JP4738561B2 - 露光装置およびデバイス製造法 - Google Patents

露光装置およびデバイス製造法 Download PDF

Info

Publication number
JP4738561B2
JP4738561B2 JP35428799A JP35428799A JP4738561B2 JP 4738561 B2 JP4738561 B2 JP 4738561B2 JP 35428799 A JP35428799 A JP 35428799A JP 35428799 A JP35428799 A JP 35428799A JP 4738561 B2 JP4738561 B2 JP 4738561B2
Authority
JP
Japan
Prior art keywords
pressure
container
optical system
inert gas
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP35428799A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001167997A5 (enExample
JP2001167997A (ja
Inventor
雄大 村上
一志 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP35428799A priority Critical patent/JP4738561B2/ja
Publication of JP2001167997A publication Critical patent/JP2001167997A/ja
Publication of JP2001167997A5 publication Critical patent/JP2001167997A5/ja
Application granted granted Critical
Publication of JP4738561B2 publication Critical patent/JP4738561B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP35428799A 1999-12-14 1999-12-14 露光装置およびデバイス製造法 Expired - Fee Related JP4738561B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35428799A JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35428799A JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Publications (3)

Publication Number Publication Date
JP2001167997A JP2001167997A (ja) 2001-06-22
JP2001167997A5 JP2001167997A5 (enExample) 2007-02-01
JP4738561B2 true JP4738561B2 (ja) 2011-08-03

Family

ID=18436536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35428799A Expired - Fee Related JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Country Status (1)

Country Link
JP (1) JP4738561B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4532660B2 (ja) * 2000-03-30 2010-08-25 キヤノン株式会社 露光装置
TWI311691B (en) * 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6179228A (ja) * 1984-09-26 1986-04-22 Nippon Kogaku Kk <Nikon> 投影光学装置
JPH05210049A (ja) * 1992-01-31 1993-08-20 Matsushita Electric Ind Co Ltd 投影レンズ倍率補正方法およびその装置
JPH0653108A (ja) * 1992-07-27 1994-02-25 Nec Corp 投影式露光装置
JP3629790B2 (ja) * 1995-12-05 2005-03-16 株式会社ニコン 露光装置
JP2852227B2 (ja) * 1996-01-23 1999-01-27 九州日本電気株式会社 縮小投影露光装置
JPH09298151A (ja) * 1996-05-02 1997-11-18 Nikon Corp 投影露光装置
JPH10133150A (ja) * 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
JPH10209033A (ja) * 1997-01-21 1998-08-07 Canon Inc 位置決めステージ装置およびこれを用いた露光装置
JP2000036447A (ja) * 1998-07-17 2000-02-02 Nikon Corp 露光装置及び投影光学系の圧力調整方法
JPH1167657A (ja) * 1997-08-26 1999-03-09 Toshiba Corp 露光装置
JP4026943B2 (ja) * 1997-09-04 2007-12-26 キヤノン株式会社 露光装置およびデバイス製造方法
JP2000294497A (ja) * 1999-04-09 2000-10-20 Seiko Epson Corp 露光装置及び露光方法

Also Published As

Publication number Publication date
JP2001167997A (ja) 2001-06-22

Similar Documents

Publication Publication Date Title
US5559584A (en) Exposure apparatus
EP1326139B1 (en) Exposure apparatus and device manufacturing method
US6833903B2 (en) Inert gas purge method and apparatus, exposure apparatus, reticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method
JP4026943B2 (ja) 露光装置およびデバイス製造方法
JP2005129898A (ja) 露光装置およびデバイス製造方法
JP2002373849A (ja) 露光装置
JP4738561B2 (ja) 露光装置およびデバイス製造法
JPWO2007083686A1 (ja) 露光装置
JP2003059803A (ja) 露光装置
US6914667B2 (en) Exposure apparatus and purging method for the same
JP3977377B2 (ja) 露光装置およびデバイス製造方法
JP4174239B2 (ja) ガス供給装置、露光システムおよびデバイス製造方法
JP2000133583A (ja) 露光装置およびデバイス製造方法
US7110088B2 (en) Exposure apparatus and device manufacturing method
JP2003234281A (ja) 露光装置、デバイス製造方法
JPH06260386A (ja) 露光装置
US20050122492A1 (en) Exposing method, exposing apparatus and device manufacturing method utilizing them
JP3809416B2 (ja) 走査露光装置及びそれを用いたデバイス製造方法
JP2010016112A (ja) 露光装置、露光方法、及びデバイス製造方法
JP4724537B2 (ja) 露光装置
JP2002373853A (ja) 露光装置
JP4878082B2 (ja) 露光装置およびデバイス製造方法
JP2007096050A (ja) 露光装置
JP2005183624A (ja) 鏡筒及び露光装置並びにデバイスの製造方法
JP2002373854A (ja) 露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061212

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061212

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20090406

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090821

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090901

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091102

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100511

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20100630

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100706

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110426

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110427

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140513

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees