JP4834103B2 - 電極に電極触媒面を形成する方法およびその電極 - Google Patents
電極に電極触媒面を形成する方法およびその電極 Download PDFInfo
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- JP4834103B2 JP4834103B2 JP2008536068A JP2008536068A JP4834103B2 JP 4834103 B2 JP4834103 B2 JP 4834103B2 JP 2008536068 A JP2008536068 A JP 2008536068A JP 2008536068 A JP2008536068 A JP 2008536068A JP 4834103 B2 JP4834103 B2 JP 4834103B2
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- manganese dioxide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/129—Flame spraying
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/077—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the compound being a non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Catalysts (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
Claims (17)
- 電極に電極触媒面を形成する方法において、粉末状の触媒皮膜は、金属の電解回収で用いられる鉛系陽極に一工程でコールドスプレーされ、該皮膜は主として二酸化マンガンを含み、該二酸化マンガンはβ-二酸化マンガン(βMnO2)、化学的に生成された二酸化マンガン(CMD)、電気化学的に生成された二酸化マンガン(EMD)、熱処理された二酸化マンガン(HTMD)または天然の二酸化マンガン(NMD)の少なくとも一つであることを特徴とする方法。
- 請求項1に記載の方法において、前記粉末状の触媒の物理的および化学的特性がスプレー中本質的に不変であることを特徴とする方法。
- 請求項1または2に記載の方法において、皮膜として用いられる前記二酸化マンガンは、単純酸化物または合成酸化物であり、前記異なる方法で生成された二酸化マンガンのうちの少なくとも1種類が第一の金属酸化物に結合していることを特徴とする方法。
- 請求項1または2に記載の方法において、皮膜として用いられる前記二酸化マンガンは合成酸化物であり、一つまたは複数の他の遷移金属の酸化物が第一の金属に結合していることを特徴とする方法。
- 請求項1ないし4のいずれかに記載の方法において、前記二酸化マンガンはMO2、MO3、M3O4またはM2O5の形の遷移金属と結合していて、ここでMは遷移金属であることを特徴とする方法。
- 請求項5に記載の方法において、前記遷移金属はPtO2、RuO2、IrO2、Co3O4、NiCo2O4、CoFe2O4、NiO2、TiO2、ペロブスカイト、Ta2O5、WO3およびMoO3のうちの少なくとも一つであることを特徴とする方法。
- 請求項1ないし4のいずれかに記載の方法において、前記二酸化マンガンはPbO2またはSnO2と結合していることを特徴とする方法。
- 請求項1ないし7のいずれかに記載の方法において、被覆に用いられる前記粉末の粒子の大きさは5マイクロメートルから100マイクロメートルの範囲内であることを特徴とする方法。
- 請求項1ないし8のいずれかに記載の方法において、前記電極に形成される皮膜の厚さは前記被覆粉末粒子の直径の1倍から5倍であることを特徴とする方法。
- 請求項1ないし9のいずれかに記載の方法において、前記電極は、該電極に前記皮膜を形成する前に、化学的におよび/または機械的に洗浄されることを特徴とする方法。
- 電極触媒を利用して被覆された電極において、主として酸化マンガンで構成された皮膜は、金属の電解回収に用いられる鉛系陽極の表面にコールドスプレーによって形成され、該酸化マンガンはβ-二酸化マンガン(βMnO2)、化学的に生成された二酸化マンガン(CMD)、電気化学的に生成された二酸化マンガン(EMD)、熱処理された二酸化マンガン(HTMD)または天然の二酸化マンガン(NMD)の少なくとも一つであることを特徴とする電極。
- 請求項11に記載の電極において、皮膜として用いられる前記二酸化マンガンは、単純酸化物または合成酸化物であり、前記異なる方法で生成された二酸化マンガンのうちの少なくとも1種類が第一の金属酸化物に結合していることを特徴とする電極。
- 請求項11または12に記載の電極において、皮膜として用いられる前記二酸化マンガンは合成酸化物であり、一つまたは複数の他の遷移金属の酸化物が第一の金属に結合していることを特徴とする電極。
- 請求項11ないし13のいずれかに記載の電極において、前記酸化マンガンはMO2、MO3、M3O4またはM2O5の形の遷移金属と結合していて、ここでMは遷移金属であることを特徴とする電極。
- 請求項14に記載の電極において、前記遷移金属はPtO2、RuO2、IrO2、Co3O4、NiCo2O4、CoFe2O4、NiO2、TiO2、ペロブスカイト、Ta2O5、WO3およびMoO3のうちの少なくとも一つであることを特徴とする電極。
- 請求項11ないし13のいずれかに記載の電極において、前記酸化マンガンはPbO2またはSnO2と結合していることを特徴とする電極。
- 請求項11ないし16のいずれかに記載の電極において、該電極に形成される皮膜の厚さは前記被覆粉末粒子の直径の1倍から5倍であることを特徴とする電極。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20051059 | 2005-10-21 | ||
FI20051059A FI118159B (fi) | 2005-10-21 | 2005-10-21 | Menetelmä elektrokatalyyttisen pinnan muodostamiseksi elektrodiin ja elektrodi |
PCT/FI2006/000314 WO2007045716A1 (en) | 2005-10-21 | 2006-09-26 | Method for forming an electrocatalytic surface on an electrode and the electrode |
Publications (2)
Publication Number | Publication Date |
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JP2009512781A JP2009512781A (ja) | 2009-03-26 |
JP4834103B2 true JP4834103B2 (ja) | 2011-12-14 |
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ID=35185198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008536068A Expired - Fee Related JP4834103B2 (ja) | 2005-10-21 | 2006-09-26 | 電極に電極触媒面を形成する方法およびその電極 |
Country Status (14)
Country | Link |
---|---|
US (1) | US7871504B2 (ja) |
EP (1) | EP1937864A4 (ja) |
JP (1) | JP4834103B2 (ja) |
KR (1) | KR101383524B1 (ja) |
CN (1) | CN101292057B (ja) |
AU (1) | AU2006303250B2 (ja) |
BR (1) | BRPI0617694A2 (ja) |
CA (1) | CA2626720C (ja) |
EA (1) | EA012053B1 (ja) |
FI (1) | FI118159B (ja) |
NO (1) | NO20082277L (ja) |
PE (1) | PE20070862A1 (ja) |
WO (1) | WO2007045716A1 (ja) |
ZA (1) | ZA200803109B (ja) |
Families Citing this family (26)
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DE102008059165A1 (de) * | 2008-11-24 | 2010-05-27 | Siemens Aktiengesellschaft | Bauteil mit einer katalytischen Oberfläche, Verfahren zu dessen Herstellung und Verwendung dieses Bauteils |
KR100930790B1 (ko) * | 2009-02-18 | 2009-12-09 | 황부성 | 수소산소 발생용 전극판 및 그를 제조하기 위한 제조방법 |
DE102010021553A1 (de) | 2010-05-21 | 2011-11-24 | Siemens Aktiengesellschaft | Bauteil mit einer katalytischen Oberfläche, Verfahren zu dessen Herstellung und Verwendung dieses Bauteils |
DE102010021554A1 (de) | 2010-05-21 | 2011-11-24 | Siemens Aktiengesellschaft | Bauteil mit einer katalytischen Oberfläche, Verfahren zu dessen Herstellung und Verwendung dieses Bauteils |
CN102268689B (zh) * | 2011-06-24 | 2013-05-22 | 太原理工大学 | 一种钛基氧化物耐酸阳极及其制备方法 |
ITMI20120873A1 (it) * | 2012-05-21 | 2013-11-22 | Industrie De Nora Spa | Elettrodo per evoluzione di prodotti gassosi e metodo per il suo ottenimento |
FI127028B (en) | 2013-06-05 | 2017-09-29 | Outotec Finland Oy | Method and apparatus for metal electrical recovery |
DE102014003424B4 (de) * | 2014-03-04 | 2017-04-13 | Vdm Metals International Gmbh | Kathode für die elektrolytische Zinkgewinnung |
CN104133070B (zh) * | 2014-07-17 | 2015-07-08 | 济南大学 | 一种环境雌激素无标记免疫传感器的制备方法及应用 |
KR101670929B1 (ko) * | 2014-10-21 | 2016-11-07 | 서울대학교산학협력단 | 산소 발생 촉매, 전극 및 전기화학반응 시스템 |
BE1023239B1 (fr) * | 2014-12-19 | 2017-01-06 | Prayon | Procédé pour le dépôt de films minces par voie humide |
AR106069A1 (es) * | 2015-09-25 | 2017-12-06 | Akzo Nobel Chemicals Int Bv | Electrodo y proceso para su manufactura |
CN105521784B (zh) * | 2015-12-21 | 2017-11-03 | 哈尔滨工业大学 | 一种TiO2阳极表面负载Co3O4的方法 |
JP6615682B2 (ja) * | 2016-04-12 | 2019-12-04 | デノラ・ペルメレック株式会社 | アルカリ水電解用陽極及びアルカリ水電解用陽極の製造方法 |
KR102173226B1 (ko) * | 2016-10-25 | 2020-11-03 | 서울대학교산학협력단 | 산소 발생 촉매, 전극 및 전기화학반응 시스템 |
EP3406758A1 (en) * | 2017-05-22 | 2018-11-28 | Vishay Electronic GmbH | Method of producing an ntcr sensor |
CN107604388B (zh) | 2017-09-11 | 2023-08-08 | 昆明理工恒达科技股份有限公司 | 复合阳极材料及其制备方法、阳极板及其制备方法 |
JP7108483B2 (ja) * | 2018-07-13 | 2022-07-28 | Dowaメタルマイン株式会社 | 非鉄金属の電解採取方法およびそれに用いるアノードの製造方法 |
CN109786769B (zh) * | 2018-12-18 | 2020-12-08 | 厦门大学 | 一种碳载贵金属氧化物双功能催化剂及其制备方法和应用 |
CN109440158A (zh) * | 2018-12-28 | 2019-03-08 | 南京时恒电子科技有限公司 | 一种Cu-Ti-Co复合电极及其制备方法 |
CN109680301B (zh) * | 2019-02-19 | 2020-06-12 | 湘西土家族苗族自治州产商品质量监督检验所 | 一种电解锌用阳极板及其制备方法 |
CA3133201C (en) * | 2019-03-12 | 2022-01-25 | De Nora Permelec Ltd | Alkaline water electrolysis method and alkaline water electrolysis anode |
CN110093633A (zh) * | 2019-03-25 | 2019-08-06 | 厦门潼源科技有限公司 | 一种钛基-β型二氧化铅的阳极、制备方法及其应用 |
CN109763021B (zh) * | 2019-03-27 | 2021-02-02 | 贵州省过程工业技术研究中心 | 一种低Ag铅合金复合阳极材料制备方法 |
CN111962131B (zh) * | 2020-07-14 | 2021-06-22 | 广东省科学院稀有金属研究所 | 一种析氧电极用复合氧化物催化涂层及其制备方法 |
CN112663094B (zh) * | 2020-12-03 | 2024-01-26 | 郑州大学 | 一种化学催化过渡金属溶液电解冶金的方法 |
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JPS5773191A (en) * | 1980-08-18 | 1982-05-07 | Diamond Shamrock Corp | Improved anode based on lead and preparation thereof |
JPS62170495A (ja) * | 1986-01-24 | 1987-07-27 | Toyo Soda Mfg Co Ltd | 電解用電極の製造法 |
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JPH04301062A (ja) * | 1990-12-26 | 1992-10-23 | Eltech Syst Corp | 改良された酸素発生用陽極 |
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US4265728A (en) * | 1978-11-03 | 1981-05-05 | Diamond Shamrock Corporation | Method and electrode with manganese dioxide coating |
CA1225066A (en) * | 1980-08-18 | 1987-08-04 | Jean M. Hinden | Electrode with surface film of oxide of valve metal incorporating platinum group metal or oxide |
DE3106587C2 (de) * | 1981-02-21 | 1987-01-02 | Heraeus Elektroden GmbH, 6450 Hanau | Elektrode und deren Verwendung |
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TW214570B (ja) | 1989-06-30 | 1993-10-11 | Eltech Systems Corp | |
GB9316930D0 (en) | 1993-08-13 | 1993-09-29 | Ici Plc | Electrode |
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US5716422A (en) * | 1996-03-25 | 1998-02-10 | Wilson Greatbatch Ltd. | Thermal spray deposited electrode component and method of manufacture |
IT1293319B1 (it) | 1997-07-10 | 1999-02-16 | De Nora Spa | Metodo per l'applicazione di un rivestmento catalitico ad un substrato metallico |
US7501208B2 (en) * | 2001-06-01 | 2009-03-10 | Eveready Battery Company, Inc. | Doped manganese dioxides |
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2005
- 2005-10-21 FI FI20051059A patent/FI118159B/fi active IP Right Grant
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2006
- 2006-09-26 CA CA2626720A patent/CA2626720C/en not_active Expired - Fee Related
- 2006-09-26 KR KR1020087009293A patent/KR101383524B1/ko active IP Right Grant
- 2006-09-26 US US12/090,638 patent/US7871504B2/en active Active
- 2006-09-26 WO PCT/FI2006/000314 patent/WO2007045716A1/en active Application Filing
- 2006-09-26 BR BRPI0617694-1A patent/BRPI0617694A2/pt not_active IP Right Cessation
- 2006-09-26 EA EA200800705A patent/EA012053B1/ru not_active IP Right Cessation
- 2006-09-26 EP EP20060794090 patent/EP1937864A4/en not_active Withdrawn
- 2006-09-26 CN CN2006800391668A patent/CN101292057B/zh active Active
- 2006-09-26 JP JP2008536068A patent/JP4834103B2/ja not_active Expired - Fee Related
- 2006-09-26 AU AU2006303250A patent/AU2006303250B2/en not_active Ceased
- 2006-10-18 PE PE2006001263A patent/PE20070862A1/es not_active Application Discontinuation
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2008
- 2008-04-09 ZA ZA200803109A patent/ZA200803109B/xx unknown
- 2008-05-19 NO NO20082277A patent/NO20082277L/no not_active Application Discontinuation
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JPS5773191A (en) * | 1980-08-18 | 1982-05-07 | Diamond Shamrock Corp | Improved anode based on lead and preparation thereof |
JPS62170495A (ja) * | 1986-01-24 | 1987-07-27 | Toyo Soda Mfg Co Ltd | 電解用電極の製造法 |
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Also Published As
Publication number | Publication date |
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FI118159B (fi) | 2007-07-31 |
FI20051059A (fi) | 2007-04-22 |
KR20080058414A (ko) | 2008-06-25 |
EA012053B1 (ru) | 2009-08-28 |
BRPI0617694A2 (pt) | 2011-08-02 |
FI20051059A0 (fi) | 2005-10-21 |
EP1937864A4 (en) | 2011-01-26 |
NO20082277L (no) | 2008-07-02 |
EP1937864A1 (en) | 2008-07-02 |
CN101292057A (zh) | 2008-10-22 |
JP2009512781A (ja) | 2009-03-26 |
KR101383524B1 (ko) | 2014-04-08 |
US20080237036A1 (en) | 2008-10-02 |
WO2007045716A1 (en) | 2007-04-26 |
EA200800705A1 (ru) | 2008-10-30 |
AU2006303250A1 (en) | 2007-04-26 |
ZA200803109B (en) | 2009-02-25 |
CA2626720A1 (en) | 2007-04-26 |
PE20070862A1 (es) | 2007-09-05 |
CN101292057B (zh) | 2012-06-13 |
US7871504B2 (en) | 2011-01-18 |
CA2626720C (en) | 2012-09-25 |
AU2006303250B2 (en) | 2011-05-26 |
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