JP4730970B2 - 高周波用途電子電気部品用樹脂組成物、およびその成形体 - Google Patents
高周波用途電子電気部品用樹脂組成物、およびその成形体 Download PDFInfo
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- JP4730970B2 JP4730970B2 JP2007501626A JP2007501626A JP4730970B2 JP 4730970 B2 JP4730970 B2 JP 4730970B2 JP 2007501626 A JP2007501626 A JP 2007501626A JP 2007501626 A JP2007501626 A JP 2007501626A JP 4730970 B2 JP4730970 B2 JP 4730970B2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 229920001515 polyalkylene glycol Polymers 0.000 description 1
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
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- 125000001424 substituent group Chemical group 0.000 description 1
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- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
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- 239000010936 titanium Substances 0.000 description 1
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- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
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Description
しかしながら、回路基板として、従来使用されているフッ素樹脂銅張り積層板(例えば、特許文献1参照)は、ここに記載してあるように、ガラスクロスにフッ素樹脂ディスパージョンを含浸、焼成させる工程を繰り返し、ガラスクロスにフッ素樹脂を充分に含浸させたプリプレグを作製した後、プリプレグ、フッ素樹脂シートを数枚重ね合わせ、最表面に銅箔を積層して、プレスにより高温加圧成形される。成形工程が複雑な上、バッチ成形のため、コストが高く、生産性が悪い。また、BTレジン、熱硬化性ポリフェニレンエーテルは熱硬化性樹脂のため、フッ素樹脂と同様に、熱硬化・賦形するために、熱プレスによるバッチ成形が必要であり、生産性に劣る。このような状況下、回路基板に要求される特性を保持しつつ、簡単に押出成形、射出成形で成形が可能な加工性(生産性)の良い熱可塑性樹脂材料が求められている。優れた耐熱性、低誘電損失特性を有する熱可塑性樹脂としては、ポリアリーレンサルファイド樹脂、ポリフェニレンエーテル樹脂、ポリアリーレンサルファイド樹脂とポリフェニレンエーテル樹脂のアロイ樹脂組成物(例えば、特許文献2)、シンジオタック構造を有するスチレン系樹脂等が提案されている。
[1](a)ポリアリーレンサルファイド樹脂:5〜95重量%、
(b)ポリフェニレンエーテル樹脂:95〜5重量%、
(c)グリシジル基、オキサゾリル基、酸無水物基のいずれか一つの官能基を有するスチレン系共重合体:(a)成分+(b)成分100重量部当たり1〜20重量部、及び
(d)平均粒径10〜100μmのグラファイト:(a)成分+(b)成分+(c)成分100重量部当たり1〜15重量部
からなる原料組成物を溶融混練りしてなる樹脂組成物であって、1GHzにおける比誘電率が3〜10、誘電正接が0.007以下の誘電特性を有する、1GHz以上の高周波用途電子電気部品用低誘電損失樹脂組成物。
[2]上記[1]に記載の樹脂組成物を成形して得られる成形体。
である。
2a 電解銅箔
2b 電解銅箔
3a 酸化チタンを添加しない樹脂層
3b 酸化チタンを添加した樹脂層
本発明の樹脂組成物は、(a)ポリアリーレンサルファイド樹脂および(b)ポリフェニレンエーテル樹脂、(c)混和剤を主成分とする樹脂組成物で構成されている。
本発明において、(a)成分および(b)成分の配合割合は、成形加工性、特に厚さが100μm以上の押出成形におけるドローダウン改良効果、射出成形におけるバリ抑制効果、誘電特性の観点から、(a)ポリアリーレンサルファイド樹脂40〜99重量%が好ましく、より好ましくは60〜80重量%であり、(b)ポリフェニレンエーテル樹脂1〜60重量%が好ましく、より好ましくは20〜40である。
かかる(c)成分の配合量が1重量部以上であれば、(a)成分のポリアリーレンサルファイド樹脂と(b)成分のポリフェニレンエーテル樹脂との混和性が良くなり、20重量部以下であれば、シート押出成形性、射出成形加工性が改良できる他に、耐熱性(衝撃強度)および靱性と機械的強度に優れた効果をもたらす。
なお、樹脂組成物に使用した原料は下記の通りである。
(a)成分のポリアリーレンサルファイド樹脂
特開平8−253587号公報の実施例1に準じて溶融粘度(フローテスターを用いて、300℃、荷重196N、L/D=10/1で6分間保持した後測定した値。)が500ポイズ、塩化メチレンによる抽出量が0.4重量%、末端−SX基量が26μmol/gのp−フェニレンスルフィドの繰り返し単位を有するリニアタイプのポリフェニレンスルフィド樹脂を得た。
(b)成分のポリフェニレンエーテル系樹脂
2,6−キシレノールを酸化重合し、還元粘度(0.5g/dl、クロロホルム溶液、30℃測定)のポリフェニレンエーテルを得た。
(c)成分の混和剤
グリシジルメタクリレートを5重量%含有するスチレン−グリシジルメタクリレート共重合体(重量平均分子量110,000)をラジカル重合して得た。
(d)成分のグラファイト
フレーク状グラファイト平均粒径5μm(日本黒鉛工業社製、商標J−CPB)、12μm(同、商標CPシリーズCSP)19μm(同、商標CPB)、60μm(同、商標F#3)、130μm(同、商標F#2)、および粒状グラファイト平均粒径20μm(同、商標CGB)を用いた。
(e)成分の金属酸化物
結晶粒径0.19μmのルチル型酸化チタン(タイオキサイド ジャパン株式会社製、商標タイオキサイドR−TC30)を用いた。
・線膨張係数:JIS K7197に準じて測定した。(測定範囲は−30℃〜65℃と80℃〜150℃の二点)
・比誘電率、誘電正接:同軸型共振器(株式会社エー・イー・ティー・ジャパン製)を用いて測定した。
多層成形可能なサブ押出機を有する65mmφ、L/D=28の1軸押出機にダイス幅750mmのリップ幅0.5mmのTダイを取り付けて、シリンダー温度300℃設定にて、表1に示すグラファイト添加樹脂組成物を単層で、表2に示す酸化チタン添加樹脂組成物を単層、および多層で押出し、幅700mm、厚さ500μmのシート成形体を得た。
表3に各樹脂組成物のシート押出成形性とシート成形体の25℃、1GHzにおける誘電特性を示す。
実施例1の平均粒径20μmのグラファイト、実施例2〜4の平均粒径60μmのグラファイトを添加したシートの誘電正接は0.0025以下であり、比較例1の平均粒径5μmのグラファイトを添加したシートの誘電正接0.0045、比較例2の平均粒径130μmのグラファイトを添加したシートの誘電正接0.0038と比べ、誘電正接が小さく誘電特性に優れることが分かる。
また、比較例3の平均粒径60μmのグラファイトを15重量%添加したシートは、誘電正接が0.0072と大きく、誘電損失特性に劣ることが分かる。
また、実施例4のグラファイトを10重量%添加したシートの比誘電率が4.95、誘電正接が0.0025に対し、比較例4の酸化チタンを30重量%添加したシートの比誘電率は4.28、誘電正接が0.0043であり、グラファイトを添加した樹脂組成物は金属酸化物を添加した樹脂組成物に比べ、少ない添加量で比誘電率を上げる効果に優れることが分かる。
参考例1の樹脂組成物で得られた多層シートの両面に18μmの電解銅箔を220℃の加熱温度にてプレスで圧着積層して、図1に示すポリアリーレンサルファイド系樹脂銅張積層板を作製した。図1は該銅張積層板の概略断面図を示す。図中の附番の1は、表2に示す樹脂組成物から形成された実施例5の厚さ0.5mmの押出成形シート(誘電体)を示し、該誘電体1の両面に、夫々18μmの電解銅箔2a、2bが積層されている。
Claims (2)
- (a)ポリアリーレンサルファイド樹脂:5〜95重量%、
(b)ポリフェニレンエーテル樹脂:95〜5重量%、
(c)グリシジル基、オキサゾリル基、酸無水物基のいずれか一つの官能基を有するスチレン系共重合体:(a)成分+(b)成分100重量部当たり1〜20重量部、及び
(d)平均粒径10〜100μmのグラファイト:(a)成分+(b)成分+(c)成分100重量部当たり1〜15重量部
からなる原料組成物を溶融混練りしてなる樹脂組成物であって、1GHzにおける比誘電率が3〜10、誘電正接が0.007以下の誘電特性を有する、1GHz以上の高周波用途電子電気部品用低誘電損失樹脂組成物。 - 請求項1に記載の樹脂組成物を成形して得られる成形体。
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JP2011213090A (ja) * | 2009-09-29 | 2011-10-27 | Sekisui Chem Co Ltd | 樹脂積層板 |
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Also Published As
Publication number | Publication date |
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EP1854845A4 (en) | 2008-12-31 |
WO2006082902A1 (ja) | 2006-08-10 |
CN101115800A (zh) | 2008-01-30 |
JPWO2006082902A1 (ja) | 2008-06-26 |
DE602006021155D1 (de) | 2011-05-19 |
EP1854845B1 (en) | 2011-04-06 |
EP1854845A1 (en) | 2007-11-14 |
US20080113187A1 (en) | 2008-05-15 |
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