JP4893367B2 - 薄膜磁気デバイス - Google Patents
薄膜磁気デバイス Download PDFInfo
- Publication number
- JP4893367B2 JP4893367B2 JP2007047172A JP2007047172A JP4893367B2 JP 4893367 B2 JP4893367 B2 JP 4893367B2 JP 2007047172 A JP2007047172 A JP 2007047172A JP 2007047172 A JP2007047172 A JP 2007047172A JP 4893367 B2 JP4893367 B2 JP 4893367B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- thin film
- coil
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 106
- 239000010408 film Substances 0.000 claims abstract description 104
- 230000005415 magnetization Effects 0.000 claims abstract description 71
- 230000005381 magnetic domain Effects 0.000 claims description 43
- 230000035699 permeability Effects 0.000 abstract description 58
- 238000004519 manufacturing process Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000004804 winding Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BDVUYXNQWZQBBN-UHFFFAOYSA-N [Co].[Zr].[Nb] Chemical compound [Co].[Zr].[Nb] BDVUYXNQWZQBBN-UHFFFAOYSA-N 0.000 description 1
- ZGWQKLYPIPNASE-UHFFFAOYSA-N [Co].[Zr].[Ta] Chemical compound [Co].[Zr].[Ta] ZGWQKLYPIPNASE-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Landscapes
- Thin Magnetic Films (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Coils Or Transformers For Communication (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007047172A JP4893367B2 (ja) | 2006-03-31 | 2007-02-27 | 薄膜磁気デバイス |
| US11/730,152 US7791836B2 (en) | 2006-03-31 | 2007-03-29 | Thin film magnetic device having strip-shaped magnetic films with their magnetization easy axes arranged orthogonal to a thin film coil and method of manufacturing the same |
| CN200710092142.5A CN101071678B (zh) | 2006-03-31 | 2007-04-02 | 薄膜磁器件及其制造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006098630 | 2006-03-31 | ||
| JP2006098630 | 2006-03-31 | ||
| JP2007047172A JP4893367B2 (ja) | 2006-03-31 | 2007-02-27 | 薄膜磁気デバイス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007294882A JP2007294882A (ja) | 2007-11-08 |
| JP2007294882A5 JP2007294882A5 (enExample) | 2010-03-11 |
| JP4893367B2 true JP4893367B2 (ja) | 2012-03-07 |
Family
ID=38765146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007047172A Expired - Fee Related JP4893367B2 (ja) | 2006-03-31 | 2007-02-27 | 薄膜磁気デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4893367B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5622262B2 (ja) * | 2010-03-12 | 2014-11-12 | 独立行政法人国立高等専門学校機構 | 磁性薄膜を用いた伝送線路デバイス |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3441082B2 (ja) * | 1990-05-31 | 2003-08-25 | 株式会社東芝 | 平面型磁気素子 |
| JP3392444B2 (ja) * | 1992-09-30 | 2003-03-31 | 株式会社東芝 | 磁性人工格子膜 |
| JP3130407B2 (ja) * | 1993-05-24 | 2001-01-31 | 三菱電機株式会社 | 磁性膜の製法および薄膜磁気ヘッド |
| JP3229718B2 (ja) * | 1993-06-11 | 2001-11-19 | ティーディーケイ株式会社 | 軟磁性合金、軟磁性薄膜および多層膜 |
| JP2694114B2 (ja) * | 1994-02-28 | 1997-12-24 | 株式会社アモルファス・電子デバイス研究所 | 薄膜磁気素子及びその製造方法 |
| JPH08227813A (ja) * | 1994-12-05 | 1996-09-03 | Sony Corp | 軟磁性薄膜及びこれを用いた薄膜磁気ヘッド |
| JP3432667B2 (ja) * | 1996-02-29 | 2003-08-04 | シャープ株式会社 | 高密度磁気記録ヘッド用軟磁性薄膜 |
| JPH11354323A (ja) * | 1998-06-05 | 1999-12-24 | Mitsubishi Electric Corp | インダクタ |
| JP3676579B2 (ja) * | 1998-08-05 | 2005-07-27 | ミネベア株式会社 | 磁気インピーダンス素子 |
| JP2000269035A (ja) * | 1999-03-15 | 2000-09-29 | Toshiba Corp | 平面磁気素子 |
-
2007
- 2007-02-27 JP JP2007047172A patent/JP4893367B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007294882A (ja) | 2007-11-08 |
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