JP4877871B2 - 表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン - Google Patents

表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン Download PDF

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Publication number
JP4877871B2
JP4877871B2 JP2005130607A JP2005130607A JP4877871B2 JP 4877871 B2 JP4877871 B2 JP 4877871B2 JP 2005130607 A JP2005130607 A JP 2005130607A JP 2005130607 A JP2005130607 A JP 2005130607A JP 4877871 B2 JP4877871 B2 JP 4877871B2
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Prior art keywords
film
mask pattern
layer
light
conductive
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Expired - Fee Related
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JP2005130607A
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Japanese (ja)
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JP2005346043A (ja
JP2005346043A5 (ko
Inventor
邦彦 福地
敏行 伊佐
厳 藤井
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2005346043A5 publication Critical patent/JP2005346043A5/ja
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2005130607A 2004-04-28 2005-04-27 表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン Expired - Fee Related JP4877871B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005130607A JP4877871B2 (ja) 2004-04-28 2005-04-27 表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004134154 2004-04-28
JP2004134154 2004-04-28
JP2005130607A JP4877871B2 (ja) 2004-04-28 2005-04-27 表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン

Publications (3)

Publication Number Publication Date
JP2005346043A JP2005346043A (ja) 2005-12-15
JP2005346043A5 JP2005346043A5 (ko) 2008-06-19
JP4877871B2 true JP4877871B2 (ja) 2012-02-15

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JP2005130607A Expired - Fee Related JP4877871B2 (ja) 2004-04-28 2005-04-27 表示装置の作製方法、液晶テレビジョン、及びｅｌテレビジョン

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466779B (zh) 2006-12-27 2015-01-01 Hitachi Chemical Co Ltd Gravure and use of its substrate with a conductive layer pattern
JP4953166B2 (ja) * 2007-11-29 2012-06-13 カシオ計算機株式会社 表示パネルの製造方法
TWI452419B (zh) * 2008-01-28 2014-09-11 Az Electronic Mat Ip Japan Kk 細微圖案光罩及其製造方法、及使用其之細微圖案形成方法
US9305496B2 (en) 2010-07-01 2016-04-05 Semiconductor Energy Laboratory Co., Ltd. Electric field driving display device
JP2013115098A (ja) * 2011-11-25 2013-06-10 Sony Corp トランジスタ、トランジスタの製造方法、表示装置および電子機器
KR101888174B1 (ko) * 2011-12-09 2018-08-13 주성엔지니어링(주) 발광 소자
WO2019175704A1 (ja) * 2018-03-16 2019-09-19 株式会社半導体エネルギー研究所 電気モジュール、表示パネル、表示装置、入出力装置、情報処理装置、電気モジュールの作製方法
KR102620103B1 (ko) * 2021-09-17 2024-01-02 주식회사 레티널 증강 현실용 광학 장치의 제조 방법 및 이에 의해 제조된 증강 현실용 광학 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11340129A (ja) * 1998-05-28 1999-12-10 Seiko Epson Corp パターン製造方法およびパターン製造装置
JP2003124215A (ja) * 2001-10-15 2003-04-25 Seiko Epson Corp パターン形成方法、半導体デバイス、電気回路、表示体モジュール、カラーフィルタおよび発光素子
JP2003317945A (ja) * 2002-04-19 2003-11-07 Seiko Epson Corp デバイスの製造方法、デバイス、及び電子機器
JP2003331662A (ja) * 2002-05-10 2003-11-21 Seiko Epson Corp 薄膜のパターニング方法、有機エレクトロルミネッセンス装置、回路基板及び電子機器
JP4378767B2 (ja) * 2002-09-26 2009-12-09 セイコーエプソン株式会社 発光装置及び電子機器

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JP2005346043A (ja) 2005-12-15

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