JP4879548B2 - 高周波電源装置 - Google Patents
高周波電源装置 Download PDFInfo
- Publication number
- JP4879548B2 JP4879548B2 JP2005289437A JP2005289437A JP4879548B2 JP 4879548 B2 JP4879548 B2 JP 4879548B2 JP 2005289437 A JP2005289437 A JP 2005289437A JP 2005289437 A JP2005289437 A JP 2005289437A JP 4879548 B2 JP4879548 B2 JP 4879548B2
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- signal
- oscillation
- power supply
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Control Of Amplification And Gain Control (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005289437A JP4879548B2 (ja) | 2005-09-30 | 2005-09-30 | 高周波電源装置 |
| US11/536,171 US7615983B2 (en) | 2005-09-30 | 2006-09-28 | High frequency power device for protecting an amplifying element therein |
| KR1020060095688A KR101293877B1 (ko) | 2005-09-30 | 2006-09-29 | 고주파 전원 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005289437A JP4879548B2 (ja) | 2005-09-30 | 2005-09-30 | 高周波電源装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007103102A JP2007103102A (ja) | 2007-04-19 |
| JP2007103102A5 JP2007103102A5 (enExample) | 2008-10-30 |
| JP4879548B2 true JP4879548B2 (ja) | 2012-02-22 |
Family
ID=37942151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005289437A Expired - Lifetime JP4879548B2 (ja) | 2005-09-30 | 2005-09-30 | 高周波電源装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7615983B2 (enExample) |
| JP (1) | JP4879548B2 (enExample) |
| KR (1) | KR101293877B1 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7517437B2 (en) * | 2006-03-29 | 2009-04-14 | Applied Materials, Inc. | RF powered target for increasing deposition uniformity in sputtering systems |
| JP5090986B2 (ja) * | 2008-03-26 | 2012-12-05 | 株式会社ダイヘン | 高周波電源装置 |
| JP4932787B2 (ja) * | 2008-05-30 | 2012-05-16 | 株式会社ダイヘン | 高周波電源装置 |
| JP5283475B2 (ja) * | 2008-10-21 | 2013-09-04 | Sppテクノロジーズ株式会社 | プラズマ制御用電源装置 |
| JP5398058B2 (ja) * | 2008-10-31 | 2014-01-29 | 株式会社ダイヘン | 高周波電源装置 |
| JP5595134B2 (ja) * | 2010-06-11 | 2014-09-24 | 富士フイルム株式会社 | ドライエッチング装置及びドライエッチング方法 |
| JP5729693B2 (ja) | 2011-03-30 | 2015-06-03 | 株式会社ダイヘン | 高周波電源装置 |
| JP2013223380A (ja) * | 2012-04-18 | 2013-10-28 | Sony Corp | 送電装置、非接触電力伝送システムおよび信号生成方法 |
| JP6219057B2 (ja) * | 2013-04-02 | 2017-10-25 | 株式会社ダイヘン | 高周波電源 |
| JP6342235B2 (ja) * | 2014-03-19 | 2018-06-13 | 株式会社ダイヘン | 高周波電源 |
| US9947514B2 (en) | 2015-09-01 | 2018-04-17 | Mks Instruments, Inc. | Plasma RF bias cancellation system |
| JP6761173B2 (ja) * | 2016-08-15 | 2020-09-23 | 富士通株式会社 | 無線解析装置、無線解析方法、及びプログラム |
| KR101927439B1 (ko) * | 2017-01-04 | 2018-12-10 | 주식회사 메디플 | 플라즈마 생성을 위한 전력 공급 장치 |
| CN110504149B (zh) * | 2018-05-17 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 射频电源的脉冲调制系统及方法 |
| JP6842443B2 (ja) * | 2018-06-22 | 2021-03-17 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマを生成する方法 |
| JP7437142B2 (ja) * | 2019-11-25 | 2024-02-22 | 株式会社ダイヘン | 高周波電源システム |
| CN113394067A (zh) * | 2020-03-13 | 2021-09-14 | Asm Ip私人控股有限公司 | 基板处理设备 |
| JP7383533B2 (ja) | 2020-03-16 | 2023-11-20 | 株式会社京三製作所 | 高周波電源装置及びその出力制御方法 |
| JP7544594B2 (ja) * | 2020-12-25 | 2024-09-03 | 株式会社ダイヘン | 高周波電源システム |
| WO2022163535A1 (ja) * | 2021-01-29 | 2022-08-04 | 東京エレクトロン株式会社 | プラズマ処理装置及びソース高周波電力のソース周波数を制御する方法 |
| JP7763099B2 (ja) * | 2021-12-28 | 2025-10-31 | 株式会社ダイヘン | 高周波電源装置 |
| JP2023098297A (ja) | 2021-12-28 | 2023-07-10 | 株式会社ダイヘン | 高周波電源装置 |
| JP2024094846A (ja) | 2022-12-28 | 2024-07-10 | 株式会社ダイヘン | 高周波電源装置 |
| JP2024095373A (ja) * | 2022-12-28 | 2024-07-10 | 株式会社ダイヘン | 高周波電力供給システム |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08236294A (ja) * | 1995-02-28 | 1996-09-13 | Jeol Ltd | 高周波プラズマ応用装置 |
| JP3220383B2 (ja) * | 1996-07-23 | 2001-10-22 | 東京エレクトロン株式会社 | プラズマ処理装置及びその方法 |
| ATE352123T1 (de) * | 1997-09-17 | 2007-02-15 | Tokyo Electron Ltd | System und verfahren zur anpassung von elektrischen impedanzen |
| GB9817675D0 (en) * | 1998-08-13 | 1998-10-07 | Simoco Int Ltd | Error correction in amplifiers |
| JP2000144416A (ja) * | 1998-11-06 | 2000-05-26 | Sanyo Shinku Kogyo Kk | 電力印加装置および電力印加方法 |
| JP2000150478A (ja) * | 1998-11-12 | 2000-05-30 | Matsushita Electronics Industry Corp | プラズマ発生方法及びプラズマ発生装置 |
| JP2002026137A (ja) * | 2000-07-05 | 2002-01-25 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
| JP2002353809A (ja) * | 2001-05-28 | 2002-12-06 | Mitsubishi Electric Corp | クロック発生回路 |
| US6489731B1 (en) * | 2001-07-27 | 2002-12-03 | Koninklijke Philips Electronics N.V. | Power supply and/or ballast system controlled by desired load power spectrum |
| JP2003143861A (ja) | 2001-10-31 | 2003-05-16 | Daihen Corp | 高周波電源装置 |
| GB2389252B (en) * | 2002-05-31 | 2006-09-27 | Zarlink Semiconductor Ltd | A frequency modulation system & method |
| JP4111845B2 (ja) * | 2003-02-28 | 2008-07-02 | 三菱電機株式会社 | D級増幅器 |
| EP1529491A4 (en) * | 2003-04-03 | 2009-05-27 | Panasonic Corp | ULTRASONIC EQUIPMENT AND METHOD FOR CHECKING AN ULTRASONIC EQUIPMENT |
| KR100980598B1 (ko) * | 2003-11-27 | 2010-09-07 | 가부시키가이샤 다이헨 | 고주파 전력 공급 시스템 |
| WO2005052533A1 (ja) * | 2003-11-27 | 2005-06-09 | Kyocera Corporation | 圧力センサ装置 |
| JP4799947B2 (ja) * | 2005-02-25 | 2011-10-26 | 株式会社ダイヘン | 高周波電源装置および高周波電源の制御方法 |
-
2005
- 2005-09-30 JP JP2005289437A patent/JP4879548B2/ja not_active Expired - Lifetime
-
2006
- 2006-09-28 US US11/536,171 patent/US7615983B2/en active Active
- 2006-09-29 KR KR1020060095688A patent/KR101293877B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR101293877B1 (ko) | 2013-08-07 |
| JP2007103102A (ja) | 2007-04-19 |
| US20070076344A1 (en) | 2007-04-05 |
| US7615983B2 (en) | 2009-11-10 |
| KR20070037394A (ko) | 2007-04-04 |
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