JP4876237B2 - 複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 - Google Patents
複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 Download PDFInfo
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- JP4876237B2 JP4876237B2 JP2007111466A JP2007111466A JP4876237B2 JP 4876237 B2 JP4876237 B2 JP 4876237B2 JP 2007111466 A JP2007111466 A JP 2007111466A JP 2007111466 A JP2007111466 A JP 2007111466A JP 4876237 B2 JP4876237 B2 JP 4876237B2
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- crucible
- housing
- thin film
- evaporation source
- organic light
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- 238000001704 evaporation Methods 0.000 title claims description 39
- 230000008020 evaporation Effects 0.000 title claims description 38
- 239000010409 thin film Substances 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000011368 organic material Substances 0.000 claims description 27
- 238000010438 heat treatment Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 12
- 230000008021 deposition Effects 0.000 claims description 10
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 230000037431 insertion Effects 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 23
- 239000000126 substance Substances 0.000 description 14
- 238000000151 deposition Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000005416 organic matter Substances 0.000 description 3
- 238000005553 drilling Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Description
12 係止部
50 有機物質
60 ハウジング
70 ルツボ固定部
72 係止支持台
80 熱線
Claims (7)
- 長い筒状ないし箱状に形成されるハウジングと、
上面は開放されており、内部に蒸着用物質を入れるものであり、前記ハウジングに一列に挿入される複数のルツボと、
前記ルツボを加熱する加熱装置と、を備える有機発光素子薄膜製作のための線形蒸発源において、
各ルツボの開口の高さが各々異なり、前記ルツボで蒸発された前記蒸着用物質が前記異なる高さのルツボの開口から広がるように構成され、前記高さは、前記ハウジングの中央から外側へゆくほど高くなる、有機発光素子薄膜製作のための線形蒸発源。 - 前記ルツボは、その高さ寸法がいずれも同じであり、前記ハウジング内で一列に配置され、前記ハウジングの中央から外側へ行くほど前記ルツボが前記ハウジングに挿入される深さが浅くなる請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ルツボは、その高さ寸法がいずれも異なり、前記ハウジング内で一列に配置され、前記ハウジングの中央から外側へ行くほど高さ寸法が大きくなる前記ルツボが挿入され、前記ルツボの挿入深さがいずれも同じである請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ルツボは、その高さ寸法がいずれも同じであり、前記ハウジング内で一列に配置され、前記ルツボが挿入される深さがいずれも同じく、前記ハウジングの中央から外側へ行くほど高さ寸法が大きくなる高さ調節部が前記ルツボ上に形成される請求項1に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記ハウジングの上面は開放されており、前記ハウジングの上面を覆うように設けられ、前記ハウジングに挿入される前記ルツボの上部が貫通されるように複数の孔があけられており、前記孔には係止支持台が形成されたルツボ固定部をさらに備え、前記ルツボの外壁には前記係止支持台に係止する係止部が形成されて、前記ルツボ固定部の係止支持台により前記ルツボが前記ハウジングに固定される請求項1ないし4のうちいずれか1項に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記加熱装置は熱線を利用するものであり、前記ルツボの下部で所定高さ部位を加熱できるように、前記熱線がルツボ外壁の周囲に形成された請求項1ないし5のうちいずれか1項に記載の有機発光素子薄膜製作のための線形蒸発源。
- 前記所定高さ部位は、前記ルツボ内部に置かれる有機物質の高さより高い請求項6に記載の有機発光素子薄膜製作のための線形蒸発源。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060046222A KR100784953B1 (ko) | 2006-05-23 | 2006-05-23 | 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원 |
KR10-2006-0046222 | 2006-05-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007314873A JP2007314873A (ja) | 2007-12-06 |
JP4876237B2 true JP4876237B2 (ja) | 2012-02-15 |
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Application Number | Title | Priority Date | Filing Date |
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JP2007111466A Active JP4876237B2 (ja) | 2006-05-23 | 2007-04-20 | 複数のルツボを利用した有機発光素子薄膜製作のための線形蒸発源 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070272156A1 (ja) |
JP (1) | JP4876237B2 (ja) |
KR (1) | KR100784953B1 (ja) |
CN (1) | CN101078104A (ja) |
TW (1) | TWI364125B (ja) |
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WO2009134041A2 (en) * | 2008-04-29 | 2009-11-05 | Sunic System. Ltd. | Evaporator and vacuum deposition apparatus having the same |
US20100159132A1 (en) * | 2008-12-18 | 2010-06-24 | Veeco Instruments, Inc. | Linear Deposition Source |
US20100247809A1 (en) * | 2009-03-31 | 2010-09-30 | Neal James W | Electron beam vapor deposition apparatus for depositing multi-layer coating |
JP5400653B2 (ja) * | 2010-02-16 | 2014-01-29 | 株式会社日立ハイテクノロジーズ | 真空蒸着装置 |
JP2011176148A (ja) * | 2010-02-24 | 2011-09-08 | Nitto Denko Corp | 太陽電池モジュールの製造方法およびそれを用いて得られた太陽電池モジュール |
CN102212784A (zh) * | 2010-04-12 | 2011-10-12 | 无锡尚德太阳能电力有限公司 | 沉积蒸发源 |
KR101730498B1 (ko) * | 2010-10-22 | 2017-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
EP2447393A1 (en) * | 2010-10-27 | 2012-05-02 | Applied Materials, Inc. | Evaporation system and method |
JP5715802B2 (ja) * | 2010-11-19 | 2015-05-13 | 株式会社半導体エネルギー研究所 | 成膜装置 |
JP6049355B2 (ja) * | 2012-08-29 | 2016-12-21 | キヤノントッキ株式会社 | 蒸発源 |
KR20150065883A (ko) * | 2012-11-14 | 2015-06-15 | 가부시키가이샤 고베 세이코쇼 | 성막 장치 |
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2006
- 2006-05-23 KR KR1020060046222A patent/KR100784953B1/ko active IP Right Grant
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2007
- 2007-04-20 JP JP2007111466A patent/JP4876237B2/ja active Active
- 2007-05-14 US US11/803,297 patent/US20070272156A1/en not_active Abandoned
- 2007-05-16 CN CN200710103720.0A patent/CN101078104A/zh active Pending
- 2007-05-17 TW TW096117672A patent/TWI364125B/zh active
Also Published As
Publication number | Publication date |
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US20070272156A1 (en) | 2007-11-29 |
TWI364125B (en) | 2012-05-11 |
KR20070113410A (ko) | 2007-11-29 |
JP2007314873A (ja) | 2007-12-06 |
TW200744242A (en) | 2007-12-01 |
CN101078104A (zh) | 2007-11-28 |
KR100784953B1 (ko) | 2007-12-11 |
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