JP4860152B2 - 研磨剤組成物とそれによる研磨方法 - Google Patents
研磨剤組成物とそれによる研磨方法 Download PDFInfo
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- 238000005498 polishing Methods 0.000 title claims description 278
- 239000000203 mixture Substances 0.000 title claims description 137
- 238000000034 method Methods 0.000 title claims description 57
- 239000000758 substrate Substances 0.000 claims description 112
- 239000002245 particle Substances 0.000 claims description 66
- 229920000620 organic polymer Polymers 0.000 claims description 50
- 229910044991 metal oxide Inorganic materials 0.000 claims description 34
- 150000004706 metal oxides Chemical class 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 239000004065 semiconductor Substances 0.000 claims description 20
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 17
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 17
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 17
- 239000002002 slurry Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000007787 solid Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 238000007730 finishing process Methods 0.000 claims description 11
- 238000002955 isolation Methods 0.000 claims description 11
- 229920000058 polyacrylate Polymers 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 8
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 8
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 8
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 58
- 238000007517 polishing process Methods 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- 239000011229 interlayer Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 229920002125 Sokalan® Polymers 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 239000004584 polyacrylic acid Substances 0.000 description 7
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- 239000010410 layer Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000003082 abrasive agent Substances 0.000 description 4
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 229920003169 water-soluble polymer Polymers 0.000 description 4
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 3
- 229920002907 Guar gum Polymers 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 235000010443 alginic acid Nutrition 0.000 description 3
- 229920000615 alginic acid Polymers 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 235000010417 guar gum Nutrition 0.000 description 3
- 239000000665 guar gum Substances 0.000 description 3
- 229960002154 guar gum Drugs 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 239000000783 alginic acid Substances 0.000 description 2
- 229960001126 alginic acid Drugs 0.000 description 2
- 150000004781 alginic acids Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229920003063 hydroxymethyl cellulose Polymers 0.000 description 2
- 229940031574 hydroxymethyl cellulose Drugs 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- -1 organic acid salt Chemical class 0.000 description 2
- UPSOBXZLFLJAKK-UHFFFAOYSA-N ozone;tetraethyl silicate Chemical compound [O-][O+]=O.CCO[Si](OCC)(OCC)OCC UPSOBXZLFLJAKK-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- FHVDTGUDJYJELY-UHFFFAOYSA-N 6-{[2-carboxy-4,5-dihydroxy-6-(phosphanyloxy)oxan-3-yl]oxy}-4,5-dihydroxy-3-phosphanyloxane-2-carboxylic acid Chemical compound O1C(C(O)=O)C(P)C(O)C(O)C1OC1C(C(O)=O)OC(OP)C(O)C1O FHVDTGUDJYJELY-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229940072056 alginate Drugs 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- WPKYZIPODULRBM-UHFFFAOYSA-N azane;prop-2-enoic acid Chemical class N.OC(=O)C=C WPKYZIPODULRBM-UHFFFAOYSA-N 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229940105329 carboxymethylcellulose Drugs 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 150000001785 cerium compounds Chemical class 0.000 description 1
- VYLVYHXQOHJDJL-UHFFFAOYSA-K cerium trichloride Chemical compound Cl[Ce](Cl)Cl VYLVYHXQOHJDJL-UHFFFAOYSA-K 0.000 description 1
- UNJPQTDTZAKTFK-UHFFFAOYSA-K cerium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Ce+3] UNJPQTDTZAKTFK-UHFFFAOYSA-K 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 229920013819 hydroxyethyl ethylcellulose Polymers 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229940068984 polyvinyl alcohol Drugs 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Weting (AREA)
Description
(1)重量平均分子量が約12,000〜約20,000であるポリアクリル酸アンモニウムと、重量平均分子量が約22,000〜約40,000であるポリアクリル酸アンモニウムを使用し、含有量比率が約70:30〜約90:10である場合、
(2)重量平均分子量が約14,000〜約22,000であるポリアクリル酸アンモニウムと、重量平均分子量が約26,000〜約42,000であるポリアクリル酸アンモニウムを使用し、含有量比率が約60:40〜約90:10である場合、
等を挙げることができる。
Claims (18)
- 半導体基板の研磨方法であって、
a)金属膜、素子分離膜又は絶縁膜の少なくとも1種を備えた半導体基板を用意し、
b)金属酸化物粒子、第1の平均分子量を有する第1の水溶性有機高分子、前記第1の平均分子量の29.5%〜54%の間の第2の平均分子量を有する第2の水溶性有機高分子及び水を含む研磨剤スラリー組成物を前記基板とポリッシングパッドとの間に設置し、
c)前記パッドの一部と前記基板を研磨圧が生じる位置で保持し、前記ポリッシングパッドと前記基板との間に相対動作速度を生じさせるように前記ポリッシングパッド又は基板の少なくとも1つを動かし、これにより半導体基板を研磨することを含み、
ポリッシングパッドと前記基板との間の研磨圧を一定に維持した状態で、前記基板を、前記基板と前記基板に対して相対的に動くポリッシングパッドとの間に配置した前記スラリー組成物と接触させることによって研磨した場合に、パッドの基板に対する相対動作に対する基板除去速度の関係が極大ピークを呈することを特徴とする研磨方法。 - 前記一定研磨圧が、200g/cm 2 であり、前記ポリッシングパッドが回転可能な定盤に備えられており、前記パッド回転速度が15rpmから60rpmまで変化するに際し、ポリッシングパッド−基板動作速度に対する基板除去速度曲線がピークを呈することを特徴とする請求項1に記載の研磨方法。
- 前記スラリー組成物が、第1の平均分子量及び第2の平均分子量とは異なる平均分子量を有する第3の水溶性有機高分子を含むことを特徴とする、請求項1に記載の研磨方法。
- 前記高分子量側の水溶性有機高分子と前記低分子量側の水溶性有機高分子の重量比が、0.075:0.425〜0.25:0.25であることを特徴とする請求項1に記載の研磨方法。
- 前記水溶性有機高分子の少なくとも1種が、ポリアクリル酸塩であることを特徴とする請求項1に記載の研磨方法。
- 前記水溶性有機高分子の少なくとも1種が、ポリビニルアルコールであることを特徴とする請求項1に記載の研磨方法。
- 前記水溶性有機高分子の含有量が、前記組成物全量に対して0.06重量%〜0.5重量%であることを特徴とする請求項1に記載の研磨方法。
- 前記金属酸化物粒子が、平均粒子径を有するセリアを含み、前記セリアの平均粒子径が、0.12nm〜0.3nmであり、前記スラリー組成物中の前記金属酸化物粒子の固形分が前記組成物全量に対して0.25重量%〜6.0重量%であることを特徴とする請求項1に記載の研磨方法。
- 前記金属酸化物粒子が、平均粒子径を有するシリカを含み、前記シリカの平均粒子径が、0.12nm〜0.3nmであり、前記スラリー組成物中の前記金属酸化物粒子の固形分が前記組成物全量に対して0.25重量%〜6.0重量%であることを特徴とする請求項1に記載の研磨方法。
- 前記金属酸化物粒子が、平均粒子径を有するアルミナを含み、前記アルミナの平均粒子径が、0.12nm〜0.3nmであり、前記スラリー組成物中の前記金属酸化物粒子の固形分が前記組成物全量に対して0.25重量%〜6.0重量%であることを特徴とする請求項1に記載の研磨方法。
- 前記ポリッシングパッドと前記基板との間の前記相対動作速度が、前記研磨圧における基板除去速度の極大ピークを呈する相対動作速度である、請求項1に記載の研磨方法。
- 前記研磨工程が、平坦化研磨工程と仕上げ工程とを含み、
平坦化研磨工程と仕上げ工程において異なる研磨剤スラリー組成物を用いることを特徴とする請求項1に記載の研磨方法。 - 前記研磨工程が、平坦化研磨工程と仕上げ工程とを含み、
平坦化研磨工程と仕上げ工程において同じ研磨剤スラリー組成物を用いることを特徴とする請求項1に記載の半導体基板の研磨方法。 - 前記平坦化研磨工程における前記ポリッシングパッドと前記基板との間の相対動作速度が、前記仕上げ工程における前記ポリッシングパッドと前記基板との間の相対動作速度よりも早いことを特徴とする請求項13に記載の研磨方法。
- 前記平坦化研磨工程における研磨圧が前記仕上げ工程における研磨圧よりも低く、前記平坦化研磨工程における前記ポリッシングパッドと前記基板との間の相対動作速度が、前記仕上げ工程における前記ポリッシングパッドと前記基板との間の相対動作速度よりも早いことを特徴とする請求項12に記載の研磨方法。
- 半導体基板の研磨方法であって、
a)絶縁膜を備えた半導体基板を用意し、
b)研磨セリア粒子、26000〜50000の間の第1の平均分子量を有する第1の水溶性有機高分子、前記第1の平均分子量の29.5%〜54%の間の第2の平均分子量を有する第2の水溶性有機高分子及び水を含む研磨剤スラリー組成物を前記基板とポリッシングパッドとの間に設置し、
c)前記パッドの一部と前記基板を研磨圧が生じる位置で保持し、前記ポリッシングパッドと前記基板との間に相対動作速度を生じさせるように前記ポリッシングパッド又は基板の少なくとも1つを動かし、これにより半導体基板を研磨することを含み、
ポリッシングパッドと前記基板との間の研磨圧を一定に維持した状態で、前記基板を、前記基板と前記基板に対して相対的に動くポリッシングパッドとの間に配置した前記スラリー組成物と接触させることによって研磨した場合に、パッドの基板に対する相対動作に対する基板除去速度の関係が極大ピークを呈する研磨方法。 - 前記第1及び第2の水溶性有機高分子の少なくとも1種がポリアクリル酸アンモニウム塩であり、前記第1の平均分子量が27000〜40000の間であり、且つ、前記第2の平均分子量が10000〜20000の間である、請求項16記載の研磨方法。
- 前記絶縁膜がTEOS材料を含むものである、請求項16に記載の研磨方法。
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JP2004552235A JP4860152B2 (ja) | 2002-11-13 | 2003-11-13 | 研磨剤組成物とそれによる研磨方法 |
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JP2002329464A JP2004165424A (ja) | 2002-11-13 | 2002-11-13 | 研磨剤組成物とそれによる研磨方法 |
PCT/US2003/036618 WO2004044076A1 (en) | 2002-11-13 | 2003-11-13 | A slurry composition and a polishing method using the same |
JP2004552235A JP4860152B2 (ja) | 2002-11-13 | 2003-11-13 | 研磨剤組成物とそれによる研磨方法 |
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US (1) | US9676966B2 (ja) |
JP (2) | JP2004165424A (ja) |
AU (1) | AU2003290980A1 (ja) |
TW (1) | TWI332980B (ja) |
WO (1) | WO2004044076A1 (ja) |
Families Citing this family (15)
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CN100417495C (zh) * | 2006-04-30 | 2008-09-10 | 华侨大学 | 一种超细微粉抛光膜的制备方法 |
JP2008277495A (ja) * | 2007-04-27 | 2008-11-13 | Sharp Corp | 半導体装置の製造方法 |
JP2008290169A (ja) | 2007-05-23 | 2008-12-04 | Tdk Corp | アルミナ膜研磨用組成物およびそれを用いる化学機械研磨方法 |
CN102786879B (zh) * | 2012-07-17 | 2014-04-23 | 清华大学 | 钛酸钡化学机械抛光水性组合物及其应用 |
KR101985544B1 (ko) * | 2012-09-03 | 2019-06-03 | 에스케이하이닉스 주식회사 | 유기 절연막 연마용 슬러리 및 이를 이용한 기판 연마 방법 |
JP2014142987A (ja) * | 2012-12-27 | 2014-08-07 | Sanyo Chem Ind Ltd | 電子材料用研磨液 |
TWI635160B (zh) * | 2014-03-07 | 2018-09-11 | 東友精細化工有限公司 | 紋理蝕刻溶液組成物及晶體矽晶圓紋理蝕刻方法 |
JP6268069B2 (ja) * | 2014-09-12 | 2018-01-24 | 信越化学工業株式会社 | 研磨組成物及び研磨方法 |
WO2016052281A1 (ja) * | 2014-09-30 | 2016-04-07 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびそれを用いた研磨方法 |
JP6517555B2 (ja) * | 2014-09-30 | 2019-05-22 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびそれを用いた研磨方法 |
CN104342037B (zh) * | 2014-10-09 | 2016-06-22 | 青岛洁能环保有限公司 | 一种金属抛光剂及其制备方法 |
JP6422325B2 (ja) * | 2014-12-15 | 2018-11-14 | 花王株式会社 | 半導体基板用研磨液組成物 |
EP3315577A4 (en) * | 2015-06-26 | 2018-05-09 | Fujimi Incorporated | Polishing composition |
JP6377656B2 (ja) | 2016-02-29 | 2018-08-22 | 株式会社フジミインコーポレーテッド | シリコン基板の研磨方法および研磨用組成物セット |
JP6099067B1 (ja) * | 2016-04-26 | 2017-03-22 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0786215A (ja) * | 1993-09-17 | 1995-03-31 | Toshiba Corp | 半導体装置の製造方法 |
JPH07254579A (ja) * | 1994-03-15 | 1995-10-03 | Toshiba Corp | 研磨装置 |
JPH08316179A (ja) * | 1995-05-23 | 1996-11-29 | Sony Corp | 半導体プロセスにおける平坦化方法及びその装置 |
WO2002083804A1 (en) * | 2001-04-12 | 2002-10-24 | Rodel Holdings, Inc. | Polishing composition having a surfactant |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5607718A (en) * | 1993-03-26 | 1997-03-04 | Kabushiki Kaisha Toshiba | Polishing method and polishing apparatus |
JP3231659B2 (ja) * | 1997-04-28 | 2001-11-26 | 日本電気株式会社 | 自動研磨装置 |
JPH11140427A (ja) | 1997-11-13 | 1999-05-25 | Kobe Steel Ltd | 研磨液および研磨方法 |
JPH11181403A (ja) * | 1997-12-18 | 1999-07-06 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の研磨法 |
JP4088811B2 (ja) | 1998-10-08 | 2008-05-21 | 日立化成工業株式会社 | Cmp研磨剤及び基板の研磨方法 |
TWI290740B (en) * | 1999-08-26 | 2007-12-01 | Hitachi Chemical Co Ltd | Polishing compound for chemical-mechanical polishing and polishing method |
US6332831B1 (en) * | 2000-04-06 | 2001-12-25 | Fujimi America Inc. | Polishing composition and method for producing a memory hard disk |
KR100378180B1 (ko) * | 2000-05-22 | 2003-03-29 | 삼성전자주식회사 | 화학기계적 연마 공정용 슬러리 및 이를 이용한 반도체소자의 제조방법 |
US7037352B2 (en) * | 2000-12-12 | 2006-05-02 | Showa Denko Kabushiki Kaisha | Polishing particle and method for producing polishing particle |
JP5017574B2 (ja) * | 2001-05-25 | 2012-09-05 | エア プロダクツ アンド ケミカルズ インコーポレイテッド | 酸化セリウム研磨剤及び基板の製造方法 |
JP2003313542A (ja) * | 2002-04-22 | 2003-11-06 | Jsr Corp | 化学機械研磨用水系分散体 |
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2002
- 2002-11-13 JP JP2002329464A patent/JP2004165424A/ja active Pending
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2003
- 2003-11-12 TW TW092131676A patent/TWI332980B/zh not_active IP Right Cessation
- 2003-11-13 AU AU2003290980A patent/AU2003290980A1/en not_active Abandoned
- 2003-11-13 US US10/534,699 patent/US9676966B2/en active Active
- 2003-11-13 WO PCT/US2003/036618 patent/WO2004044076A1/en active Application Filing
- 2003-11-13 JP JP2004552235A patent/JP4860152B2/ja not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0786215A (ja) * | 1993-09-17 | 1995-03-31 | Toshiba Corp | 半導体装置の製造方法 |
JPH07254579A (ja) * | 1994-03-15 | 1995-10-03 | Toshiba Corp | 研磨装置 |
JPH08316179A (ja) * | 1995-05-23 | 1996-11-29 | Sony Corp | 半導体プロセスにおける平坦化方法及びその装置 |
WO2002083804A1 (en) * | 2001-04-12 | 2002-10-24 | Rodel Holdings, Inc. | Polishing composition having a surfactant |
Also Published As
Publication number | Publication date |
---|---|
TWI332980B (en) | 2010-11-11 |
US9676966B2 (en) | 2017-06-13 |
JP2006516067A (ja) | 2006-06-15 |
JP2004165424A (ja) | 2004-06-10 |
TW200418966A (en) | 2004-10-01 |
AU2003290980A1 (en) | 2004-06-03 |
WO2004044076A1 (en) | 2004-05-27 |
US20090197412A1 (en) | 2009-08-06 |
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