-07 Henkel Ag & Co. Kgaa Curable epoxy resin-based adhesive compositions
US20080063871A1 (en) * 2006-09-11 2008-03-13 Jung Ki S Adhesive film composition for semiconductor assembly, associated dicing die bonding film and semiconductor package
KR100909169B1 (ko) * 2006-09-11 2009-07-23 제일모직주식회사 선 경화형 반도체 조립용 접착 필름 조성물
US7498197B2 (en) * 2006-09-13 2009-03-03 Delphi Technologies, Inc. Silica nanoparticles thermoset resin compositions
WO2008045270A1 (en) * 2006-10-06 2008-04-17 Henkel Ag & Co. Kgaa Pumpable epoxy paste adhesives resistant to wash-off
KR20090090324A (ko) * 2006-11-02 2009-08-25 헨켈 아게 운트 코. 카게아아 성능 강화를 위해 열처리된 실리카 충전제를 갖는 조성물
KR20080047990A (ko) 2006-11-27 2008-05-30 린텍 가부시키가이샤 점접착제 조성물, 점접착 시트 및 반도체 장치의 제조방법
JP4458546B2 (ja) * 2006-12-07 2010-04-28 日東電工株式会社 両面接着性感圧接着シートの製造方法
KR100827057B1 (ko) * 2006-12-15 2008-05-02 엘에스전선 주식회사 다이 접착용 페이스트 조성물
DE102006061458B4 (de) * 2006-12-23 2014-06-18 Bostik Gmbh Verwendung einer selbstverlaufenden, wasserfreien Beschichtungsmasse und Fußboden, mit Laminat- oder Parkettpaneelen
JP5298428B2 (ja) * 2006-12-26 2013-09-25 Jnc株式会社 熱硬化性樹脂組成物及び硬化膜
US8008124B2 (en) * 2007-02-28 2011-08-30 Sumitomo Bakelite Co., Ltd. Adhesive film for semiconductor and semiconductor device using the adhesive film
KR100844383B1 (ko) 2007-03-13 2008-07-07 도레이새한 주식회사 반도체 칩 적층용 접착 필름
JP2008260908A (ja) * 2007-03-16 2008-10-30 Hitachi Chem Co Ltd 光導波路用接着剤組成物およびこれを用いた光導波路用接着フィルム、ならびにこれらを用いた光学装置
KR101101526B1 (ko) * 2007-03-16 2012-01-04 히다치 가세고교 가부시끼가이샤 광도파로용 접착제 조성물, 이것을 이용한 광도파로용 접착 필름 및 광도파로용 점접착 시트, 및 이들을 이용한 광학장치
JP2008247936A (ja) * 2007-03-29 2008-10-16 Lintec Corp 粘接着剤組成物、粘接着シートおよび半導体装置の製造方法
JP4737130B2 (ja) * 2007-04-13 2011-07-27 日立化成工業株式会社 半導体装置
KR101082448B1 (ko) * 2007-04-30 2011-11-11 주식회사 엘지화학 접착 수지 조성물 및 이를 이용한 다이싱 다이 본딩 필름
EP2173810A4 (en) * 2007-07-26 2012-07-25 Henkel Corp CURABLE ADHESIVE COMPOSITIONS BASED ON EPOXY RESIN
KR100934558B1 (ko) * 2007-10-08 2009-12-29 제일모직주식회사 실란커플링제와 선반응된 페놀형 경화수지를 포함하는반도체 조립용 접착 필름 조성물 및 이에 의한 접착 필름
KR20120007556A (ko) * 2007-10-09 2012-01-20 히다치 가세고교 가부시끼가이샤 접착 필름이 부착된 반도체칩의 제조 방법, 이 제조 방법에 사용되는 반도체용 접착 필름, 및 반도체 장치의 제조 방법
JP2009096851A (ja) * 2007-10-15 2009-05-07 Three M Innovative Properties Co 非導電性接着剤組成物及び非導電性接着フィルム、並びにそれらの製造方法及び使用方法
CN101779158A (zh) * 2007-10-18 2010-07-14 夏普株式会社 液晶显示装置
JP2009099825A (ja) * 2007-10-18 2009-05-07 Hitachi Chem Co Ltd 半導体装置接着剤用アクリル系樹脂及びアクリル系樹脂組成物
US20090117324A1 (en) * 2007-11-05 2009-05-07 Seong Choon Lim Electronic substrate having cavities and method of making
CN101821841B (zh) * 2007-11-08 2013-05-08 日立化成株式会社 半导体用粘接片及切割带一体型半导体用粘接片
TW200933866A (en) * 2008-01-16 2009-08-01 Lingsen Precision Ind Ltd Chip stacking method using light hardened glue
WO2009131405A2 (ko) * 2008-04-25 2009-10-29 (주)Lg화학 에폭시계 조성물, 접착 필름, 다이싱 다이본딩 필름 및 반도체 장치
EP2277194A1 (en) * 2008-05-08 2011-01-26 Basf Se Layered structures comprising silicon carbide layers, a process for their manufacture and their use
JP5361264B2 (ja) * 2008-07-04 2013-12-04 ローム株式会社 半導体装置
JP5298704B2 (ja) * 2008-08-26 2013-09-25 日立化成株式会社 アクリル樹脂組成物
JP4939574B2 (ja) 2008-08-28 2012-05-30 日東電工株式会社 熱硬化型ダイボンドフィルム
JP2010100840A (ja) * 2008-09-24 2010-05-06 Hitachi Chem Co Ltd 接着剤フィルム及び回路接続材料
JP5549182B2 (ja) * 2008-10-28 2014-07-16 日立化成株式会社 接着シート及びこれを用いた半導体装置の製造方法
US9721825B2 (en) 2008-12-02 2017-08-01 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University Method of providing a flexible semiconductor device and flexible semiconductor device thereof
US9991311B2 (en) 2008-12-02 2018-06-05 Arizona Board Of Regents On Behalf Of Arizona State University Dual active layer semiconductor device and method of manufacturing the same
US20140254113A1 (en) * 2008-12-02 2014-09-11 Arizona Board of Regents, a body corporate of the State of Arizona Acting for and on behalf of Arizo Method of providing an electronic device structure and related electronic device structures
JP5456441B2 (ja) * 2009-01-30 2014-03-26 日東電工株式会社 ダイシングテープ一体型ウエハ裏面保護フィルム
JP5805367B2 (ja) * 2009-01-30 2015-11-04 日東電工株式会社 ダイシングテープ一体型ウエハ裏面保護フィルム
JP5456440B2 (ja) * 2009-01-30 2014-03-26 日東電工株式会社 ダイシングテープ一体型ウエハ裏面保護フィルム
JP2010222390A (ja) * 2009-03-19 2010-10-07 Lintec Corp 接着剤組成物、接着シートおよび半導体装置の製造方法
WO2010110069A1 (ja) * 2009-03-23 2010-09-30 日立化成工業株式会社 ダイボンディング用樹脂ペースト、それを用いた半導体装置の製造方法、及び半導体装置
WO2010131655A1 (ja) * 2009-05-13 2010-11-18 日立化成工業株式会社 接着シート
JP5569126B2 (ja) * 2009-05-29 2014-08-13 日立化成株式会社 接着剤組成物、接着剤シート及び半導体装置の製造方法
JP5569121B2 (ja) * 2009-05-29 2014-08-13 日立化成株式会社 接着剤組成物、回路部材接続用接着剤シート及び半導体装置の製造方法
US9125603B2 (en) 2009-08-11 2015-09-08 Abbott Diabetes Care Inc. Analyte sensor ports
CN102020960A (zh) * 2009-09-14 2011-04-20 合正科技股份有限公司 高导热及低散逸系数的增层结合胶剂制法
CN102020959B (zh) * 2009-09-14 2014-03-19 合正科技股份有限公司 高导热及低散逸系数的增层结合胶剂
JP5565931B2 (ja) * 2009-10-01 2014-08-06 株式会社Adeka シリコンウエハ接着性樹脂組成物
JP5137937B2 (ja) * 2009-12-16 2013-02-06 日東電工株式会社 半導体装置製造用耐熱性粘着シート、該シートに用いる粘着剤、及び該シートを用いた半導体装置の製造方法
JP2011132430A (ja) * 2009-12-25 2011-07-07 Sekisui Chem Co Ltd 半導体チップ接合用接着剤、非導電性ペースト及び非導電性フィルム
KR101023241B1 (ko) * 2009-12-28 2011-03-21 제일모직주식회사 반도체용 접착제 조성물 및 이를 이용한 접착 필름
JP5844963B2 (ja) * 2010-03-19 2016-01-20 積水化学工業株式会社 電子部品用接着剤
WO2011125778A1 (ja) * 2010-04-01 2011-10-13 日立化成工業株式会社 接着剤組成物、接着シート及び半導体装置
JP5691244B2 (ja) * 2010-05-26 2015-04-01 日立化成株式会社 フィルム状接着剤、接着シート及び半導体装置
CN102959004B (zh) * 2010-06-21 2015-06-17 电气化学工业株式会社 丙烯酸类橡胶组合物、硫化物、软管部件、密封部件
JP5845559B2 (ja) * 2010-07-30 2016-01-20 住友ベークライト株式会社 接着体
KR101176957B1 (ko) 2010-09-30 2012-09-07 주식회사 케이씨씨 반도체 패키지 제작용 접착제 조성물 및 접착시트
CN103249559B (zh) * 2010-11-18 2015-08-05 日立化成株式会社 半导体密封填充用膜状树脂组合物、半导体装置的制造方法和半导体装置
EP2644677B1 (en) * 2010-11-23 2020-11-04 LG Chem, Ltd. Adhesive composition
JP5398083B2 (ja) * 2011-03-11 2014-01-29 日東電工株式会社 ダイボンドフィルム及びその用途
JP5866152B2 (ja) * 2011-06-30 2016-02-17 スリーエム イノベイティブ プロパティズ カンパニー 貫通孔を有する窓貼り用積層フィルム
US20140131691A1 (en) * 2011-07-06 2014-05-15 Mitsui Chemicals, Inc. Polymerizable epoxy composition and organic el device
KR102007545B1 (ko) * 2011-07-07 2019-08-05 히타치가세이가부시끼가이샤 접착 필름, 상기 접착 필름을 이용한 다층 인쇄 배선판, 및 상기 다층 인쇄 배선판의 제조 방법
US20130042976A1 (en) * 2011-08-19 2013-02-21 Harris Corporation Film adhesives and processes for bonding components using same
JP5626179B2 (ja) * 2011-10-24 2014-11-19 日立化成株式会社 フィルム状接着剤及びこれを用いた半導体装置
KR101391083B1 (ko) * 2011-12-27 2014-05-02 (주)엘지하우시스 전자종이용 점접착 조성물
WO2013103282A1 (ko) * 2012-01-06 2013-07-11 주식회사 엘지화학 봉지용 필름
US9212298B2 (en) * 2012-03-08 2015-12-15 Hitachi Chemical Company, Ltd. Adhesive sheet and method for manufacturing semiconductor device
DE112013001810T5 (de) 2012-03-30 2014-12-18 Waters Technologies Corporation Probenträger für getrocknete biologische Proben
US8715391B2 (en) * 2012-04-10 2014-05-06 Milliken & Company High temperature filter
TWI633164B (zh) 2012-08-03 2018-08-21 Lg化學股份有限公司 黏合膜與使用彼之有機電子裝置的包封產物
US9157014B2 (en) 2012-11-29 2015-10-13 Micron Technology, Inc. Adhesives including a filler material and related methods
JP6364191B2 (ja) * 2012-12-06 2018-07-25 積水化学工業株式会社 導電材料、接続構造体及び接続構造体の製造方法
KR102346224B1 (ko) 2013-08-02 2021-12-31 린텍 가부시키가이샤 접착제 조성물, 접착 시트 및 반도체 장치의 제조 방법
CN105579546B (zh) * 2013-09-27 2019-02-22 株式会社大赛璐 半导体叠层用粘接剂组合物
US9576872B2 (en) * 2013-12-18 2017-02-21 Infineon Technologies Ag Semiconductor devices and methods for manufacturing semiconductor devices
US10381224B2 (en) 2014-01-23 2019-08-13 Arizona Board Of Regents On Behalf Of Arizona State University Method of providing an electronic device and electronic device thereof
WO2017034645A2 (en) 2015-06-09 2017-03-02 ARIZONA BOARD OF REGENTS, a body corporate for THE STATE OF ARIZONA for and on behalf of ARIZONA STATE UNIVERSITY Method of providing an electronic device and electronic device thereof
WO2015175353A1 (en) 2014-05-13 2015-11-19 Arizona Board Of Regents, For And On Behalf Of Arizona State University Method of providing an electronic device and electronic device thereof
WO2015156891A2 (en) 2014-01-23 2015-10-15 Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University Method of providing a flexible semiconductor device and flexible semiconductor device thereof
KR102141721B1 (ko) * 2014-01-24 2020-08-05 도레이첨단소재 주식회사 고효율 방열접착재료 및 그의 제조방법
CN105981138B (zh) * 2014-02-14 2018-12-28 三井化学东赛璐株式会社 半导体晶片表面保护用粘着膜、以及使用粘着膜的半导体晶片的保护方法和半导体装置的制造方法
JP6013406B2 (ja) * 2014-07-24 2016-10-25 株式会社タムラ製作所 接着剤組成物および電子部品の接合方法
JP6451204B2 (ja) * 2014-10-22 2019-01-16 日立化成株式会社 樹脂組成物、プリプレグ、樹脂付き金属箔、及びこれらを用いた積層板及びプリント配線板
US10446582B2 (en) 2014-12-22 2019-10-15 Arizona Board Of Regents On Behalf Of Arizona State University Method of providing an imaging system and imaging system thereof
US9741742B2 (en) 2014-12-22 2017-08-22 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University Deformable electronic device and methods of providing and using deformable electronic device
KR101799499B1 (ko) 2014-12-24 2017-12-20 주식회사 엘지화학 반도체 접착용 수지 조성물, 접착 필름, 다이싱 다이본딩 필름 및 반도체 장치
WO2016105134A1 (ko) * 2014-12-24 2016-06-30 주식회사 엘지화학 반도체 접착용 수지 조성물, 접착 필름, 다이싱 다이본딩 필름 및 반도체 장치
JP6883937B2 (ja) * 2015-03-19 2021-06-09 日東電工株式会社 封止用シートおよび中空パッケージの製造方法
WO2017010754A1 (ko) * 2015-07-10 2017-01-19 주식회사 엘지화학 반도체 접착용 수지 조성물 및 다이싱 다이본딩 필름
JP6619445B2 (ja) 2015-07-10 2019-12-11 エルジー・ケム・リミテッド 半導体接着用樹脂組成物およびダイシングダイボンディングフィルム
SG11201803243UA (en) * 2015-11-04 2018-05-30 Lintec Corp Curable resin film and first protective film forming sheet
EP3373326A4 (en) * 2015-11-04 2019-07-10 Lintec Corporation CURABLE RESIN FILM AND FIRST PROTECTIVE FILM FORMING SHEET
KR20170053416A (ko) * 2015-11-06 2017-05-16 주식회사 엘지화학 반도체 장치 및 반도체 장치의 제조 방법
JP6710955B2 (ja) * 2015-12-16 2020-06-17 味の素株式会社 プリプレグ
JP6512133B2 (ja) * 2016-02-25 2019-05-15 株式会社オートネットワーク技術研究所 電線保護部材及びその製造方法並びにワイヤーハーネス
KR102204964B1 (ko) * 2018-04-17 2021-01-19 주식회사 엘지화학 반도체 회로 접속용 접착제 조성물 및 이를 포함한 접착 필름
US11158594B2 (en) 2019-11-12 2021-10-26 Samsung Electronics Co., Ltd. Semiconductor packages having improved reliability in bonds between connection conductors and pads
JP6893576B2 (ja) * 2019-12-02 2021-06-23 日本メクトロン株式会社 接着フィルム及びフレキシブルプリント基板
WO2021124857A1 (ja) * 2019-12-20 2021-06-24 株式会社アイセロ 熱可塑型接着剤組成物
WO2023180858A1 (en) * 2022-03-22 2023-09-28 Ricoh Company, Ltd. Adhesive structure and manufacturing method thereof, electronic component and manufacturing method thereof, and adhesive layer for transfer
WO2023210471A1 (ja) * 2022-04-28 2023-11-02 富士フイルム株式会社 フィルム及び積層体

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3496042A (en) * 1966-03-30 1970-02-17 Porvair Ltd Process for making a porous polyurethane-fabric laminate
JPS59105018A (ja) * 1982-12-07 1984-06-18 Toshiba Chem Corp 封止用樹脂組成物
GB8309993D0 (en) * 1983-04-13 1983-05-18 Smith & Nephew Ass Surgical adhesive dressing
JPS61138680A (ja) 1984-12-10 1986-06-26 Sumitomo Bakelite Co Ltd フレキシブル印刷回路用基板
JPH0629394B2 (ja) * 1987-05-29 1994-04-20 信越化学工業株式会社 カバ−レイフイルム
US5024880A (en) * 1990-01-03 1991-06-18 Minnesota Mining And Manufacturing Company Cellular pressure-sensitive adhesive membrane
US5294668A (en) * 1990-11-15 1994-03-15 Minnesota Mining And Manufacturing Company Polyolefin pressure-sensitive adhesive compositions containing macromonomers
JPH04223007A (ja) 1990-12-25 1992-08-12 Sumitomo Bakelite Co Ltd 半導体用導電性樹脂ペースト
JPH05171073A (ja) * 1991-12-20 1993-07-09 Toshiba Chem Corp 導電性ペースト
US5202361A (en) * 1991-12-23 1993-04-13 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive
JPH05315743A (ja) * 1992-05-08 1993-11-26 Nitto Denko Corp フレキシブルプリント回路板用接着剤組成物
JP3063935B2 (ja) * 1992-05-12 2000-07-12 宇部興産株式会社 接着性、耐熱性および耐カ−ル性を兼ね備えたポリイミドシロキサン組成物
JPH06104566A (ja) 1992-09-22 1994-04-15 Kanegafuchi Chem Ind Co Ltd 電気用金属箔張積層板
JP2512859B2 (ja) * 1993-04-19 1996-07-03 東芝ケミカル株式会社 半導体素子の取付け方法
US5519177A (en) * 1993-05-19 1996-05-21 Ibiden Co., Ltd. Adhesives, adhesive layers for electroless plating and printed circuit boards
US5356993A (en) * 1993-07-12 1994-10-18 Shell Oil Company Coreactive conjugated diene polymer compositions which phase separate when cured
JPH07147010A (ja) * 1993-09-28 1995-06-06 Toshiba Corp モータ装置
JPH0841438A (ja) * 1994-07-27 1996-02-13 Sumitomo Bakelite Co Ltd 低温加工性の優れた耐熱性フィルム接着剤及びその製造方法
US5550196A (en) * 1994-11-09 1996-08-27 Shell Oil Company Low viscosity adhesive compositions containing asymmetric radial polymers
JPH08157572A (ja) * 1994-12-07 1996-06-18 Mitsui Toatsu Chem Inc 変性フェノールアラルキル樹脂およびその製造方法
JPH08165410A (ja) * 1994-12-15 1996-06-25 Hitachi Chem Co Ltd 導電性樹脂ペースト組成物および半導体装置
WO1996031574A1 (fr) 1995-04-04 1996-10-10 Hitachi Chemical Company, Ltd. Adhesif, pellicule adhesive et feuille metallique a envers adhesif
TW340967B (en) * 1996-02-19 1998-09-21 Toray Industries An adhesive sheet for a semiconductor to connect with a substrate, and adhesive sticking tape for tab, an adhesive sticking tape for wire bonding connection, a substrate for connecting with a semiconductor and a semiconductor device
JP3700243B2 (ja) * 1996-05-08 2005-09-28 東レ株式会社 Tab用接着剤付きテープおよび半導体装置
JPH1017870A (ja) * 1996-06-28 1998-01-20 Nippon Steel Corp コークス乾式消火設備のスローピングフリュー部構造
EP0831528A3 (en) * 1996-09-10 1999-12-22 Hitachi Chemical Company, Ltd. Multilayer wiring board for mounting semiconductor device and method of producing the same
TW422874B (en) * 1996-10-08 2001-02-21 Hitachi Chemical Co Ltd Semiconductor device, semiconductor chip mounting substrate, methods of manufacturing the device and substrate, adhesive, and adhesive double coated film
JPH10178070A (ja) * 1996-10-15 1998-06-30 Toray Ind Inc 半導体装置用接着剤組成物およびそれを用いた半導体装置用接着剤シート
EP0841339B1 (en) * 1996-11-06 2007-02-21 Basilea Pharmaceutica AG Vinylpyrrolidinon cephalosporin derivatives
JP3792327B2 (ja) * 1996-12-24 2006-07-05 日立化成工業株式会社 熱伝導性接着剤組成物及び該組成物を用いた熱伝導性接着フィルム
JPH10275891A (ja) 1997-03-28 1998-10-13 Hitachi Ltd 半導体装置
JPH10330724A (ja) * 1997-05-30 1998-12-15 Hitachi Chem Co Ltd 耐熱接着剤、耐熱接着剤層付き半導体チップ、耐熱接着剤層付きリードフレーム、耐熱接着剤層付きフィルム及び半導体装置
JP3915940B2 (ja) 1997-06-10 2007-05-16 日立化成工業株式会社 絶縁層用接着フィルム
JPH111670A (ja) 1997-06-13 1999-01-06 Nippon Shokubai Co Ltd 粘着製品
US6302994B1 (en) * 1997-06-18 2001-10-16 Toagosei Co., Ltd. Process for producing labeled article
US5997682A (en) * 1997-08-27 1999-12-07 Science Research Laboratory Phase-separated dual-cure elastomeric adhesive formulations and methods of using the same
JPH11140386A (ja) * 1997-11-14 1999-05-25 Hitachi Chem Co Ltd 接着フィルム、その製造法、接着フィルム付き支持部材及び半導体装置
JPH11209724A (ja) * 1998-01-30 1999-08-03 Hitachi Chem Co Ltd 難燃化接着剤、難燃化接着部材、難燃化接着部材を備えた半導体搭載用配線基板及びこれを用いた半導体装置
JP3994498B2 (ja) * 1998-01-30 2007-10-17 日立化成工業株式会社 半導体装置の製造方法
KR100530519B1 (ko) * 1998-02-17 2006-04-21 주식회사 새 한 전자부품용 접착테이프의 제조방법
JPH11260838A (ja) 1998-03-09 1999-09-24 Hitachi Chem Co Ltd 両面接着フィルムを用いて作製した半導体装置
JPH11284114A (ja) 1998-03-27 1999-10-15 Hitachi Chem Co Ltd 半導体装置
JPH11315189A (ja) * 1998-05-07 1999-11-16 Fujitsu Ltd 半導体装置封止用樹脂組成物及びこれを用いた半導体装置
JP4049452B2 (ja) * 1998-07-02 2008-02-20 日東電工株式会社 半導体素子用接着シートおよびそれを用いた半導体装置
JP4275221B2 (ja) * 1998-07-06 2009-06-10 リンテック株式会社 粘接着剤組成物および粘接着シート
JP3678007B2 (ja) * 1998-07-10 2005-08-03 松下電器産業株式会社 電子部品実装装置における電子部品認識装置および電子部品認識方法
EP1209211B1 (en) * 1999-06-18 2006-01-25 Hitachi Chemical Company, Ltd. Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same
JP2001302998A (ja) * 2000-02-15 2001-10-31 Hitachi Chem Co Ltd 接着フィルムおよびその用途
KR20080087046A (ko) * 2000-02-15 2008-09-29 히다치 가세고교 가부시끼가이샤 접착제 조성물, 그 제조 방법, 이것을 이용한 접착 필름, 반도체 탑재용 기판 및 반도체 장치
TWI245791B (en) * 2000-03-31 2005-12-21 Hitachi Chemical Co Ltd Adhesive films, and semiconductor devices using the same
JP3913481B2 (ja) * 2001-01-24 2007-05-09 シャープ株式会社 半導体装置および半導体装置の製造方法
KR20090077860A (ko) * 2004-05-18 2009-07-15 히다치 가세고교 가부시끼가이샤 점접착 시트

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