JP4885154B2 - 複数波長による表面形状の測定方法およびこれを用いた装置 - Google Patents

複数波長による表面形状の測定方法およびこれを用いた装置 Download PDF

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Publication number
JP4885154B2
JP4885154B2 JP2008008233A JP2008008233A JP4885154B2 JP 4885154 B2 JP4885154 B2 JP 4885154B2 JP 2008008233 A JP2008008233 A JP 2008008233A JP 2008008233 A JP2008008233 A JP 2008008233A JP 4885154 B2 JP4885154 B2 JP 4885154B2
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Japan
Prior art keywords
pixel
surface shape
light
intensity value
wavelengths
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Expired - Fee Related
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JP2008008233A
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English (en)
Japanese (ja)
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JP2008209404A (ja
Inventor
克一 北川
将 杉山
英光 小川
一嘉 鈴木
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Tokyo Institute of Technology NUC
Toray Engineering Co Ltd
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Tokyo Institute of Technology NUC
Toray Engineering Co Ltd
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Application filed by Tokyo Institute of Technology NUC, Toray Engineering Co Ltd filed Critical Tokyo Institute of Technology NUC
Priority to JP2008008233A priority Critical patent/JP4885154B2/ja
Priority to KR1020080008642A priority patent/KR20080071905A/ko
Priority to TW097103198A priority patent/TW200839177A/zh
Priority to CN2008100057818A priority patent/CN101236067B/zh
Publication of JP2008209404A publication Critical patent/JP2008209404A/ja
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Publication of JP4885154B2 publication Critical patent/JP4885154B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G01B9/02009—Two or more frequencies or sources used for interferometric measurement by using two or more low coherence lengths using different or varying spectral width
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02029—Combination with non-interferometric systems, i.e. for measuring the object
    • G01B9/0203—With imaging systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02032—Interferometers characterised by the beam path configuration generating a spatial carrier frequency, e.g. by creating lateral or angular offset between reference and object beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2008008233A 2007-01-31 2008-01-17 複数波長による表面形状の測定方法およびこれを用いた装置 Expired - Fee Related JP4885154B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008008233A JP4885154B2 (ja) 2007-01-31 2008-01-17 複数波長による表面形状の測定方法およびこれを用いた装置
KR1020080008642A KR20080071905A (ko) 2007-01-31 2008-01-28 복수파장에 의한 표면형상의 측정방법 및 이를 이용한 장치
TW097103198A TW200839177A (en) 2007-01-31 2008-01-29 A measurement method of surface shape with plural wavelengths and an apparatus using the same method
CN2008100057818A CN101236067B (zh) 2007-01-31 2008-01-31 用多波长来测量表面形状测量方法和使用此方法的装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007021870 2007-01-31
JP2007021870 2007-01-31
JP2008008233A JP4885154B2 (ja) 2007-01-31 2008-01-17 複数波長による表面形状の測定方法およびこれを用いた装置

Publications (2)

Publication Number Publication Date
JP2008209404A JP2008209404A (ja) 2008-09-11
JP4885154B2 true JP4885154B2 (ja) 2012-02-29

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JP2008008233A Expired - Fee Related JP4885154B2 (ja) 2007-01-31 2008-01-17 複数波長による表面形状の測定方法およびこれを用いた装置

Country Status (4)

Country Link
JP (1) JP4885154B2 (ko)
KR (1) KR20080071905A (ko)
CN (1) CN101236067B (ko)
TW (1) TW200839177A (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5701159B2 (ja) * 2010-06-24 2015-04-15 東レエンジニアリング株式会社 干渉縞モデル適合による表面形状測定方法およびその装置
JP2012078269A (ja) * 2010-10-05 2012-04-19 Naoyuki Furuyama 測距方法及びレーザ測距装置
JP2013068489A (ja) * 2011-09-21 2013-04-18 Toray Eng Co Ltd 複数波長による表面形状測定方法およびこれを用いた装置
JP5954979B2 (ja) * 2011-12-15 2016-07-20 キヤノン株式会社 多波長干渉計を有する計測装置
WO2013088871A1 (ja) * 2011-12-16 2013-06-20 東レエンジニアリング株式会社 干渉色のモデル適合による膜厚測定方法およびその装置
US9147102B2 (en) * 2012-01-02 2015-09-29 Camtek Ltd. Method and system for measuring bumps based on phase and amplitude information
DE102012002174B4 (de) * 2012-02-07 2014-05-15 Schott Ag Vorrichtung und Verfahren zum Erkennen von Fehlstellen innerhalb des Volumens einer transparenten Scheibe und Verwendung der Vorrichtung
KR101341620B1 (ko) * 2012-06-14 2013-12-13 전자부품연구원 3차원 형상 측정 시스템 및 방법
JP5997578B2 (ja) * 2012-10-19 2016-09-28 東レエンジニアリング株式会社 クロストーク補正係数算出方法およびクロストーク補正係数算出機能を備えた透明膜の膜厚測定装置
CN103267494B (zh) * 2013-05-20 2015-11-04 湖北工业大学 一种表面形貌干涉测量的方法及装置
TWI467129B (zh) * 2014-01-07 2015-01-01 China Steel Corp 鑄嘴平坦度之檢測方法
JP6351289B2 (ja) * 2014-02-18 2018-07-04 Ntn株式会社 表面形状測定装置、方法およびプログラム
JP6126640B2 (ja) * 2015-05-11 2017-05-10 Ckd株式会社 三次元計測装置及び三次元計測方法
CN105021137B (zh) * 2015-06-30 2017-11-07 西安空间无线电技术研究所 一种快速转镜动态面形的测试系统
WO2017047605A1 (ja) * 2015-09-15 2017-03-23 日本碍子株式会社 複合基板及び圧電基板の厚み傾向推定方法
TWI579525B (zh) * 2015-12-23 2017-04-21 國立臺灣大學 運動物件之絕對定位距離與偏擺角度同步量測之光學系統與方法
WO2017168469A1 (ja) * 2016-03-28 2017-10-05 パナソニックＩｐマネジメント株式会社 外観検査装置と外観検査方法
KR101804527B1 (ko) * 2016-05-20 2017-12-05 주식회사 미르기술 다파장 광 주사 간섭계를 이용한 3차원 형상 측정장치
JP6246875B1 (ja) * 2016-08-24 2017-12-13 Ckd株式会社 計測装置
CN107966453B (zh) * 2016-10-20 2020-08-04 上海微电子装备（集团）股份有限公司 一种芯片缺陷检测装置及检测方法
CN108122797A (zh) * 2016-11-29 2018-06-05 上海微电子装备（集团）股份有限公司 一种3d检测装置
JP2019060683A (ja) * 2017-09-26 2019-04-18 東レエンジニアリング株式会社 塗布液滴の特性評価装置
CN110118533B (zh) * 2018-02-05 2021-08-03 上海微电子装备（集团）股份有限公司 一种三维检测方法及检测装置
CN108871206B (zh) * 2018-08-23 2021-06-22 业成科技（成都）有限公司 表面测量方法以及表面量测装置
CN109099859B (zh) * 2018-09-26 2021-07-27 中国科学院上海光学精密机械研究所 大口径光学元件表面缺陷三维形貌测量装置和方法
JP7257162B2 (ja) * 2019-02-08 2023-04-13 株式会社キーエンス 検査装置
SG11202109905QA (en) * 2019-03-21 2021-10-28 Mit Semiconductor Pte Ltd Method of Color Inspection by Using Monochrome Imaging With Multiple Wavelengths of Light
JP7279596B2 (ja) * 2019-09-24 2023-05-23 株式会社デンソーウェーブ 三次元計測装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282205A (ja) * 1986-05-31 1987-12-08 Toshiba Corp 物体の形状誤差を測定する方法およびその装置
JPH11218411A (ja) * 1998-02-02 1999-08-10 Fuji Xerox Co Ltd 干渉計測方法および干渉計測装置
JP4183089B2 (ja) * 2004-09-16 2008-11-19 東レエンジニアリング株式会社 表面形状および／または膜厚測定方法およびその装置
CN100363710C (zh) * 2005-04-15 2008-01-23 天津大学 基于相移干涉图像序列解析的微结构三维信息获取方法
JP4710078B2 (ja) * 2006-02-01 2011-06-29 国立大学法人東京工業大学 表面形状の測定方法およびこれを用いた装置

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Publication number Publication date
KR20080071905A (ko) 2008-08-05
JP2008209404A (ja) 2008-09-11
TW200839177A (en) 2008-10-01
CN101236067B (zh) 2011-02-16
CN101236067A (zh) 2008-08-06

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