JP2001167997A5 - - Google Patents

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Publication number
JP2001167997A5
JP2001167997A5 JP1999354287A JP35428799A JP2001167997A5 JP 2001167997 A5 JP2001167997 A5 JP 2001167997A5 JP 1999354287 A JP1999354287 A JP 1999354287A JP 35428799 A JP35428799 A JP 35428799A JP 2001167997 A5 JP2001167997 A5 JP 2001167997A5
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JP
Japan
Prior art keywords
inert gas
pressure
exposure apparatus
pressure value
adjusting means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999354287A
Other languages
English (en)
Japanese (ja)
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JP2001167997A (ja
JP4738561B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP35428799A priority Critical patent/JP4738561B2/ja
Priority claimed from JP35428799A external-priority patent/JP4738561B2/ja
Publication of JP2001167997A publication Critical patent/JP2001167997A/ja
Publication of JP2001167997A5 publication Critical patent/JP2001167997A5/ja
Application granted granted Critical
Publication of JP4738561B2 publication Critical patent/JP4738561B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP35428799A 1999-12-14 1999-12-14 露光装置およびデバイス製造法 Expired - Fee Related JP4738561B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35428799A JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35428799A JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Publications (3)

Publication Number Publication Date
JP2001167997A JP2001167997A (ja) 2001-06-22
JP2001167997A5 true JP2001167997A5 (enExample) 2007-02-01
JP4738561B2 JP4738561B2 (ja) 2011-08-03

Family

ID=18436536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35428799A Expired - Fee Related JP4738561B2 (ja) 1999-12-14 1999-12-14 露光装置およびデバイス製造法

Country Status (1)

Country Link
JP (1) JP4738561B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4532660B2 (ja) * 2000-03-30 2010-08-25 キヤノン株式会社 露光装置
TWI311691B (en) * 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6179228A (ja) * 1984-09-26 1986-04-22 Nippon Kogaku Kk <Nikon> 投影光学装置
JPH05210049A (ja) * 1992-01-31 1993-08-20 Matsushita Electric Ind Co Ltd 投影レンズ倍率補正方法およびその装置
JPH0653108A (ja) * 1992-07-27 1994-02-25 Nec Corp 投影式露光装置
JP3629790B2 (ja) * 1995-12-05 2005-03-16 株式会社ニコン 露光装置
JP2852227B2 (ja) * 1996-01-23 1999-01-27 九州日本電気株式会社 縮小投影露光装置
JPH09298151A (ja) * 1996-05-02 1997-11-18 Nikon Corp 投影露光装置
JPH10133150A (ja) * 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
JPH10209033A (ja) * 1997-01-21 1998-08-07 Canon Inc 位置決めステージ装置およびこれを用いた露光装置
JP2000036447A (ja) * 1998-07-17 2000-02-02 Nikon Corp 露光装置及び投影光学系の圧力調整方法
JPH1167657A (ja) * 1997-08-26 1999-03-09 Toshiba Corp 露光装置
JP4026943B2 (ja) * 1997-09-04 2007-12-26 キヤノン株式会社 露光装置およびデバイス製造方法
JP2000294497A (ja) * 1999-04-09 2000-10-20 Seiko Epson Corp 露光装置及び露光方法

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